公开(公告)号：EP3161462A4

公开(公告)日：2017-10-04

申请号：EP15812142

申请日：2015-06-19

Applicant: REVERA INCORPORATED

Inventor： POIS HEATH A ,  LEE WEI TI ,  BOT LAWRENCE V ,  KWAN MICHAEL C ,  KLARE MARK ,  LARSON CHARLES THOMAS

IPC: G01B15/02 ,  G01N23/22 ,  G01N23/223 ,  G01N23/227

CPC classification number: G01B15/02 ,  G01N23/223 ,  G01N23/2273

Abstract: Methods and systems for feed-forward of multi-layer and multi-process information using XPS and XRF technolgies are disclosed. In an example, a method of thin film characterization includes measuring first XPS and XRF intensity signals for a sample having a first layer above a substrate. A thickness of the first layer is determined based on the first XPS and XRF intensity signals. The information for the first layer and for the substrate is combined to estimate an effective substrate. Second XPS and XRF intensity signals are measured for a sample having a second layer above the first layer above the substrate. The method also involves determining a thickness of the second layer based on the second XPS and XRF intensity signals, the thickness accounting for the effective substrate.

Abstract translation: 公开了使用XPS和XRF技术前馈多层和多处理信息的方法和系统。 在一个示例中，薄膜表征的方法包括测量具有衬底上方的第一层的样本的第一XPS和XRF强度信号。 基于第一XPS和XRF强度信号确定第一层的厚度。 结合第一层和基底的信息来估计有效底物。 测量第二XPS和XRF强度信号用于在衬底上方的第一层上具有第二层的样本。 该方法还涉及基于第二XPS和XRF强度信号确定第二层的厚度，所述厚度考虑到有效衬底。

公开(公告)号：EP3134712A4

公开(公告)日：2017-11-08

申请号：EP15782815

申请日：2015-04-21

Applicant: REVERA INCORPORATED

Inventor： POIS HEATH A ,  LEE WEI TI

IPC: G01D21/02 ,  G01B15/02 ,  G01N23/22 ,  G01N23/223 ,  G01N23/227

CPC classification number: G01N23/2206 ,  G01B15/02 ,  G01N23/2208 ,  G01N23/223 ,  G01N23/2273 ,  G01N2223/61 ,  G01N2223/6116

Abstract: Systems and approaches for silicon germanium thickness and composition determination using combined XPS and XRF technologies are described. In an example, a method for characterizing a silicon germanium film includes generating an X-ray beam. A sample is positioned in a pathway of said X-ray beam. An X-ray photoelectron spectroscopy (XPS) signal generated by bombarding said sample with said X-ray beam is collected. An X-ray fluorescence (XRF) signal generated by bombarding said sample with said X-ray beam is also collected. Thickness or composition, or both, of the silicon germanium film is determined from the XRF signal or the XPS signal, or both.

公开(公告)号：EP3097383A4

公开(公告)日：2017-08-02

申请号：EP15739786

申请日：2015-01-16

Applicant: REVERA INCORPORATED

Inventor： POIS HEATH A ,  REED DAVID A ,  SCHUELER BRUNO W ,  SMEDT RODNEY ,  FANTON JEFFREY T

IPC: G01N23/201 ,  H01L21/66

CPC classification number: G01N23/201 ,  G01N2223/054 ,  H01L22/12