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    CHARGED PARTICLE OPTICAL DEVICE
    1.
    发明申请
    CHARGED PARTICLE OPTICAL DEVICE 审中-公开
    充电颗粒光学器件

    公开(公告)号：WO2015034362A1

    公开(公告)日：2015-03-12

    申请号：PCT/NL2014/050610

    申请日：2014-09-05

    Applicant: MAPPER LITHOGRAPHY IP B.V.

    Inventor： CHATOOR, Sohail ,  WITTEVEEN, Joost ,  ROSENTHAL, Alon ,  KONING, Johan Joost

    IPC: H01J37/147 ,  H01J37/317

    CPC classification number: G21K1/093 ,  G21K1/087 ,  H01F2007/068 ,  H01J37/1475 ,  H01J37/3177 ,  H01J2237/1526 ,  H01J2237/31774

    Abstract: The invention relates to a charged particle optical device for manipulating a trajectory of multiple beamlets of charged particles. Said charged particle optical device comprising an electromagnetic deflector comprising a planar substrate having an upper side and a lower side of said substrate, and an even thickness. The substrate comprises: a through opening for passing said beamlets there through, wherein said through opening debouches in the upper and lower side of said substrate; a first and a second coil, wherein each of said coils preferably is a substantially helical coil and comprises conducting upper leads arranged at the upper side, conducting lower leads arranged at the lower side, and vias extending through said substrate and which conductively connect one of said upper leads with one of said lower leads for forming said coil; wherein said first and second coils are arranged on either side of the through opening.

    Abstract translation: 本发明涉及一种用于操纵带电粒子的多个子束的轨迹的带电粒子光学装置。 所述带电粒子光学器件包括电磁偏转器，该电磁偏转器包括具有所述基底的上侧和下侧的平面基底和均匀的厚度。 基板包括：用于使所述子束通过的通孔，其中所述通孔在所述基板的上侧和下侧消失; 第一和第二线圈，其中每个所述线圈优选地是基本上螺旋形的线圈，并且包括导通布置在上侧的上引线，导电布置在下侧的下引线，以及延伸穿过所述基板的通孔，并且导电地连接 所述上引线与所述下导线之一形成所述线圈; 其中所述第一和第二线圈布置在所述通孔的任一侧上。

    SYSTEM FOR MAGNETIC SHIELDING
    2.
    发明申请
    SYSTEM FOR MAGNETIC SHIELDING 审中-公开
    磁屏蔽系统

    公开(公告)号：WO2012110465A2

    公开(公告)日：2012-08-23

    申请号：PCT/EP2012/052431

    申请日：2012-02-13

    Applicant: MAPPER LITHOGRAPHY IP B.V. ,  ROSENTHAL, Alon

    Inventor： ROSENTHAL, Alon

    IPC: G03F7/20

    CPC classification number: G03F7/70858 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/708 ,  H01J37/09 ,  H01J37/1475 ,  H01J37/3174 ,  H01J37/3177 ,  H01J2237/0264 ,  H01J2237/31754 ,  H01J2237/31774 ,  H01J2237/31793 ,  H01L21/6719 ,  H01L21/67213

    Abstract: The invention relates to a system for magnetically shielding a charged particle lithography apparatus. The system comprises a first chamber, a second chamber and a set of two coils. The first chamber has walls comprising a magnetic shielding material, and, at least partially, encloses the charged particle lithography apparatus. The second chamber also has walls comprising a magnetic shielding material, and encloses the first chamber. The set of two coils is disposed in the second chamber on opposing sides of the first chamber. The two coils have a common axis.

    Abstract translation: 本发明涉及一种用于磁屏蔽带电粒子光刻设备的系统。 该系统包括第一室，第二室和一组两个盘管。 第一室具有包括磁屏蔽材料的壁，并且至少部分地包围带电粒子光刻设备。 第二室还具有包括磁屏蔽材料的壁，并且包围第一室。 该组两个线圈被布置在第二腔室中的第一腔室的相对侧上。 两个线圈具有公共轴。

    SYSTEM FOR MAGNETIC SHIELDING
    3.
    发明公开
    SYSTEM FOR MAGNETIC SHIELDING 审中-公开
    系统ZUR MAGNETISCHEN ABSCHIRMUNG

    公开(公告)号：EP2676168A2

    公开(公告)日：2013-12-25

    申请号：EP12706000.2

    申请日：2012-02-13

    Applicant: Mapper Lithography IP B.V.

    Inventor： ROSENTHAL, Alon

    IPC: G03F7/20 ,  H01J37/147 ,  H01J37/317 ,  H01L21/67

    CPC classification number: G03F7/70858 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/708 ,  H01J37/09 ,  H01J37/1475 ,  H01J37/3174 ,  H01J37/3177 ,  H01J2237/0264 ,  H01J2237/31754 ,  H01J2237/31774 ,  H01J2237/31793 ,  H01L21/6719 ,  H01L21/67213

    Abstract: The invention relates to a system for magnetically shielding a charged particle lithography apparatus. The system comprises a first chamber, a second chamber and a set of two coils. The first chamber has walls comprising a magnetic shielding material, and, at least partially, encloses the charged particle lithography apparatus. The second chamber also has walls comprising a magnetic shielding material, and encloses the first chamber. The set of two coils is disposed in the second chamber on opposing sides of the first chamber. The two coils have a common axis.

    Abstract translation: 本发明涉及一种用于磁屏蔽带电粒子光刻设备的系统。 该系统包括第一室，第二室和一组两个盘管。 第一室具有包括磁屏蔽材料的壁，并且至少部分地包围带电粒子光刻设备。 第二室还具有包括磁屏蔽材料的壁，并且包围第一室。 该组两个线圈设置在第二腔室的第一腔室的相对侧上。 两个线圈具有公共轴。

    CHARGED PARTICLE OPTICAL DEVICE
    6.
    发明公开
    CHARGED PARTICLE OPTICAL DEVICE 有权
    OPTISCHE VORRICHTUNG MIT GELADENEN TEILCHEN

    公开(公告)号：EP3042386A1

    公开(公告)日：2016-07-13

    申请号：EP14784383.3

    申请日：2014-09-05

    Applicant: Mapper Lithography IP B.V.

    Inventor： CHATOOR, Sohail ,  WITTEVEEN, Joost ,  ROSENTHAL, Alon ,  KONING, Johan Joost

    IPC: H01J37/147 ,  H01J37/317

    CPC classification number: G21K1/093 ,  G21K1/087 ,  H01F2007/068 ,  H01J37/1475 ,  H01J37/3177 ,  H01J2237/1526 ,  H01J2237/31774

    Abstract: The invention relates to a charged particle optical device for manipulating a trajectory of multiple beamlets of charged particles. Said charged particle optical device comprising an electromagnetic deflector comprising a planar substrate having an upper side and a lower side of said substrate, and an even thickness. The substrate comprises: a through opening for passing said beamlets there through, wherein said through opening debouches in the upper and lower side of said substrate; a first and a second coil, wherein each of said coils preferably is a substantially helical coil and comprises conducting upper leads arranged at the upper side, conducting lower leads arranged at the lower side, and vias extending through said substrate and which conductively connect one of said upper leads with one of said lower leads for forming said coil; wherein said first and second coils are arranged on either side of the through opening.

    Abstract translation: 本发明涉及一种用于操纵带电粒子的多个子束轨迹的带电粒子光学装置。 所述带电粒子光学装置包括电磁偏转器，其包括具有所述基板的上侧和下侧的平面基板，并且具有均匀的厚度。 基板包括：用于使所述子束通过的通孔，其中所述通孔在所述基板的上侧和下侧剥离; 第一和第二线圈，其中每个所述线圈优选地是基本上螺旋形的线圈，并且包括导通布置在上侧的上引线，导电布置在下侧的下引线和穿过所述基板的通孔，并且导电地连接 所述上引线与所述下引线之一形成所述线圈; 其中所述第一和第二线圈布置在通孔的任一侧上。

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