ADDRESSABLE VERTICAL NANOWIRE PROBE ARRAYS AND FABRICATION METHODS
    2.
    发明申请
    ADDRESSABLE VERTICAL NANOWIRE PROBE ARRAYS AND FABRICATION METHODS 审中-公开
    可寻址的垂直纳米探针阵列和制造方法

    公开(公告)号:WO2017127551A1

    公开(公告)日:2017-07-27

    申请号:PCT/US2017/014143

    申请日:2017-01-19

    Abstract: A nanowire probe sensor array including a substrate with a metal pattern thereon. An array of semiconductor vertical nanowire probes extends away from the substrate, and at least some of probes, and preferably all, are individually electrically addressed through the metal pattern. The metal pattern is insulated with dielectric, and base and stem portions of the nanowires are also preferably insulated. A fabrication process patterns metal connections on a substrate. A semiconductor substrate is bonded to the metal pattern. The semiconductor substrate is etched to form the neural nanowire probes that are bonded to the metal pattern. Dielectric is then deposited to insulate the metal pattern.

    Abstract translation: 纳米线探针传感器阵列,包括其上具有金属图案的衬底。 半导体垂直纳米线探针的阵列从衬底延伸出来,并且探针中的至少一些,并且优选地全部通过金属图案单独电寻址。 金属图案用电介质绝缘,并且纳米线的基部和杆部也优选地绝缘。 制造工艺在衬底上图案化金属连接。 半导体衬底结合到金属图案。 蚀刻半导体衬底以形成结合到金属图案的神经纳米线探针。 然后沉积电介质以绝缘金属图案。

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