公开(公告)号：US20160246002A1

公开(公告)日：2016-08-25

申请号：US15047205

申请日：2016-02-18

Applicant: Si-Ware Systems

Inventor： Bassam Saadany ,  Yasser M. Sabry ,  Mostafa Medhat ,  Bassem Mortada ,  Muhammed Nagi ,  Mohamed Sadek ,  Yasseen Nada ,  Khaled Hassan

IPC: G02B6/136 ,  G02B6/36

CPC classification number: G02B6/136 ,  B81B2201/047 ,  B81C1/00833 ,  G01B9/02051 ,  G01J3/0259 ,  G01J3/453 ,  G02B6/3692

Abstract: A micro-optical bench device is fabricated by a process that provides control over one or more properties of the micro-optical bench device and/or one or more properties of optical surfaces in the micro-optical bench device. The process includes etching a substrate to form a permanent structure including optical elements and a temporary structure. The shape of the temporary structure and gaps between the temporary structure and permanent structure facilitate control of a property of the micro-optical bench and/or optical surfaces therein. The process further includes removing the temporary structure from an optical path of the micro-optical bench device.

Abstract translation: 通过提供对微型光学台装置的一个或多个特性的控制和/或微型光学台装置中的光学表面的一个或多个特性的方法制造微型光学台装置。 该方法包括蚀刻衬底以形成包括光学元件和临时结构的永久结构。 临时结构的形状和临时结构和永久结构之间的间隙便于控制微光学台和/或其中的光学表面的性质。 该方法还包括从微型光学平台装置的光路中移除临时结构。

公开(公告)号：US20160246010A1

公开(公告)日：2016-08-25

申请号：US15047032

申请日：2016-02-18

Applicant: Si-Ware Systems

Inventor： Mostafa Medhat ,  Bassem Mortada ,  Yasser Sabry ,  Sebastian Nazeer ,  Yasseen Nada ,  Mohamed Sadek ,  Bassam A. Saadany

IPC: G02B6/36 ,  B05D5/06 ,  B05B15/04 ,  C23C30/00

Abstract: A shadow mask having two or more levels of openings enables selective step coverage of micro-fabricated structures within a micro-optical bench device. The shadow mask includes a first opening within a top surface of the shadow mask and a second opening within the bottom surface of the shadow mask. The second opening is aligned with the first opening and has a second width less than a first width of the first opening. An overlap between the first opening and the second opening forms a hole within the shadow mask through which selective coating of micro-fabricated structures within the micro-optical bench device may occur.

Abstract translation: 具有两个或多个开口级别的荫罩使得可以在微型光学台装置内的微结构的选择性阶梯覆盖。 荫罩包括在荫罩的顶表面内的第一开口和荫罩的底表面内的第二开口。 第二开口与第一开口对准并且具有小于第一开口的第一宽度的第二宽度。 第一开口和第二开口之间的重叠在荫罩内形成一个孔，通过该孔可以发生微光学工作台装置内的微结构的选择性涂层。

公开(公告)号：US11499218B2

公开(公告)日：2022-11-15

申请号：US16730947

申请日：2019-12-30

Applicant: Si-Ware Systems

Inventor： Mostafa Medhat ,  Bassem Mortada ,  Yasser Sabry ,  Sebastian Nazeer ,  Yasseen Nada ,  Mohamed Sadek ,  Bassam A. Saadany

IPC: C23C14/04 ,  C23C16/04 ,  H01L21/68 ,  B81C1/00 ,  B05B12/20

Abstract: A shadow mask having two or more levels of openings enables selective step coverage of micro-fabricated structures within a micro-optical bench device. The shadow mask includes a first opening within a top surface of the shadow mask and a second opening within the bottom surface of the shadow mask. The second opening is aligned with the first opening and has a second width less than a first width of the first opening. An overlap between the first opening and the second opening forms a hole within the shadow mask through which selective coating of micro-fabricated structures within the micro-optical bench device may occur.

公开(公告)号：US10562055B2

公开(公告)日：2020-02-18

申请号：US15047032

申请日：2016-02-18

Applicant: Si-Ware Systems

Inventor： Mostafa Medhat ,  Bassem Mortada ,  Yasser Sabry ,  Sebastian Nazeer ,  Yasseen Nada ,  Mohamed Sadek ,  Bassam A. Saadany

IPC: B05B12/20 ,  C23C14/04 ,  C23C16/04 ,  H01L21/68 ,  B81C1/00

Abstract: A shadow mask having two or more levels of openings enables selective step coverage of micro-fabricated structures within a micro-optical bench device. The shadow mask includes a first opening within a top surface of the shadow mask and a second opening within the bottom surface of the shadow mask. The second opening is aligned with the first opening and has a second width less than a first width of the first opening. An overlap between the first opening and the second opening forms a hole within the shadow mask through which selective coating of micro-fabricated structures within the micro-optical bench device may occur.

公开(公告)号：US10120134B2

公开(公告)日：2018-11-06

申请号：US15047205

申请日：2016-02-18

Applicant: Si-Ware Systems

Inventor： Bassam Saadany ,  Yasser M. Sabry ,  Mostafa Medhat ,  Bassem Mortada ,  Muhammed Nagi ,  Mohamed Sadek ,  Yasseen Nada ,  Khaled Hassan

IPC: G02B6/12 ,  G02B6/136 ,  G02B6/36 ,  G01B9/02 ,  B81C1/00 ,  G01J3/453 ,  G01J3/02

Abstract: A micro-optical bench device is fabricated by a process that provides control over one or more properties of the micro-optical bench device and/or one or more properties of optical surfaces in the micro-optical bench device. The process includes etching a substrate to form a permanent structure including optical elements and a temporary structure. The shape of the temporary structure and gaps between the temporary structure and permanent structure facilitate control of a property of the micro-optical bench and/or optical surfaces therein. The process further includes removing the temporary structure from an optical path of the micro-optical bench device.