Transfer film, in particular for durable embedding of toner images

    公开(公告)号:DE3139341A1

    公开(公告)日:1983-04-21

    申请号:DE3139341

    申请日:1981-10-02

    Applicant: SIEMENS AG

    Abstract: In connection with X-ray electrography, toner images must be transferred onto a transparent base by means of an extremely fine-grained powder and with very flat gradation, and durably embedded therein. This is carried out by means of a transfer film comprising a commercially available polyethylene terephthalate film onto which a gelatin coating has been applied with high adherence. Just before the toner image is transferred, the gelatin coating is temporarily softened, and the transfer coating prepared in this way is pressed onto the toner image using moderate pressure.

    8.
    发明专利
    未知

    公开(公告)号:DE2531163A1

    公开(公告)日:1977-02-03

    申请号:DE2531163

    申请日:1975-07-11

    Applicant: SIEMENS AG

    Abstract: 1484542 Cleaning and activating circuit boards for soldering SIEMENS A G 4 May 1976 [11 July 1975] 18120/76 Heading C7U [Also in Division B3] The solderability of electric circuit boards with Cu or Cu alloy conductor paths is improved by cleaning the boards in an aqueous solution containing a non ionic surfactant and an organic acid and then activating in an aqueous solution containing potassium peroxy disulphate (persulphate) and an acid. The preferred cleaning solution contains 20-100g/l of an hydroxyethylated alkyl phenol and 15-80g/l of an organic acid such as formic acid. The activating solution is preferably saturated with the potassium peroxydisulphate the pH adjusted to 2-4 with H 2 SO 4 and stabilized with phosphoric acid. The boards may be rinsed with water between treatments and also retreated in the cleaning solution after treating in the activating solution. Colophony or soldering lacquers may then be applied and dried.

    9.
    发明专利
    未知

    公开(公告)号:DE3870685D1

    公开(公告)日:1992-06-11

    申请号:DE3870685

    申请日:1988-02-02

    Applicant: SIEMENS AG

    Abstract: Electroplating appts. to produce fine-structured thick metal deposits, e.g. a flat-topped humps of quadratic shape, 140 x 140 mu or less and max. 18 mu high +/- 1 mu on a chip module, uses an electroplating bath containing a flattener in which the electroplating cell is immersed. The latter consists of an anode, a cathode, an aperture ring and a holder for a semiconductor wafer. The external circuit contains an activated ring and a holder for a semiconductor wafer. The external circuit contains an activated carbon filter.

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