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Patent Agency Ranking
公开(公告)号：US20160246010A1
公开(公告)日：2016-08-25
申请号：US15047032
申请日：2016-02-18
Applicant: Si-Ware Systems
Inventor： Mostafa Medhat , Bassem Mortada , Yasser Sabry , Sebastian Nazeer , Yasseen Nada , Mohamed Sadek , Bassam A. Saadany
Abstract: A shadow mask having two or more levels of openings enables selective step coverage of micro-fabricated structures within a micro-optical bench device. The shadow mask includes a first opening within a top surface of the shadow mask and a second opening within the bottom surface of the shadow mask. The second opening is aligned with the first opening and has a second width less than a first width of the first opening. An overlap between the first opening and the second opening forms a hole within the shadow mask through which selective coating of micro-fabricated structures within the micro-optical bench device may occur.
Abstract translation: 具有两个或多个开口级别的荫罩使得可以在微型光学台装置内的微结构的选择性阶梯覆盖。 荫罩包括在荫罩的顶表面内的第一开口和荫罩的底表面内的第二开口。 第二开口与第一开口对准并且具有小于第一开口的第一宽度的第二宽度。 第一开口和第二开口之间的重叠在荫罩内形成一个孔，通过该孔可以发生微光学工作台装置内的微结构的选择性涂层。
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公开(公告)号：US10562055B2
公开(公告)日：2020-02-18
申请号：US15047032
申请日：2016-02-18
Applicant: Si-Ware Systems
Inventor： Mostafa Medhat , Bassem Mortada , Yasser Sabry , Sebastian Nazeer , Yasseen Nada , Mohamed Sadek , Bassam A. Saadany
Abstract: A shadow mask having two or more levels of openings enables selective step coverage of micro-fabricated structures within a micro-optical bench device. The shadow mask includes a first opening within a top surface of the shadow mask and a second opening within the bottom surface of the shadow mask. The second opening is aligned with the first opening and has a second width less than a first width of the first opening. An overlap between the first opening and the second opening forms a hole within the shadow mask through which selective coating of micro-fabricated structures within the micro-optical bench device may occur.
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公开(公告)号：US11499218B2
公开(公告)日：2022-11-15
申请号：US16730947
申请日：2019-12-30
Applicant: Si-Ware Systems
Inventor： Mostafa Medhat , Bassem Mortada , Yasser Sabry , Sebastian Nazeer , Yasseen Nada , Mohamed Sadek , Bassam A. Saadany
Abstract: A shadow mask having two or more levels of openings enables selective step coverage of micro-fabricated structures within a micro-optical bench device. The shadow mask includes a first opening within a top surface of the shadow mask and a second opening within the bottom surface of the shadow mask. The second opening is aligned with the first opening and has a second width less than a first width of the first opening. An overlap between the first opening and the second opening forms a hole within the shadow mask through which selective coating of micro-fabricated structures within the micro-optical bench device may occur.
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公开(公告)号：US11085825B2
公开(公告)日：2021-08-10
申请号：US16368771
申请日：2019-03-28
Applicant: Si-Ware Systems
Inventor： Mostafa Medhat , Bassem Mortada , Yasser Sabry , Mohamed Hossam , Momen Anwar , Ahmed Shebl , Hisham Haddara , Bassam A. Saadany
Abstract: Aspects of the disclosure relate to a self-referenced spectrometer for providing simultaneous measurement of a background or reference spectral density and a sample or other spectral density. The self-referenced spectrometer includes an interferometer optically coupled to receive an input beam and to direct the input beam along a first optical path to produce a first interfering beam and a second optical path to produce a second interfering beam, where each interfering beam is produced prior to an output of the interferometer. The spectrometer further includes a detector optically coupled to simultaneously detect a first interference signal produced from the first interfering beam and a second interference signal produced from the second interfering beam, and a processor configured to process the first interference signal and the second interference signal and to utilize the second interference signal as a reference signal in processing the first interference signal.
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公开(公告)号：US20190301939A1
公开(公告)日：2019-10-03
申请号：US16368771
申请日：2019-03-28
Applicant: Si-Ware Systems
Inventor： Mostafa Medhat , Bassem Mortada , Yasser Sabry , Mohamed Hossam , Momen Anwar , Ahmed Shebl , Hisham Haddara , Bassam A. Saadany
Abstract: Aspects of the disclosure relate to a self-referenced spectrometer for providing simultaneous measurement of a background or reference spectral density and a sample or other spectral density. The self-referenced spectrometer includes an interferometer optically coupled to receive an input beam and to direct the input beam along a first optical path to produce a first interfering beam and a second optical path to produce a second interfering beam, where each interfering beam is produced prior to an output of the interferometer. The spectrometer further includes a detector optically coupled to simultaneously detect a first interference signal produced from the first interfering beam and a second interference signal produced from the second interfering beam, and a processor configured to process the first interference signal and the second interference signal and to utilize the second interference signal as a reference signal in processing the first interference signal.
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