Optical scanning system for surface inspection

    公开(公告)号:AU3376597A

    公开(公告)日:1998-01-05

    申请号:AU3376597

    申请日:1997-06-03

    Abstract: In an optical scanning system for detecting particles and pattern defects on a sample surface, a light beam is focused to an illuminated spot on the surface and the spot is scanned across the surface along a scan line. A detector is positioned adjacent to the surface to collect scattered light from the spot where the detector includes a one- or two-dimensional array of sensors. Light scattered from the illuminated spot at each of a plurality of positions along the scan line is focused onto a corresponding sensor in the array. A plurality of detectors symmetrically placed with respect to the illuminating beam detect laterally and forward scattered light from the spot. The spot is scanned over arrays of scan line segments shorter than the dimensions of the surface. A bright field channel enables the adjustment of the height of the sample surface to correct for errors caused by height variations of the surface. Different defect maps provided by the output of the detectors can be compared to identify and classify the defects. The imaging function of the array of sensors combines the advantages of a scanning system and an imaging system while improving signal/background ratio of the system.

    SCANNING SYSTEM FOR INSPECTING ANOMALIES ON SURFACES
    2.
    发明公开
    SCANNING SYSTEM FOR INSPECTING ANOMALIES ON SURFACES 失效
    RASTERVORRICHTUNG ZUR UNTERSUCHUNG VONOBERFLÄCHENANOMALITÄTEN

    公开(公告)号:EP0797763A4

    公开(公告)日:1999-03-24

    申请号:EP95943768

    申请日:1995-12-08

    Abstract: A high sensitivity and high throughput surface inspection system directs a focused beam of light (38) at a grazing angle towards the surface to be inspected (40). Relative motion is caused between the beam (38) and the surface (40) so that the beam (38) scans a scan path covering substantially the entire surface and light scattered along the path is collected for detecting anomalies. The scan path comprises a plurality of arrays of straight scan path segments. The focused beam of light (38) illuminates an area of the surface between 5-15 microns in width and this system is capable of inspecting in excess of about 40 wafers per hour for 150 millimeter diameter wafers (6-inch wafers), in excess of about 20 wafers per hour for 200 millimeter diameter wafers (8-inch wafers) and in excess of about 10 wafers per hour for 300 millimeter diameter wafers (12-inch wafers).

    Abstract translation: 一种用于检测表面(40)上的异常(例如颗粒或图案缺陷)的光学系统,包括:光学器件(22,26,34,36),其布置成提供以倾斜角照射表面的辐射束(38) ; 至少两个检测器(110a,110b,111a,111b); 布置成收集从表面散射的辐射的至少两个光学元件(110a,110b,111a,111b),每个光学元件布置成将所收集的散射辐射引导到相应的一个检测器,使得检测器提供输出信号 响应于此,其中光学元件被定位成使得每个检测器感测从表面沿不同方向散射的辐射; 一种装置,包括使所述梁和所述表面之间相对运动的移动台(124); 以及处理器(200)处理来自所述检测器输出信号的信息,所述信号涉及从所述检测器的不同方向从所述表面的不同部分散射的辐射,并且被布置为识别异常; 所述装置还包括声光偏转器(30),使得每个移动台和声光偏转器引起光束和表面之间的相对运动,使得光束扫描覆盖基本上整个表面的扫描路径,所述扫描路径 所述扫描路径段包括扫描路径段(50,50',50“,50”)的多个阵列,其中所述扫描路径段中的至少一些具有比所述表面(40)的尺寸短的跨度,并且因此 使光束照射表面的不同部分,并且使得检测器响应于由光束照射的表面的不同部分的辐射而提供输出信号。

    OPTICAL SCANNING SYSTEM FOR SURFACE INSPECTION
    3.
    发明公开
    OPTICAL SCANNING SYSTEM FOR SURFACE INSPECTION 失效
    OPTISCHE RASTERVORRICHTUNG FUR OBERFLAECHENPRUEFUNG

    公开(公告)号:EP0979398A4

    公开(公告)日:2000-02-16

    申请号:EP97929786

    申请日:1997-06-03

    CPC classification number: G01N21/95607 G01N21/94 G01N21/9501

    Abstract: In an optical scanning system (200) for detecting particles and pattern defects on a sample surface (240), a light beam (238) is focused to an illuminated spot on the surface and the spot is scanned across a scan line. A detector (11b) is positioned adjacent to the surface to collect scattered light from the spot where the detector includes a one- or two-dimensional array of sensors. Light scattered from the illuminated spot at each of a plurality of positions along the scan line is focused onto a corresponding sensor in the array. A plurality of detectors symmetrically placed with respect to the illuminating beam detect laterally and forward scattered light from the spot.

    Abstract translation: 在用于检测样本表面(240)上的粒子和图案缺陷的光学扫描系统(200)中,光束(238)被聚焦到表面上的照亮点,并且该点在扫描线上被扫描。 检测器(11b)定位在表面附近以收集来自检测器包括传感器的一维或二维阵列的点的散射光。 在沿着扫描线的多个位置中的每一个处从照明点散射的光被聚焦到阵列中的相应传感器上。 相对于照明光束对称放置的多个检测器检测来自该点的横向和前向散射光。

    OPTICAL WAFER POSITIONING SYSTEM
    5.
    发明公开
    OPTICAL WAFER POSITIONING SYSTEM 失效
    光学基片定位系统

    公开(公告)号:EP0804713A4

    公开(公告)日:1999-03-24

    申请号:EP95916365

    申请日:1995-04-13

    CPC classification number: G01N21/9501 G01N21/94 G01N21/956

    Abstract: A surface height detection and positioning device for use in a surface inspection system. A light beam (25) impinges obliquely upon the surface (22), and a position detector (38) with a mechanical window (45) defining an aperture (46) receives specularly reflected light (33) producing a plurality of electrical signals. The aperture's width (46), along a scan direction, is of sufficient size to create a train of signals from each of the plurality of signals, having a frequency equal to the scan frequency. These signals carry information responsive to the position of the reflected beam (33) impinging on the detector and the beam's intensity. To abrogate information responsive to intensity variations at the detector, an electronic circuit (100) determines the sum and the difference of the plurality of signals, producing a summed signal and a difference signal, respectively. The difference signal is divided by the summed signal, thereby producing a normalized signal which represents the height of the surface.

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