公开(公告)号：US10092979B2

公开(公告)日：2018-10-09

申请号：US15962664

申请日：2018-04-25

Applicant: GIGAPHOTON INC.

Inventor： Akiyoshi Suzuki ,  Minoru Taniyama ,  Osamu Wakabayashi

IPC: B23K26/06 ,  B23K26/073 ,  G02B26/08 ,  B23K26/10

Abstract: A laser irradiation apparatus may include: an irradiation head section including first and second irradiation heads each configured to perform laser light irradiation on a workpiece; a laser unit section including first and second laser units configured to respectively output first laser light and second laser light; a beam delivery section provided in an optical path between the laser unit section and the irradiation head section, and configured to perform switching of optical paths between optical paths of the first laser light and the second laser light to cause the first or second laser light to enter the first or second irradiation head; a first beam property varying section provided in an optical path between the first laser unit and the irradiation head section; and a second beam property varying section provided in an optical path between the second laser unit and the irradiation head section.

公开(公告)号：US10074958B2

公开(公告)日：2018-09-11

申请号：US15353235

申请日：2016-11-16

Applicant: Gigaphoton Inc.

Inventor： Osamu Wakabayashi ,  Masaki Arakawa ,  Kouji Kakizaki

IPC: G02B27/10 ,  H01S3/13 ,  G01J1/42 ,  H01S3/00 ,  H01S3/139 ,  H01S3/23 ,  H01S3/225

CPC classification number: H01S3/1305 ,  G01J1/4257 ,  G01J2001/4261 ,  H01S3/0014 ,  H01S3/005 ,  H01S3/0071 ,  H01S3/1394 ,  H01S3/225 ,  H01S3/2383

Abstract: The laser system may include a plurality of laser apparatuses, a beam delivery device configured to bundle pulse laser beams emitted from respective laser apparatuses of the plurality of laser apparatuses to emit a bundled pulse laser beam, and a beam parameter measuring device provided in an optical path of the bundled pulse laser beam to measure a beam parameter of each one of the pulse laser beams and a beam parameter of the bundled pulse laser beam.

公开(公告)号：US09986629B2

公开(公告)日：2018-05-29

申请号：US15017000

申请日：2016-02-05

Applicant: Gigaphoton Inc.

Inventor： Toru Suzuki ,  Tamotsu Abe ,  Osamu Wakabayashi ,  Tatsuya Yanagida

IPC: H05G2/00 ,  G03F7/20

CPC classification number: H05G2/008 ,  G03F7/70033 ,  H05G2/003 ,  H05G2/005

Abstract: An extreme ultraviolet light generation apparatus may include: a chamber including a plasma generation region to which a target is supplied, the target being turned into plasma so that extreme ultraviolet light is generated in the chamber; a target supply part configured to supply the target to the plasma generation region by outputting the target as a droplet into the chamber; a droplet detector configured to detect the droplet traveling from the target supply part to the plasma generation region; an imaging part configured to capture an image of an imaging region containing the plasma generation region in the chamber; and a controller configured to control an imaging timing at which the imaging part captures the image of the imaging region, based on a detection timing at which the droplet detector detects the droplet.

公开(公告)号：US09980360B2

公开(公告)日：2018-05-22

申请号：US15284805

申请日：2016-10-04

Applicant: Gigaphoton Inc.

Inventor： Tatsuya Yanagida ,  Osamu Wakabayashi

IPC: H05G2/00 ,  H01S3/06 ,  H01S3/11 ,  H01S3/223 ,  H01S3/08 ,  H01S3/107 ,  H01S3/16 ,  H01S3/23 ,  H01S3/00

CPC classification number: H05G2/008 ,  H01S3/005 ,  H01S3/0602 ,  H01S3/08054 ,  H01S3/107 ,  H01S3/1115 ,  H01S3/1611 ,  H01S3/1643 ,  H01S3/1673 ,  H01S3/2232 ,  H01S3/2308 ,  H01S3/2316 ,  H01S3/235 ,  H05G2/006

Abstract: An extreme ultraviolet light (EUV) generation system is configured to improve conversion efficiency of energy of a laser system to EUV energy by improving the efficiency of plasma generation. The EUV generation system includes a target generation unit configured to output a target toward a plasma generation region in a chamber. The laser system is configured to generate a first pre-pulse laser beam, a second pre-pulse laser beam, and a main pulse laser beam so that the target is irradiated with the first pre-pulse laser beam, the second pre-pulse laser beam, and the main pulse laser beam in this order. In addition, the EUV generation system includes a controller configured to control the laser system so that a fluence of the second pre-pulse laser beam is equal to or higher than 1 J/cm2 and equal to or lower than a fluence of the main pulse laser beam.

公开(公告)号：US09954339B2

公开(公告)日：2018-04-24

申请号：US15040645

申请日：2016-02-10

Applicant: GIGAPHOTON INC.

Inventor： Takashi Suganuma ,  Hakaru Mizoguchi ,  Osamu Wakabayashi

IPC: H01S3/00 ,  H05G2/00 ,  G02B27/28 ,  H01S3/23 ,  H01S3/038 ,  G03F7/20

CPC classification number: H01S3/005 ,  G02B27/286 ,  G03F7/70033 ,  G03F7/70041 ,  H01S3/038 ,  H01S3/2316 ,  H05G2/008

Abstract: There is provided a laser unit that may include: a master oscillator configured to output a linear-polarized laser light beam; a first polarization device disposed in a light path of the linear-polarized laser light beam and provided with a polarization axis substantially aligned with a polarization direction of the linearly-polarized incident laser light beam; a second polarization device disposed in the light path of the linear-polarized laser light beam and provided with a polarization axis substantially aligned with a direction of the polarization axis of the first polarization device; and a laser amplifier disposed between the first polarization device and the second polarization device in the light path of the linear-polarized laser light beam and including a pair of discharge electrodes disposed to oppose each other, an opposing direction of the pair of discharge electrodes being substantially aligned with the direction of the polarization axis of the first polarization device.

公开(公告)号：US09882334B2

公开(公告)日：2018-01-30

申请号：US15201769

申请日：2016-07-05

Applicant: Gigaphoton Inc.

Inventor： Toru Suzuki ,  Yukio Watanabe ,  Miwa Igarashi ,  Osamu Wakabayashi

IPC: H01S3/00 ,  G02B7/182 ,  H05G2/00 ,  H01S3/10 ,  G02B7/18 ,  G02B27/14 ,  G02B26/06 ,  H01S3/223 ,  H01S3/23

CPC classification number: H01S3/0071 ,  G02B7/1815 ,  G02B7/182 ,  G02B26/06 ,  G02B27/144 ,  H01S3/005 ,  H01S3/1003 ,  H01S3/2232 ,  H01S3/2316 ,  H05G2/003 ,  H05G2/008

Abstract: A mirror device may include: an optical element configured to reflect part of a laser beam and transmit the other part of the laser beam therethrough; and a holder in surface contact with the optical element to hold the optical element. A flatness of a contact surface of the holder in contact with the optical element may be equal to or smaller than a flatness of the optical element.

公开(公告)号：US09877378B2

公开(公告)日：2018-01-23

申请号：US15278629

申请日：2016-09-28

Applicant: Gigaphoton Inc.

Inventor： Tsukasa Hori ,  Kouji Kakizaki ,  Tatsuya Yanagida ,  Osamu Wakabayashi ,  Hakaru Mizoguchi

IPC: H05G2/00 ,  H01S3/104 ,  H01S3/16 ,  H01S3/223 ,  H01S3/23 ,  H01S3/11 ,  H01S3/09 ,  H01S3/102 ,  H01S3/00

CPC classification number: H05G2/008 ,  H01S3/005 ,  H01S3/0071 ,  H01S3/09 ,  H01S3/102 ,  H01S3/104 ,  H01S3/1106 ,  H01S3/1611 ,  H01S3/1643 ,  H01S3/1673 ,  H01S3/2232 ,  H01S3/2308 ,  H01S3/2366 ,  H01S3/2391 ,  H05G2/003 ,  H05G2/005

Abstract: A system includes a chamber, a laser beam apparatus configured to generate a laser beam to be introduced into the chamber, a laser controller for the laser beam apparatus to control at least a beam intensity and an output timing of the laser beam, and a target supply unit configured to supply a target material into the chamber, the target material being irradiated with the laser beam for generating extreme ultraviolet light.

公开(公告)号：US09667019B2

公开(公告)日：2017-05-30

申请号：US14748332

申请日：2015-06-24

Applicant: GIGAPHOTON INC.

Inventor： Masato Moriya ,  Takashi Suganuma ,  Osamu Wakabayashi

IPC: H01S3/00 ,  H05G2/00 ,  H01S3/223 ,  H01S3/23

CPC classification number: H01S3/0064 ,  H01S3/005 ,  H01S3/2232 ,  H01S3/2316 ,  H01S2301/02 ,  H05G2/008

Abstract: There may be included: a master oscillator configured to output pulsed laser light; two or more power amplifiers disposed in an optical path of the pulsed laser light to amplify the pulsed laser light; and an optical isolator provided between adjacent two of the power amplifiers in the optical path of the pulsed laser light, and configured to suppress transmission of light traveling from the power amplifiers to a side where the master oscillator is provided.

公开(公告)号：US09661730B2

公开(公告)日：2017-05-23

申请号：US15151025

申请日：2016-05-10

Applicant: Gigaphoton Inc.

Inventor： Atsushi Ueda ,  Takayuki Yabu ,  Osamu Wakabayashi ,  Georg Soumagne ,  Takashi Saito

IPC: H05G2/00

CPC classification number: H05G2/006 ,  H05G2/008

Abstract: An extreme ultraviolet light generation apparatus may include: a chamber; a target supply unit configured to output a target toward a predetermined region inside the chamber; a first gas supply unit configured to blow out gas in a first direction toward a trajectory of the target between the target supply unit and the predetermined region; and a focusing optical system configured to concentrate a pulse laser beam to the predetermined region.

公开(公告)号：US09509115B2

公开(公告)日：2016-11-29

申请号：US14821442

申请日：2015-08-07

Applicant: GIGAPHOTON, INC.

Inventor： Tatsuya Yanagida ,  Osamu Wakabayashi

IPC: H05G2/00 ,  H01S3/10

CPC classification number: H01S3/10061 ,  H01S3/08054 ,  H01S3/08059 ,  H01S3/2308 ,  H01S3/2383 ,  H01S2301/20 ,  H05G2/003 ,  H05G2/008

Abstract: An extreme ultraviolet light generation system used with a laser apparatus may be provided, and the extreme ultraviolet light generation system may include: a chamber including at least one window for at least one laser beam and a target supply unit for supplying a target material into the chamber; and at least one polarization control unit, provided on a laser beam path, for controlling a polarization state of the at least one laser beam.