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公开(公告)号：WO9927333A9
公开(公告)日：1999-08-26
申请号：PCT/US9824897
申请日：1998-11-20
Applicant: SENSYS INSTR CORP , UNIV LELAND STANFORD JUNIOR
Inventor： STANKE FRED E , KHURI-YAKUB B T , DEGERTEKIN FAHRETTIN LEVENT , PHAM HUNG
CPC classification number: G01H5/00 , G01N29/075 , G01N29/326 , G01N29/348 , G01N2291/012 , G01N2291/0231 , G01N2291/02854 , G01N2291/02881 , G01N2291/0421 , G01N2291/0422
Abstract: A system (150) is disclosed that employs ultrasonic waves to perform in-situ measurements to determine the properties of films (152) deposited on substrates in the course of various semiconductor or processing steps. In one embodiment, a single transducer (156) excites incident acoustic waves at multiple frequencies that reflect from the films. The reflected waves are received by the same transducer. An analysis system (162) determines the phase shift of the received reflected waves and, based on the phase shift, determines the film properties. Other embodiments employ distinct source and receiving transducers. Embodiments are also disclosed that compensate the measured phase shift for temperature variations in the substrate. In one such system, temperature compensation is performed based on the processing of phase measurements made at multiple frequencies or incidence angles or with multiple ultrasonic modes. The disclosed techniques are equally applicable to determining the degree of erosion of chamber members.
Abstract translation: 公开了一种系统（150），其采用超声波来执行原位测量以确定在各种半导体或处理步骤过程中沉积在衬底上的膜（152）的性质。 在一个实施例中，单个换能器（156）以多个从膜反射的频率激发入射声波。 反射波由同一个换能器接收。 分析系统（162）确定接收到的反射波的相移，并且基于相移来确定膜特性。 其他实施例采用不同的源和接收换能器。 本发明还公开了补偿所测量的基板中温度变化的相移的实施例。 在一个这样的系统中，基于在多个频率或入射角或多个超声波模式下进行的相位测量的处理来执行温度补偿。 所公开的技术同样适用于确定腔室构件的侵蚀程度。
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公开(公告)号：WO0057127A9
公开(公告)日：2002-03-28
申请号：PCT/US0007709
申请日：2000-03-22
Applicant: SENSYS INSTR CORP , STANKE FRED E , WEBER GRABAU MICHAEL , RUTH DOUGLAS E , TONG EDRIC H , CAHILL JAMES M JR , CARLISLE CLINTON , BURKE ELLIOT , PHAM HUNG
Inventor： STANKE FRED E , WEBER-GRABAU MICHAEL , RUTH DOUGLAS E , TONG EDRIC H , CAHILL JAMES M JR , CARLISLE CLINTON , BURKE ELLIOT , PHAM HUNG
IPC: B24B49/12 , G01B11/06 , G01B11/24 , G01B11/30 , G01N21/21 , G01N21/95 , H01L21/66 , H01L21/67 , H01L21/683 , C23C16/52 , G01N21/88 , H01L21/304
CPC classification number: B24B49/12 , G01B11/0625 , G01B11/30 , G01N21/211 , G01N21/9501 , H01L21/67 , H01L22/12
Abstract: This invention is an apparatus for imaging metrology, which in particular embodiments may be integrated with a processor station such that a metrology station is apart from but coupled to a process station. The metrology station is provided with a first imaging camera with a first field of view containing the measurement region. Alternate embodiments include a second imaging camera with a second field of view. Preferred embodiments comprise a broadband ultraviolet light source, although other embodiments may have a visible or near infrared light source of broad or narrow optical bandwidth. Embodiments including a broad bandwidth source typically include a spectrograph, or an imaging spectrograph. Particular embodiments may include curved, reflective optics or a measurement region wetted by a liquid. In a typical embodiment, the metrology station and the measurement region are configured to have 4 degrees of freedom of movement relative to each other.
Abstract translation: 本发明是一种用于成像测量的装置，其在特定实施例中可以与处理器站集成，使得计量站离开处理站而不是耦合到处理站。 计量站设置有具有包含测量区域的第一视野的第一成像照相机。 替代实施例包括具有第二视野的第二成像相机。 优选实施例包括宽带紫外光源，但是其他实施例可以具有宽或窄光带宽的可见光或近红外光源。 包括宽带宽源的实施例通常包括光谱仪或成像光谱仪。 具体实施例可以包括弯曲的，反射光学的或由液体润湿的测量区域。 在典型的实施例中，计量站和测量区域被配置为具有相对于彼此的4个移动自由度。
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公开(公告)号：AU4175800A
公开(公告)日：2000-10-09
申请号：AU4175800
申请日：2000-03-22
Applicant: SENSYS INSTR CORP
Inventor： STANKE FRED E , WEBER-GRABAU MICHAEL , RUTH DOUGLAS E , TONG EDRIC H , CAHILL JAMES M JR , CARLISLE CLINTON , BURKE ELLIOT , PHAM HUNG
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公开(公告)号：AU1596899A
公开(公告)日：1999-06-15
申请号：AU1596899
申请日：1998-11-20
Applicant: SENSYS INSTR CORP , UNIV LELAND STANFORD JUNIOR
Inventor： STANKE FRED E , KHURI-YAKUB B T , DEGERTEKIN FAHRETTIN LEVENT , PHAM HUNG
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