公开(公告)号：US20140287237A1

公开(公告)日：2014-09-25

申请号：US14352873

申请日：2012-10-19

Applicant: NEXDOT

Inventor： Benoit Mahler

IPC: B82B3/00 ,  B82B1/00 ,  B05D1/00

CPC classification number: H01L31/035218 ,  B01J27/04 ,  B01J27/0573 ,  B01J27/0576 ,  B01J35/0013 ,  B01J35/023 ,  B01J35/06 ,  B05D1/00 ,  B82B1/005 ,  B82B3/0033 ,  B82Y15/00 ,  H01L21/02521 ,  H01L21/02601 ,  H01L21/02628 ,  H01L29/127 ,  Y10T428/2991 ,  Y10T428/2993

Abstract: A process of growth in the thickness of at least one facet of a colloidal inorganic sheet. By sheet is meant a structure having at least one dimension, the thickness, of nanometric size and lateral dimensions great compared to the thickness, typically more than 5 times the thickness. By homostructured is meant a material of homogeneous composition in the thickness and by heterostructured is meant a material of heterogeneous composition in the thickness. The process allows the deposition of at least one monolayer of atoms on at least one inorganic colloidal sheet, this monolayer being constituted of atoms of the type of those contained or not in the sheet. Homostructured and heterostructured materials resulting from such process as well as the applications of the materials are also described.

Abstract translation: 胶态无机片材的至少一个面的厚度生长过程。 片材是指具有至少一个尺寸，厚度，纳米尺寸和横向尺寸的结构，其厚度通常大于厚度的5倍。 均质化是指厚度均匀组成的材料，异质结构是指厚度不均匀的材料。 该方法允许在至少一种无机胶体片上沉积至少一个单层原子，该单层由包含或不在片中的那些类型的原子构成。 还描述了由这种方法产生的均质和异质结构材料以及材料的应用。

公开(公告)号：US08821957B2

公开(公告)日：2014-09-02

申请号：US12299798

申请日：2007-05-11

Applicant: Jean-Jacques Benattar

Inventor： Jean-Jacques Benattar

IPC: B05D3/00 ,  B05D1/20 ,  B82Y30/00 ,  B82Y40/00 ,  B05D1/00 ,  B05D3/04

CPC classification number: B05D1/00 ,  B05D1/204 ,  B05D3/042 ,  B82Y30/00 ,  B82Y40/00 ,  Y10T428/25

Abstract: The invention concerns in particular a method for depositing a nanometric multilayer thin film on a substrate from a liquid solution containing at least one surfactant. The method includes the following steps: forming a film from the solution; contacting the substrate; and depositing the film on the substrate. The invention is particularly formed to enable depositing black films on different types of surfaces, in particular for obtaining highly organized films. The films obtained by the method are particularly useful in electronics and optics.

Abstract translation: 本发明特别涉及从含有至少一种表面活性剂的液体溶液在衬底上沉积纳米多层薄膜的方法。 该方法包括以下步骤：从溶液中形成膜; 使基板接触; 并将膜沉积在基底上。 本发明特别地形成为能够在不同类型的表面上沉积黑色膜，特别是用于获得高度组织的膜。 通过该方法获得的膜在电子和光学中特别有用。

公开(公告)号：US20140199499A1

公开(公告)日：2014-07-17

申请号：US13970856

申请日：2013-08-20

Applicant: International Business Machines Corporation

Inventor： Theodore G. van Kessel ,  Brent A. Wacaser

IPC: B05D1/00

CPC classification number: B05D1/00 ,  B05C19/04 ,  C23C14/00 ,  C23C14/04 ,  C23C14/228 ,  C23C14/24 ,  C23C14/26 ,  C23C14/34 ,  C23C14/50 ,  C23C16/4481 ,  C23C16/45517 ,  C23C16/45563 ,  C23C16/45585 ,  C23C16/458 ,  C23C16/4583 ,  F16C32/0603

Abstract: A method for depositing a particle on a work piece is disclosed. The housing is coupled to the work piece to form a chamber and a separation distance between a surface of the work piece and a surface of the housing is controlled using a coupling device. A working gas having a particle entrained therein is directed within the chamber to deposit the particle at the work piece. The coupling between the housing and the work piece may be a slidable coupling. The coupling device may include an air-bearing surface or a gasketed coupling.

Abstract translation: 公开了一种在工件上沉积颗粒的方法。 壳体联接到工件以形成室，并且使用联接装置来控制工件的表面与壳体的表面之间的间隔距离。 具有夹带在其中的颗粒的工作气体被引导到室内以将颗粒沉积在工件上。 壳体和工件之间的联接可以是可滑动的联接件。 联接装置可以包括空气轴承表面或垫圈联接器。

公开(公告)号：US20140138393A1

公开(公告)日：2014-05-22

申请号：US14165679

申请日：2014-01-28

Applicant: Valspar Sourcing, Inc.

Inventor： Charles Skillman ,  Paul E. Share ,  Greg Paulson ,  Richard H. Evans ,  Benoit Prouvost ,  Paul Stenson

IPC: B65D1/12 ,  B05D1/00

CPC classification number: C08G63/553 ,  B05D1/00 ,  B65D1/12 ,  B65D25/14 ,  C08L61/12 ,  C08L2203/10 ,  C09D5/08 ,  C09D167/06 ,  Y10T428/1355 ,  C08L2666/16

Abstract: A polymer is provided that preferably includes at least one unsaturated cycloaliphatic group. In one embodiment, the polymer is combined with an optional crosslinker and an optional carrier to form a coating composition suitable for use in coating articles such as packaging articles. In one embodiment, the polymer has at least one unsaturated cycloaliphatic group that is at least bicyclic.

Abstract translation: 提供了优选包含至少一个不饱和脂环族基团的聚合物。 在一个实施方案中，聚合物与任选的交联剂和任选的载体组合以形成适用于涂覆制品如包装制品的涂料组合物。 在一个实施方案中，聚合物具有至少一个至少二环的不饱和脂环族基团。

公开(公告)号：US08722152B2

公开(公告)日：2014-05-13

申请号：US13914742

申请日：2013-06-11

Applicant: Tokyo Electron Limited

Inventor： Naofumi Kishita ,  Kouji Fujimura ,  Yoshitaka Hara

IPC: B05D1/02

CPC classification number: B05D1/02 ,  B05C11/00 ,  B05D1/00 ,  B05D1/30

Abstract: A wet processing apparatus for wet-processing substrates can suppress the reduction of throughput when some component part thereof becomes unserviceable. The wet processing apparatus includes a first nozzle unit and a second nozzle unit. When the wet processing apparatus operates in a normal mode, a substrate carrying mechanism is controlled so as to deliver substrates alternately to processing units of a first group and those of a second group so that the substrates are processed sequentially in order. When the processing units of the first group (the second group) are unserviceable due to the inoperativeness of the substrate holders, a processing liquid supply system or a nozzle support mechanism, the nozzle unit for the processing units of the second group (the first group) is moved to process substrates by the serviceable ones of the first group (the second group).

Abstract translation: 用于湿处理基板的湿式处理装置可以抑制当其一部分成为不可用时的吞吐量的降低。 湿式处理装置包括第一喷嘴单元和第二喷嘴单元。 当湿法处理装置以正常模式操作时，控制基板承载机构以将基板交替地传送到第一组和第二组的处理单元，使得依次顺序地处理基板。 当第一组（第二组）的处理单元由于衬底保持器的不操作而不能使用时，处理液体供应系统或喷嘴支撑机构，用于第二组（第一组）的处理单元的喷嘴单元 ）被移动到由第一组（第二组）中可用的基板处理衬底。

公开(公告)号：US08663765B2

公开(公告)日：2014-03-04

申请号：US13833233

申请日：2013-03-15

Applicant: Valspar Sourcing, Inc.

Inventor： Charles Skillman ,  Paul E. Share ,  Greg Paulson ,  Richard H. Evans ,  Benoit Prouvost ,  Paul Stenson

IPC: B29D22/00 ,  B29D23/00 ,  B32B1/08 ,  B32B15/08

CPC classification number: C08G63/553 ,  B05D1/00 ,  B65D1/12 ,  B65D25/14 ,  C08L61/12 ,  C08L2203/10 ,  C09D5/08 ,  C09D167/06 ,  Y10T428/1355 ,  C08L2666/16

Abstract: A polymer is provided that preferably includes at least one unsaturated cycloaliphatic group. In one embodiment, the polymer is combined with an optional crosslinker and an optional carrier to form a coating composition suitable for use in coating articles such as packaging articles. In one embodiment, the polymer has at least one unsaturated cycloaliphatic group that is at least bicyclic.

Abstract translation: 提供了优选包含至少一个不饱和脂环族基团的聚合物。 在一个实施方案中，聚合物与任选的交联剂和任选的载体组合以形成适用于涂覆制品如包装制品的涂料组合物。 在一个实施方案中，聚合物具有至少一个至少二环的不饱和脂环族基团。

公开(公告)号：US20130316163A1

公开(公告)日：2013-11-28

申请号：US13893985

申请日：2013-05-14

Applicant: BASF SE

Inventor： Rajesh Kumar ,  Sridhar Iyer ,  Christopher Tanguay ,  Daniel Niedzwiecki

IPC: B32B13/04

CPC classification number: B32B13/04 ,  B05D1/00 ,  B05D3/02 ,  B32B13/12 ,  Y10T428/249968

Abstract: A gypsum board comprises a cover sheet and a gypsum layer disposed on the cover sheet. The gypsum layer comprises the reaction product of an isocyanate, water, and stucco. The isocyanate increases the moisture resistance of the gypsum board. A method of manufacturing the gypsum board comprises the steps of combining the isocyanate, the water, and the stucco to form a slurry, and applying the slurry to a cover sheet to form the gypsum layer on the cover sheet.

Abstract translation: 石膏板包括覆盖片和设置在覆盖片上的石膏层。 石膏层包括异氰酸酯，水和灰泥的反应产物。 异氰酸酯增加了石膏板的耐湿性。 制造石膏板的方法包括以下步骤：将异氰酸酯，水和灰泥组合以形成浆料，并将浆料施加到覆盖片上以在覆盖片上形成石膏层。

公开(公告)号：US08574670B2

公开(公告)日：2013-11-05

申请号：US13185848

申请日：2011-07-19

Applicant: Wei Liu ,  Curtis Robert Fekety ,  Todd P St Clair

Inventor： Wei Liu ,  Curtis Robert Fekety ,  Todd P St Clair

IPC: B05D7/22

CPC classification number: B05D7/22 ,  B01D63/061 ,  B01D63/066 ,  B01D67/0046 ,  B01D67/0069 ,  B01D2323/42 ,  B05C7/04 ,  B05D1/00 ,  B05D3/0493 ,  C04B38/0096 ,  C23C18/1216 ,  C23C18/1628 ,  C23C18/1644 ,  C23C18/1678 ,  C23C18/42 ,  C04B35/00 ,  C04B38/0006

Abstract: A method and apparatus for applying a uniform membrane coating to a substrate, such as a honeycomb structure, having a plurality of through-channels, wherein the through-channels have an average diameter of less than or equal to 3 mm. The method includes providing a liquid precursor comprising membrane-forming materials to the substrate and applying a pressure differential across the substrate. The pressure differential causes the liquid precursor to travel uniformly through the through-channels, depositing the membrane-forming materials on the walls of the through-channels and forming the membrane on the walls of the through-channels. The apparatus includes a chamber capable of holding the substrate and of maintaining a pressure differential across the plurality of through-channels.

Abstract translation: 一种用于将均匀的膜涂层施加到具有多个通道的基底例如蜂窝结构的方法和装置，其中所述通道的平均直径小于或等于3mm。 该方法包括向衬底提供包含成膜材料的液体前体，并在衬底上施加压力差。 压力差导致液体前体均匀地流过通道，将膜形成材料沉积在通道的壁上并在通道的壁上形成膜。 该装置包括能够保持基板并且保持跨越多个通道的压差的室。

公开(公告)号：US20130287999A1

公开(公告)日：2013-10-31

申请号：US13702133

申请日：2011-06-07

Applicant: Nam-Goo Cha ,  Yolanda Ehegoyen ,  Ahmed Busnaina ,  Taehoon Kim

Inventor： Nam-Goo Cha ,  Yolanda Ehegoyen ,  Ahmed Busnaina ,  Taehoon Kim

IPC: B81B1/00 ,  B32B3/18 ,  B81C1/00

CPC classification number: B81B1/002 ,  B05D1/00 ,  B05D1/36 ,  B05D7/22 ,  B05D2401/32 ,  B22F2998/00 ,  B32B3/18 ,  B81C1/00373 ,  B81C1/0038 ,  C23C26/00 ,  Y10T428/24355 ,  Y10T428/24562 ,  B22F1/0022

Abstract: A method for assembling colloidal particles onto a substrate surface through fluid transport. The method comprises placing a first fluid placed adjacent to the substrate surface, applying a colloidal dispersion on top of the first fluid layer and removal of the first fluid layer. The method is extremely versatile, and is especially useful in depositing colloidal materials in high aspect ratio channels and vias without the need for prior treatment of the surface.

Abstract translation: 通过流体输送将胶体颗粒组装到基材表面上的方法。 该方法包括放置邻近衬底表面放置的第一流体，在第一流体层的顶部上施加胶态分散体并除去第一流体层。 该方法是非常通用的，并且特别可用于在高纵横比通道和通孔中沉积胶体材料，而不需要对表面进行先前的处理。

公开(公告)号：US20130284367A1

公开(公告)日：2013-10-31

申请号：US13873304

申请日：2013-04-30

Applicant: SEMES CO., LTD.

Inventor： Byung Chul Kang ,  Bong Joo Kim ,  Byung Man Kang ,  Young Ho Choo

IPC: B05C11/10 ,  B05D1/00

CPC classification number: B05C11/1042 ,  B05D1/00 ,  H01L21/67017 ,  H01L21/6715 ,  Y10T137/0329

Abstract: Provided is a substrate processing apparatus. The apparatus includes a processing chamber containing a substrate and processing the substrate by using a processing solution and a supplying unit supplying the processing solution to the processing chamber. The supplying unit includes a supply line through which the processing solution is supplied, a preliminary heater installed on the supply line and preliminary heating the processing solution, a main heater installed on the supply line at a lower stream of the preliminary heater and secondarily heating the processing solution, a first detour line connected to the supply line to detour to the preliminary heater and comprising a first valve, a second detour line connected to the supply line to detour the preliminary heater and the main heater or the main heater and comprising a second valve, and a controller controlling the first valve and the second valve.

Abstract translation: 提供了一种基板处理装置。 所述装置包括处理室，所述处理室包含基板并通过使用处理溶液和将所述处理溶液供应到所述处理室的供应单元来处理所述基板。 供给单元包括供给管线，通过该供给管路供给处理液，将预热加热器安装在供给管路上，对该处理液进行预加热，将主加热器安装在预热器的下游的供给管路上， 连接到所述供应管线以绕行到所述预加热器的第一绕线，包括第一阀，连接到所述供应管线的第二绕行线，以绕过所述预加热器和所述主加热器或所述主加热器并且包括第二阀 阀，以及控制第一阀和第二阀的控制器。