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    一种含无功电流注入的光伏低电压穿越方法
    1.
    发明公开
    一种含无功电流注入的光伏低电压穿越方法 失效

    公开(公告)号：CN105591401A

    公开(公告)日：2016-05-18

    申请号：CN201610057166.6

    申请日：2016-01-27

    Applicant: 浙江大学

    Inventor： 王慧芳 ,  黄显斌 ,  林达

    IPC: H02J3/38 ,  H02J3/16 ,  H02J3/24

    CPC classification number: Y02E10/563 ,  Y02E40/34 ,  H01J3/386 ,  H01J3/16 ,  H01J3/24

    Abstract: 本发明涉及一种含无功电流注入的光伏低电压穿越方法。现有的光伏低电压穿越方法有很多，然而并未充分利用光伏逆变器对功率的控制作用。本发明在电压跌落不严重情况下，保持光伏有功功率输出不变，尽量提供无功功率；在电压跌落较严重情况下，光伏不输出有功功率，全部输出无功功率。同时在电网不对称故障下，引入负序控制消除由负序分量引起的有功功率波动，并推导出最大无功功率设定值计算公式。本发明能根据电压跌落情况充分利用光伏对有功功率和无功功率的控制能力，在一定情况下保证有功功率输出又能最大限度的提供无功功率，有助于并网点电压的恢复。

    Charged particle lithography system with a long shape illumination beam
    2.
    发明授权
    Charged particle lithography system with a long shape illumination beam 有权
    具有长形照明光束的带电粒子光刻系统

    公开(公告)号：US09202662B2

    公开(公告)日：2015-12-01

    申请号：US13756178

    申请日：2013-01-31

    Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.

    Inventor： Jimmy Hsiao ,  Ming-Zhang Kuo ,  Ping-Lin Yang ,  Cheng-Chung Lin ,  Osamu Takahashi ,  Sang Hoo Dhong

    IPC: G21K5/04 ,  H01J29/62 ,  H01J3/12 ,  H01J3/16 ,  H01J3/18 ,  H01J37/30 ,  H01J37/317

    CPC classification number: H01J29/62 ,  H01J3/12 ,  H01J3/16 ,  H01J3/18 ,  H01J37/3007 ,  H01J37/3177 ,  H01J2237/1205 ,  H01J2237/31789

    Abstract: A system includes an integrated circuit (IC) design data base having a feature, a source configured to generate a radiation beam, a pattern generator (PG) including a mirror array plate and an electrode plate disposed over the mirror array plate, wherein the electrode plate includes a lens let having a first dimension and a second dimension perpendicular to the first dimension with the first dimension larger than the second dimension so that the lens let modifies the radiation beam to form the long shaped radiation beam, and a stage configured secured the substrate. The system further includes an electric field generator connecting the mirror array plate. The mirror array plate includes a mirror. The mirror absorbs or reflects the radiation beam. The radiation beam includes electron beam or ion beam. The second dimension is equal to a minimum dimension of the feature.

    Abstract translation: 一种系统包括具有特征的集成电路（IC）设计数据库，被配置为产生辐射束的源，包括反射镜阵列板的图案发生器（PG）和设置在所述反射镜阵列板上的电极板，其中所述电极 板包括透镜，其具有垂直于第一尺寸的第一尺寸和第二尺寸，其第一尺寸大于第二尺寸，使得透镜使得辐射束修改以形成长形辐射束，并且被配置为将 基质。 该系统还包括连接镜阵列板的电场发生器。 镜阵列板包括镜子。 镜子吸收或反射辐射束。 辐射束包括电子束或离子束。 第二个维度等于该特征的最小尺寸。

    DEVICE, SYSTEM, AND METHOD FOR REFLECTING IONS
    8.
    发明申请
    DEVICE, SYSTEM, AND METHOD FOR REFLECTING IONS 有权
    用于反射离子的装置，系统和方法

    公开(公告)号：US20120280121A1

    公开(公告)日：2012-11-08

    申请号：US13101008

    申请日：2011-05-04

    Applicant: Gangqiang Li

    Inventor： Gangqiang Li

    IPC: H01J49/40 ,  H01J3/18

    CPC classification number: H01J49/405 ,  H01J3/16

    Abstract: Devices and systems for reflecting ions are provided. In general, the devices and systems include a plurality of curved lens plates adapted for connection to at least one voltage source and having a passage therein to allow the ions to pass therethrough. The plurality of curved lens plates generates electric fields having elliptic equipotential surfaces that reflect and focus the ions as they pass through the passage. Reflectron time-of-flight (RE-TOF) spectrometers are also provided that include an ion source, ion detector, and such a reflectron as described above. Mass spectrometer systems are provided that comprise an ion source that generates ions and a reflectron TOF spectrometer such as described above.

    Abstract translation: 提供了用于反射离子的装置和系统。 通常，装置和系统包括适于连接至少一个电压源的多个弯曲透镜板，并且其中具有允许离子通过的通道。 多个弯曲透镜板产生具有椭圆等电位面的电场，它们在通过通道时反射和聚焦离子。 还提供了反射器飞行时间（RE-TOF）光谱仪，其包括如上所述的离子源，离子检测器和反射器。 提供包括产生离子的离子源和如上所述的反射体TOF光谱仪的质谱仪系统。

    Charged Particle Lithography System With a Long Shape Illumination Beam
    9.
    发明申请
    Charged Particle Lithography System With a Long Shape Illumination Beam 有权
    带有长形照明光束的带电粒子光刻系统

    公开(公告)号：US20140212815A1

    公开(公告)日：2014-07-31

    申请号：US13756178

    申请日：2013-01-31

    Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.

    Inventor： Jimmy Hsiao ,  Ming-Zhang Kuo ,  Ping-Lin Yang ,  Cheng-Chung Lin ,  Osamu Takahashi ,  Sang Hoo Dhong

    IPC: H01J29/60 ,  H01J29/62

    CPC classification number: H01J29/62 ,  H01J3/12 ,  H01J3/16 ,  H01J3/18 ,  H01J37/3007 ,  H01J37/3177 ,  H01J2237/1205 ,  H01J2237/31789

    Abstract: A system includes an integrated circuit (IC) design data base having a feature, a source configured to generate a radiation beam, a pattern generator (PG) including a mirror array plate and an electrode plate disposed over the mirror array plate, wherein the electrode plate includes a lens let having a first dimension and a second dimension perpendicular to the first dimension with the first dimension larger than the second dimension so that the lens let modifies the radiation beam to form the long shaped radiation beam, and a stage configured secured the substrate. The system further includes an electric field generator connecting the minor array plate. The mirror array plate includes a mirror. The mirror absorbs or reflects the radiation beam. The radiation beam includes electron beam or ion beam. The second dimension is equal to a minimum dimension of the feature.

    Abstract translation: 一种系统包括具有特征的集成电路（IC）设计数据库，被配置为产生辐射束的源，包括反射镜阵列板的图案发生器（PG）和设置在所述反射镜阵列板上的电极板，其中所述电极 板包括透镜，其具有垂直于第一尺寸的第一尺寸和第二尺寸，其第一尺寸大于第二尺寸，使得透镜使得辐射束修改以形成长形辐射束，并且被配置为将 基质。 该系统还包括连接小阵列板的电场发生器。 镜阵列板包括镜子。 镜子吸收或反射辐射束。 辐射束包括电子束或离子束。 第二个维度等于该特征的最小尺寸。

    Device, system, and method for reflecting ions
    10.
    发明授权
    Device, system, and method for reflecting ions 有权
    用于反射离子的装置，系统和方法

    公开(公告)号：US08642951B2

    公开(公告)日：2014-02-04

    申请号：US13101008

    申请日：2011-05-04

    Applicant: Gangqiang Li

    Inventor： Gangqiang Li

    IPC: H01J49/40

    CPC classification number: H01J49/405 ,  H01J3/16

    Abstract: Devices and systems for reflecting ions are provided. In general, the devices and systems include a plurality of curved lens plates adapted for connection to at least one voltage source and having a passage therein to allow the ions to pass therethrough. The plurality of curved lens plates generates electric fields having elliptic equipotential surfaces that reflect and focus the ions as they pass through the passage. Reflectron time-of-flight (RE-TOF) spectrometers are also provided that include an ion source, ion detector, and such a reflectron as described above. Mass spectrometer systems are provided that comprise an ion source that generates ions and a reflectron TOF spectrometer such as described above.

    Abstract translation: 提供了用于反射离子的装置和系统。 通常，装置和系统包括适于连接至少一个电压源的多个弯曲透镜板，并且其中具有允许离子通过的通道。 多个弯曲透镜板产生具有椭圆等电位面的电场，它们在通过通道时反射和聚焦离子。 还提供了反射器飞行时间（RE-TOF）光谱仪，其包括如上所述的离子源，离子检测器和反射器。 提供包括产生离子的离子源和如上所述的反射体TOF光谱仪的质谱仪系统。

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