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    一种智能电子枪
    1.
    发明公开
    一种智能电子枪 无效

    公开(公告)号：CN106206210A

    公开(公告)日：2016-12-07

    申请号：CN201610774376.7

    申请日：2016-08-31

    Applicant: 成都磁动势科技有限公司

    Inventor： 张科 ,  王琳 ,  翟培件

    IPC: H01J3/02 ,  H01J3/07

    CPC classification number: H01J3/024 ,  H01J3/027 ,  H01J3/07

    Abstract: 本发明涉及电子枪技术领域，尤其涉及一种智能电子枪，包括电子阴极枪、加速引导装置、聚焦装置以及壳体，所述电子阴极枪包括保持部和发射端，所述保持部用于对所述发射端进行保持，所述加速引导装置用于控制加速电子的数量和速度，所述聚焦装置用于对加速电子进行约束，使得结构简单，使用方便。

    Apparatus for generating a plurality of beamlets
    4.
    发明申请
    Apparatus for generating a plurality of beamlets 有权
    用于产生多个子束的装置

    公开(公告)号：US20040232349A1

    公开(公告)日：2004-11-25

    申请号：US10797364

    申请日：2004-03-10

    Inventor： Pieter Kruit

    IPC: H01J003/26 ,  H01J003/14

    CPC classification number: H01J3/07 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/063 ,  H01J37/12 ,  H01J37/153 ,  H01J37/3174 ,  H01J37/3177 ,  H01J2237/1205 ,  H01J2237/151 ,  H01J2237/1536 ,  H01J2237/26 ,  H01J2237/31774

    Abstract: The invention relates to an apparatus for generating a plurality of charged particle beamlets, comprising a charged particle source for generating a diverging charged particle beam, a converging means for refracting said diverging charged particle beam and a lens array comprising a plurality of lenses, wherein said lens array is located between said charged particle source and said converging means. In this way, it is possible to reduce aberrations of the converging means.

    Abstract translation: 本发明涉及一种用于产生多个带电粒子束的装置，包括用于产生发散带电粒子束的带电粒子源，用于折射所述发散带电粒子束的会聚装置和包括多个透镜的透镜阵列，其中所述 透镜阵列位于所述带电粒子源和所述会聚装置之间。 以这种方式，可以减小会聚装置的像差。

    APPARATUS FOR GENERATING A PLURALITY OF BEAMLETS
    5.
    发明申请
    APPARATUS FOR GENERATING A PLURALITY OF BEAMLETS 有权
    用于产生大量光束的装置

    公开(公告)号：US20080073547A1

    公开(公告)日：2008-03-27

    申请号：US11545975

    申请日：2006-10-10

    Applicant: Pieter Kruit

    Inventor： Pieter Kruit

    IPC: H01J3/14

    CPC classification number: H01J3/07 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/063 ,  H01J37/12 ,  H01J37/153 ,  H01J37/3174 ,  H01J37/3177 ,  H01J2237/1205 ,  H01J2237/151 ,  H01J2237/1536 ,  H01J2237/26 ,  H01J2237/31774

    Abstract: The invention relates to an apparatus for generating a plurality of charged particle beamlets, comprising a charged particle source for generating a diverging charged particle beam, a converging means for refracting said diverging charged particle beam and a lens array comprising a plurality of lenses, wherein said lens array is located between said charged particle source and said converging means.In this way, it is possible to reduce aberrations of the converging means.

    Abstract translation: 本发明涉及一种用于产生多个带电粒子束的装置，包括用于产生发散带电粒子束的带电粒子源，用于折射所述发散带电粒子束的会聚装置和包括多个透镜的透镜阵列，其中所述 透镜阵列位于所述带电粒子源和所述会聚装置之间。 以这种方式，可以减小会聚装置的像差。

    Apparatus for generating a plurality of beamlets
    7.
    发明公开
    Apparatus for generating a plurality of beamlets 审中-公开
    Vorrichtung zur Erzeugung einer Vielzahl von Teilstrahlen

    公开(公告)号：EP2503587A2

    公开(公告)日：2012-09-26

    申请号：EP12172592.3

    申请日：2004-03-10

    Applicant: MAPPER LITHOGRAPHY IP B.V.

    Inventor： Kruit, Pieter

    IPC: H01J37/317 ,  H01J37/063 ,  H01J3/02

    CPC classification number: H01J3/07 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/063 ,  H01J37/12 ,  H01J37/153 ,  H01J37/3174 ,  H01J37/3177 ,  H01J2237/1205 ,  H01J2237/151 ,  H01J2237/1536 ,  H01J2237/26 ,  H01J2237/31774

    Abstract: The invention relates to an apparatus for generating a plurality of charged particle beamlets and a charged particle beam lithography system comprising such an apparatus, said apparatus comprising:
    a charged particle source (1) for generating a diverging charged particle beam;
    a collimating means (4) for collimating said diverging charged particle beam, wherein said collimating means comprises at least one deflector array,
    said deflector array adapted for having a voltage applied to each deflector of said deflector array for deflecting a beamlet (8),

    wherein at least one deflector of said deflector array is adapted to assert a deflecting effect proportional to its distance with respect the optical axis of the beam.

    Abstract translation: 本发明涉及一种用于产生多个带电粒子子束的装置和包括这种装置的带电粒子束光刻系统，所述装置包括：用于产生发散带电粒子束的带电粒子源（1） 用于准直所述发散带电粒子束的准直装置（4），其中所述准直装置包括至少一个偏转器阵列，所述偏转器阵列适于具有施加到所述偏转器阵列的每个偏转器的偏转器的电压，用于偏转小梁（8），其中 所述偏转器阵列的至少一个偏转器适于断定与其相对于光束的光轴的距离成比例的偏转效应。

    Apparatus for generating a plurality of beamlets
    9.
    发明公开
    Apparatus for generating a plurality of beamlets 审中-公开
    用于生成多个子束的设备

    公开(公告)号：EP2503587A3

    公开(公告)日：2017-08-23

    申请号：EP12172592.3

    申请日：2004-03-10

    Applicant: MAPPER LITHOGRAPHY IP B.V.

    Inventor： Kruit, Pieter

    IPC: H01J37/317 ,  H01J37/063 ,  H01J3/02 ,  H01J37/153 ,  H01J37/12 ,  H01J3/07

    CPC classification number: H01J3/07 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/063 ,  H01J37/12 ,  H01J37/153 ,  H01J37/3174 ,  H01J37/3177 ,  H01J2237/1205 ,  H01J2237/151 ,  H01J2237/1536 ,  H01J2237/26 ,  H01J2237/31774

    Abstract: The invention relates to an apparatus for generating a plurality of charged particle beamlets and a charged particle beam lithography system comprising such an apparatus, said apparatus comprising:
    a charged particle source (1) for generating a diverging charged particle beam;
    a collimating means (4) for collimating said diverging charged particle beam, wherein said collimating means comprises at least one deflector array,
    said deflector array adapted for having a voltage applied to each deflector of said deflector array for deflecting a beamlet (8),

    wherein at least one deflector of said deflector array is adapted to assert a deflecting effect proportional to its distance with respect the optical axis of the beam.

    Abstract translation: 本发明涉及用于产生多个带电粒子小射束的设备和包括这种设备的带电粒子束光刻系统，所述设备包括：用于产生发散带电粒子束的带电粒子源（1） 准直所述发散带电粒子束的准直装置（4），其中所述准直装置包括至少一个偏转器阵列，所述偏转器阵列适于使施加到所述偏转器阵列的每个偏转器上的电压偏转小射束（8），其中 所述偏转器阵列的至少一个偏转器适于确定与其相对于光束的光轴的距离成比例的偏转效应。

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