Abstract:
PROBLEM TO BE SOLVED: To provide a method of manufacturing polarizing element capable of obtaining a polarizing element which is excellent in a heat radiation characteristic, has a large area, has uniform in-plain spectral characteristic distribution and has high reliability. SOLUTION: The method includes: a step of pressing a mold 21 against a resist layer 12a while heating a transparent quartz substrate 11a and a resist layer 12a to at least the temperature of softening the resist layer 12a, subsequently, cooling the resist layer 12b until the resist layer 12b is cured, thereafter, drawing the mold 21 and, thereby, forming the grid-like first irregularities 13 transferred from the mold 21 on the resist layer 12b; a step of etching the quartz substrate 11a by using the resist layer 12b as a mask and, thereby, forming the grid-like second irregularities 14 corresponding to the first irregularities 13 on the surface of a quartz substrate 11b; and a step of performing sputter-film forming for the surface of the quartz substrate 11b from an oblique direction and, thereby, forming an inorganic fine particle layer 15 on an apex or at least one side surface part of the second irregularities 14. COPYRIGHT: (C)2008,JPO&INPIT
Abstract:
PROBLEM TO BE SOLVED: To decrease etching quantity of a 2nd pole which serves as a mask at the time of etching. SOLUTION: A method for manufacturing a thin-film magnetic head made by forming a 1st and a 2nd magnetic core so as to opposite to each other through a magnetic gap is provided with a 1st magnetic layer forming process for forming a 1st magnetic layer 4 becoming a 1st magnetic core on a base body, a nonmagnetic layer forming process for forming a nonmagnetic layer 6 becoming a magnetic gap on the 1st magnetic layer 4, a 2nd magnetic layer forming process for forming a 2nd magnetic layer 11 in a specific shape becoming a 2nd magnetic core on the nonmagnetic layer 6 and an etching process for making the nonmagnetic layer 6 and 1st magnetic layer 4 integrally in a specific shape by etching the nonmagnetic layer 6 and 1st magnetic layer 4 by using the 2nd magnetic layer as a mask. In the etching process, when the nonmagnetic layer 6 is etched, etching is carried out by reactive ion etching and when the 1st magnetic layer 4 is etched, etching is carried out by ion beam etching.
Abstract:
PROBLEM TO BE SOLVED: To provide a thin angular velocity sensor. SOLUTION: The angular velocity sensor 1 has: a vibrator section 101 containing a plurality of vibration sections actuated by the same drive signal in a first surface in two directions which are not parallel; and a frame body 102 supporting the vibrator section. The sensor is equipped with: a sensor element 100 which generates the signals corresponding to angular velocities around a first axis and a second axis along the first surface in predetermined two directions and to angular velocity around a third axis in the direction which intersects perpendicularly with the first surface; a self-excited oscillation circuit 201 which outputs the drive signal; a controller 200 which has a detection circuit outputting the angular velocities around the first, second and third axes based on the signal corresponding to each angular velocity; and a circuit board 400 having the sensor element and the controller mounted thereon. COPYRIGHT: (C)2011,JPO&INPIT
Abstract:
PROBLEM TO BE SOLVED: To reduce an element resistance value and to reduce variations in resistance value among channels. SOLUTION: A composite magnetic head 10 in which a magnetic head for reproduction and a magnetic head for recording are stacked and a multi-track magnetic head equipped with the same have a lead-out conductor LMR which is connected to a magnetoresistive effect element and led out and a lead-out conductor LIND which is led out of a coil constituting the magnetic head for recording, the lead-out conductor LMR being made thicker on the side where the lead-out conductor LIND is formed. COPYRIGHT: (C)2005,JPO&NCIPI
Abstract:
PROBLEM TO BE SOLVED: To provide a method for producing a polarizing element, which can easily obtain a polarizing element with a large area in which the distribution of the spectral characteristics in the plane is uniform and which has high reliability in a short time, and to provide a polarizing element produced with the method for producing a polarizing element. SOLUTION: The method for producing the polarizing element comprises: a photolithography step where a resist layer 13a is formed on either main face of a substrate 11a (c) transparent to visible light and in which a pair of confronted edge faces are respectively made into slopes where the other main face overflows to either main face, and ultraviolet light is made incident so as to be oblique to the surface of the resist layer 13a and also in such a manner that the incident optical flux face including the light flux of the ultraviolet light is made vertical to the faces made into the slopes, thus interference exposure (d) and development (e) are performed regarding the resist layer 13a; an etching step (f) where either main face side of the substrate 11a is subjected to etching to form a diffraction grating-shaped concavo-convex part 14 on either main face; and an inorganic fine particle layer-forming step (g) where an inorganic fine particle layer 15 is formed on the top or one side face part of the convex part in the concavo-convex part 14. COPYRIGHT: (C)2010,JPO&INPIT
Abstract:
PROBLEM TO BE SOLVED: To provide an angular velocity sensor which is excellent in sensitivity and enables its productivity to be improved, and provide a method for manufacturing the same. SOLUTION: The method for manufacturing the angular velocity sensor includes respectively preparing a substrate 111 which has a thickness corresponding to that of a vibrator section 102, and a substrate 112 thicker than the substrate 111. An insulating film 112a is formed on the substrate 112. An aperture 90 is formed on the insulating film 112a in order to expose a surface of the substrate 112. The substrate 111 and the substrate 112 are laminated so as to sandwich the insulating film 112a. A piezoelectric layer 7 is formed on the substrate 111. The vibrator section 102 is formed in a region on the substrate 111 corresponding to a position on which the aperture 90 is formed. The substrate 111 and the substrate 112 are cut, thereby forming the outline of a base section 103. COPYRIGHT: (C)2010,JPO&INPIT
Abstract:
PROBLEM TO BE SOLVED: To provide a thin-film magnetic head, in which irregularities in the frame width of an upper-layer pole is excluded, and to provide a manufacturing method. SOLUTION: In this thin-film magnetic head 40, an upper-layer pole 46 is provided between a back yoke 44, which is formed on a conductor coil and a gap. When a resist frame 53, which is used to form the upper-layer pole 46, is formed by a photolithographic method, in such a way that the time which elapses until a photoresist is exposed and developed after it is coated, is maintained so as to be constant. Thereby, this thin-film magnetic head in which irregularities in the frame width of the upper-layer pole 46 are excluded and whose performance quality is superior can be obtained, and its manufacturing method can be obtained.
Abstract:
PROBLEM TO BE SOLVED: To provide a thin film magnetic head provided with a magneto-resistance effect type magnetic head element in which disturbance of magnetic domain structure in a magnetic shield layer by a high saturation magnetic flux density material is suppressed and occurrence of Barkhausen noise is suppressed, and its manufacturing method. SOLUTION: In this thin film magnetic head, the magnetic shield layer 34 of the magneto-resistance effect type magnetic head element is formed by a frame plated layer made by using a frame 12 with the frame width larger than 4.0 μm and less than 9.0 μm, and the magnetic shield layer 34 is formed by the high saturation magnetic flux density material. COPYRIGHT: (C)2006,JPO&NCIPI
Abstract:
PROBLEM TO BE SOLVED: To uniformly irradiate a substrate with a beam and to eliminate the variation of the etching quantity within the substrate by largely repetitively turning the substrate in an intra-surface direction in an etching stage using the ion beam. SOLUTION: When the substrate is not turned, the substrate is irradiated with the ion beam 30 approximately parallel with the longs side on the upper surface of a second pole 8. The substrate is repetitively turned and moved back and forth between the position of 180 deg. in a plus direction and a position of 180 deg. in a minus direction. As the substrate is turned, the irradiation direction of the ion beam 30 with second pole 8 changes and the portion which is the shade of the second pole 8 changes accordingly. The direction where the irradiation direction of the ion beam 30 with the second pole 8 is successively varied by repetitively moving the substrate within a specified range. Even if, therefore, the shape of the second pile 8 is asymmetrical on the front side and the rear side, the uniform irradiation with the ion beam 30 is made possible.
Abstract:
PROBLEM TO BE SOLVED: To provide a method for manufacturing a thin-film magnetic head whose the record fringing is reduced by preventing a nonmagnetic layer and a 1st magnetic body which are left at the time of trim etching and removed matters from being restuck. SOLUTION: This method is provided with a 1st magnetic body forming process for forming a 1st magnetic body 4 becoming a 1st magnetic core on a base body, a nonmagnetic layer forming process for forming a nonmagnetic layer 6 becoming a magnetic gap on the 1st magnetic body, a 2nd magnetic body forming process for forming a 2nd magnetic body 11 in a specific shape becoming a 2nd magnetic core on the nonmagnetic layer 6 and an etching process for making the nonmagnetic layer 6 and the 1st magnetic body 4 integrally in a specific shape by ion beam etching by using the 2nd magnetic body 11 as a mask. Then, in the etching process, 1st etching is carried out while the base body is slanted at a specific angle to the incidence direction of the ion beam and is repeatedly rotated within a specific angle range and 2nd etching is carried out while the base body is slanted within an angle range larger than that of the 1st etching and is repeatedly rotated within an angle range larger than that of the 1st etching.