ELECTRON BEAM DEPOSITION DEVICE AND METHOD OF MANUFACTURING THIN FILM BY USING THE DEPOSITION DEVICE
    1.
    发明申请
    ELECTRON BEAM DEPOSITION DEVICE AND METHOD OF MANUFACTURING THIN FILM BY USING THE DEPOSITION DEVICE 审中-公开
    电子束沉积装置及使用沉积装置制造薄膜的方法

    公开(公告)号:WO9927149A8

    公开(公告)日:1999-07-29

    申请号:PCT/JP9805234

    申请日:1998-11-20

    CPC classification number: C23C14/30 C23C14/243 C23C14/246 C23C14/54

    Abstract: An electron beam deposition device capable of manufacturing a high-quality deposited film, the method of manufacturing a deposited thin film by using the electron beam deposition device and a high quality compound thin film. The electron beam deposition device provided with at least one evaporation furnace, one electron gun and one arbitrary waveform signal generator, characterized in that the electron gun has a means of scanning with an electron beam two-dimensionally and, further, is so connected to receive signals outputted from the arbitrary waveform signal generator as electron beam scanning signal and/or electron beam intensity signals.

    Abstract translation: 一种能够制造高质量沉积膜的电子束沉积装置,通过使用电子束沉积装置制造沉积薄膜的方法和高质量复合薄膜。 电子束沉积装置具有至少一个蒸发炉,一个电子枪和一个任意波形信号发生器,其特征在于,该电子枪具有用电子束二维扫描的装置,并且进一步被连接以接收 从任意波形信号发生器输出的信号作为电子束扫描信号和/或电子束强度信号。

    VAPOR DEPOSITION DEVICE AND MANUFACTURE OF THIN FILM USING THE SAME

    公开(公告)号:JPH10265946A

    公开(公告)日:1998-10-06

    申请号:JP7626997

    申请日:1997-03-27

    Abstract: PROBLEM TO BE SOLVED: To provide a vapor deposition device with which the quantity of evaporation is stably kept even in the case of using plasma with a large power in order to manufacture a conductive oxidized film such as ITO with higher quality and at a lower cost than in the conventional practice by using the vapor deposition method. SOLUTION: A container 1, which is evacuatable to a reduced pressure atmosphere, is provided with an evaporation source 2, a base material holding mechanism 3 and a plasma formation electrode 4 at least one each at the inside. The evaporation source is provided with an evaporation material holder 23 and the DC electric resistance between at least a part of the surface of the evaporation material holder and the wall of the container 1, which is evacuatable to a reduced pressure atmosphere, and between the part and an earth is >=10 Ω.

    MULTIBRANCHED IMAGE DISPLAY BODY AND ITS PRODUCTION

    公开(公告)号:JPH0619409A

    公开(公告)日:1994-01-28

    申请号:JP17539392

    申请日:1992-07-02

    Abstract: PURPOSE:To obtain the image display body which is easily controllable, compact and inexpensive as the respective other ends of the optical fibers forming branched optical fiber groups form image exit faces arranged at prescribed intervals. CONSTITUTION:This image display body 1 is constituted of the optical fiber groups 3 where plural pieces of the optical fibers 3a are branched from an image incident part 2 to two groups, left and right, and two pieces of image output part 4 which display enlarged images. The image incident part 2 is constituted by bundling one end of the optical fibers 3a consisting of A-pieces in proximity and fixing the outer peripheries thereof in such a manner that the spacings between each other do not deviate, thereby forming the image incident surface 2 of the a rectangular plane consisting of plural pieces of the optical fiber end faces. The optical fiber group 3 is branched to two groups of the optical fiber groups consisting of A/2 in the state of maintaining the positions corresponding to the arrangement of the individual optical fibers 3a at the image incident surface 2b. These front ends are arranged and held at the pitch magnified to the pitch larger than the arrangement pitch on the image incident surface. and at the same magnification in vertical and cross directions by which the image exit surfaces 4b are constituted.

    METHOD AND APPARATUS FOR PRODUCING ELECTRET FIBER SHEET

    公开(公告)号:JP2001262463A

    公开(公告)日:2001-09-26

    申请号:JP2000070087

    申请日:2000-03-14

    Abstract: PROBLEM TO BE SOLVED: To provide a method and apparatus for producing an electret fiber sheet scarcely causing a trouble by spark discharge and excellent in durability and maintainability. SOLUTION: In this method for producing an electret fiber sheet by interposing a fiber sheet between a noncontact type voltage applying electrode and an earth electrode which are opposed to each other and applying electric current therebetween to convert the fiber sheet into the electrets, plural resistance layers having different volume resistivities are laminated and attached onto the above earth electrode and the fiber sheet to be treated is brought into contact with the upper surface of the laminated resistive layer to convert the fiber sheet into the electrets. In this apparatus for producing an electret fiber sheet by interposing a fiber sheet between a noncontact type applied electrode and an earth electrode which are opposed and applying electric current therebetween to convert the fiber sheet into elecrets, plural resistive layers having different volume resistivities and laminated onto the above earth electrode to constitute an earth electrode part so that volume resistivity of resistive layer of surface layer among the above plural resistive layers is 10-1 to 108 Ω.cm and resistance value per unit area of laminated whole resistive layer is 102 to 1010 Ω.cm2.

    PRODUCTION OF THIN FILM AND THIN FILM PRODUCING DEVICE

    公开(公告)号:JP2000290771A

    公开(公告)日:2000-10-17

    申请号:JP10077099

    申请日:1999-04-08

    Abstract: PROBLEM TO BE SOLVED: To provide a method for accelerating ionized material grains to the surface of a base material without being restricted by the shape and electrical conductivity of the base material and a holding method in the conventional thin film forming technique. SOLUTION: As to the method for producing a thin film, plasma 42 is generated in the space between a material feeding part 2 and a base material 31 in a vessel 1 capable of being evacuated to vacuum, and, while the electric potential of plasma is controlled by the electric potential of an electrode installed in the space the same as that of the plasma, film formation is executed. Moreover, as to the thin film producing device, the inside of the vessel 1 capable of evacuation is provided with the material feeding part 2 and the base material holding part 3 respectively one by one, moreover, the space between the material feeding part and the base material holding part is provided with a plasma generating means 4, and, furthermore, the space same as that of the plasma 42 generated by the plasma generating means is provided with an electrode 5 for controlling the plasma potential.

    METHOD AND APPARATUS FOR EVALUATING GAS

    公开(公告)号:JP2000275199A

    公开(公告)日:2000-10-06

    申请号:JP8417499

    申请日:1999-03-26

    Abstract: PROBLEM TO BE SOLVED: To easily measure the oxidation and reduction capacity of gas from a change in the electric resistance of a P-type or N-type oxide semiconductor by exposing the surface of the semiconductor to gas containing oxidizable (reducible) gas. SOLUTION: The electric resistance value of an N-type oxide semiconductor increases (decreases) as the increase of the oxidizable (reducible) gas on the surface of the semiconductor but that of a P-type oxide semiconductor becomes reverse. For example, when a detection part 6 including the N-type oxide semiconductor is used, a vacuum pump 4 is operated in such a state that a leak valve 5 is closed and a main valve 2 and a vacuum valve 3 are opened to reduce the pressure in a vacuum container 1 and the output of the detection part 6 and that of a pressure measuring Pirani gauge 9 in this process are recorded on a pencorder 8. At this time, when pressure lowers to become 10 Torr or less, the output of the detection part 6 lowers markedly because the resistance value of the N-type oxide semiconductor increases, that is, the oxidizing capacity of the gas in the vacuum container l is enhanced. The oxidation and reduction capacity of gas can be easily evaluated from a change in the electric resistance of the oxide semiconductor.

    CHARGING SUPPRESSING METHOD, AND METHOD AND DEVICE FOR MANUFACTURING OBJECT USING THE SAME

    公开(公告)号:JPH1015812A

    公开(公告)日:1998-01-20

    申请号:JP19548296

    申请日:1996-07-05

    Abstract: PROBLEM TO BE SOLVED: To allow a charge on an insulator of one object, at least a portion of the surface which is formed by the insulator, resulting from contact with other object, to be neutralized by use of a simple facility while they are in contact by checking in advance the polarity of the charge produced on the insulator of one object when it is in contact with the other object, and charging the insulator to the opposite polarity before they come into contact. SOLUTION: A charge is produced on an insulator 2 by bringing the insulator 2 into contact with a manufacturing tool 3 in advance without operating a charge imparting means 7. The potential 51 of the charge is measured using a potentiometer 5, and a voltage 61 of the opposite polarity to that of the potential 51 measured is applied to a discharge device 71 using an applied voltage control means 6, so that ions 93 are produced by a discharge and supplied to the insulator 2. By thus charging the insulator 2, the polarity and strength of the charge 3 can be changed simply by changing the voltage applied to the discharge device 71. On the surface of the insulator 2 after contact with the manufacturing tool 3, the charges 83, 84 of opposite polarities are distributed and cancel out each other, neutralizing the charge 84 and suppressing the charging.

    PLASMA TREATING DEVICE
    8.
    发明专利

    公开(公告)号:JPH08176822A

    公开(公告)日:1996-07-09

    申请号:JP33596394

    申请日:1994-12-22

    Abstract: PURPOSE: To optimize the plasma treating condition and the vacuum condition in a metal vapor-depositing process by covering a discharge electrode with a counter electrode having a slit opening and directing the opening toward a material to be treated. CONSTITUTION: A cathode 11 contg. a permanent magnet 12 generates a plasma discharge. The cathode 11 is covered with an anode 13 having a slit opening 14. The opening 14 is opened toward a plastic film 6 to be treated. The anode 13 is set in a vacuum deposition device, and a discharge gas is injected into the anode 13 from an inert gas cylinder 19. A plasma discharge 22 is generated between the cathode 11 and anode 13 to produce an ionized gas 23. The ionized gas 23 is blown off from the opening 14 to treat the surface of the film 6. A metal is vapor-deposited on the film 6. The gas pressure around the cathode 11 is increased by the sealing effect of the cathode 13. The metal vapor- deposition part is kept at a high vacuum independently of the plasma part.

    BASE MATERIAL FOR MAGNETIC RECORDING MEDIUM

    公开(公告)号:JP2002269729A

    公开(公告)日:2002-09-20

    申请号:JP2001061902

    申请日:2001-03-06

    Abstract: PROBLEM TO BE SOLVED: To provide a base material suitable for manufacturing magnetic recording medium having few number of dropouts (DOs) and excellent running durability, especially a DVC-LP tape. SOLUTION: In the base material for the magnetic recording medium, a reinforcing film consisting of a material selected from the oxide of a metal, the oxide of a semimetal, a semimetal and the composite consisting of those and a metal is formed on the surface B on one side of a polyester film, the other surface A has 1-5 nm Ra value and the substrate has a thickness of 2-6 μm, Young's moduli in the longitudinal and the lateral directions of >=5,500 MPa and >=7,500 MPa, respectively, and an infrared ray transmittance of >=70%.

    DEVICE AND METHOD FOR MANUFACTURING FILM CAPACITOR ELEMENT

    公开(公告)号:JPH10208981A

    公开(公告)日:1998-08-07

    申请号:JP756397

    申请日:1997-01-20

    Abstract: PROBLEM TO BE SOLVED: To prevent the occurrence of the dislocation, slipping, wrinkling, etc., of films by controlling the adhesive forces and slip property of the films by providing at least one electrification control mechanism between a film supply mechanism and a film laminating mechanism. SOLUTION: An electrification control mechanism 4 is provided between a film supply mechanism and a film laminating mechanism 2. The mechanism 4 is composed of a discharge electrode 41 and a grounding electrode 42 and the electrode 41 generates ions required for electrification control by generating discharge, such as the corona discharge, etc. Four films 101-104 supplied from the supply mechanism 1 are run through carrying rolls 51-58 and the laminating mechanism 3 and wound in a roll as a film capacitor element. When the films 101-104 are wound, the polypropylene film 102 having at least one insulating surface is passed through an electrification control mechanism 4 so as to control the charge amount of the film 102 to a desirable level before the film 102 is supplied to the laminating mechanism 2. Therefore, the film capacitor element can be manufactured without causing the dislocation, slipping, and wrinkling, etc., of the films 101-104.

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