公开(公告)号：US06333508B1

公开(公告)日：2001-12-25

申请号：US09580530

申请日：2000-05-30

Applicant: Victor Katsap ,  Pieter Kruit ,  Daniel Moonen ,  Warren K Waskiewicz

Inventor： Victor Katsap ,  Pieter Kruit ,  Daniel Moonen ,  Warren K Waskiewicz

IPC: H01J37302

CPC classification number: B82Y10/00 ,  B82Y40/00 ,  H01J3/18 ,  H01J37/063 ,  H01J37/12 ,  H01J37/3174 ,  H01J2237/065 ,  H01J2237/12 ,  H01J2237/1205 ,  H01J2237/3175 ,  H01J2237/31774

Abstract: A method and apparatus for controlling beam emittance by placing a quadrupole lens array in a drift space of an illumination system component. The illumination system component may be an electron gun or a liner tube or drift tube, attachable to an electron gun. The quadrupole lens array may be three or more mesh grids or a combination of grids and continuous foils. The quadrupole lens array forms a multitude of microlenses resembling an optical “fly's eye” lens. The quadrupole lens array splits an incoming solid electron beam into a multitude of subbeams, such that the outgoing beam emittance is different from the incoming beam emittance, while beam total current remains unchanged. The method and apparatus permit independent control of beam current and beam emittance, which is beneficial in a SCALPEL illumination system.

Abstract translation: 一种通过将四极透镜阵列放置在照明系统部件的漂移空间中来控制光束发射的方法和装置。 照明系统部件可以是可附接到电子枪的电子枪或衬管或漂移管。 四极透镜阵列可以是三个或更多个网格或网格和连续箔片的组合。 四极透镜阵列形成大量类似于光学“飞眼”透镜的微透镜。 四极透镜阵列将输入的固体电子束分裂成多个子束，使得输出光束发射不同于入射光束发射，而光束总电流保持不变。 该方法和装置允许对束电流和光束发射的独立控制，这在SCALPEL照明系统中是有益的。

公开(公告)号：US07345290B2

公开(公告)日：2008-03-18

申请号：US09414004

申请日：1999-10-07

Applicant: Victor Katsap ,  Pieter Kruit ,  Daniel Moonen ,  Warren Kazmir Waskiewicz

Inventor： Victor Katsap ,  Pieter Kruit ,  Daniel Moonen ,  Warren Kazmir Waskiewicz

IPC: G21K5/10

CPC classification number: H01J37/065 ,  H01J37/12 ,  H01J2237/1205 ,  H01J2237/31774

Abstract: A method and apparatus for controlling beam emittance by placing a lens array in a drift space of an illumination system component. The illumination system component may be an electron gun or a liner tube or drift tube, attachable to an electron gun. The lens array may be one or more mesh grids or a combination of grids and continuous foils. The lens array forms a multitude of microlenses resembling an optical “fly's eye” lens. The lens array splits an incoming solid electron beam into a multitude of subbeams, such that the outgoing beam emittance is different from the incoming beam emittance, while beam total current remains unchanged. The method and apparatus permit independent control of beam current and beam emittance, which is beneficial in a SCALPEL illumination system.

Abstract translation: 一种通过将透镜阵列放置在照明系统部件的漂移空间中来控制光束发射的方法和装置。 照明系统部件可以是可附接到电子枪的电子枪或衬管或漂移管。 透镜阵列可以是一个或多个网状网格或网格和连续箔片的组合。 透镜阵列形成大量类似于光学“飞眼”透镜的微透镜。 透镜阵列将输入的固体电子束分裂成多个子束，使得输出光束发射不同于入射光束发射，而光束总电流保持不变。 该方法和装置允许对束电流和光束发射的独立控制，这在SCALPEL照明系统中是有益的。

公开(公告)号：US07176610B2

公开(公告)日：2007-02-13

申请号：US10774693

申请日：2004-02-10

Applicant: Victor Katsap

Inventor： Victor Katsap

IPC: H01J19/06

CPC classification number: H01J9/042 ,  H01J1/148 ,  H01J1/15 ,  H01J2201/19 ,  H01J2237/06308

Abstract: An improved thermionic cathode is provided. The cathode has a carbon-coated cone surface and reduced cone angle (e.g. typically 60 degrees or less) that delivers an electron beam with high angular intensity and brightness and exhibits increased longevity.

Abstract translation: 提供了一种改进的热离子阴极。 阴极具有碳涂覆的锥形表面和减小的锥角（例如通常为60度或更小），其传送具有高角度强度和亮度的电子束，并且延长寿命。

公开(公告)号：US20050174030A1

公开(公告)日：2005-08-11

申请号：US10774693

申请日：2004-02-10

Applicant: Victor Katsap

Inventor： Victor Katsap

IPC: H01J1/14 ,  H01J1/148 ,  H01J1/15 ,  H01J1/16 ,  H01J9/04 ,  H01J37/06 ,  H01J19/06

CPC classification number: H01J9/042 ,  H01J1/148 ,  H01J1/15 ,  H01J2201/19 ,  H01J2237/06308

Abstract: An improved thermionic cathode is provided. The cathode has a carbon-coated cone surface and reduced cone angle (e.g. typically 60 degrees or less) that delivers an electron beam with high angular intensity and brightness and exhibits increased longevity.

Abstract translation: 提供了一种改进的热离子阴极。 阴极具有碳涂覆的锥形表面和减小的锥角（例如通常为60度或更小），其传送具有高角度强度和亮度的电子束，并且延长寿命。

公开(公告)号：US06528799B1

公开(公告)日：2003-03-04

申请号：US09692150

申请日：2000-10-20

Applicant: Victor Katsap ,  James A. Liddle ,  Masis Mkrtchyan ,  Stuart T. Stanton

Inventor： Victor Katsap ,  James A. Liddle ,  Masis Mkrtchyan ,  Stuart T. Stanton

IPC: H01J37063

CPC classification number: B82Y10/00 ,  B82Y40/00 ,  H01J37/065 ,  H01J37/153 ,  H01J37/3174 ,  H01J2237/0656 ,  Y10S977/881 ,  Y10S977/887

Abstract: An electron beam lithographic apparatus has an electron gun providing a beam of accelerated electrons, a mask stage adapted to hold a mask in a path of the beam of accelerated electrons, and a workpiece stage adapted to hold a workpiece in a path of electrons that have passed through the mask. The electron gun has a cathode having an electron emission surface, an anode adapted to be connected to a high-voltage power supply to provide an electric field between the cathode and the anode to accelerate electrons emitted from the cathode toward the anode, and a current-density-profile control grid disposed between the anode and the cathode. The current-density-profile control grid is configured to provide an electron gun that produces an electron beam having a non-uniform current density profile. A method of producing a micro-device includes generating a beam of charged particles having a non-uniform charged-particle current density, illuminating a mask with the beam of charged particles, and exposing a workpiece with charged particles from the beam of charged particles.

Abstract translation: 电子束光刻设备具有提供加速电子束的电子枪，适于将加速电子束的路径中的掩模保持的掩模台，以及适于将工件保持在具有 穿过面具。 电子枪具有具有电子发射表面的阴极，适于连接到高压电源的阳极，以在阴极和阳极之间提供电场，以加速从阴极向阳极发射的电子，以及电流 设置在阳极和阴极之间的密度分布控制网格。 电流密度分布控制网格被配置为提供产生具有不均匀电流密度分布的电子束的电子枪。 微型器件的制造方法包括：生成具有不均匀带电粒子电流密度的带电粒子束，用带电粒子束照射掩模，以及从带电粒子束带电的带电粒子露出工件。

公开(公告)号：US06440620B1

公开(公告)日：2002-08-27

申请号：US09679403

申请日：2000-10-04

Applicant: Victor Katsap ,  Eric Munro ,  John Andrew Rouse ,  Warren K. Waskiewicz ,  Xieqing Zhu

Inventor： Victor Katsap ,  Eric Munro ,  John Andrew Rouse ,  Warren K. Waskiewicz ,  Xieqing Zhu

IPC: G03C500

CPC classification number: B82Y10/00 ,  B82Y40/00 ,  H01J37/3174 ,  H01J2237/1534 ,  Y10S430/143

Abstract: An apparatus and method of focusing including a source for producing an electron beam, a mask and a projection column, through which the electron beam passes, and a wafer on which the electron beam is to be focused. The wafer is located in a plane where spherical aberrations of the projection column reduce the negative defocusing effect caused by chromatic aberrations in the projection column. The apparatus and method are applicable to general electron patterning tools, electron patterning tools where a thickness of the mask is smaller than an electron mean free path of the electron patterning tool, and the SCALPEL™ electron patterning tool.

Abstract translation: 一种聚焦装置和方法，包括用于产生电子束通过的电子束，掩模和投影柱的源，以及电子束将被聚焦的晶片。 晶片位于投影柱的球面像差减小由投影柱中的色像差引起的负散焦效应的平面中。 该装置和方法适用于通常的电子图案形成工具，其中掩模的厚度小于电子图案形成工具的电子平均自由程的电子图案形成工具，以及SCALPEL TM电子图案形成工具。

公开(公告)号：US06620565B2

公开(公告)日：2003-09-16

申请号：US10188030

申请日：2002-07-03

Applicant: Victor Katsap ,  Eric Munro ,  John Andrew Rouse ,  Warren K. Waskiewicz ,  Xieqing Zhu

Inventor： Victor Katsap ,  Eric Munro ,  John Andrew Rouse ,  Warren K. Waskiewicz ,  Xieqing Zhu

IPC: G03F900

CPC classification number: B82Y10/00 ,  B82Y40/00 ,  H01J37/3174 ,  H01J2237/1534 ,  Y10S430/143

Abstract: An apparatus and method of focusing including a source for producing an electron beam, a mask and a projection column, through which the electron beam passes, and a wafer on which the electron beam is to be focused. The wafer is located in a plane where spherical aberrations of the projection column reduce the negative defocusing effect caused by chromatic aberrations in the projection column. The apparatus and method are applicable to general electron patterning tools, electron patterning tools where a thickness of the mask is smaller than an electron mean free path of the electron patterning tool, and the SCALPEL™ electron patterning tool.

Abstract translation: 一种聚焦装置和方法，包括用于产生电子束通过的电子束，掩模和投影柱的源，以及电子束将被聚焦的晶片。 晶片位于投影柱的球面像差减小由投影柱中的色像差引起的负散焦效应的平面中。 该装置和方法适用于通常的电子图案形成工具，其中掩模的厚度小于电子图案形成工具的电子平均自由程的电子图案形成工具，以及SCALPEL TM电子图案形成工具。

公开(公告)号：US06492647B1

公开(公告)日：2002-12-10

申请号：US09310701

申请日：1999-05-07

Applicant: Victor Katsap ,  James Alexander Liddle ,  Warren Kazmir Waskiewicz

Inventor： Victor Katsap ,  James Alexander Liddle ,  Warren Kazmir Waskiewicz

IPC: H01J3730

CPC classification number: H01J37/065 ,  H01J2237/31791

Abstract: The specification describes a method and apparatus for electron beam lithography wherein a Wehnelt electron gun is modified to improve the uniformity of the electron beam. The bias on the Wehnelt aperture is reversed from the conventional bias so that it is biased positively with respect to the cathode. The Wehnelt opening is tapered with a disk emitter inserted into the taper. The result of these modifications is an electron beam output with low brightness which is highly uniform over the beam cross section.

Abstract translation: 本说明书描述了一种用于电子束光刻的方法和装置，其中修改了Wehnelt电子枪以改善电子束的均匀性。 Wehnelt孔径上的偏置与传统的偏压相反，使得它相对于阴极被正向偏置。 Wehnelt开口呈锥形，盘形发生器插入锥形。 这些修改的结果是具有低亮度的电子束输出，其在束横截面上是高度均匀的。

公开(公告)号：US06448569B1

公开(公告)日：2002-09-10

申请号：US09337741

申请日：1999-06-22

Applicant: Victor Katsap ,  Warren K. Waskiewicz

Inventor： Victor Katsap ,  Warren K. Waskiewicz

IPC: G21G400

CPC classification number: H01J1/15 ,  H01J9/04 ,  H01J37/06 ,  H01J2237/3175

Abstract: A bonded article including a single crystal cathode, for use in projection electron beam lithography, such as the SCALPEL™ system. Because of its single crystalline structure, the single crystal cathode has only slightly misoriented grains. As a result, the single crystal cathode has few structural non-uniformities, and therefore a uniform emission characteristic. The single crystal cathode may be made of at least one of tantalum, tungsten, rhenium, and molybdenum. A local bonding technique for bonding a single crystal cathode with a conventional member. The local bonding technique does not recrystallize a center of the single crystal cathode, and therefore produces a bonded article which is usable in a projection electron lithography system, such as the SCALPEL™ system. The local bonding technique may be laser welding and the single crystal cathode may be made of at least one of tantalum, tungsten, rhenium, and molybdenum. The member may be a conventional filament and the filament may be made of one of tungsten, a tungsten-rhenium alloy, and a tungsten-tantalum alloy.

Abstract translation: 包括用于投影电子束光刻的单晶阴极的粘合制品，例如SCALPEL TM系统。 由于其单晶结构，单晶阴极仅具有微小的取向差的晶粒。 结果，单晶阴极具有很小的结构不均匀性，因此具有均匀的发射特性。 单晶阴极可以由钽，钨，铼和钼中的至少一种制成。 用于将单晶阴极与常规构件结合的局部粘结技术。 局部接合技术不会使单晶阴极的中心再结晶，因此产生可用于诸如SCALPEL TM系统的投影电子光刻系统中的接合制品。 局部粘合技术可以是激光焊接，并且单晶阴极可以由钽，钨，铼和钼中的至少一种制成。 构件可以是常规的灯丝，并且灯丝可以由钨，钨 - 铼合金和钨 - 钽合金之一制成。

公开(公告)号：US06232040B1

公开(公告)日：2001-05-15

申请号：US09306287

申请日：1999-05-06

Applicant: Victor Katsap ,  James Alexander Liddle ,  Warren Kazmir Waskiewicz

Inventor： Victor Katsap ,  James Alexander Liddle ,  Warren Kazmir Waskiewicz

IPC: G03C500

CPC classification number: H01J37/065 ,  H01J2237/3175 ,  Y10S430/143

Abstract: The specification describes a method and apparatus for electron beam lithography wherein a Wehnelt electron gun is modified to improve the uniformity of the electron beam. A mesh grid is applied to the Wehnelt aperture and the mesh grid functions as a multiple secondary emitter to produce a uniform beam flux over a wide area. The grid voltage of the modified gun is substantially lower than in a conventional Wehnelt gun, i.e. less than 100 volts, which can be switched conveniently and economically using semiconductor drive circuits.

Abstract translation: 本说明书描述了一种用于电子束光刻的方法和装置，其中修改了Wehnelt电子枪以改善电子束的均匀性。 网格格栅应用于Wehnelt孔径，网格栅格用作多重二次发射器，以在广泛的区域产生均匀的光束通量。 修改枪的电网电压基本上低于常规的Wehnelt枪，即小于100伏特，其可以使用半导体驱动电路方便和经济地切换。