公开(公告)号：EP1123955A3

公开(公告)日：2001-09-26

申请号：EP00126680.8

申请日：1998-09-01

Applicant: LUCENT TECHNOLOGIES INC.

Inventor： Bautista, Jerry Rodolfo ,  Chandross, Edwin Arthur ,  Kuck, Valerie Jeanne

IPC: C09D183/04 ,  C03C25/40 ,  C08G77/04 ,  C08K5/07 ,  C08K5/5317

CPC classification number: C09D183/04 ,  C03C17/30 ,  C03C25/106 ,  C03C25/40 ,  C08G77/04 ,  C08K5/07 ,  C08K5/5317 ,  Y10T428/249953 ,  Y10T428/2962 ,  C08L83/04 ,  C08L83/00 ,  C08L2666/28

Abstract: The invention provides a method for coating an article with a siloxane-based coating composition that results in a coating with high thermal mechanical stability, the method also allowing commercially acceptable speeds to be employed while inhibiting beading of the coating prior to cure. In one embodiment, the invention provides a method for coating an article with a modified methylsilsequioxane coating suitable for higher temperature applications than an all-methyl coating. This embodiment involves coating an article with a composition comprising an oligomer characterized by A:B:C, where A represents the number of methyl pendant groups in the oligomer and is about 13 to about 67, B represents dimethyl pendant groups and is about 0 to about 33, and C represents phenyl pendant groups and is about 10 to about 80, a lower aliphatic ketone viscosity-lowering additive, and a catalyst of a moderately strong protic acid.

Abstract translation: 本发明提供了制品用基于硅氧烷的涂层组合物的涂层的方法没有导致具有高的热机械稳定性的涂层，所述方法因此允许抑制而对固化前涂层的卷边待使用商业上可接受的速度。 ，实施例，可以实现在甚至更高的温度的涂层。 该方法涉及通过没甲基三乙氧基硅烷单体与二甲基二单体混合并已部分水解和低聚制备什么施加涂层含有修饰methylsilsequioxane低聚的步骤。

公开(公告)号：EP0940370B1

公开(公告)日：2001-05-23

申请号：EP99301304.4

申请日：1999-02-23

Applicant: LUCENT TECHNOLOGIES INC.

Inventor： Bohrer, Michael Philip ,  Chandross, Edwin Arthur ,  Mixon, David Anton ,  Psota-Kelty, Linda A. ,  Trevor, Dennis J.

IPC: C02F1/72

CPC classification number: C02F1/722 ,  Y10S210/903 ,  Y10S210/908

公开(公告)号：EP1026546A1

公开(公告)日：2000-08-09

申请号：EP99309584.3

申请日：1999-11-30

Applicant: LUCENT TECHNOLOGIES INC.

Inventor： Chandross, Edwin Arthur ,  Dhar, Lisa ,  Galvin-Donoghue, Mary Ellen ,  Lowe-Harris, Alexander ,  Patel, Sanjay ,  Schilling, Marcia Lea ,  Schnoes, Melinda Lamont ,  Wiltzius, Pierre

IPC: G03F7/00 ,  G03H1/02

CPC classification number: G03H1/02 ,  G03F7/001 ,  G03H2001/026 ,  G03H2001/0264 ,  G03H2270/53

Abstract: An improved recording medium is provided having a rigid porous matrix containing a photoimageable system. In contrast to previous media containing porous matrices, the invention allows readable holograms to be written in a medium without the need for solvent processing steps subsequent to irradiation. Due to the rigid nature of the matrix, polymerization and/or diffusion during formation of each individual hologram induces only a small level of Bragg detuning. Temperature fluctuations similarly induce only a small Bragg shift. Improved archival life of recorded holograms and improved fidelity of read-out, as well as improved optical elements, are thereby attained. And the avoidance of solvent processing makes the process of recording holograms far easier than in previous porous matrix-based media.

Abstract translation: 提供了一种改进的记录介质，其具有含有可光成像系统的刚性多孔基体。 与含有多孔基质的以前的介质相比，本发明允许将可读全息图写在介质中，而不需要在照射之后的溶剂处理步骤。 由于基体的刚性，每个单独的全息图的形成过程中的聚合和/或扩散只会引起很少量的布拉格失谐。 温度波动类似地仅引起小的布拉格移位。 从而获得了记录的全息图的改进的存档寿命和读出的改进的保真度以及改进的光学元件。 并且避免溶剂处理使记录全息图的过程比以前的基于多孔基质的介质更容易。

公开(公告)号：EP0940370A3

公开(公告)日：1999-09-15

申请号：EP99301304.4

申请日：1999-02-23

Applicant: LUCENT TECHNOLOGIES INC.

Inventor： Bohrer, Michael Philip ,  Chandross, Edwin Arthur ,  Mixon, David Anton ,  Psota-Kelty, Linda A. ,  Trevor, Dennis J.

IPC: C02F1/72

CPC classification number: C02F1/722 ,  Y10S210/903 ,  Y10S210/908

Abstract: It has been found that in sol-gel processes utilizing TMAH, it is possible to treat a trimethylamine (TRIMA)-containing solution with hydrogen peroxide to form trimethylamine oxide - (CH 3 ) 3 N + -O- (TRIMAO), a water soluble compound which is less volatile and less odorous than TRIMA, and which is capable of being sent to a standard wastewater treatment plant. The hydrogen peroxide is generally added to the TRIMA-containing solution in a H 2 O 2 :TRIMA ratio of at least 3:1, advantageously at least 10:1. Because of the resultant TRIMAO solution's ability to be sent to a standard wastewater treatment facility, improved productivity and lowered expense of the overall fiber fabrication process are obtained. The invention is also suitable for treatment of triethylamine.

Abstract translation: 已经发现，在使用TMAH的溶胶 - 凝胶方法中，可以用过氧化氢处理含有三甲胺（TRIMA）的溶液以形成三甲胺氧化物 - （CH 3）3 N + -O-（TRIMAO），其为水溶性化合物 比TRIMA具有更低的挥发性和更低的臭味，并且能够被送到标准的污水处理厂。 过氧化氢通常以至少3：1，有利地至少10：1的H 2 O 2：TRIMA比率加入到含TRIMA的溶液中。 由于所得到的TRIMAO解决方案能够发送到标准废水处理设施，因此可以提高生产率并降低整个纤维制造过程的成本。 本发明也适用于三乙胺的处理。

公开(公告)号：EP1104035A3

公开(公告)日：2005-04-13

申请号：EP00310305.8

申请日：2000-11-20

Applicant: LUCENT TECHNOLOGIES INC.

Inventor： Chandross, Edwin Arthur ,  Crone, Brian Keith ,  Dodabalapur, Ananth ,  Filas, Robert William

IPC: H01L51/20

CPC classification number: H01L51/0545 ,  H01L21/288 ,  H01L27/283 ,  H01L51/0021 ,  H01L51/0023 ,  H01L51/105

Abstract: The specification describes source/drain contact material that is compatible with organic semiconductors in thin film transistor integrated circuits. The contact material is nickel/gold wherein the nickel is plated as Ni-P on a base conductor, preferably TiN x , by electroless plating, and the gold overlay is deposited by displacement plating. It was found, unexpectedly, that forming Ni/Au contacts in this way extends the lifetime of TFT devices substantially.

Abstract translation: 该规范描述了与薄膜晶体管集成电路中的有机半导体兼容的源极/漏极接触材料。 接触材料是镍/金，其中镍通过无电镀而作为Ni-P电镀在基底导体上，优选为TiN x上，并且通过置换电镀沉积金覆层。 发现意外地，以这种方式形成Ni / Au触点基本上延长了TFT器件的寿命。

公开(公告)号：EP1104035B1

公开(公告)日：2008-08-20

申请号：EP00310305.8

申请日：2000-11-20

Applicant: Lucent Technologies Inc.

Inventor： Chandross, Edwin Arthur ,  Crone, Brian Keith ,  Dodabalapur, Ananth ,  Filas, Robert William

IPC: H01L51/10 ,  H01L51/05

CPC classification number: H01L51/0545 ,  H01L21/288 ,  H01L27/283 ,  H01L51/0021 ,  H01L51/0023 ,  H01L51/105

公开(公告)号：EP1096340A3

公开(公告)日：2004-12-29

申请号：EP00309102.2

申请日：2000-10-16

Applicant: LUCENT TECHNOLOGIES INC.

Inventor： Chandross, Edwin Arthur ,  Raju, Venkataram Reddy ,  Schilling, Marcia Lea ,  Bream, Jeffrey Linn

IPC: G03H1/02

CPC classification number: G03H1/0252 ,  B32B17/10036 ,  G03H1/02 ,  G03H1/181 ,  G03H1/182 ,  G03H2001/0482 ,  G03H2001/0497 ,  G03H2250/37 ,  G03H2260/12 ,  G03H2270/22

Abstract: The specification describes techniques for holography using a photosensitive polymer medium. The shelf life of the photosensitive polymer medium is improved by hermetically sealing the polymer between glass plates. The hermetic seal is designed so that high T g materials, or solder, can be used as the sealant without damage to the polymer already contained between the plates. The hermetic seal comprises metal foils attached to the plates with the edges thereof extending away from the plates in tab-like fashion. The foils are attached prior to filling the assembly with polymer. After filling, the outer edges of the foil tabs are the sealed with local heating away from the site of the polymer, or crimped using mechanical crimping.

Abstract translation: 全息介质使用光敏聚合物介质。 光聚合物介质的保质期通过在玻璃板之间密封聚合物来改善。 气密密封设计成使得高Tg材料或焊料可以用作密封剂，而不损坏已经包含在板之间的聚合物。 气密密封包括附着在板上的金属箔，其边缘以片状方式从板延伸。 在用聚合物填充组件之前将箔连接。 在填充之后，箔片的外边缘是密封的，局部加热远离聚合物的位置，或使用机械卷曲卷曲。

公开(公告)号：EP1026546B1

公开(公告)日：2002-07-31

申请号：EP99309584.3

申请日：1999-11-30

Applicant: LUCENT TECHNOLOGIES INC.

Inventor： Chandross, Edwin Arthur ,  Dhar, Lisa ,  Galvin-Donoghue, Mary Ellen ,  Lowe-Harris, Alexander ,  Patel, Sanjay ,  Schilling, Marcia Lea ,  Schnoes, Melinda Lamont ,  Wiltzius, Pierre

IPC: G03F7/00 ,  G03H1/02

CPC classification number: G03H1/02 ,  G03F7/001 ,  G03H2001/026 ,  G03H2001/0264 ,  G03H2270/53

公开(公告)号：EP1111019A3

公开(公告)日：2001-09-19

申请号：EP00126681.6

申请日：1998-09-01

Applicant: LUCENT TECHNOLOGIES INC.

Inventor： Bautista, Jerry Rodolfo ,  Chandross, Edwin Arthur ,  Kuck, Valerie Jeanne

IPC: C09D183/04 ,  C03C25/40

CPC classification number: C09D183/04 ,  C03C17/30 ,  C03C25/106 ,  C03C25/40 ,  C08G77/04 ,  C08K5/07 ,  C08K5/5317 ,  Y10T428/249953 ,  Y10T428/2962 ,  C08L83/04 ,  C08L83/00 ,  C08L2666/28

Abstract: The invention provides a method for coating an article with a siloxane-based coating composition that results in a coating with high thermal mechanical stability, the method also allowing commercially acceptable speeds to be employed while inhibiting beading of the coating prior to cure. In an embodiment, it is possible to attain an even higher temperature coating. The method involves a step of applying a coating containing modified methylsilsequioxane oligomer that was prepared by mixing methyltriethoxysilane monomer with dimethyldiethoxysilane monomer that has already been partially hydrolyzed and oligomerized.

Abstract translation: 本发明提供了用硅氧烷基涂料组合物涂覆制品的方法，该涂料组合物产生具有高热机械稳定性的涂层，所述方法还允许采用商业上可接受的速度，同时在固化之前抑制涂层成珠。 在一个实施方案中，可以获得更高温度的涂层。 该方法包括施加含有改性甲基倍半硅氧烷低聚物的涂层的步骤，所述改性甲基倍半硅氧烷低聚物通过将甲基三乙氧基硅烷单体与已经部分水解和低聚的二甲基二乙氧基硅烷单体混合而制备。

公开(公告)号：EP1111019A2

公开(公告)日：2001-06-27

申请号：EP00126681.6

申请日：1998-09-01

Applicant: LUCENT TECHNOLOGIES INC.

Inventor： Bautista, Jerry Rodolfo ,  Chandross, Edwin Arthur ,  Kuck, Valerie Jeanne

IPC: C09D183/04

CPC classification number: C09D183/04 ,  C03C17/30 ,  C03C25/106 ,  C03C25/40 ,  C08G77/04 ,  C08K5/07 ,  C08K5/5317 ,  Y10T428/249953 ,  Y10T428/2962 ,  C08L83/04 ,  C08L83/00 ,  C08L2666/28

Abstract: The invention provides a method for coating an article with a siloxane-based coating composition that results in a coating with high thermal mechanical stability, the method also allowing commercially acceptable speeds to be employed while inhibiting beading of the coating prior to cure.
In an embodiment, it is possible to attain an even higher temperature coating. The method involves a step of applying a coating containing modified methylsilsequioxane oligomer that was prepared by mixing methyltriethoxysilane monomer with dimethyldiethoxysilane monomer that has already been partially hydrolyzed and oligomerized.