公开(公告)号：WO1988009049A1

公开(公告)日：1988-11-17

申请号：PCT/US1988001469

申请日：1988-05-10

Applicant: MICROBEAM INC.

Inventor： MICROBEAM INC. ,  PARKER, Norman, William ,  ROBINSON, William, Preston ,  PICCIONI, Robert, Libero

IPC: H01J27/00

CPC classification number: H01J37/317 ,  G03F1/74 ,  H01J37/3056

Abstract: Apparatus and method for repairing semiconductor masks (32) and reticles is disclosed, utilizing a focused ion beam system (8) capable of delivering, from a single ion column, several different species of focused ion beams (12), each of which is individually optimized to meet the differing requirements of the major functions to be performed in mask repair. This method allows the mask (32) to be imaged with high resolution and minimum mask damage. Opaque defects are removed by sputter etching at high rates with minimum damage to the mask substrate (32), with the optional use of a sputter rate enhancing gas such as chlorine, and clear defects are filled in at high rates by deposition of a metallic or other substance compatible with the mask materials by condensation of metal-containing vapor such as chromium hexacarbonyl using a focused ion beam. A focused ion beam column able to produce precisely focused ion beams (12) is employed and is operated at high energies for imaging and sputter etching, and at low energies for imaging and deposition. A liquid metal alloy source (10) containing a plurality of suitable atomic species is employed.

公开(公告)号：WO1988009559A1

公开(公告)日：1988-12-01

申请号：PCT/US1988001694

申请日：1988-05-27

Applicant: MICROBEAM INC.

Inventor： MICROBEAM INC. ,  PARKER, Norman, William

IPC: H01J03/14

CPC classification number: H01J49/288 ,  H01J37/05

Abstract: A Wien filter for use in charged particle beam systems is disclosed, having two opposed resistive magnetic pole pieces (106, 108) separated from a set of excitation coils by an electrically insulating material. Two opposed electric pole pieces (114, 116) are positioned in orthogonal relationship to and in physical contact with the magnetic pole pieces to form a physical aperture through which the charged particles will pass. The resistivity of the magnetic pole pieces is such that sufficient current will flow through them between the electric pole pieces to establish a uniform electric field over the entire physical aperture.

公开(公告)号：WO1988009051A1

公开(公告)日：1988-11-17

申请号：PCT/US1988001470

申请日：1988-05-10

Applicant: MICROBEAM INC.

Inventor： MICROBEAM INC. ,  PARKER, Norman, William ,  TURNBULL, William, Garfield ,  ROBINSON, William, Preston

IPC: H01J49/10

CPC classification number: H01J37/026

Abstract: An integrated charge neutralization and imaging system is disclosed. An energy analyser (44) is mounted directly above a target surface (56) consisting of a 90 degree spherical electrostatic capacitor with variable voltage on both the inner (46) and outer (48) electrodes. Circular apertures (50, 52) are mounted at the entrance and exit of the analyzer to limit the fringing electric field and define the beam size. An electrostatic lens (34) is used for focusing the beam (10) from the electron gun (4) into the virtual object plane (40) of the energy analyzer (44). It is also used to collect secondary electrons (60) or secondary ions leaving the energy analyzer (44) and focus them into the imaging optics. A deflector (20) is used for steering the electron beam (10) onto the axis of the lens. This deflector (20) is also used to steer the secondary electrons (60) or secondary ions into the electron/ion detector (66), or to steer the secondary ions into the SIMS mass filter (84) entrance aperture.