Optoelectronics semiconductor main body and method for manufacturing optoelectronics semiconductor main body
    5.
    发明专利
    Optoelectronics semiconductor main body and method for manufacturing optoelectronics semiconductor main body 审中-公开
    光电子半导体主体和制造光电半导体主体的方法

    公开(公告)号:JP2014078743A

    公开(公告)日:2014-05-01

    申请号:JP2013260573

    申请日:2013-12-17

    Abstract: PROBLEM TO BE SOLVED: To provide an improved optoelectronics semiconductor main body and to provide a method for manufacturing an improved optoelectronics semiconductor main body.SOLUTION: An optoelectronics semiconductor main body comprises: a substrate (10); an epitaxial semiconductor stacked layer (20) suitable to generate electromagnetic radiations and provided in a first region (14) on a first principal face (12) of the substrate; a first trench (24) in a second region (22) neighboring the first region (14) in the substrate; and at least one second trench (30) provided in the second region (22) outside the first region (14). The at least one second trench (30) at least partially cuts a principal face of the epitaxial semiconductor stacked layer (20) on the side opposite to the substrate (10) off the epitaxial semiconductor stacked layer (20). The second trench (30) is disposed so that the first trench (24) is covered.

    Abstract translation: 要解决的问题:提供一种改进的光电半导体主体,并提供一种制造改进的光电半导体主体的方法。解决方案:一种光电半导体主体,包括:基板(10); 适于产生电磁辐射并且设置在所述基板的第一主面上的第一区域(14)中的外延半导体层叠层(20) 与衬底中的第一区域相邻的第二区域中的第一沟槽(24); 以及设置在第一区域(14)外部的第二区域(22)中的至少一个第二沟槽(30)。 所述至少一个第二沟槽(30)至少部分地在所述外延半导体层叠层(20)上切割所述外延半导体层叠层(20)的与所述衬底(10)相对的一侧的主面。 第二沟槽(30)被布置成使得第一沟槽(24)被覆盖。

    オプトエレクトロニクス半導体チップ

    公开(公告)号:JP2015092636A

    公开(公告)日:2015-05-14

    申请号:JP2015025476

    申请日:2015-02-12

    Abstract: 【課題】動作中に高い効率で光を生成する、量子井戸構造を含むオプトエレクトロニクス半導体チップを実現する。【解決手段】オプトエレクトロニクス半導体チップの少なくとも1つの実施形態では、該オプトエレクトロニクス半導体チップ(1)は窒化物材料系をベースとし、少なくとも1つの活性量子井戸(2)を含む。前記少なくとも1つの活性量子井戸(2)は、動作中に電磁波を生成するように形成されている。さらに、前記少なくとも1つの活性量子井戸(2)は、半導体チップ(1)の成長方向zに対して平行な方向にN個の相互に重なったゾーン(A)を含む。ここで、Nは2以上の自然数である。前記活性量子井戸(2)のゾーン(A)のうち少なくとも2つのゾーンの各平均インジウム含有率cは相互に異なる。【選択図】図1

    OPTO-ELECTRONIC SEMICONDUCTOR CHIP HAVING QUANTUM WELL STRUCTURE
    10.
    发明申请
    OPTO-ELECTRONIC SEMICONDUCTOR CHIP HAVING QUANTUM WELL STRUCTURE 审中-公开
    具有量子头结构的光电子半导体芯片

    公开(公告)号:WO2009036730A2

    公开(公告)日:2009-03-26

    申请号:PCT/DE2008001445

    申请日:2008-08-29

    CPC classification number: H01L33/06 H01L2924/0002 H01L2924/00

    Abstract: The invention relates to an opto-electronic semiconductor chip, which has a radiation-emitting semiconductor layer sequence (1) with an active zone (120). The active zone comprises a first quantum well layer (3), a second quantum well layer (4), and two end barrier layers (51). The first quantum well layer and the second quantum well layer are disposed between the two end barrier layers. The active zone has a semiconductor material, which comprises at least one first and a second component. The fraction of the first component in the semiconductor material of the two end barrier layers is lower than in the first and second quantum well layers. Compared to the first quantum well layer, the second quantum well layer has either a lower layer thickness and a larger fraction of the first component of the semiconductor material, or a higher or the same layer thickness and a lower fraction of the first component of the semiconductor material.

    Abstract translation: 公开了一种光电子半导体芯片,其具有带有有源区(120)的发射辐射的半导体层序列(1)。 有源区包括第一量子阱层(3),第二量子阱层(4)和两个终止势垒层(51)。 第一量子阱层和第二量子阱层设置在两个终止势垒层之间。 有源区包括含有至少第一和第二组分的半导体材料。 两个终止势垒层的半导体材料中第一组分的比例低​​于第一和第二量子阱层中的比例。 与第一量子阱层相比,第二量子阱层具有较小的层厚度和较大比例的半导体材料的第一组分或者较大或相同的层厚度以及较小比例的半导体材料的第一组分。

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