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Patent Agency Ranking
公开(公告)号：US09585236B2
公开(公告)日：2017-02-28
申请号：US14260306
申请日：2014-04-24
Applicant: Media Lario S.R.L.
Inventor： Natale M. Ceglio , Daniel Stearns , Richard Levesque
CPC classification number: H05G2/005 , G03F7/70033 , G03F7/70916 , H05G2/006 , H05G2/008
Abstract: A Sn vapor EUV LLP source system for EUV lithography is disclosed. The system generates a Sn vapor column from a supply of Sn liquid. The Sn column has a Sn-atom density of
Abstract translation: 公开了一种用于EUV光刻的Sn蒸气EUV LLP源系统。 该系统从Sn液体供应产生Sn蒸气柱。 Sn柱的Sn原子密度<1019 atoms / cm3，以声速或接近声速行进。 该系统还具有一个Sn蒸汽冷凝器，其布置成接收Sn蒸气柱并冷凝Sn蒸气以形成再循环的Sn液体。 脉冲激光照射Sn蒸气柱的一部分。 每个脉冲产生电子密度<1019电子/ cm 3的低密度Sn等离子体，从而允许低密度Sn等离子体基本上各向同性地发射EUV辐射。
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2.发明授权Source-collector modules for EUV lithography employing a GIC mirror and a LPP source 有权用于采用GIC镜和LPP光源的EUV光刻的源极集电极模块公开(公告)号：US08895946B2
公开(公告)日：2014-11-25
申请号：US13761189
申请日：2013-02-07
Applicant: Media Lario, S.R.L.
Inventor： Natale M. Ceglio , Daniel Stearns , Jacques Kools , Giuseppe Valsecchi , Fabio Zocchi , Riccardo Binda
CPC classification number: H05G2/005 , G02B5/203 , G02B19/0095 , G02B27/425 , G03F7/70033 , G03F7/70166 , G03F7/70316 , G03F7/70575 , G03F7/70916 , G21K1/067 , H05G2/008 , G21K2201/06 , G21K2201/064
Abstract: Source-collector modules for use with EUV lithography systems are disclosed, wherein the source-collector modules employ a laser-produced plasma EUV radiation source and a grazing-incidence collector. The EUV radiation source is generated by first forming an under-dense plasma, and then irradiating the under-dense plasma with infrared radiation of sufficient intensity to create a final EUV-emitting plasma. The grazing incidence collector can include a grating configured to prevent infrared radiation from reaching the intermediate focus. Use of debris mitigation devices preserves the longevity of operation of the source-collector modules.
Abstract translation: 公开了用于EUV光刻系统的源极集电极模块，其中源极 - 集电极模块采用激光产生的等离子体EUV辐射源和放电入射收集器。 通过首先形成低密度等离子体，然后用足够强度的红外辐射照射低密度等离子体来产生EUV辐射源，以产生最终的EUV发射等离子体。 掠入射收集器可以包括被配置为防止红外辐射到达中间焦点的光栅。 使用碎片减轻装置可以保持源 - 收集器模块的使用寿命。
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3.发明申请公开(公告)号：US20160007435A1
公开(公告)日：2016-01-07
申请号：US14325193
申请日：2014-07-07
Applicant: Media Lario S.R.L.
Inventor： Raymond Merrill, JR. , Natale Ceglio , Daniel Stearns
IPC: H05G2/00
CPC classification number: H05G2/008 , G03F7/2039 , G03F7/70033 , G03F7/70166 , G03F7/70175 , G03F7/7055 , G03F7/70916 , H05G2/003 , H05G2/005
Abstract: Systems and methods for synchronous operation of debris-mitigation devices (DMDs) in an EUV radiation source that emits EUV radiation and debris particles are disclosed. The methods include establishing a select relative angular orientation between the first and second DMDs that provides a maximum amount of transmission of EUV radiation between respective first and second rotatable vanes of the first and second DMDs. The methods also include rotating the first and second sets of vanes to capture at least some of the debris particles while substantially maintaining the select relative angular orientation. The systems employ DMD drive units, and an optical-based encoder disc in one of the DMD drive units measures and controls the rotational speed of the rotatable DMD vanes. Systems and methods for optimally aligning the DMDs are also disclosed.
Abstract translation: 公开了在发射EUV辐射和碎屑颗粒的EUV辐射源中同步操作碎片减轻装置（DMD）的系统和方法。 所述方法包括在第一和第二DMD之间建立选择的相对角度取向，其提供在第一和第二DMD的相应的第一和第二可旋转叶片之间的EUV辐射的最大传输量。 所述方法还包括旋转第一组叶片和第二组叶片以捕获碎片颗粒中的至少一些，同时基本保持选择的相对角度取向。 该系统采用DMD驱动单元，并且其中一个DMD驱动单元中的基于光学的编码器盘测量并控制可旋转的DMD叶片的旋转速度。 还公开了用于最佳对准DMD的系统和方法。
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公开(公告)号：US20140326904A1
公开(公告)日：2014-11-06
申请号：US14260306
申请日：2014-04-24
Applicant: Media Lario S.R.L.
Inventor： Natale M. Ceglio , Daniel Stearns , Richard Levesque
IPC: H05G2/00
CPC classification number: H05G2/005 , G03F7/70033 , G03F7/70916 , H05G2/006 , H05G2/008
Abstract: A Sn vapor EUV LLP source system for EUV lithography is disclosed. The system generates a Sn vapor column from a supply of Sn liquid. The Sn column has a Sn-atom density of
Abstract translation: 公开了一种用于EUV光刻的Sn蒸气EUV LLP源系统。 该系统从Sn液体供应产生Sn蒸气柱。 Sn柱的Sn原子密度<1019 atoms / cm3，以声速或接近声速行进。 该系统还具有一个Sn蒸汽冷凝器，其布置成接收Sn蒸气柱并冷凝Sn蒸气以形成再循环的Sn液体。 脉冲激光照射Sn蒸气柱的一部分。 每个脉冲产生电子密度<1019电子/ cm 3的低密度Sn等离子体，从而允许低密度Sn等离子体基本上各向同性地发射EUV辐射。
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公开(公告)号：US09609731B2
公开(公告)日：2017-03-28
申请号：US14325193
申请日：2014-07-07
Applicant: Media Lario S.R.L.
Inventor： Raymond Merrill, Jr. , Natale Ceglio , Daniel Stearns
CPC classification number: H05G2/008 , G03F7/2039 , G03F7/70033 , G03F7/70166 , G03F7/70175 , G03F7/7055 , G03F7/70916 , H05G2/003 , H05G2/005
Abstract: Systems and methods for synchronous operation of debris-mitigation devices (DMDs) in an EUV radiation source that emits EUV radiation and debris particles are disclosed. The methods include establishing a select relative angular orientation between the first and second DMDs that provides a maximum amount of transmission of EUV radiation between respective first and second rotatable vanes of the first and second DMDs. The methods also include rotating the first and second sets of vanes to capture at least some of the debris particles while substantially maintaining the select relative angular orientation. The systems employ DMD drive units, and an optical-based encoder disc in one of the DMD drive units measures and controls the rotational speed of the rotatable DMD vanes. Systems and methods for optimally aligning the DMDs are also disclosed.
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