CERAMIC ARTICLE HAVING CORROSION-RESISTANT LAYER, SEMICONDUCTOR PROCESSING APPARATUS INCORPORATING SAME, AND METHOD FOR FORMING SAME
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    发明申请
    CERAMIC ARTICLE HAVING CORROSION-RESISTANT LAYER, SEMICONDUCTOR PROCESSING APPARATUS INCORPORATING SAME, AND METHOD FOR FORMING SAME 审中-公开
    具有耐腐蚀层的陶瓷制品,与其相容的半导体加工装置及其形成方法

    公开(公告)号:WO2005021830A2

    公开(公告)日:2005-03-10

    申请号:PCT/US2004026764

    申请日:2004-08-19

    Abstract: An article-is provided that includes a substrate and a corrosion-resistant coating provided on the substrate. The substrate generally consists essentially of alumina, and the corrosion-resistant coating is provided so as to directed contact the substrate without the provision of intervening layers between the substrate and the corrosion-resistant coatin, such as reaction products provided by high-temperature treatment processes. The corrosion-resistant coating generally consists essentially of a rare earth oxide, and has an adhesion strength not less than about 15 MPa. According to particular embodiments, the article is a ceramic component utilized and implemented in a semiconductor processing apparatus for processing semiconductor wafers.

    Abstract translation: 提供了一种包括衬底和设置在衬底上的耐腐蚀涂层的制品。 基材通常由氧化铝组成,并且提供耐腐蚀涂层以便引导接触基材,而不在基材和耐腐蚀涂层之间提供介入层,例如通过高温处理工艺提供的反应产物 。 耐腐蚀涂层通常基本上由稀土氧化物组成,并且具有不小于约15MPa的粘合强度。 根据特定实施例,制品是在用于处理半导体晶片的半导体处理装置中使用和实现的陶瓷部件。

    CERAMIC ARTICLE HAVING CORROSION-RESISTANT LAYER, SEMICONDUCTOR PROCESSING APPARATUS INCORPORATING SAME, AND METHOD FOR FORMING SAME

    公开(公告)号:SG147461A1

    公开(公告)日:2008-11-28

    申请号:SG2008078750

    申请日:2004-08-19

    Abstract: CERAMIC ARTICLE HAVING CORROSION- RESISTANT LAYER, SEMICONDUCTOR PROCESSING APPARATUS INCORPORATING SAME, AND METHOD FOR FORMING SAME An article-is provided that includes a substrate and a corrosion-resistant coating provided on the substrate. The substrate generally consists essentially of alumina, and the corrosion-resistant coating is provided so as to directed contact the substrate without the provision of intervening layers between the substrate and the corrosion-resistant coatin, such as reaction products provided by high-temperature treatment processes. The corrosion-resistant coating generally consists essentially of a rare earth oxide, and has an adhesion strength not less than about 15 MPa. According to particular embodiments, the article is a ceramic component utilized and implemented in a semiconductor processing apparatus for processing semiconductor wafers. Fig.1

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