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    WHITE LIGHT INTERFEROMETRIC INSPECTION USING TILTED REFERENCE BEAM AND SPATIAL FILTERING
    91.
    发明申请
    WHITE LIGHT INTERFEROMETRIC INSPECTION USING TILTED REFERENCE BEAM AND SPATIAL FILTERING 有权

    公开(公告)号：US20240426751A1

    公开(公告)日：2024-12-26

    申请号：US18212036

    申请日：2023-06-20

    Applicant: Orbotech Ltd.

    Inventor： Nir A. Turko ,  Hanina Golan ,  Igor Sakaev

    IPC: G01N21/45

    Abstract: Systems and methods for characterizing a sample utilizing white light interferometry are disclosed. Such systems and methods may include an optical sub-system. The optical sub-system may include a reference element configured to tilt an optical axis of a reference beam relative to an optical axis of a measurement beam and a sample positioning stage configured to adjust a sample position of a sample along a Z-direction of the sample. Such systems and methods may include receiving an image of the sample. Such systems and methods may include utilizing a filter to demodulate an interference pattern of the image. Such systems and methods may include determining a location of the interference pattern on the image; and directing the focal adjustment based on the location of the interference pattern.

    SYSTEM AND METHOD FOR DEFECT MITIGATION USING DATA ANALYSIS
    94.
    发明公开
    SYSTEM AND METHOD FOR DEFECT MITIGATION USING DATA ANALYSIS 审中-公开

    公开(公告)号：US20240142958A1

    公开(公告)日：2024-05-02

    申请号：US17979386

    申请日：2022-11-02

    Applicant: Orbotech Ltd.

    Inventor： Nava Shpaisman ,  Bronislav Kupershtein

    IPC: G05B19/418 ,  G06T7/00

    CPC classification number: G05B19/41875 ,  G06T7/0004 ,  G05B2219/32182 ,  G06T2207/30141

    Abstract: A method for defect mitigation is disclosed. The method may include receiving defect data for one or more defects of one or more samples. The defect data may include a defect location, a defect size, a defect shape, or a relationship between the defect and a component of the one or more samples. The method may include identifying at least one defect as a disqualifying defect based on the received defect data and one or more predetermined thresholds. Upon identifying the defect as a disqualifying defect, the method may include generating a tool readable index configured to cause one or more downstream fabrications tool to adjust one or more downstream fabrication steps corresponding to the disqualifying defect based on the generated tool readable index. The method may include providing the generated tool readable index to the one or more downstream fabrication tool.

    Method of determining an X and Y location of a surface particle
    95.
    发明授权
    Method of determining an X and Y location of a surface particle 有权

    公开(公告)号：US11959961B2

    公开(公告)日：2024-04-16

    申请号：US17716764

    申请日：2022-04-08

    Applicant: Orbotech Ltd.

    Inventor： Robert Barnett

    IPC: G01N21/88 ,  B08B5/02 ,  B08B13/00 ,  G01B11/00 ,  G01R31/28 ,  G01R31/308

    CPC classification number: G01R31/2881 ,  B08B5/02 ,  B08B13/00 ,  G01B11/002 ,  G01R31/308

    Abstract: A system including a modulator, a laser source, a mirror, a laser sensor, and a processor. The modulator is movable in a first direction. The laser source is configured to emit laser light in a direction parallel to the surface of the modulator. The mirror is configured to redirect the laser light. The laser sensor is configured to detect a first change in intensity when a particle on the surface of the modulator passes through the laser light emitted by the laser source. The laser sensor is further configured to detect a second change in intensity when the particle on the surface of the modulator passes through the laser light redirected by the at least one mirror. The processor is configured to determine an X-Y location of the particle based on the first change in intensity and the second change in intensity.

    System and method for coating substrates
    96.
    发明授权
    System and method for coating substrates 有权

    公开(公告)号：US11944996B2

    公开(公告)日：2024-04-02

    申请号：US17413942

    申请日：2020-01-06

    Applicant: Orbotech Ltd.

    Inventor： Tal Goichman ,  Ashkan Aghajani

    IPC: B05C11/04 ,  B05D1/42

    CPC classification number: B05C11/041 ,  B05C11/044 ,  B05C11/045 ,  B05D1/42

    Abstract: A system for coating of a donor material onto a laser radiation transparent substrate, the system including a donor material applicator, applying donor material to the laser radiation transparent substrate, a multi-pass precise donor material thickness determiner for providing a desired thickness of the donor material on the laser radiation transparent substrate and including a linearly displaceable blade support, a layer thickness uniformizing blade lockably pivotably mounted onto the linearly displaceable blade support about a pivot axis, the blade having a straight edge and a blade position maintainer operative for maintaining the straight edge at a desired separation distance from the laser radiation transparent substrate, the separation distance being uniform along the straight edge of the layer thickness uniformizing blade.

    Adaptive routing for correcting die placement errors
    99.
    发明授权
    Adaptive routing for correcting die placement errors 有权

    公开(公告)号：US11652008B2

    公开(公告)日：2023-05-16

    申请号：US17288369

    申请日：2019-10-02

    Applicant: Orbotech Ltd.

    Inventor： Ram Oron ,  Michael Burdinov ,  Elad Goshen ,  Ronald F. Kaminsky ,  Gonen Raveh

    IPC: G06F30/3953 ,  G06F30/398 ,  G06F30/31 ,  G06F115/12

    CPC classification number: G06F30/3953 ,  G06F30/31 ,  G06F30/398 ,  G06F2115/12

    Abstract: A method includes, receiving a layout design of at least part of an electronic module, the design specifying at least (i) an electronic device coupled to at least a substrate, and (ii) an electrical trace that is connected to the electronic device and has a designed route. A digital input, which represents at least part of an actual electronic module that was manufactured in accordance with the layout design but without at least a portion of the electrical trace, is received. An error in coupling the electronic device to the substrate, relative to the layout design, is estimated based on the digital input. An actual route that corrects the estimated error, is calculated for at least the portion of the electrical trace. At least the portion of the electrical trace is formed on the substrate of the actual electronic module, along the actual route instead of the designed route.

    Accuracy of classification models
    100.
    发明授权
    Accuracy of classification models 有权

    公开(公告)号：US11640559B2

    公开(公告)日：2023-05-02

    申请号：US17107851

    申请日：2020-11-30

    Applicant: Orbotech Ltd.

    Inventor： Gonen Raveh ,  Elad Goshen

    IPC: G06K9/62 ,  G06N3/08

    Abstract: An Artificial Intelligence system, an apparatus and, a computer program product and a method for automatic improvement of artificial intelligence classification models. A model-performance measurement of the classification model is iteratively improved by at least a predetermined target goal in each iteration. The iterative improvement comprises generating a hypotheses graph for improving the classification model, based on a list of hypotheses and scores thereof. Each hypothesis relates to a strategy for potentially improving the classification model, and is associated with a score indicating a likelihood that an application thereof improves the model-performance measurement. Each node of the hypotheses graph comprises a hypothesis of the list of hypotheses. The iterative improvement further comprises selecting a selected hypothesis from the hypotheses graph based on a traversal thereof; and executing the selected hypothesis thereby updating the classification model and improving the model-performance measurement by at least the predetermined target goal.

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