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    SIMULTANEOUS AND SELECTIVE PARTITIONING OF VIA STRUCTURES USING PLATING RESIST
    1.
    发明申请
    SIMULTANEOUS AND SELECTIVE PARTITIONING OF VIA STRUCTURES USING PLATING RESIST 审中-公开
    通过使用耐蚀材料的结构的同时选择性分选

    公开(公告)号：WO2006094307A2

    公开(公告)日：2006-09-08

    申请号：PCT/US2006008334

    申请日：2006-03-06

    Applicant: SANMINA SCI CORP

    Inventor： DUDNIKOV GEORGE JR ,  GISIN FRANZ

    CPC classification number: H05K3/429 ,  H05K1/0257 ,  H05K1/0259 ,  H05K1/116 ,  H05K1/167 ,  H05K3/184 ,  H05K3/422 ,  H05K2201/0187 ,  H05K2201/0738 ,  H05K2201/096 ,  H05K2201/09645 ,  H05K2201/09718 ,  H05K2201/09881 ,  Y10T29/49117 ,  Y10T29/49124 ,  Y10T29/49126 ,  Y10T29/49139 ,  Y10T29/49155 ,  Y10T29/49156 ,  Y10T29/49165

    Abstract: Systems and methods for simultaneously partitioning a plurality of via structures into electrically isolated portions by using plating resist within a PCB stackup are disclosed. Such via structures are made by selectively depositing plating resist in one or more locations in a sub-composite structure. A plurality of sub-composite structures with plating resist deposited in varying locations are laminated to form a PCB stackup of a desired PCB design. Through-holes are drilled through the PCB stackup through conductive layers, dielelectric layers and through the plating resist. Thus, the PCB panel has multiple through-holes that can then be plated simultaneously by placing the PCB panel into a seed bath, followed by immersion in an electroless copper bath. Such partitioned vias increase wiring density and limit stub formation in via structures. Such partitioned vias allow a plurality of electrical signals to traverse each electrically isolated portion without interference from each other.

    Abstract translation: 公开了通过在PCB堆叠中使用电镀抗蚀剂将多个通孔结构同时分隔成电隔离部分的系统和方法。 通过在子复合结构中的一个或多个位置选择性地沉积电镀抗蚀剂来制造这种通孔结构。 具有在不同位置沉积的电镀抗蚀剂的多个亚复合结构层压以形成期望的PCB设计的PCB堆叠。 通过导电层，电介质层和电镀抗蚀剂在PCB堆叠中钻出通孔。 因此，PCB面板具有多个通孔，然后可以通过将PCB面板放置在种子池中，然后浸入无电解铜浴中而同时进行电镀。 这种分隔的通孔增加布线密度并限制通孔结构中的短截线形成。 这种分隔的通孔允许多个电信号穿过每个电隔离部分而没有彼此的干扰。

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