公开(公告)号：US08369674B2

公开(公告)日：2013-02-05

申请号：US12469121

申请日：2009-05-20

Applicant: Susanne Madeline Lee ,  Peter Michael Edic

Inventor： Susanne Madeline Lee ,  Peter Michael Edic

IPC: G02B6/028 ,  G02B6/34 ,  G02B6/10

CPC classification number: G21K1/062 ,  B82Y10/00 ,  G02B5/0833 ,  G02B5/0883 ,  G02B5/0891 ,  G02B6/0283 ,  G02B6/03638 ,  G02B6/03661 ,  G02B6/03688 ,  G02B6/102 ,  G21K2201/064 ,  G21K2201/067

Abstract: An optic device includes a multilayer zone forming a redirection section for redirecting and transmitting photons through total internal reflection, each multilayer zone including a high index material having a first real refractive index n1 and a first absorption coefficient β1, a low index material having a second real refractive index n2 and a second absorption coefficient β2, and a grading zone disposed between the high index material and the low index material and including a grading layer having a third real refractive index n3 and a third absorption coefficient β3, wherein n1>n3>n2.

Abstract translation: 光学器件包括形成重定向部分的多层区域，用于通过全内反射来重定向和传输光子，每个多层区域包括具有第一实际折射率n1和第一吸收系数bgr的高折射率材料; 1，具有 第二实际折射率n2和第二吸收系数bgr; 2以及设置在高折射率材料和低折射率材料之间的分级区，并且包括具有第三实际折射率n3和第三吸收系数＆lt; bgr 3的分级层 其中n1> n3> n2。

公开(公告)号：US20130010929A1

公开(公告)日：2013-01-10

申请号：US13519175

申请日：2010-12-28

Applicant: Kazuto Yamauchi ,  Takashi Kimura ,  Takashi Tsumura

Inventor： Kazuto Yamauchi ,  Takashi Kimura ,  Takashi Tsumura

IPC: G21K1/06 ,  G21K1/087 ,  H01L41/22

CPC classification number: G21K1/06 ,  G21K2201/064 ,  G21K2201/067 ,  Y10T29/42

Abstract: The device is configured from: a reflective surface shape controllable mirror in which a band-shaped X-ray reflective surface 2 is formed on a central portion of a front surface of a substrate 1, reference planes 3 are formed along both sides of the X-ray reflective surface, and a plurality of piezoelectric elements 4 are attached to at least one of front and back surfaces of the substrate so as to be arranged in the longitudinal direction of the X-ray reflective surface on both side portions of the substrate, and a multichannel control system for applying a voltage to each of the piezoelectric elements.

Abstract translation: 该装置由以下部件构成：反射面形状可控反射镜，其中在基板1的前表面的中心部分上形成带状X射线反射表面2，基准平面3沿X的两侧形成 射线反射表面，并且多个压电元件4被附着到基板的前表面和后表面中的至少一个上，以便被布置在基板的两侧部分上的X射线反射表面的纵向方向上， 以及用于向每个压电元件施加电压的多通道控制系统。

公开(公告)号：US08278636B2

公开(公告)日：2012-10-02

申请号：US12540596

申请日：2009-08-13

Applicant: Erik Roelof Loopstra ,  Hendrikus Gijsbertus Schimmel

Inventor： Erik Roelof Loopstra ,  Hendrikus Gijsbertus Schimmel

IPC: G21K1/00

CPC classification number: G03F7/70175 ,  G03F7/70033 ,  G21K1/06 ,  G21K2201/064 ,  G21K2201/067 ,  H05G2/003 ,  H05G2/005 ,  H05G2/006 ,  H05G2/008

Abstract: A radiation source is configured to generate radiation. The radiation source includes a fuel droplet generator constructed and arranged to generate a stream of droplets of fuel that are directed to a plasma generation site; a laser constructed and arranged to generate a laser beam that is directed to the plasma generation site, an angle between the direction of movement of the stream of droplets and the direction of the laser beam being less than about 90°; and a collector constructed and arranged to collect radiation generated by a plasma formed at the plasma formation site when the beam of radiation and a droplet collide. The collector is configured to reflect the radiation substantially along an optical axis of the radiation source. The laser beam is directed to the plasma generation site through an aperture provided in the collector.

Abstract translation: 辐射源被配置成产生辐射。 辐射源包括燃料液滴发生器，其被构造和布置成产生引导到等离子体产生位置的燃料液滴流; 激光器被构造和布置成产生被引导到等离子体产生位置的激光束，液滴流的移动方向与激光束的方向之间的角度小于约90°; 以及收集器，其被构造和布置成当辐射束和液滴碰撞时收集由等离子体形成部位形成的等离子体产生的辐射。 收集器被配置为基本上沿辐射源的光轴反射辐射。 激光束通过设置在收集器中的孔引导到等离子体产生位置。

公开(公告)号：US20120162627A1

公开(公告)日：2012-06-28

申请号：US13370829

申请日：2012-02-10

Applicant: Damian Fiolka ,  Ralf Stuetzle

Inventor： Damian Fiolka ,  Ralf Stuetzle

IPC: G03B27/72 ,  G02B5/30 ,  G02B5/09

CPC classification number: G03F7/70233 ,  G02B27/0905 ,  G02B27/0977 ,  G03F7/70075 ,  G03F7/70116 ,  G03F7/70175 ,  G03F7/702 ,  G03F7/70566 ,  G21K1/06 ,  G21K1/16 ,  G21K2201/06 ,  G21K2201/064 ,  G21K2201/067

Abstract: An illumination optical unit includes a collector mirror which produces a polarization distribution that is applied to the first faceted optical element during the operation of the illumination optical unit. There are at least two first facet elements to which radiation having a differing polarization is applied. The first faceted optical element has at least one first state in which the normal vectors of the reflective surfaces of the first facet elements are selected so that a first predetermined polarization distribution results at the location of the object field during the operation of the illumination optical unit.

Abstract translation: 照明光学单元包括集光镜，其在照明光学单元的操作期间产生施加到第一刻面光学元件的偏振分布。 存在施加具有不同极化的辐射的至少两个第一小面元件。 第一刻面光学元件具有至少一个第一状态，其中第一面元件的反射表面的法向矢量被选择为使得在照明光学单元的操作期间在物场的位置处产生第一预定偏振分布 。

公开(公告)号：US20120140897A1

公开(公告)日：2012-06-07

申请号：US13373644

申请日：2011-11-23

Applicant: Lutz Bruegemann ,  Carsten Michaelsen ,  Keisuke Saito

Inventor： Lutz Bruegemann ,  Carsten Michaelsen ,  Keisuke Saito

IPC: G21K1/02 ,  G21K1/00

CPC classification number: G21K1/06 ,  G21K2201/064

Abstract: An X-ray optical configuration for irradiation of a sample (1) with an X-ray beam having a line-shaped cross-section, wherein the configuration contains an X-ray source (2) and a beam-conditioning X-ray optics, is characterized in that the X-ray source (2) comprises a brilliant point source (4) and the X-ray optics comprises an X-ray optical element (3) which conditions X-ray light emitted by the point source in such a fashion that the X-ray beam is rendered parallel in one direction perpendicular to the beam propagation direction and remains divergent in a direction which is perpendicular thereto and also to the beam propagation direction. An X-ray optical element of this type enables use of both point-shaped and line-shaped beam geometries without complicated and time-consuming conversion work.

Abstract translation: 一种用于用具有线状横截面的X射线束照射样品（1）的X射线光学构造，其中所述构造包含X射线源（2）和束调节X射线光学器件 的特征在于，所述X射线源（2）包括辉光点源（4），所述X射线光学元件包括X射线光学元件（3），所述X射线光学元件（3）对所述X射线光学元件 使得X射线束在垂直于光束传播方向的一个方向上平行，并且在与其垂直的方向以及波束传播方向上保持发散。 这种类型的X射线光学元件使得能够使用点状和线形的几何形状，而不需要复杂和耗时的转换工作。

公开(公告)号：US20120134465A1

公开(公告)日：2012-05-31

申请号：US13300083

申请日：2011-11-18

Applicant: Susanne Madeline Lee ,  Aurelle Boulder ,  Serge Louis Wilfrid Muller

Inventor： Susanne Madeline Lee ,  Aurelle Boulder ,  Serge Louis Wilfrid Muller

IPC: A61B6/04

CPC classification number: A61B6/482 ,  A61B6/08 ,  A61B6/4021 ,  A61B6/502 ,  A61B6/588 ,  B82Y10/00 ,  G21K1/06 ,  G21K2201/061 ,  G21K2201/064 ,  H01J35/06 ,  H01J2235/068

Abstract: A mammograph is provided. The mammograph includes a source of X-rays; a detector of X-rays, the source being configured to emit at least one beam of X-rays to the detector; and an optic control device configured to control the direction of X-rays emitted by the source such that the X-rays emitted. by the source are substantially parallel to one another,

Abstract translation: 提供乳房X光检查。 乳房X线照相术包括X射线源; X射线检测器，所述源被配置为向所述检测器发射至少一束X射线; 以及光学控制装置，被配置为控制由所述源发射的X射线的方向，使得发射的X射线。 源极基本上彼此平行，

公开(公告)号：US08155267B2

公开(公告)日：2012-04-10

申请号：US12593908

申请日：2008-03-27

Applicant: Jean-Louis Hodeau ,  Pierre Henri Michel Bordet ,  Alessandra Gianoncelli ,  Luc Ortega ,  Alain Prat ,  Philippe Walter ,  Joseph Salomon ,  Eric Dooryhe

Inventor： Jean-Louis Hodeau ,  Pierre Henri Michel Bordet ,  Alessandra Gianoncelli ,  Luc Ortega ,  Alain Prat ,  Philippe Walter ,  Joseph Salomon ,  Eric Dooryhe

IPC: G01N23/223 ,  G01N23/20

CPC classification number: G01N23/2076 ,  G21K1/06 ,  G21K2201/064

Abstract: A device for X-ray analysis of a sample (1), including: a generation system for the generation of an X-ray beam to irradiate an analysis zone of the sample, said analysis zone defining a analysis mean plane, and the X-ray beam being emitted along a direction of incidence; a detection system for the detection, in at least one dimension, of X-rays diffracted by the irradiated analysis zone. An analyser system located between the sample and the detection system and includes an X-ray diffracting surface forming a partial surface of revolution about an axis of revolution being contained in the analysis mean plane, with the axis of revolution being distinct from the direction of incidence and passing through the centre of the analysis zone, and with the diffracting surface being oriented so as to diffract the X-rays toward the detection system.

Abstract translation: 一种用于样品（1）的X射线分析的装置，包括：用于产生X射线束以照射样品的分析区域的生成系统，所述分析区域限定分析平均平面， 射线束沿着入射方向发射; 用于在至少一个维度上检测被辐射分析区衍射的X射线的检测系统。 位于样品和检测系统之间的分析仪系统，包括形成围绕分析平面的旋转轴线的部分旋转表面的X射线衍射表面，旋转轴线不同于入射方向 并穿过分析区的中心，并且衍射面被定向成将X射线衍射到检测系统。

公开(公告)号：US08153994B2

公开(公告)日：2012-04-10

申请号：US12592736

申请日：2009-12-02

Applicant: Marco Pedrali ,  Riccardo Ghislanzoni

Inventor： Marco Pedrali ,  Riccardo Ghislanzoni

IPC: G21K5/00

CPC classification number: G21K1/06 ,  C25D1/02 ,  C25D1/22 ,  C25D5/02 ,  C25D5/14 ,  G02B7/1815 ,  G02B19/0019 ,  G02B19/0095 ,  G03F7/70175 ,  G03F7/70891 ,  G21K1/067 ,  G21K2201/064 ,  G21K2201/065 ,  G21K2201/067 ,  Y10T29/4935

Abstract: A cooling system (10) for an extreme ultraviolet (EUV) grazing incidence collector (GIC) mirror assembly (240) having at least one shell (20) with a back surface (22) is disclosed. The cooling system has a plurality of spaced apart circularly configured cooling lines (30) arranged in parallel planes (PL) that are perpendicular to the shell central axis (AC) and that are in thermal contact with and that run around the back surface. Input and output secondary cooling-fluid manifolds (44, 46) are respectively fluidly connected to the plurality of cooling lines to flow a cooling fluid from the input secondary cooling-fluid manifold to the output cooling secondary fluid manifold over two semicircular paths for each cooling line. Separating the cooling fluid input and output locations reduces thermal gradients that can cause local surface deformations in the shell that can lead to degraded focusing performance.

Abstract translation: 公开了一种用于具有至少一个具有后表面（22）的外壳（20）的极紫外（EUV）掠入射收集器（GIC）反射镜组件（240）的冷却系统（10）。 冷却系统具有多个间隔开的圆形配置的冷却管线（30），它们布置在垂直于壳体中心轴线（AC）并且与背面表面热交换并且在其周围流动的平行平面（PL）中。 输入和输出二次冷却流体歧管（44,46）分别流体地连接到多个冷却管线，以将冷却流体从输入的二次冷却流体歧管流到输出冷却次要流体歧管两个半圆的路径，以进行每个冷却 线。 分离冷却液输入和输出位置可减少热梯度，从而导致壳体局部表面变形，从而导致聚焦性能降低。

公开(公告)号：US20120050706A1

公开(公告)日：2012-03-01

申请号：US12807167

申请日：2010-08-30

Applicant: Richard A. Levesque ,  Natale M. Ceglio ,  Giovanni Nocerino ,  Fabio Zocchi

Inventor： Richard A. Levesque ,  Natale M. Ceglio ,  Giovanni Nocerino ,  Fabio Zocchi

IPC: G03B27/52 ,  H05G2/00

CPC classification number: G21K1/067 ,  B82Y10/00 ,  G02B5/0891 ,  G03F7/70033 ,  G03F7/70166 ,  G21K2201/061 ,  G21K2201/064 ,  G21K2201/067 ,  H05G2/006 ,  H05G2/008

Abstract: A source-collector module (SOCOMO) for generating a laser-produced plasma (LPP) that emits EUV radiation, and a grazing-incidence collector (GIC) mirror arranged relative to the LPP and having an input end and an output end. The LPP is formed using an LPP target system having a light source portion and a target portion, wherein a pulsed laser beam from the light source portion irradiates Xenon ice provided by the target portion to an irradiation location. The GIC mirror is arranged relative to the LPP to receive the EUV radiation at its input end and focus the received EUV radiation at an intermediate focus adjacent the output end. A radiation collection enhancement device having at least one funnel element may be used to increase the amount of EUV radiation provided to the intermediate focus and/or directed to a downstream illuminator. An EUV lithography system that utilizes the SOCOMO is also disclosed.

Abstract translation: 用于产生发射EUV辐射的激光产生等离子体（LPP）的源极集电极模块（SOCOMO）以及相对于LPP布置并具有输入端和输出端的掠入射收集器（GIC）反射镜。 使用具有光源部分和目标部分的LPP靶系统形成LPP，其中来自光源部分的脉冲激光束将由目标部分提供的氙冰照射到照射位置。 GIC反射镜相对于LPP布置以在其输入端接收EUV辐射，并将接收的EUV辐射聚焦在邻近输出端的中间焦点。 具有至少一个漏斗元件的辐射收集增强装置可以用于增加提供给中间焦点和/或被引导到下游照明器的EUV辐射的量。 还公开了利用SOCOMO的EUV光刻系统。

公开(公告)号：US20120050704A1

公开(公告)日：2012-03-01

申请号：US12807165

申请日：2010-08-30

Applicant: Richard A. Levesque ,  Natale M. Ceglio ,  Giovanni Nocerino ,  Fabio Zocchi

Inventor： Richard A. Levesque ,  Natale M. Ceglio ,  Giovanni Nocerino ,  Fabio Zocchi

IPC: G03B27/42 ,  H05G2/00

CPC classification number: G21K1/067 ,  G03F7/70033 ,  G03F7/70166 ,  G21K2201/06 ,  G21K2201/064 ,  G21K2201/065 ,  G21K2201/067 ,  H05G2/003 ,  H05G2/006 ,  H05G2/008

Abstract: A source-collector module (SOCOMO) for generating a laser-produced plasma (LPP) that emits EUV radiation, and a grazing-incidence collector (GIC) mirror arranged relative to the LPP and having an input end and an output end. The LPP is formed using an LPP target system having a light source portion and a target portion, wherein a pulsed laser beam from the light source portion irradiates Xenon liquid in the target portion. The GIC mirror is arranged relative to the LPP to receive the EUV radiation at its input end and focus the received EUV radiation at an intermediate focus adjacent the output end. A radiation collection enhancement device having at least one funnel element may be used to increase the amount of EUV radiation provided to the intermediate focus and/or directed to a downstream illuminator. An EUV lithography system that utilizes the SOCOMO is also disclosed.