公开(公告)号：US06360562B1

公开(公告)日：2002-03-26

申请号：US09141394

申请日：1998-08-27

Applicant: Toivo T. Kodas ,  Mark J. Hampden-Smith ,  James Caruso ,  Quint H. Powell ,  Audunn Ludviksson

Inventor： Toivo T. Kodas ,  Mark J. Hampden-Smith ,  James Caruso ,  Quint H. Powell ,  Audunn Ludviksson

IPC: C03B1910

CPC classification number: B82Y30/00 ,  A61K6/0276 ,  A61K6/08 ,  A61K6/083 ,  B01J13/02 ,  B01J19/10 ,  B01J19/2405 ,  B01J2219/00112 ,  B01J2219/00155 ,  B01J2219/00159 ,  B01J2219/00162 ,  B01J2219/00166 ,  B01J2219/00171 ,  B01J2219/00186 ,  B24B37/044 ,  C01B13/18 ,  C01B13/185 ,  C01B17/20 ,  C01F17/0043 ,  C01G23/003 ,  C01P2002/60 ,  C01P2004/03 ,  C01P2004/32 ,  C01P2004/34 ,  C01P2004/50 ,  C01P2004/52 ,  C01P2004/61 ,  C01P2004/62 ,  C01P2006/22 ,  C03B19/106 ,  C03B2201/07 ,  C03C8/16 ,  C03C11/002 ,  C03C12/00 ,  C03C14/004 ,  C03C17/30 ,  C03C2214/08 ,  C09G1/02 ,  C09K3/1436 ,  C09K3/1463 ,  C09K11/584 ,  C09K11/595 ,  C09K11/623 ,  C09K11/642 ,  C09K11/643 ,  C09K11/644 ,  C09K11/662 ,  C09K11/666 ,  C09K11/672 ,  C09K11/7701 ,  C09K11/7708 ,  C09K11/7729 ,  C09K11/7769 ,  C09K11/7776 ,  C09K11/7784 ,  C09K11/7786 ,  C09K11/7787 ,  H01L21/3212 ,  Y02P40/57 ,  Y10T428/29 ,  Y10T428/2982 ,  Y10T428/2991 ,  Y10T428/2995 ,  Y10T428/2996 ,  C08L33/00

Abstract: Glass powders and methods for producing glass powders. The powders preferably have a small particle size, narrow size distribution and a spherical morphology. The method includes forming the particles by a spray pyrolysis technique. The invention also includes novel devices and products formed from the glass powders.

Abstract translation: 玻璃粉末和玻璃粉末的制造方法。 粉末优选具有小的粒度，窄的粒度分布和球形的形态。 该方法包括通过喷雾热解技术形成颗粒。 本发明还包括由玻璃粉末形成的新型器件和产品。

公开(公告)号：US20020018942A1

公开(公告)日：2002-02-14

申请号：US09841517

申请日：2001-04-24

Inventor： John T. Brown ,  Stephen C. Currie ,  Lisa A. Moore ,  Susan L. Schiefelbein ,  Robert S. Pavlik JR.

IPC: B32B015/00 ,  B32B009/00 ,  B32B017/06 ,  G03G016/00 ,  G03F009/00 ,  C03B037/10 ,  C03B037/018 ,  G02B006/18 ,  C03B037/075 ,  C03C013/00 ,  C03B019/06 ,  C03B019/00 ,  G02B006/00

CPC classification number: G03F7/70216 ,  C03B19/1407 ,  C03B19/1415 ,  C03B19/1423 ,  C03B19/1453 ,  C03B37/01202 ,  C03B37/01406 ,  C03B37/01413 ,  C03B37/0142 ,  C03B37/0146 ,  C03B2201/07 ,  C03B2201/075 ,  C03B2201/12 ,  C03B2201/20 ,  C03B2201/21 ,  C03B2207/06 ,  C03B2207/14 ,  C03B2207/20 ,  C03B2207/30 ,  C03B2207/32 ,  C03B2207/36 ,  C03B2207/38 ,  C03B2207/40 ,  C03B2207/46 ,  C03B2207/54 ,  C03C3/06 ,  C03C4/0085 ,  C03C2201/12 ,  C03C2201/20 ,  C03C2201/21 ,  C03C2201/23 ,  C03C2201/30 ,  C03C2201/32 ,  C03C2203/54 ,  G03F1/60 ,  G03F7/70958 ,  Y02P40/57

Abstract: High purity direct deposit vitrified silicon oxyfluoride glass suitable for use as a photomask substrates for photolithography applications in the VUV wavelength region below 190 nm is disclosed. The inventive direct deposit vitrified silicon oxyfluoride glass is transmissive at wavelengths around 157 nm, making it particularly useful as a photomask substrate at the 157 nm wavelength region. The inventive photomask substrate is a dry direct deposit vitrified silicon oxyfluoride glass which exhibits very high transmittance in the vacuum ultraviolet (VUV) wavelength region while maintaining the excellent thermal and physical properties generally associated with high purity fused silica. In addition to containing fluorine and having little or no OH content, the inventive direct deposit vitrified silicon oxyfluoride glass suitable for use as a photomask substrate at 157 nm is also characterized by having less than 1null1017 molecules/cm3 of molecular hydrogen and low chlorine levels.

Abstract translation: 公开了适用于在190nm以下的VUV波长区域中用于光刻应用的光掩模基板的高纯度直接沉积玻璃化硅氧氟化物玻璃。 本发明的直接沉积玻璃化硅氧氟化物玻璃在157nm波长附近是透射的，使其特别适用于157nm波长区域的光掩模衬底。 本发明的光掩模基材是在真空紫外（VUV）波长区域中显示非常高的透射率的干直接沉积玻璃化硅氧氟化物玻璃，同时保持通常与高纯度熔融二氧化硅相关的优异的热和物理性能。 除了含氟且具有很少或不含OH含量之外，本发明的适用于157nm的光掩模衬底的直接沉积玻璃化氟氧化硅玻璃的特征还在于具有小于1×10 17分子/ cm 3的分子氢和低氯水平。

公开(公告)号：US06333283B1

公开(公告)日：2001-12-25

申请号：US09369425

申请日：1999-08-06

Applicant: Akira Urano ,  Toshio Danzuka ,  Tatsuhiko Saito ,  Yasuhiko Shishido ,  Masaharu Mogi ,  Michihisa Kyoto

Inventor： Akira Urano ,  Toshio Danzuka ,  Tatsuhiko Saito ,  Yasuhiko Shishido ,  Masaharu Mogi ,  Michihisa Kyoto

IPC: C03C306

CPC classification number: G02B6/102 ,  C03B19/1453 ,  C03B32/00 ,  C03B37/01446 ,  C03B37/14 ,  C03B37/15 ,  C03B2201/07 ,  C03B2201/12 ,  C03B2201/21 ,  C03B2201/23 ,  C03C3/06 ,  C03C4/0085 ,  C03C13/045 ,  C03C23/002 ,  C03C23/0025 ,  C03C23/003 ,  C03C23/0035 ,  C03C23/0095 ,  C03C25/6208 ,  C03C2201/21 ,  C03C2201/23 ,  C03C2203/50 ,  G02B6/02 ,  Y02P40/57 ,  Y10S501/905

Abstract: A process of manufacturing a silica glass article comprising the steps of: (1) irradiating a silica glass article with electromagnetic waves to generate defects therein; and (2) immersing the thus irradiated silica glass article in an atmosphere comprising a hydrogen gas, thereby providing the resulting silica glass article with a characteristic that is effective for preventing it substantially from increasing its absorption within an ultraviolet region due to ultraviolet ray irradiation. Also disclosed are a silica glass article or a glass fiber produced according to the manufacturing process.

Abstract translation: 一种制造石英玻璃制品的方法，包括以下步骤：（1）用电磁波照射石英玻璃制品以在其中产生缺陷; 和（2）将这样照射的二氧化硅玻璃制品浸入包括氢气的气氛中，从而使得到的石英玻璃制品具有有效地防止紫外线辐射在紫外线区域内大幅吸收的特征。 还公开了根据制造方法制造的石英玻璃制品或玻璃纤维。

公开(公告)号：US06291377B1

公开(公告)日：2001-09-18

申请号：US09150613

申请日：1998-09-10

Applicant: Norio Komine ,  Seishi Fujiwara ,  Hiroki Jinbo

Inventor： Norio Komine ,  Seishi Fujiwara ,  Hiroki Jinbo

IPC: C03C306

CPC classification number: C03B19/14 ,  C03B19/1423 ,  C03B19/1484 ,  C03B37/014 ,  C03B37/0142 ,  C03B2201/07 ,  C03B2201/12 ,  C03B2201/23 ,  C03B2207/06 ,  C03B2207/12 ,  C03B2207/20 ,  C03B2207/30 ,  C03B2207/36 ,  C03B2207/66 ,  C03C3/06 ,  C03C4/0085 ,  C03C2201/12 ,  C03C2201/21 ,  C03C2201/23 ,  C03C2203/42 ,  C03C2203/46 ,  G03F7/2004 ,  Y10S65/90

Abstract: A method is provided for manufacturing a silica glass that is substantially free of chlorine. The method includes the step of separately expelling a silicon tetrafluoride gas, a combustion gas, and a combustible gas from a burner made of silica glass, the flow velocity of the silicon tetrafluoride gas being within the range of about 9 slm/cm2 to about 20 slm/cm2. The method further includes the steps of producing minute silica glass particles by reacting the silicon tetrafluoride gas with water produced by a reaction of the combustion gas with the combustible gas, depositing the minute silica glass particles on a target, and producing the silica glass by fusing and vitrifying the minute silica glass particles deposited on the target.

Abstract translation: 提供了一种制造基本上不含氯的石英玻璃的方法。 该方法包括从由石英玻璃制成的燃烧器分别排出四氟化硅气体，燃烧气体和可燃气体的步骤，四氟化硅气体的流速在约9slm / cm 2至约20的范围内 slm / cm2。 该方法还包括以下步骤：通过使四氟化硅气体与通过燃烧气体与可燃气体的反应产生的水反应生成微小的二氧化硅玻璃颗粒，将微小二氧化硅玻璃颗粒沉积在靶材上，并通过熔融制备石英玻璃 并使沉积在靶上的微小二氧化硅玻璃颗粒玻璃化。

公开(公告)号：US06289161B1

公开(公告)日：2001-09-11

申请号：US09198883

申请日：1998-11-23

Applicant: Gerhard Schötz ,  Jan Vydra

Inventor： Gerhard Schötz ,  Jan Vydra

IPC: G02B600

CPC classification number: C03C13/045 ,  C03B37/01446 ,  C03B2201/03 ,  C03B2201/04 ,  C03B2201/07 ,  C03B2201/08 ,  C03B2201/12 ,  C03B2201/20 ,  C03B2201/23 ,  C03C2201/11 ,  C03C2201/23 ,  G02B6/02 ,  G02B6/02395 ,  G02B6/443

Abstract: In a known optical component a cylindrical glass core of synthetic quartz glass contains hydroxyl groups, a maximum 200 wt.-ppm of chlorine, and no dopant in the form of a metal oxide. The glass core is axially enveloped by a glass mantle of doped quartz glass which has a lower refractive index than the glass core. Setting out from this, in order to offer an optical component of quartz glass for broad-band transmission, especially for broad-band spectroscopy, which is characterized by low attenuation over a broad range of wavelengths, it is proposed by the invention that the core glass contain less than 5 wt.-ppm of hydroxyl groups.

Abstract translation: 在已知的光学组件中，合成石英玻璃的圆柱形玻璃芯包含羟基，最大为200重量ppm的氯，并且不含金属氧化物形式的掺杂剂。 玻璃芯由掺杂石英玻璃的玻璃罩轴向包围，折射率比玻璃芯低。 从此出发，为了提供用于宽带传输的石英玻璃的光学部件，特别是对于在宽波长范围内具有低衰减特征的宽带光谱，本发明提出了核心 玻璃含有小于5重量ppm的羟基。

公开(公告)号：US06242136B1

公开(公告)日：2001-06-05

申请号：US09397573

申请日：1999-09-16

Applicant: Lisa A. Moore ,  Charlene Smith

Inventor： Lisa A. Moore ,  Charlene Smith

IPC: G03F900

CPC classification number: C03B19/1453 ,  C03B2201/07 ,  C03B2201/075 ,  C03B2201/12 ,  C03B2201/21 ,  C03C3/06 ,  C03C4/0085 ,  C03C2201/12 ,  G03F1/60 ,  Y02P40/57

Abstract: High purity silicon oxyfluoride glass suitable for use as a photomask substrates for photolithography applications in the VUV wavelength region below 190 nm is disclosed. The inventive silicon oxyfluoride glass is transmissive at wavelengths around 157 nm, making it particularly useful as a photomask substrate at the 157 nm wavelength region. The inventive photomask substrate is a “dry,” silicon oxyfluoride glass which exhibits very high transmittance in the vacuum ultraviolet (VUV) wavelength region while maintaining the excellent thermal and physical properties generally associated with high purity fused silica. In addition to containing fluorine and having little or no OH content, the inventive silicon oxyfluoride glass suitable for use as a photomask substrate at 157 nm is also characterized by having less than 1×1017 molecules/cm3 of molecular hydrogen and low chlorine levels.

Abstract translation: 公开了适用于在低于190nm的VUV波长区域中用于光刻应用的光掩模基板的高纯度氟氧化硅玻璃。 本发明的氟氧化硅玻璃在157nm波长下是透射的，使其特别适用于157nm波长区域的光掩模衬底。 本发明的光掩模基材是“真空”的氟氧化硅玻璃，其在真空紫外（VUV）波长区域中表现出非常高的透射率，同时保持通常与高纯度熔融石英相关的优异的热和物理性能。 除了含氟并且具有很少或不含OH含量之外，本发明的适合用作157nm的光掩模衬底的氟氧化硅玻璃的特征还在于具有小于1×10 17分子/ cm 3的分子氢和低氯水平。

公开(公告)号：US5106401A

公开(公告)日：1992-04-21

申请号：US544942

申请日：1990-06-28

Applicant: Shinji Ishikawa ,  Yuichi Ohga ,  Ichiro Tsuchiya ,  Hiroo Kanamori ,  Hiroshi Yokota ,  Michihisa Kyoto

Inventor： Shinji Ishikawa ,  Yuichi Ohga ,  Ichiro Tsuchiya ,  Hiroo Kanamori ,  Hiroshi Yokota ,  Michihisa Kyoto

IPC: G02B6/00 ,  C03B37/014

CPC classification number: C03B37/01446 ,  C03B37/0146 ,  C03B2201/07 ,  C03B2201/075 ,  C03B2201/12 ,  Y10S65/16 ,  Y10S65/90

Abstract: The present invention providesa process for the dehydrating and purifying treatment by heating a porous glass preform for an optical fiber by passing the porous glass preform through a muffle tube having a SiC layer at least on its inner surface at a high temperature under an atmosphere containing an inert gas and a silicon halogenide gas;a process for the fluorine-doping treatment by heating a porous glass preform for an optical fiber by passing a porous glass preform through a muffle tube having a SiC layer at least on its inner surface at a high temperature under an atmosphere containing a fluorine compound gas and an inert gas; anda process for the vitrifying treatment by heating a porous glass preform for an opticla fiber by passing the preform, which has been previously dehydrated and purified, through a muffle tube having a SiC layer at least on its inner surface at a high temperature under an atmosphere gas.

公开(公告)号：US20240018029A1

公开(公告)日：2024-01-18

申请号：US18373886

申请日：2023-09-27

Applicant: OHARA INC.

Inventor： MORIJI NOZAKI ,  TOSHITAKA YAGI ,  KOHEI OGASAWARA

IPC: C03B23/02 ,  C03B32/02 ,  C03C3/085

CPC classification number: C03B23/02 ,  C03B32/02 ,  C03C3/085 ,  C03B2201/07 ,  C03B2201/32 ,  C03B2201/42

Abstract: To obtain a crystallized glass member having a curved shape and provide a method for producing the same. A method for producing a crystallized glass member having a curved shape, including a deformation step for adjusting the temperature of a plate glass to a first temperature zone from higher than [At+40]° C. to [At+146]° C. or lower, where At is the yield point (° C.) of the plate glass and deforming at least part of the plate glass into a curved shape by external force acting on the plate glass while precipitating crystals from the plate glass.

公开(公告)号：US09919955B2

公开(公告)日：2018-03-20

申请号：US15086169

申请日：2016-03-31

Applicant: OFS Fitel, LLC

Inventor： Man F Yan ,  Peter I Borel ,  Tommy Geisler ,  Rasmus V Jensen ,  Ole A Levring ,  Jorgen Ostgaard Olsen ,  David W Peckham ,  Dennis J Trevor ,  Patrick W Wisk ,  Benyuan Zhu

IPC: G02B6/36 ,  C03C13/04 ,  C03B37/012 ,  C03C3/06 ,  C03C4/10 ,  C03B37/027 ,  G02B6/036

CPC classification number: C03C13/046 ,  C03B37/01208 ,  C03B37/01853 ,  C03B37/027 ,  C03B2201/07 ,  C03B2201/08 ,  C03B2201/12 ,  C03B2201/20 ,  C03B2201/28 ,  C03B2201/50 ,  C03B2203/223 ,  C03B2203/23 ,  C03C3/06 ,  C03C4/10 ,  C03C13/045 ,  C03C2201/11 ,  C03C2201/12 ,  C03C2201/28 ,  C03C2201/50 ,  G02B6/03627 ,  G02B6/0365

Abstract: An optical fiber has a core region that is doped with one or more viscosity-reducing dopants in respective amounts that are configured, such that, in a Raman spectrum with a frequency shift of approximately 600 cm−1, the fiber has a nanoscale structure having an integrated D2 line defect intensity of less than 0.025. Alternatively, the core region is doped with one or more viscosity-reducing dopants in respective amounts that are configured such that the fiber has a residual axial compressive stress with a stress magnitude of more than 20 MPa and a stress radial extent between 2 and 7 times the core radius.According to another aspect of the invention a majority of the optical propagation through the fiber is supported by an identified group of fiber regions comprising the core region and one or more adjacent cladding regions. The fiber regions are doped with one or more viscosity-reducing dopants in respective amounts and radial positions that are configured to achieve viscosity matching among the fiber regions in the identified group.

公开(公告)号：US20170349477A1

公开(公告)日：2017-12-07

申请号：US15608118

申请日：2017-05-30

Applicant: CoorsTek KK

Inventor： Yuji FUKASAWA ,  Sachiko KATO

IPC: C03C3/06 ,  C03B25/02 ,  C03B27/02 ,  C03C4/00

CPC classification number: C03C3/06 ,  C03B19/1461 ,  C03B25/02 ,  C03B27/02 ,  C03B27/028 ,  C03B27/04 ,  C03B32/00 ,  C03B2201/07 ,  C03B2201/075 ,  C03B2201/12 ,  C03C4/0085

Abstract: Provided is a silica glass member which exhibits high optical transparency to vacuum ultraviolet light and has a low thermal expansion coefficient of 4.0−10−7/K or less at near room temperature, particularly a silica glass member which is suitable as a photomask substrate to be used in a double patterning exposure process using an ArF excimer laser (193 nm) as a light source. The silica glass member is used in a photolithography process using a vacuum ultraviolet light source, in which the fluorine concentration is 1 wt % or more and 5 wt % or less, and the thermal expansion coefficient at from 20° C. to 50° C. is 4.0×10−7/K or less.