公开(公告)号：WO2007037931A2

公开(公告)日：2007-04-05

申请号：PCT/US2006/034781

申请日：2006-09-08

Applicant: REVERA INCORPORATED ,  SCHUELER, Bruno, W. ,  REED, David, A.

Inventor： SCHUELER, Bruno, W. ,  REED, David, A.

IPC: H01J40/00

CPC classification number: G01N23/2273 ,  G01N2223/085 ,  G01N2223/6116 ,  H01J2235/08

Abstract: According to one aspect of the present invention, a substrate processing system is provided. The system may include a chamber wall enclosing a chamber, a substrate support positioned within the chamber to support a substrate, an electromagnetic radiation source to emit electromagnetic radiation onto the substrate on the substrate support, the electromagnetic radiation causing photoelectrons to be emitted from a material on the substrate, an analyzer to capture the photoelectrons emitted from the substrate, and a magnetic field generator to generate a magnetic field within the chamber and guide the photoelectrons from the substrate to the analyzer.

Abstract translation: 根据本发明的一个方面，提供了一种基板处理系统。 该系统可以包括封闭腔室的腔室壁，定位在腔室内以支撑基底的基底支撑件，用于将电磁辐射发射到基底支撑件上的基底上的电磁辐射源，电磁辐射导致光电子从材料 在衬底上，捕获从衬底发射的光电子的分析器，以及在室内产生磁场并将光电子从衬底引导到分析器的磁场发生器。

公开(公告)号：WO2016130603A1

公开(公告)日：2016-08-18

申请号：PCT/US2016/017224

申请日：2016-02-10

Applicant: REVERA INCORPORATED

Inventor： BEVIS, Christofer, Frederic ,  NEWCOME, Bruce ,  REED, David, A. ,  SHUELER, Bruno, W. ,  SMEDT, Rodney

IPC: H01J49/26 ,  H01J49/10 ,  G01N23/22 ,  G01Q10/06

CPC classification number: H01J49/142 ,  G01N23/22 ,  G01Q10/04 ,  H01J49/26 ,  H01L22/12

Abstract: A method of measurement and control of the surface potential of a sample using measuring the distribution of kinetic energy of charged particles emitted from a surface of a sample. A shift in kinetic energy of the charged particles is determined and the surface potential of the surface of the sample is changed in response the shift in kinetic energy of the charged particles.

Abstract translation: 使用测量从样品表面发射的带电粒子的动能的分布来测量和控制样品的表面电位的方法。 确定带电粒子的动能的变化，并且样品表面的表面电位响应于带电粒子的动能的变化而改变。

公开(公告)号：EP1929258B1

公开(公告)日：2020-11-18

申请号：EP06814252.0

申请日：2006-09-08

Applicant: ReVera Incorporated

Inventor： SCHUELER, Bruno, W. ,  REED, David, A.

IPC: G01N23/2273 ,  H01L21/67 ,  B65G49/07

公开(公告)号：EP1929258A2

公开(公告)日：2008-06-11

申请号：EP06814252.0

申请日：2006-09-08

Applicant: ReVera Incorporated

Inventor： SCHUELER, Bruno, W. ,  REED, David, A.

IPC: G01J3/42 ,  G01N21/62 ,  H01J1/50 ,  H01J40/00

CPC classification number: G01N23/2273 ,  G01N2223/085 ,  G01N2223/6116 ,  H01J2235/08

Abstract: According to one aspect of the present invention, a substrate processing system is provided. The system may include a chamber wall enclosing a chamber, a substrate support positioned within the chamber to support a substrate, an electromagnetic radiation source to emit electromagnetic radiation onto the substrate on the substrate support, the electromagnetic radiation causing photoelectrons to be emitted from a material on the substrate, an analyzer to capture the photoelectrons emitted from the substrate, and a magnetic field generator to generate a magnetic field within the chamber and guide the photoelectrons from the substrate to the analyzer.