公开(公告)号：WO2010094719A1

公开(公告)日：2010-08-26

申请号：PCT/EP2010/052004

申请日：2010-02-17

Applicant: MAPPER LITHOGRAPHY IP B.V. ,  DE BOER, Guido ,  BALTUSSEN, Sander ,  JAGER, Remco ,  PEIJSTER, Jerry, Johannes, Martinus ,  TEEPEN, Tijs, Frans ,  VAN NIEUWSTADT, Joris, Anne, Henri ,  WEEDA, Willem, Maurits ,  VAN VEEN, Alexander, Hendrik, Vincent

Inventor： DE BOER, Guido ,  BALTUSSEN, Sander ,  JAGER, Remco ,  PEIJSTER, Jerry, Johannes, Martinus ,  TEEPEN, Tijs, Frans ,  VAN NIEUWSTADT, Joris, Anne, Henri ,  WEEDA, Willem, Maurits ,  VAN VEEN, Alexander, Hendrik, Vincent

IPC: H01J37/16 ,  H01J37/18 ,  H01J37/20 ,  H01J37/305 ,  H01J37/317

CPC classification number: H01J37/16 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/165 ,  H01J37/18 ,  H01J37/20 ,  H01J37/305 ,  H01J37/317 ,  H01J37/3174 ,  H01J2237/16

Abstract: The invention relates to a charged particle lithography apparatus (100) with a charged particle source (101) for creating one or more charged particle beams (123), a charged particle projector (108, 109, 110) for projecting the beams onto a wafer; and a moveable wafer stage (132) for carrying the wafer (130). The charged particle source, charged particle projector, and moveable wafer stage are disposed in a common vacuum chamber (140) forming a vacuum environment. The vacuum chamber further has an opening for loading wafers into the chamber and a door.

Abstract translation: 本发明涉及一种具有用于产生一个或多个带电粒子束（123）的带电粒子源（101）的带电粒子光刻设备（100），用于将光束投射到晶片上的带电粒子投影仪（108,109,110） ; 以及用于承载晶片（130）的可移动晶片台（132）。 带电粒子源，带电粒子投影仪和可移动晶片台设置在形成真空环境的公共真空室（140）中。 真空室还具有用于将晶片装载到室中的开口和门。

公开(公告)号：WO2010094804A1

公开(公告)日：2010-08-26

申请号：PCT/EP2010/052221

申请日：2010-02-22

Applicant: MAPPER LITHOGRAPHY IP B.V. ,  DE BOER, Guido ,  BALTUSSEN, Sander ,  DE JONG, Hendrik Jan

Inventor： DE BOER, Guido ,  BALTUSSEN, Sander ,  DE JONG, Hendrik Jan

IPC: H01J37/16 ,  H01J37/18 ,  H01L21/677 ,  H01L21/00 ,  H01J37/317

CPC classification number: H01J37/16 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/18 ,  H01J37/3177 ,  H01L21/67173 ,  H01L21/67178 ,  H01L21/67225

Abstract: An arrangement comprising a plurality of charged particle lithography apparatuses, each charged particle lithography apparatus having a vacuum chamber (400). The arrangement further comprises a common robot (305) for conveying wafers to the plurality of lithography apparatuses, and a wafer load unit (303) for each charged particle lithography apparatus arranged at a front side of each respective vacuum chamber (400). The plurality of lithography apparatuses are arranged in a row with the front side of the lithography apparatuses facing an aisle (310) accommodating passage of the common robot (305) for conveying wafers to each apparatus, and the rear side of each lithography apparatus faces an access corridor (306), and the back wall of each vacuum chamber is provided with an access door for access to the respective lithography apparatus.

Abstract translation: 一种包括多个带电粒子光刻设备的装置，每个带电粒子光刻设备具有真空室（400）。 该装置还包括用于将晶片输送到多个光刻设备的公共机器人（305），以及布置在每个相应的真空室（400）的前侧的每个带电粒子光刻设备的晶片加载单元（303）。 多个光刻设备被布置成一排，其中光刻设备的前侧面向通用机器人（305）的通道（310），用于将晶片传送到每个设备，并且每个光刻设备的后侧面向 通路走廊（306）和每个真空室的后壁设置有用于接近相应光刻设备的通道门。

公开(公告)号：WO2010094801A1

公开(公告)日：2010-08-26

申请号：PCT/EP2010/052218

申请日：2010-02-22

Applicant: MAPPER LITHOGRAPHY IP B.V. ,  BALTUSSEN, Sander

Inventor： BALTUSSEN, Sander

IPC: H01J37/16 ,  H01J37/18 ,  H01L21/677 ,  H01L21/00 ,  H01J37/317

CPC classification number: F17D1/00 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/18 ,  H01J37/3174 ,  H01J2237/1825 ,  Y10S417/901 ,  Y10T137/0396 ,  Y10T137/86083 ,  Y10T137/86131

Abstract: The invention relates to a method of realizing a vacuum in a vacuum chamber (400). The vacuum chamber is connected to a pumping system (300) shared by a plurality of vacuum chambers. The method includes separately pumping down each vacuum chamber. The invention further relates to an arrangement of a plurality of vacuum chambers connected to a pumping system. In this arrangement, the pumping system is arranged for pumping down each vacuum chamber separately.

Abstract translation: 本发明涉及一种在真空室（400）中实现真空的方法。 真空室连接到由多个真空室共享的泵送系统（300）。 该方法包括分别抽吸每个真空室。 本发明还涉及连接到泵送系统的多个真空室的布置。 在这种布置中，泵送系统被布置成分开地抽吸每个真空室。

公开(公告)号：WO2010094724A1

公开(公告)日：2010-08-26

申请号：PCT/EP2010/052009

申请日：2010-02-17

Applicant: MAPPER LITHOGRAPHY IP B.V. ,  BALTUSSEN, Sander ,  DE BOER, Guido ,  MAKKINK, Hugo Martijn ,  TEEPEN, Tijs Frans

Inventor： BALTUSSEN, Sander ,  DE BOER, Guido ,  MAKKINK, Hugo Martijn ,  TEEPEN, Tijs Frans

IPC: H01J37/16 ,  H01J37/18 ,  H01L21/677 ,  H01L21/00 ,  H01J37/317

CPC classification number: H01J37/16 ,  H01J37/18 ,  H01J2237/166 ,  H01L21/67161 ,  H01L21/6719

Abstract: A vacuum chamber (400) comprising a plurality of wall panels (510) enclosing an interior space, in which the wall panels are removably attached to form the chamber using a plurality of connection members (504, 524, 528) for locating the wall panels in a predetermined arrangement. The vacuum chamber further comprises one or more sealing members (522) provided at the edges of the wall panels. The wall panels are arranged so that a vacuum tight seal is formed at the edges of the wall panels as a result of forming a vacuum in the interior space.

Abstract translation: 一种真空室（400），包括围绕内部空间的多个壁板（510），其中所述壁板可移除地连接以形成所述室，所述多个连接构件用于定位所述壁板 以预定的布置。 真空室还包括设置在墙板边缘处的一个或多个密封构件（522）。 壁板被布置成使得由于在内部空间中形成真空而在壁板的边缘处形成真空密封。

公开(公告)号：EP2399271B1

公开(公告)日：2013-01-16

申请号：EP10704835.7

申请日：2010-02-22

Applicant: Mapper Lithography IP B.V.

Inventor： DE BOER, Guido ,  BALTUSSEN, Sander ,  DE JONG, Hendrik Jan

IPC: H01J37/317 ,  H01J37/16 ,  H01J37/18 ,  H01L21/677 ,  H01L21/67 ,  H01L21/00 ,  B82Y10/00

CPC classification number: H01J37/16 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/18 ,  H01J37/3177 ,  H01L21/67173 ,  H01L21/67178 ,  H01L21/67225

公开(公告)号：EP2399273B1

公开(公告)日：2017-06-28

申请号：EP10712025.5

申请日：2010-02-17

Applicant: Mapper Lithography IP B.V.

Inventor： BALTUSSEN, Sander ,  DE BOER, Guido ,  MAKKINK, Hugo Martijn ,  TEEPEN, Tijs Frans

IPC: H01J37/16 ,  H01J37/18 ,  H01L21/677 ,  H01L21/00 ,  H01J37/317

CPC classification number: H01J37/16 ,  H01J37/18 ,  H01J2237/166 ,  H01L21/67161 ,  H01L21/6719

公开(公告)号：EP2399273A1

公开(公告)日：2011-12-28

申请号：EP10712025.5

申请日：2010-02-17

Applicant: Mapper Lithography IP B.V.

Inventor： BALTUSSEN, Sander ,  DE BOER, Guido ,  MAKKINK, Hugo Martijn ,  TEEPEN, Tijs Frans

IPC: H01J37/16 ,  H01J37/18 ,  H01L21/677 ,  H01L21/00 ,  H01J37/317

CPC classification number: H01J37/16 ,  H01J37/18 ,  H01J2237/166 ,  H01L21/67161 ,  H01L21/6719

Abstract: A vacuum chamber (400) comprising a plurality of wall panels (510) enclosing an interior space, in which the wall panels are removably attached to form the chamber using a plurality of connection members (504, 524, 528) for locating the wall panels in a predetermined arrangement. The vacuum chamber further comprises one or more sealing members (522) provided at the edges of the wall panels. The wall panels are arranged so that a vacuum tight seal is formed at the edges of the wall panels as a result of forming a vacuum in the interior space.

Abstract translation: 的真空室包括墙板封闭的内部空间，其中，所述壁板被可拆卸地连接，以形成用连接部件的多个用于以预定的布置定位壁板腔室的复数。 所述真空室还包括在所述壁板的边缘设置一个或多个密封构件。 墙板被布置成做了真空密封在所述壁板的边缘作为形成在所述内部空间中的真空的结果形成的。

公开(公告)号：EP2399272A1

公开(公告)日：2011-12-28

申请号：EP10708159.8

申请日：2010-02-22

Applicant: Mapper Lithography IP B.V.

Inventor： BALTUSSEN, Sander

IPC: H01J37/16 ,  H01J37/18 ,  H01L21/677 ,  H01L21/00 ,  H01J37/317

CPC classification number: F17D1/00 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/18 ,  H01J37/3174 ,  H01J2237/1825 ,  Y10S417/901 ,  Y10T137/0396 ,  Y10T137/86083 ,  Y10T137/86131

Abstract: The invention relates to a method of realizing a vacuum in a vacuum chamber (400). The vacuum chamber is connected to a pumping system (300) shared by a plurality of vacuum chambers. The method includes separately pumping down each vacuum chamber. The invention further relates to an arrangement of a plurality of vacuum chambers connected to a pumping system. In this arrangement, the pumping system is arranged for pumping down each vacuum chamber separately.

公开(公告)号：EP2399270A1

公开(公告)日：2011-12-28

申请号：EP10704819.1

申请日：2010-02-17

Applicant: Mapper Lithography IP B.V.

Inventor： DE BOER, Guido ,  BALTUSSEN, Sander ,  JAGER, Remco ,  PEIJSTER, Jerry, Johannes, Martinus ,  TEEPEN, Tijs, Frans ,  VAN NIEUWSTADT, Joris, Anne, Henri ,  WEEDA, Willem, Maurits ,  VAN VEEN, Alexander, Hendrik, Vincent

IPC: H01J37/16 ,  H01J37/18 ,  H01J37/20 ,  H01J37/305 ,  H01J37/317

CPC classification number: H01J37/16 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/165 ,  H01J37/18 ,  H01J37/20 ,  H01J37/305 ,  H01J37/317 ,  H01J37/3174 ,  H01J2237/16

Abstract: The invention relates to a charged particle lithography apparatus (100) with a charged particle source (101) for creating one or more charged particle beams (123), a charged particle projector (108, 109, 110) for projecting the beams onto a wafer; and a moveable wafer stage (132) for carrying the wafer (130). The charged particle source, charged particle projector, and moveable wafer stage are disposed in a common vacuum chamber (140) forming a vacuum environment. The vacuum chamber further has an opening for loading wafers into the chamber and a door.

公开(公告)号：EP2399270B1

公开(公告)日：2013-06-12

申请号：EP10704819.1

申请日：2010-02-17

Applicant: Mapper Lithography IP B.V.

Inventor： DE BOER, Guido ,  BALTUSSEN, Sander ,  JAGER, Remco ,  PEIJSTER, Jerry, Johannes, Martinus ,  TEEPEN, Tijs, Frans ,  VAN NIEUWSTADT, Joris, Anne, Henri ,  WEEDA, Willem, Maurits ,  VAN VEEN, Alexander, Hendrik, Vincent

IPC: H01J37/16 ,  H01J37/18 ,  H01J37/20 ,  H01J37/305 ,  H01J37/317

CPC classification number: H01J37/16 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/165 ,  H01J37/18 ,  H01J37/20 ,  H01J37/305 ,  H01J37/317 ,  H01J37/3174 ,  H01J2237/16