FLUID TREATMENT SYSTEM
    1.
    发明申请
    FLUID TREATMENT SYSTEM 审中-公开
    流体处理系统

    公开(公告)号:WO2017096490A1

    公开(公告)日:2017-06-15

    申请号:PCT/CA2016/051456

    申请日:2016-12-12

    CPC classification number: C02F1/325 C02F2201/3222 C02F2201/3227

    Abstract: There is described a novel fluid treatment device that can induce Dean Vortices in the flowing fluid, and then induce a new set of Dean Vortices at an angle to those in the first set. Each subsequent curved section can induce vortices at an angle to those in the last curved section. This reactor has the effect of repeatedly twisting and splitting the fluid flow, resulting in targeted mixing similar to that of static mixers without the necessity of utilizing physical mixers. This is also an improvement over helical tubing configurations that generate only a single set of vortices and do not split and mix the flow.

    Abstract translation: 描述了一种新颖的流体处理装置,其可以在流动流体中诱导迪安涡流,然后以与第一组中的角度成一定角度诱导一组新的迪恩涡旋。 每个随后的弯曲部分可以与最后一个弯曲部分中的那些角度产生一定角度的涡流。 该反应器具有反复扭曲和分裂流体流动的效果,导致类似于静态混合器的目标混合,而不需要使用物理混合器。 这也是对螺旋管配置的改进,它只产生一组涡流,不会分流和混合流体。

    ULTRAVIOLET RADIATION LAMP AND SOURCE MODULE AND TREATMENT SYSTEM CONTAINING SAME
    3.
    发明申请
    ULTRAVIOLET RADIATION LAMP AND SOURCE MODULE AND TREATMENT SYSTEM CONTAINING SAME 审中-公开
    ULTRAVIOLET辐射灯和源模块及其处理系统

    公开(公告)号:WO2007025376A2

    公开(公告)日:2007-03-08

    申请号:PCT/CA2006/001420

    申请日:2006-08-31

    Abstract: The invention relates to an ultraviolet radiation lamp. The lamp comprises a substantially sealed cavity comprising a mercury-containing material; a filament disposed in the sealed cavity; and an electrical control element in contact with the filament, the electrical control element configured to adjust or maintain a temperature of the mercury-containing material with respect to a prescribed temperature. Such a constructions allows the present ultraviolet radiation lamp to be operated at optimal efficiency without the need to use additional components to add heat to and/or remove heat from the mercury-containing material.

    Abstract translation: 本发明涉及一种紫外线辐射灯。 该灯包括包含含汞材料的基本上密封的空腔; 设置在密封空腔中的细丝; 以及与灯丝接触的电气控制元件,所述电气控制元件构造成调节或维持含汞材料相对于规定温度的温度。 这种结构允许本发明的紫外线辐射灯以最佳的效率运行,而不需要使用额外的部件来加热和/或从含汞材料中去除热量。

    FLUID TREATMENT SYSTEM
    5.
    发明申请
    FLUID TREATMENT SYSTEM 审中-公开
    流体处理系统

    公开(公告)号:WO2010006428A1

    公开(公告)日:2010-01-21

    申请号:PCT/CA2009/000977

    申请日:2009-07-15

    Abstract: There is described a fluid treatment system in which fluid to be treated is impinged under pressure on a radiation emitting surface. The fluid treatment system includes at least one radiation source having a radiation emitting surface and at least one nozzle element having a fluid discharge opening spaced from the radiation emitting surface. The fluid discharge opening is configured to impinge fluid to be treated on to at least a portion of the radiation emitting surface. The fluid treatment system is well suited to treating low transmittance fluid.

    Abstract translation: 描述了一种流体处理系统,其中待处理的流体在压力下撞击在辐射发射表面上。 流体处理系统包括具有辐射发射表面的至少一个辐射源和具有与辐射发射表面间隔开的流体排放口的至少一个喷嘴元件。 流体排放口构造成将待处理的流体冲击到辐射发射表面的至少一部分。 流体处理系统非常适合于处理低透光率液体。

    ULTRAVIOLET RADIATION LAMP AND SOURCE MODULE AND TREATMENT SYSTEM CONTAINING SAME
    6.
    发明申请
    ULTRAVIOLET RADIATION LAMP AND SOURCE MODULE AND TREATMENT SYSTEM CONTAINING SAME 审中-公开
    ULTRAVIOLET辐射灯和源模块及其处理系统

    公开(公告)号:WO2006122394A1

    公开(公告)日:2006-11-23

    申请号:PCT/CA2006/000763

    申请日:2006-05-15

    CPC classification number: H01J61/52 C02F1/32 C02F2201/004 H01J61/20

    Abstract: The present invention relates to an ultraviolet radiation lamp. The lamp comprises: (i) a substantially sealed cavity comprising a mercury-containing material; and (ii) a heating unit disposed exteriorly with respect to the cavity. The heating unit is disposed in contact with a first portion of the cavity comprising the mercury- containing material. The heating unit has adjustable heat output.

    Abstract translation: 本发明涉及紫外线辐射灯。 灯包括:(i)包含含汞材料的基本上密封的空腔; 和(ii)相对于空腔设置在外部的加热单元。 加热单元设置成与包含含汞材料的空腔的第一部分接触。 加热单元具有可调节的热量输出。

    CHEMICAL INJECTION SYSTEM
    7.
    发明申请
    CHEMICAL INJECTION SYSTEM 审中-公开
    化学注射系统

    公开(公告)号:WO2009065220A1

    公开(公告)日:2009-05-28

    申请号:PCT/CA2008/002041

    申请日:2008-11-24

    Abstract: There is described a chemical injection system. Preferably, the system comprises a number of tubular members. The distal end of each tubular member is configured to be immersed in a flow of fluid and the proximal end of each tubular member is connected to a chemical supply. The system further includes a guide member for receiving at least one tubular member. The guide member is configured to orient the at least one tubular in a predetermined region of the flow of fluid. The chemical injection system may be regarded as a trailing array of flexible injection lines. By balancing the flexibility, length, weight, diameter, buoyancy, hydrodynamic characteristics and/or the angle at which each flexible injection line is positioned relative the flow of fluid, it is possible to dispose the distal end of each flexible injection line in a pre-determined region in the flow of fluid.

    Abstract translation: 描述了一种化学注射系统。 优选地,该系统包括多个管状构件。 每个管状构件的远端构造成浸入流体流中,并且每个管状构件的近端连接到化学物质供应。 该系统还包括用于容纳至少一个管状构件的引导构件。 引导构件被配置成将至少一个管状物定向在流体流的预定区域中。 化学注射系统可以被认为是柔性注射管线的拖尾阵列。 通过平衡柔性,长度,重量,直径,浮力,流体动力学特性和/或每个柔性注射管线相对于流体流定位的角度,可以将每个柔性注射管线的远端设置在预先 流体中的确定区域。

    ULTRAVIOLET RADIATION LIGHT EMITTING DIODE DEVICE
    8.
    发明申请
    ULTRAVIOLET RADIATION LIGHT EMITTING DIODE DEVICE 审中-公开
    超紫外线辐射发光二极管器件

    公开(公告)号:WO2008144922A1

    公开(公告)日:2008-12-04

    申请号:PCT/CA2008/001036

    申请日:2008-06-02

    CPC classification number: A61L2/10 A23C3/076 H01L33/405 H01L2224/14

    Abstract: There is disclosed an ultraviolet radiation device. The device comprises a base portion, a plurality of semiconductor structures connected to the base portion and an ultraviolet radiation transparent element connected to the plurality of semiconductor structures. Preferably: (i) the at least one light emitting diode is in direct contact with the ultraviolet radiation transparent element, or (ii) there is a spacing between the at least one light emitting diode and the ultraviolet radiation transparent element, the spacing being substantially completely free of air. There is also disclosed a fluid treatment system incorporating the ultraviolet radiation device.

    Abstract translation: 公开了一种紫外线照射装置。 该装置包括基部,连接到基部的多个半导体结构以及连接到多个半导体结构的紫外线透射元件。 优选地:(i)至少一个发光二极管与紫外线辐射透明元件直接接触,或者(ii)至少一个发光二极管和紫外线辐射透明元件之间存在间隔,该间隔基本上 完全没有空气。 还公开了结合有紫外线辐射装置的流体处理系统。

    FLUID TREATMENT SYSTEM
    9.
    发明申请
    FLUID TREATMENT SYSTEM 审中-公开
    流体处理系统

    公开(公告)号:WO2007071042A1

    公开(公告)日:2007-06-28

    申请号:PCT/CA2006/002084

    申请日:2006-12-21

    CPC classification number: A61L2/10 C02F1/325 C02F2201/004 C02F2303/14

    Abstract: There is described a fluid treatment system which may which may be used with radiation sources that do not require a protective sleeve - e.g., excimer radiation sources. An advantage of the present fluid system treatment is that the radiation sources may be removed from the fluid treatment zone without necessarily having to shut down the fluid treatment system, remove the fluid, break the seals which retain fluid tightness, replace/service radiation source and than reverse the steps. Instead, the present fluid treatment system allows for service/replacement of the radiation sources in the fluid treatment zone during operation of the fluid treatment system.

    Abstract translation: 描述了可以与不需要保护套筒(例如准分子辐射源)的辐射源一起使用的流体处理系统。 本流体系统处理的优点是可以从流体处理区域去除辐射源,而不必关闭流体处理系统,去除流体,破坏保持流体密封性的密封件,更换/使用辐射源和 反转步骤。 相反,本流体处理系统允许在流体处理系统的操作期间对流体处理区域中的辐射源进行维修/更换。

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