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公开(公告)号:JP2001230213A
公开(公告)日:2001-08-24
申请号:JP2000035726
申请日:2000-02-14
Applicant: NAT INST OF ADVANCED IND SCIEN
Inventor: OGURA MASAHIKO , HASEGAWA MASATAKA , KOBAYASHI NAOTO
IPC: C30B29/04 , C22F3/00 , H01L21/265
Abstract: PROBLEM TO BE SOLVED: To provide a method for annealing diamond by which the damaged inside of a diamond monocrystal caused by ion implantation or other processes can be restored at a low temperature. SOLUTION: In this method for annealing diamond in which a defective layer generated in the diamond monocrystal at the time of injecting an additional element into the diamond crystal is restored through heat treatment, the temperature of the heat treatment is adjusted to 600-1,100 deg.C, and the inside of the diamond crystal is irradiated with a helium ion beam by adjusting the ion irradiation energy of the ion beam to 40-100 keV.
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公开(公告)号:JP2001168053A
公开(公告)日:2001-06-22
申请号:JP34541099
申请日:1999-12-03
Applicant: NAT INST OF ADVANCED IND SCIEN
Inventor: HASEGAWA MASATAKA , NAKADA JOJI , OGURA MASAHIKO , KOBAYASHI NAOTO , OGUSHI HIDEYO , TAKEUCHI DAISUKE
IPC: H01L21/263 , C30B31/22 , H01L21/265
Abstract: PROBLEM TO BE SOLVED: To make ion-implanted diamond single crystal activated in n-type electrically in an annealing step. SOLUTION: In an annealing method, an amorphous layer and a defective layer generated when impurity atoms (M) is implanted into diamond single crystal 1 are restored by heat treatment. During the heat treatment, ion beam is cast and the impurity atoms are implanted to a position of substitution to activate the diamond single crystal electrically.
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公开(公告)号:DE60035747D1
公开(公告)日:2007-09-13
申请号:DE60035747
申请日:2000-08-30
Inventor: TAKEUCHI DAISUKE , WATANBE HIDEYUKI , OKUSHI HIDEYO , HASEGAWA MASATAKA , OGURA MASAHIKO , KOBAYASHI NAOTO , KAJIMURA KOJI , YAMANAKA SADANORI
IPC: H01L21/04 , H01L21/329 , H01L29/16 , H01L29/861 , H01L31/10 , H01L33/34 , H01L33/40 , H01S3/16 , H01S5/30
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公开(公告)号:DE60035747T2
公开(公告)日:2008-04-30
申请号:DE60035747
申请日:2000-08-30
Inventor: TAKEUCHI DAISUKE , WATANBE HIDEYUKI , OKUSHI HIDEYO , HASEGAWA MASATAKA , OGURA MASAHIKO , KOBAYASHI NAOTO , KAJIMURA KOJI , YAMANAKA SADANORI
IPC: H01L21/04 , H01L21/329 , H01L29/16 , H01L29/861 , H01L31/10 , H01L33/34 , H01L33/40 , H01S3/16 , H01S5/30
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