公开(公告)号：WO0215238A3

公开(公告)日：2002-10-03

申请号：PCT/US0125196

申请日：2001-08-10

Applicant: SENSYS INSTR CORP

Inventor： WEBER-GRABAU MICHAEL ,  TONG EDRIC H ,  NORTON ADAM E ,  STANKE FRED E ,  CAHILL JAMES M ,  RUTH DOUGLAS E ,  JOHNSON KENNETH C

IPC: H01L21/66 ,  G01N21/956 ,  G03F7/20 ,  H01L21/02 ,  H01L21/027 ,  G01R31/311

CPC classification number: G03F7/70625 ,  G01N21/956

Abstract: A wafer measurement station (19) integrated within a process tool (11) has a scatterometry instrument (35) for measuring patterned features on wafers (31). A wafer handler (17) feeds wafers between a cassette (15) and one or more process stations (13) of the process tool. Wafers presented to the measurement station are held on a wafer support (33), which may be moveable, and a scatterometry instrument has an optical measurement system (41) that is moveable by a stage (39) over the wafer support. A window (37) isolates the moveable optics from the wafer. The optical measurement system are microscope-based optics forming a low NA system. The illumination spot size at the wafer is larger than a periodicity of the patterned features, and data processing uses a scattering model to analyze the optical signature of the collected light.

Abstract translation: 集成在处理工具（11）内的晶片测量站（19）具有用于测量晶片（31）上的图案特征的散射仪（35）。 晶片处理器（17）在处理工具的盒（15）和一个或多个处理站（13）之间馈送晶片。 提供给测量站的晶片保持在可以是可移动的晶片支撑件（33）上，并且散射仪器具有可由晶片支撑件上的台（39）移动的光学测量系统（41）。 窗口（37）将可移动光学器件与晶片隔离。 光学测量系统是形成低NA系统的基于显微镜的光学器件。 晶片上的照明光点尺寸大于图案化特征的周期，数据处理使用散射模型来分析所收集的光的光学特征。

公开(公告)号：WO0057127A9

公开(公告)日：2002-03-28

申请号：PCT/US0007709

申请日：2000-03-22

Applicant: SENSYS INSTR CORP ,  STANKE FRED E ,  WEBER GRABAU MICHAEL ,  RUTH DOUGLAS E ,  TONG EDRIC H ,  CAHILL JAMES M JR ,  CARLISLE CLINTON ,  BURKE ELLIOT ,  PHAM HUNG

Inventor： STANKE FRED E ,  WEBER-GRABAU MICHAEL ,  RUTH DOUGLAS E ,  TONG EDRIC H ,  CAHILL JAMES M JR ,  CARLISLE CLINTON ,  BURKE ELLIOT ,  PHAM HUNG

IPC: B24B49/12 ,  G01B11/06 ,  G01B11/24 ,  G01B11/30 ,  G01N21/21 ,  G01N21/95 ,  H01L21/66 ,  H01L21/67 ,  H01L21/683 ,  C23C16/52 ,  G01N21/88 ,  H01L21/304

CPC classification number: B24B49/12 ,  G01B11/0625 ,  G01B11/30 ,  G01N21/211 ,  G01N21/9501 ,  H01L21/67 ,  H01L22/12

Abstract: This invention is an apparatus for imaging metrology, which in particular embodiments may be integrated with a processor station such that a metrology station is apart from but coupled to a process station. The metrology station is provided with a first imaging camera with a first field of view containing the measurement region. Alternate embodiments include a second imaging camera with a second field of view. Preferred embodiments comprise a broadband ultraviolet light source, although other embodiments may have a visible or near infrared light source of broad or narrow optical bandwidth. Embodiments including a broad bandwidth source typically include a spectrograph, or an imaging spectrograph. Particular embodiments may include curved, reflective optics or a measurement region wetted by a liquid. In a typical embodiment, the metrology station and the measurement region are configured to have 4 degrees of freedom of movement relative to each other.

Abstract translation: 本发明是一种用于成像测量的装置，其在特定实施例中可以与处理器站集成，使得计量站离开处理站而不是耦合到处理站。 计量站设置有具有包含测量区域的第一视野的第一成像照相机。 替代实施例包括具有第二视野的第二成像相机。 优选实施例包括宽带紫外光源，但是其他实施例可以具有宽或窄光带宽的可见光或近红外光源。 包括宽带宽源的实施例通常包括光谱仪或成像光谱仪。 具体实施例可以包括弯曲的，反射光学的或由液体润湿的测量区域。 在典型的实施例中，计量站和测量区域被配置为具有相对于彼此的4个移动自由度。

公开(公告)号：AU4175800A

公开(公告)日：2000-10-09

申请号：AU4175800

申请日：2000-03-22

Applicant: SENSYS INSTR CORP

Inventor： STANKE FRED E ,  WEBER-GRABAU MICHAEL ,  RUTH DOUGLAS E ,  TONG EDRIC H ,  CAHILL JAMES M JR ,  CARLISLE CLINTON ,  BURKE ELLIOT ,  PHAM HUNG

IPC: B24B49/12 ,  G01B11/06 ,  G01B11/24 ,  G01B11/30 ,  G01N21/21 ,  G01N21/95 ,  H01L21/66 ,  H01L21/67 ,  H01L21/683 ,  C23C16/52 ,  G01N21/88 ,  H01L21/304

公开(公告)号：AU8124301A

公开(公告)日：2002-02-25

申请号：AU8124301

申请日：2001-08-10

Applicant: SENSYS INSTR CORP

Inventor： WEBER-GRABAU MICHAEL ,  TONG EDRIC H ,  NORTON ADAM E ,  STANKE FRED E ,  CAHILL JAMES M JR ,  RUTH DOUGLAS E ,  JOHNSON KENNETH C

IPC: H01L21/66 ,  G01N21/956 ,  G03F7/20 ,  H01L21/02 ,  H01L21/027 ,  H01L21/00

Abstract: A wafer measurement station integrated within a process tool has a scatterometry instrument for measuring patterned features on wafers. A wafer handler feeds wafers between a cassette and one or more process stations of the process tool. Wafers presented to the measurement station are held on a wafer support, which may be moveable, and a scatterometry instrument has an optical measurement system that is moveable by a stage over the wafer support. A window isolates the moveable optics from the wafer. The optical measurement system are microscope-based optics forming a low NA system. The illumination spot size at the wafer is larger than a periodicity of the patterned features, and data processing uses a scattering model to analyze the optical signature of the collected light.