Abstract:
L'invention concerne un procédé d'écriture de données dans une mémoire non volatile (MA, XA) comportant des cellules mémoire devant être effacées avant d'être écrites. Le procédé comprend les étapes consistant à prévoir une zone mémoire principale non volatile (MA) comprenant des pages cibles, prévoir une zone mémoire auxiliaire non volatile (XA) comprenant des pages auxiliaires, prévoir une table de correspondance (VAM) pour associer à une adresse (RAD) de page cible invalide une adresse (XAD) de page auxiliaire valide, et, en réponse à une commande (CMD) d'écriture d'une donnée dans une page cible écrire la donnée ainsi que l'adresse de la page cible dans une première page auxiliaire effacée, invalider la page cible, et mettre à jour la table de correspondance.
Abstract:
L'invention concerne un procédé d'écriture de données dans une mémoire non volatile. Le procédé comprend les étapes consistant à prévoir, dans la mémoire, une zone mémoire principale (MA) non volatile comprenant des pages cible, une zone mémoire auxiliaire (XA) non volatile comprenant des pages auxiliaires, et, dans la zone mémoire auxiliaire : un secteur courant (CUR) comprenant des pages auxiliaires effacées utilisables pour écrire des données, un secteur de sauvegarde (ERM) comprenant des pages auxiliaires contenant des données rattachées à des pages cible à effacer ou en cours d'effacement, un secteur de transfert (CTM) comprenant des pages auxiliaires contenant des données à transférer dans des pages cible effacées, et un secteur indisponible (UNA) comprenant des pages auxiliaires à effacer ou en cours d'effacement. Application notamment aux mémoires Flash.
Abstract:
The invention relates to an electrically erasable programmable memory which is integrated onto a silicon substrate, comprising a memory area consisting of normal bit lines (BLj) and normal memory cells (C(i, j)) which are connected to the aforementioned normal bit lines (BLj). Each normal memory cell consists of a floating gate transistor (FGT) comprising a tunnel window (TW) and a selection transistor (ST). According to the invention, the memory area (MA) includes at least one memory point of a non-volatile register (NVREG), comprising: a normal memory cell (C(i+1, j) which is connected to a normal bit line (BLj) of the memory area and which can be erased and programmed using decoders (RDEC, CDEC) of the memory area; a special memory cell C(i+1, j+1) comprising a floating gate transistor (FGT) without a tunnel window, the floating gate of the floating gate transistor of the special memory cell being connected to the floating gate of the floating gate transistor of the normal memory cell; and a special bit line (RBL+1) which is used to connect the special memory cell of the memory point to a specific read-out circuit of the memory point.
Abstract:
The invention relates to an electronic charge retention circuit for time measurement, implanted in an array of EEPROM memory cells, each comprising a selection transistor in series with a floating-gate transistor, the circuit comprising, on any one row of memory cells: a first subassembly of at least a first cell (C1), the thickness of the dielectric of the tunnel window of the floating-gate transistor of which is less than that of the other cells; a second subassembly of at least a second cell (C2), the drain and source of the floating-gate transistor of which are interconnected; a third subassembly of at least a third cell (7); and a fourth subassembly of at least a fourth cell (6), the tunnel window of which is omitted, the respective floating gates of the transistors of the cells of the four subassemblies being interconnected.
Abstract:
The invention relates to a method of controlling an electronic charge retention circuit for time measurement, comprising at least a first capacitive element (C1), the dielectric of which has a leakage, and at least a second capacitive element (C2), the dielectric of which has a higher capacitance than the first, the two elements having a common electrode defining a floating node (F) that can be connected to an element (5) for measuring its residual charge, in which a charge retention period is programmed or initialized by injecting or extracting charges via the first element.
Abstract:
The invention relates to a method and a circuit for reading an electronic charge retention element (10) for a temporal measurement, of the type comprising at least one capacitive element (C1, C2) whose dielectric exhibits a leakage and a transistor with insulated control terminal (5) for reading the residual charges, the reading circuit comprising: two parallel branches between two supply terminals, each branch comprising at least one transistor of a first type (P1, P2) and one transistor of a second type (N3, 5), the transistor of the second type of one of the branches consisting of that of the element to be read and the transistor of the second type of the other branch receiving, on its control terminal, a staircase signal (VDAC), the respective drains of the transistors of the first type being connected to the respective inputs of a comparator (135) whose output (OUT) provides an indication of the residual voltage in the charge retention element.
Abstract:
The invention relates to an electronic charge retention circuit for time measurement, comprising: at least a first capacitive element (C1), a first electrode (21) of which is connected to a floating node (F); at least a second capacitive element (C2), a first electrode (31) of which is connected to said floating node (F), the first capacitive element having a leakage through its dielectric space (23) and the second capacitive element having a capacitance greater than the first; and at least a first transistor (5) having an isolated control terminal connected to said floating node.