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101.发明授权公开(公告)号：US11987491B2
公开(公告)日：2024-05-21
申请号：US17568201
申请日：2022-01-04
Inventor： Peter Dürr , Andreas Neudert , Linda Skatulla
IPC: B81B3/00
CPC classification number: B81B3/0027 , B81B2201/033 , B81B2203/04
Abstract: A MEMS (micro-electromechanical system) actuator element includes a substrate, a stationary first electrode structure with an edge structure, a second electrode structure with an edge structure, wherein the second electrode structure is deflectably coupled to the substrate by means of a spring structure and electrostatically deflectable by means of the first electrode structure to move the edge structure of the second electrode structure into an intermediate position between a minimum and maximum vertical deflection position, wherein the minimum and maximum deflection position specify a maximum deflection path, wherein the edge structures of the first and second electrode structures are to each other and are vertically spaced apart in the minimum deflection position and wherein, in the maximum deflection position, the vertical immersion path of the edge structure of the second electrode structure into the edge structure of the first electrode structure is up to 0.5 times the maximum deflection path zS.
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公开(公告)号：US11822069B2
公开(公告)日：2023-11-21
申请号：US18073998
申请日：2022-12-02
Applicant: BEIJING VOYAGER TECHNOLOGY CO., LTD.
Inventor： Youmin Wang , Yufeng Wang , Qin Zhou
CPC classification number: G02B26/0841 , B81B3/0048 , G01S7/4817 , G02B26/0858 , G02B26/105 , B81B2201/033 , B81B2201/042
Abstract: Embodiments of the disclosure provide a micromachined mirror assembly for controlling optical directions in an optical sensing system. The micromachined mirror assembly may include a micro mirror configured to direct an optical signal into a plurality of directions. The micromachined mirror assembly may also include at least one actuator coupled to the micro mirror and configured to drive the micro mirror to tilt around an axis. The micromachined mirror assembly may further include one or more objects attached to the micro mirror. The one or more objects may be asymmetrically disposed with respect to the axis to create an imbalanced state of the micro mirror when the micro mirror is not driven by the at least one actuator.
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103.发明申请公开(公告)号：US20180029878A1
公开(公告)日：2018-02-01
申请号：US15662389
申请日：2017-07-28
Applicant: Infineon Technologies AG
Inventor： Alfons Dehe , Matthias Friedrich Herrmann , Johannes Manz
CPC classification number: B81B7/0061 , B81B3/0021 , B81B2201/0257 , B81B2201/033 , B81B2203/0127 , B81B2203/04 , B81C1/00158 , B81C1/00166
Abstract: A microelectromechanical device, a microelectromechanical system, and a method of manufacturing a microelectromechanical device, wherein the microelectromechanical device may include: a substrate; a diaphragm mounted to the substrate; a first electrode mounted to the diaphragm; a second electrode mounted to the substrate; wherein the first electrode is laterally adjacent to the second electrode; and wherein the diaphragm is arranged over a gap between the first electrode and the second electrode.
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公开(公告)号：US20170302197A1
公开(公告)日：2017-10-19
申请号：US15133142
申请日：2016-04-19
Applicant: MEMS START, LLC
Inventor： ROMAN GUTIERREZ
CPC classification number: H02N1/006 , B81B3/007 , B81B2201/033 , H02N1/008 , H02N1/08
Abstract: Systems and apparatuses are provided for increasing the possible force and/or travel generated in MEMS devices. For example, comb fingers may be utilized to form a strain actuator to generate larger forces. As another example, the force advantage of a parallel plate actuator is leveraged while also leveraging the travel advantage of comb drives to increase force and/or travel capable of being generated. The systems and apparatuses disclosed may utilize one or more comb drives operationally attached to one or more flexures and/or frames.
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公开(公告)号：US20170153445A1
公开(公告)日：2017-06-01
申请号：US14955060
申请日：2015-12-01
Applicant: APPLE INC.
Inventor： Yuval Gerson , Alexander Shpunt
CPC classification number: G02B26/101 , B81B3/00 , B81B3/007 , B81B2201/033 , B81B2201/034 , B81B2201/047 , B81B2203/0136 , B81B2203/058 , B81B2207/015 , B81C1/00515 , B81C2201/0111 , G01S7/4817 , G01S7/497 , G01S17/10 , G01S17/42 , G01S17/89 , G02B26/0833
Abstract: A scanning device includes a frame, having a central opening, and an array including a plurality of parallel mirrors contained within the central opening of the frame. Hinges respectively connect the mirrors to the frame and define respective, mutually-parallel axes of rotation of the mirrors relative to the frame. A main drive applies a driving force to the array so as to drive an oscillation of the mirrors about the hinges at a resonant frequency of the array. A sensor is configured to detect a discrepancy in a synchronization of the oscillation among the mirrors in the array, and an adjustment circuit applies a corrective signal to at least one of the mirrors in order to alleviate the detected discrepancy.
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Patent Agency Ranking
公开(公告)号：US09656858B2
公开(公告)日：2017-05-23
申请号：US14336477
申请日：2014-07-21
Applicant: Atlantic Inertial Systems Limited
Inventor： Tracey Hawke , Mark Venables , Ian Sturland , Rebecka Eley
IPC: H01L21/311 , H01L21/302 , H01L21/461 , H01L29/06 , B81C1/00 , B81B3/00 , H01L21/3065 , H01L21/308
CPC classification number: B81C1/00531 , B81B3/0064 , B81B2201/033 , B81B2203/033 , B81C1/00388 , B81C1/00619 , B81C2201/0112 , H01L21/3065 , H01L21/308
Abstract: A method of reactive ion etching a substrate 46 to form at least a first and a second etched feature (42, 44) is disclosed. The first etched feature (42) has a greater aspect ratio (depth:width) than the second etched feature (44). In a first etching stage the substrate (46) is etched so as to etch only said first feature (42) to a predetermined depth. Thereafter in a second etching stage, the substrate (46) is etched so as to etch both said first and said second features (42, 44) to a respective depth. A mask (40) may be applied to define apertures corresponding in shape to the features (42, 44). The region of the substrate (46) in which the second etched feature (44) is to be produced is selectively masked with a second maskant (50) during the first etching stage, The second maskant (50) is then removed prior to the second etching stage.
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107.发明授权公开(公告)号：US09506777B2
公开(公告)日：2016-11-29
申请号：US14885656
申请日：2015-10-16
Applicant: Sagatek Co., Ltd.
Inventor： Kelvin Yi-Tse Lai , Jung-Hsiang Chen , Cheng-Szu Chen , Shu-Yi Weng
CPC classification number: G01D5/24 , B81B7/008 , B81B2201/0235 , B81B2201/033 , B81B2207/012 , B81C1/00698
Abstract: A micro-electromechanical apparatus having a signal attenuation-proof function, and a manufacturing method and a signal attenuation-proof method thereof are disclosed. The micro-electromechanical apparatus includes a substrate, an insulation layer, and a sensing unit. The substrate has a doped region in which a majority of conductive carriers have the same polarity as an electronic signal. The insulation layer is located on the substrate, and the sensing unit is located above the insulation layer and forms the electronic signal when sensing a force.
Abstract translation: 公开了一种具有信号衰减防御功能的微机电装置及其制造方法和信号衰减防止方法。 微机电装置包括基板，绝缘层和感测单元。 衬底具有掺杂区域，其中绝大多数导电载体具有与电子信号相同的极性。 绝缘层位于基板上，感测单元位于绝缘层上方，并在感测到力时形成电子信号。
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公开(公告)号：US20160216508A1
公开(公告)日：2016-07-28
申请号：US14980883
申请日：2015-12-28
Applicant: CANON KABUSHIKI KAISHA
Inventor： Kenji Tamamori
CPC classification number: H02N1/008 , A61B3/1015 , A61B3/1225 , B81B3/0072 , B81B2201/033 , G02B26/06 , G02B26/0825 , G02B27/0068
Abstract: Provided is an actuator having a structure with which stress concentration on an elastic member of the actuator can be reduced in a manufacturing process thereof and breakage of the elastic member can be inhibited. The actuator includes a movable member, an elastic member configured to connect the movable member and a supporting member to each other, and an electrode pair having a comb electrode structure for displacing the movable member in a direction perpendicular to a reflective surface in which all movable comb electrodes extending from the movable member are substantially in parallel with one another, and a portion of the elastic member, which is located at a beginning of extension from the movable member, is substantially in parallel with the movable comb electrodes.
Abstract translation: 提供一种致动器，其制造过程中可以减小致动器的弹性构件上的应力集中的结构，并且可以抑制弹性构件的断裂。 致动器包括可动构件，构造成将可动构件和支撑构件彼此连接的弹性构件，以及具有梳状电极结构的电极对，用于使可移动构件沿与反射表面垂直的方向移动，其中所有可移动 从可动部件延伸的梳状电极基本上彼此平行，并且位于从可动部件延伸开始部分的弹性部件的一部分与可动梳状电极大致平行。
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公开(公告)号：US20160047837A1
公开(公告)日：2016-02-18
申请号：US14817324
申请日：2015-08-04
Applicant: Seiko Epson Corporation
Inventor： Satoru TANAKA
IPC: G01P15/125
CPC classification number: G01P15/125 , B81B3/0013 , B81B2201/0235 , B81B2201/0242 , B81B2201/033 , B81B2207/097 , B81C2203/0109 , B81C2203/031 , G01C19/5719 , G01P2015/0814
Abstract: A physical quantity sensor includes: a base substrate; a movable portion; a plurality of movable electrode fingers which are provided in the movable portion; a fixed electrode finger which is provided on the base substrate; and a fixing portion which fixes the movable portion to the base substrate. In the movable electrode fingers, a movable electrode finger which opposes the fixing portion in the first direction is included. A clearance between the movable electrode finger and the fixing portion is smaller than a clearance between the movable electrode finger and the fixed electrode finger. The width of the movable electrode finger is greater than the width of other movable electrode finger.
Abstract translation: 物理量传感器包括：基底; 可移动部分; 多个可动电极指，设置在可动部分中; 固定电极指，其设置在基底基板上; 以及固定部，其将可动部固定在基底基板上。 在可动电极指中包括与第一方向相对的固定部的可动电极指。 可动电极指和固定部之间的间隙小于可动电极指和固定电极指的间隙。 可动电极指的宽度大于其他可动电极指的宽度。
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110.发明申请公开(公告)号：US20160041009A1
公开(公告)日：2016-02-11
申请号：US14885656
申请日：2015-10-16
Applicant: Sagatek Co., Ltd.
Inventor： Kelvin Yi-Tse LAI , Jung-Hsiang CHEN , Cheng-Szu CHEN , Shu-Yi WENG
CPC classification number: G01D5/24 , B81B7/008 , B81B2201/0235 , B81B2201/033 , B81B2207/012 , B81C1/00698
Abstract: A micro-electromechanical apparatus having a signal attenuation-proof function, and a manufacturing method and a signal attenuation-proof method thereof are disclosed. The micro-electromechanical apparatus includes a substrate, an insulation layer, and a sensing unit. The substrate has a doped region in which a majority of conductive carriers have the same polarity as an electronic signal. The insulation layer is located on the substrate, and the sensing unit is located above the insulation layer and forms the electronic signal when sensing a force.
Abstract translation: 公开了一种具有信号衰减防御功能的微机电装置及其制造方法和信号衰减防止方法。 微机电装置包括基板，绝缘层和感测单元。 衬底具有掺杂区域，其中绝大多数导电载体具有与电子信号相同的极性。 绝缘层位于基板上，感测单元位于绝缘层上方，并在感测到力时形成电子信号。
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