公开(公告)号：CA2176337A1

公开(公告)日：1995-05-26

申请号：CA2176337

申请日：1994-11-16

Applicant: SANDIA CORP

Inventor： GREENLY JOHN B

IPC: B29C35/08 ,  B29C59/16 ,  C23C8/36 ,  C23C14/48 ,  G21K5/04 ,  H01J3/04 ,  H01J27/00 ,  H01J27/08 ,  H01J27/14 ,  H01J37/08 ,  H01L21/48

Abstract: An improved magnetically-confined anode plasma pulsed ion beam source (25). Beam rotation effects and power efficiency are improved by a magnetic design which places the separatrix between the fast field flux structure (408) and the slow field structure (414) near the anode (410) of the ion beam source, by a gas port design (404, 406) which localizes the gas delivery into the gap between the fast coil (408) and the anode (410), by a pre-ionizer ringing circuit connected to the fast coil, and by a bias field means (180) which optimally adjusts the plasma formation position in the ion beam source.

公开(公告)号：AU1179095A

公开(公告)日：1995-06-06

申请号：AU1179095

申请日：1994-11-16

Applicant: SANDIA CORP

Inventor： GREENLY JOHN B

IPC: B29C35/08 ,  B29C59/16 ,  C23C8/36 ,  C23C14/48 ,  G21K5/04 ,  H01J3/04 ,  H01J27/00 ,  H01J27/08 ,  H01J27/14 ,  H01J37/08 ,  H01L21/48

Abstract: Methods and apparatus for thermally altering the near surface characteristics of a material are described. In particular, a repetitively pulsed ion beam system comprising a high energy pulsed power source and an ion beam generator are described which are capable of producing single species high voltage ion beams (0.25-2.5 MeV) at 1-1000 kW average power and over extended operating cycles (108). Irradiating materials with such high energy, repetitively pulsed ion beams can yield surface treatments including localized high temperature anneals to melting, both followed by rapid thermal quenching to ambient temperatures to achieve both novel and heretofore commercially unachievable physical characteristics in a near surface layer of material.

公开(公告)号：EP0729640A4

公开(公告)日：1997-07-16

申请号：EP95901916

申请日：1994-11-16

Applicant: SANDIA CORP

Inventor： BLOOMQUIST DOUGLAS D ,  BUCHHEIT RUDY ,  GREENLY JOHN B ,  MCINTYRE DALE C ,  NEAU EUGENE L ,  STINNETT REGAN W

IPC: B29C35/08 ,  B29C59/16 ,  C23C8/36 ,  C23C14/48 ,  G21K5/04 ,  H01J3/04 ,  H01J27/00 ,  H01J27/08 ,  H01J27/14 ,  H01J37/08 ,  H01L21/48

CPC classification number: C08J7/123 ,  B29C59/16 ,  B29C2035/0872 ,  C23C8/36 ,  C23C14/48 ,  H01J27/14 ,  H01J2237/08 ,  H01J2237/31701

Abstract: A method and apparatus for treating material surfaces (13) using a repetitively pulsed ion beam (11). In particular, the treatment is tailored by adjusting treatment parameters of a pulsed ion beam (11) to a duration less than or equal to 1000 ns and a repetition rate of less than 1 Hz.

公开(公告)号：EP0729641A4

公开(公告)日：1997-04-09

申请号：EP95902561

申请日：1994-11-16

Applicant: SANDIA CORP

Inventor： GREENLY JOHN B

IPC: B29C35/08 ,  B29C59/16 ,  C23C8/36 ,  C23C14/48 ,  G21K5/04 ,  H01J3/04 ,  H01J27/00 ,  H01J27/08 ,  H01J27/14 ,  H01J37/08 ,  H01L21/48

CPC classification number: C08J7/123 ,  B29C59/16 ,  B29C2035/0872 ,  C23C8/36 ,  C23C14/48 ,  H01J27/14 ,  H01J2237/08 ,  H01J2237/31701

Abstract: An improved magnetically-confined anode plasma pulsed ion beam source (25). Beam rotation effects and power efficiency are improved by a magnetic design which places the separatrix between the fast field flux structure (408) and the slow field structure (414) near the anode (410) of the ion beam source, by a gas port design (404, 406) which localizes the gas delivery into the gap between the fast coil (408) and the anode (410), by a pre-ionizer ringing circuit connected to the fast coil, and by a bias field means (180) which optimally adjusts the plasma formation position in the ion beam source.

公开(公告)号：CA2176339A1

公开(公告)日：1995-05-26

申请号：CA2176339

申请日：1994-11-16

Applicant: SANDIA CORP

Inventor： BLOOMQUIST DOUGLAS D ,  BUCHHEIT RUDY ,  GREENLY JOHN B ,  MCINTYRE DALE C ,  NEAU EUGENE L ,  STINNETT REGAN W

IPC: B29C35/08 ,  B29C59/16 ,  C23C8/36 ,  C23C14/48 ,  G21K5/04 ,  H01J3/04 ,  H01J27/00 ,  H01J27/08 ,  H01J27/14 ,  H01J37/08 ,  H01L21/48

Abstract: A method and apparatus for treating material smfaces (13) using a repetitively pulsed ion beam (11). In particular, the treatment is tailored by adjusting treatment parameters of a pulsed iorl beam (11) to a duration less than or equal to 1000 ns and a repetition rate of less than 1 Hz.

公开(公告)号：ZA9409098B

公开(公告)日：1995-08-24

申请号：ZA9409098

申请日：1994-11-16

Applicant: SANDIA CORP

Inventor： BLOOMQUIST DOUGLAS D ,  BUCHHEIT RUDY ,  GREENLY JOHN B ,  MCINTYRE DALE C ,  NEAU EUGENE L ,  STINNETT REGAN W

IPC: B29C35/08 ,  B29C59/16 ,  C23C8/36 ,  C23C14/48 ,  G21K5/04 ,  H01J3/04 ,  H01J27/00 ,  H01J27/08 ,  H01J27/14 ,  H01J37/08 ,  H01L21/48 ,  C23C

CPC classification number: C08J7/123 ,  B29C59/16 ,  B29C2035/0872 ,  C23C8/36 ,  C23C14/48 ,  H01J27/14 ,  H01J2237/08 ,  H01J2237/31701

公开(公告)号：AU1098195A

公开(公告)日：1995-06-06

申请号：AU1098195

申请日：1994-11-16

Applicant: SANDIA CORP

Inventor： BLOOMQUIST DOUGLAS D ,  BUCHHEIT RUDY ,  GREENLY JOHN B ,  MCINTYRE DALE C ,  NEAU EUGENE L ,  STINNETT REGAN W

IPC: B29C35/08 ,  B29C59/16 ,  C23C8/36 ,  C23C14/48 ,  G21K5/04 ,  H01J3/04 ,  H01J27/00 ,  H01J27/08 ,  H01J27/14 ,  H01J37/08 ,  H01L21/48

公开(公告)号：AU677480B2

公开(公告)日：1997-04-24

申请号：AU1098195

申请日：1994-11-16

Applicant: SANDIA CORP

Inventor： BLOOMQUIST DOUGLAS D ,  BUCHHEIT RUDY ,  GREENLY JOHN B ,  MCINTYRE DALE C ,  NEAU EUGENE L ,  STINNETT REGAN W

IPC: B29C35/08 ,  B29C59/16 ,  C23C8/36 ,  C23C14/48 ,  G21K5/04 ,  H01J3/04 ,  H01J27/00 ,  H01J27/08 ,  H01J27/14 ,  H01J37/08 ,  H01L21/48

公开(公告)号：ZA949098B

公开(公告)日：1995-08-24

申请号：ZA949098

申请日：1994-11-16

Applicant: SANDIA CORP

Inventor： BLOOMQUIST DOUGLAS D ,  BUCHHEIT RUDY ,  GREENLY JOHN B ,  MCINTYRE DALE C ,  NEAU EUGENE L ,  STINNETT REGAN W

IPC: B29C35/08 ,  B29C59/16 ,  C23C8/36 ,  C23C14/48 ,  G21K5/04 ,  H01J3/04 ,  H01J27/00 ,  H01J27/08 ,  H01J27/14 ,  H01J37/08 ,  H01L21/48 ,  C23C

Abstract: Methods and apparatus for thermally altering the near surface characteristics of a material are described. In particular, a repetitively pulsed ion beam system comprising a high energy pulsed power source and an ion beam generator are described which are capable of producing single species high voltage ion beams (0.25-2.5 MeV) at 1-1000 kW average power and over extended operating cycles (108). Irradiating materials with such high energy, repetitively pulsed ion beams can yield surface treatments including localized high temperature anneals to melting, both followed by rapid thermal quenching to ambient temperatures to achieve both novel and heretofore commercially unachievable physical characteristics in a near surface layer of material.