公开(公告)号：US20040227428A1

公开(公告)日：2004-11-18

申请号：US10868603

申请日：2004-06-14

Applicant: Microsoft Corporation

Inventor： Michael J. Sinclair

IPC: H02K005/16 ,  H02K007/08 ,  H02N001/00

CPC classification number: B81B3/0054 ,  B81B2201/032 ,  B81B2201/038 ,  B81B2201/045 ,  B81B2201/047

Abstract: An electrostatic bimorph actuator includes a cantilevered flexible bimorph arm that is secured and insulated at one end to a planar substrate. In an electrostatically activated state the bimorph arm is generally parallel to the planar substrate. In a relaxed state, residual stress in the bimorph arm causes its free end to extend out-of-plane from the planar substrate. The actuator includes a substrate electrode that is secured to and insulated from the substrate and positioned under and in alignment with the bimorph arm. An electrical potential difference applied between the bimorph arm and the substrate electrode imparts electrostatic attraction between the bimorph arm and the substrate electrode to activate the actuator. As an exemplary application in which such actuators could be used, a microelectrical mechanical optical display system is described.

Abstract translation: 静电双压电晶片致动器包括悬臂式柔性双压电晶臂，其在一端固定并绝缘到平面衬底。 在静电激活状态下，双压电晶片臂通常平行于平面衬底。 在松弛状态下，双压电晶片臂中的残余应力使其自由端从平面基板向外延伸。 致动器包括固定到基板并与基板绝缘并位于双压电晶片臂下方并与之对准的基板电极。 施加在双压电晶片臂和衬底电极之间的电势差使得双压电晶片臂和衬底电极之间的静电吸引力激活致动器。 作为可以使用这种致动器的示例性应用，描述了一种微电子机械光学显示系统。

公开(公告)号：US20040209195A1

公开(公告)日：2004-10-21

申请号：US10713508

申请日：2003-11-14

Inventor： Wen-Jian Lin

IPC: G03F007/20

CPC classification number: B81C1/00182 ,  B81B2201/047 ,  G02B26/001

Abstract: A method for fabricating an interference display unit is disclosed. A first wall and a sacrificial layer are formed in order on a substrate and an opening is formed in the first wall and the sacrificial layer. A first photoresist layer is spin-coated on the sacrificial layer and fills the openings. A post having a first arm is formed through patterning the first photoresist layer. At least a second photoresist is formed by spin-coating. A second arm is formed on the first arm through patterning the second photoresist layer. A second wall is formed on the sacrificial layer and posts. The first and the second arms' stress is released through a thermal process. The position of the arm is shifted and the distance between the first wall and the second wall is therefore defined. Finally, the sacrificial layer is removed.

Abstract translation: 公开了一种用于制造干涉显示单元的方法。 在基板上依次形成第一壁和牺牲层，并且在第一壁和牺牲层中形成开口。 将第一光致抗蚀剂层旋涂在牺牲层上并填充开口。 通过图案化第一光致抗蚀剂层形成具有第一臂的柱。 通过旋涂形成至少第二光致抗蚀剂。 通过图案化第二光致抗蚀剂层，在第一臂上形成第二臂。 在牺牲层和柱上形成第二壁。 第一和第二臂的应力通过热过程释放。 臂的位置被移动，因此第一壁和第二壁之间的距离被限定。 最后，去除牺牲层。

公开(公告)号：US06706203B2

公开(公告)日：2004-03-16

申请号：US10022452

申请日：2001-10-30

Applicant: Philip W. Barth ,  Daniel B. Roitman ,  Joel Myerson

Inventor： Philip W. Barth ,  Daniel B. Roitman ,  Joel Myerson

IPC: H01L2100

CPC classification number: G01N33/48721 ,  B01D67/0058 ,  B01D67/0072 ,  B01D69/02 ,  B01D69/12 ,  B01D71/02 ,  B01D2325/02 ,  B81B3/0059 ,  B81B5/00 ,  B81B2201/0214 ,  B81B2201/047 ,  B81B2203/0353 ,  B81C99/002 ,  B82Y15/00 ,  B82Y30/00

Abstract: An adjustable nanopore is fabricated by placing the surfaces of two planar substrates in contact, wherein each substrate contains a hole having sharp corners and edges. A corner is brought into proximity with an edge to define a triangular aperture of variable area. Ionic current in a liquid solution and through the aperture is monitored as the area of the aperture is adjusted by moving one planar substrate with respect to the other along two directional axes and a rotational axis. Piezoelectric positioners can provide subnanometer repeatability in the adjustment process. The invention is useful for characterizing, cleaving, and capturing molecules, molecular complexes, and supramolecular complexes which pass through the nanopore, and provides an improvement over previous devices in which the hole size of nanopores fabricated by etching and/or redeposition is fixed after fabrication.

Abstract translation: 通过将两个平面基板的表面放置接触来制造可调纳米孔，其中每个基板包含具有锐角和边缘的孔。 一个角落靠近一个边缘以限定可变区域的三角形孔。 通过沿着两个方向轴和旋转轴线相对于另一个移动一个平面基板来调节在液体溶液中并通过孔的离子电流，因为孔的面积被调整。 压电定位器可以在调整过程中提供亚纳米计重复性。 本发明可用于表征，切割和捕获通过纳米孔的分子，分子复合物和超分子复合物，并且对先前的装置提供了改进，其中通过蚀刻和/或再沉积制造的纳米孔的孔径在制造后被固定 。

公开(公告)号：US06678084B2

公开(公告)日：2004-01-13

申请号：US10124716

申请日：2002-04-18

Applicant: Michael J. Little ,  William P. Eaton ,  Thomas S. Tyrie ,  Harry Melkonian ,  Ping Li

Inventor： Michael J. Little ,  William P. Eaton ,  Thomas S. Tyrie ,  Harry Melkonian ,  Ping Li

IPC: G02B2600

CPC classification number: B81B3/0021 ,  B81B2201/047 ,  B81B2203/053 ,  B81B2203/058 ,  B81C99/008 ,  G02B6/3512 ,  G02B6/3522 ,  G02B6/3526 ,  G02B6/3528 ,  G02B6/3534 ,  G02B6/357 ,  G02B6/3572 ,  G02B6/3574 ,  G02B6/358 ,  G02B6/3584 ,  G02B6/362 ,  G02B6/3692 ,  G02B6/4226 ,  G02B26/001 ,  G02B26/02 ,  G02B26/0841 ,  G02B2006/12104

Abstract: The present invention provides method of making mechanisms in which the relative locations of elements are maintained during manufacturing. The methods according to the present invention can be used to make a variety of devices, including tunable optical devices. The methods include displaceably attaching an island (support) to a frame with a non-rigid material.

Abstract translation: 本发明提供了制造机构的方法，其中在制造期间保持元件的相对位置。 根据本发明的方法可以用于制造包括可调光学装置在内的各种装置。 这些方法包括用非刚性材料可移动地将岛（支撑件）附接到框架。

公开(公告)号：US06665109B2

公开(公告)日：2003-12-16

申请号：US10085143

申请日：2002-03-01

Applicant: Michael J. Little ,  Thomas S. Tyrie ,  William P. Eaton ,  John J. Lyon

Inventor： Michael J. Little ,  Thomas S. Tyrie ,  William P. Eaton ,  John J. Lyon

IPC: G02B2600

CPC classification number: G02B26/0841 ,  B81B3/0021 ,  B81B2201/047 ,  B81B2203/053 ,  B81B2203/058 ,  G02B6/3512 ,  G02B6/3522 ,  G02B6/3526 ,  G02B6/3528 ,  G02B6/3534 ,  G02B6/357 ,  G02B6/3572 ,  G02B6/3574 ,  G02B6/358 ,  G02B6/3584 ,  G02B6/4226 ,  G02B26/001 ,  G02B26/02 ,  G02B2006/12104

Abstract: The present invention provides a compliant mechanism that can be used to make a variety of devices, such as tunable optical devices that are more reliable, more cost effective and/or exhibit better performance than prior art devices.

公开(公告)号：US06653244B2

公开(公告)日：2003-11-25

申请号：US09955123

申请日：2001-09-19

Applicant: Alex Behfar ,  Alfred T. Schremer ,  Cristian B. Stagarescu

Inventor： Alex Behfar ,  Alfred T. Schremer ,  Cristian B. Stagarescu

IPC: H01L21469

CPC classification number: G02B6/12002 ,  B81B2201/047 ,  B81C99/008 ,  B81C2201/0159 ,  G02B6/13 ,  G02B6/4204 ,  G02B6/4249 ,  G03F7/0037 ,  Y10S438/948 ,  Y10S438/949 ,  Y10S438/95

Abstract: Three-dimensional structures of arbitrary shape are fabricated on the surface of a substrate through a series of processing steps wherein a monolithic structure is fabricated in successive layers. A first layer of photoresist material is spun onto a substrate surface and is exposed in a desired pattern corresponding to the shape of a final structure, at a corresponding cross-sectional level in the structure. The layer is not developed after exposure; instead, a second layer of photoresist material is deposited and is also exposed in a desired pattern. Subsequent layers are spun onto the top surface of prior layers and exposed, and upon completion of the succession of layers each defining corresponding levels of the desired structure, the layers are all developed at the same time leaving the three-dimensional structure.

公开(公告)号：US06647036B1

公开(公告)日：2003-11-11

申请号：US09731154

申请日：2000-12-06

Applicant: Decai Sun ,  Michel A. Rosa

Inventor： Decai Sun ,  Michel A. Rosa

IPC: H01S304

CPC classification number: B81C3/002 ,  B81B2201/047 ,  B81C2203/058 ,  H01S5/02252 ,  H01S5/02272 ,  H01S5/183 ,  H01S5/423 ,  H05K1/183 ,  H05K3/3442

Abstract: A micro-electromechanical system assembly is designed to integrate a laser. More particularly, laser is a vertical cavity surface-emitting laser. The MEMS assembly includes a micro-electromechanical substrate having an upper surface and a lower surface, the upper surface defined as having a first area and a second area. A first substrate bonding pad is positioned on the upper surface at a location within the first area, and a second substrate bonding pad is positioned on the upper surface at a location within the second area. Deposited upon the first and second substrate bonding areas are respective first and second solder material. A laser to be integrated in the MEMS assembly has a first laser bonding pad located on a first side, and a second laser bonding pad located on a second side. The laser is placed between the first substrate bonding pad and second substrate bonding pad such that they align with the respective first and second laser bonding pads. Upon a reflow of the solder material, a precise alignment of the laser is obtained while the reflow process occurs, and at the same time providing a mechanical and electrical connection between the bonding pads. In a further embodiment, the MEMS substrate is configured with a trench portion into which is placed the laser having the first and second laser bonding pads. Placement in the trench, is at least one of a 45° and 54.74° angle. Upon reflow of solder material on the substrate, the laser is finely positioned and held mechanically stable. In a further embodiment, the trench previously described includes a spring mechanism which carries a substrate bonding pad. The spring mechanism causing the laser within the trench to be maintained in a preferred position during and after the solder reflow process. Still yet another embodiment employs bimetallic cantilevers for positioning the laser and electrical interconnect.

Abstract translation: 微机电系统组件被设计为集成激光器。 更具体地，激光是垂直腔表面发射激光器。 MEMS组件包括具有上表面和下表面的微机电衬底，所述上表面限定为具有第一区域和第二区域。 第一衬底接合焊盘位于第一区域内的位置的上表面上，第二衬底接合焊盘位于第二区域内的位置的上表面上。 沉积在第一和第二衬底接合区域上的是相应的第一和第二焊料材料。 集成在MEMS组件中的激光器具有位于第一侧的第一激光焊盘和位于第二侧的第二激光焊盘。 激光器被放置在第一衬底焊盘和第二衬底焊盘之间，使得它们与相应的第一和第二激光焊盘对准。 当焊料回流时，在回流过程发生时获得激光的精确对准，并且同时在接合焊盘之间提供机械和电连接。 在另一实施例中，MEMS衬底被配置有沟槽部分，放置有具有第一和第二激光焊盘的激光器。 放置在沟槽中，是45°和54.74°角中的至少一个。 在衬底上焊料材料回流时，激光器被精细地定位并保持机械稳定。 在另一实施例中，先前描述的沟槽包括一个承载衬底接合焊盘的弹簧机构。 在焊料回流过程中和之后使引起沟槽内的激光的弹簧机构保持在优选的位置。 又一实施例采用双金属悬臂来定位激光和电互连。

公开(公告)号：US06625342B2

公开(公告)日：2003-09-23

申请号：US09898988

申请日：2001-07-03

Applicant: Bevan Staple ,  David Paul Anderson ,  Lilac Muller

Inventor： Bevan Staple ,  David Paul Anderson ,  Lilac Muller

IPC: G02B626

CPC classification number: G02B6/358 ,  B81B3/0016 ,  B81B2201/047 ,  B81B2203/0181 ,  G02B6/29307 ,  G02B6/2931 ,  G02B6/3518 ,  G02B6/352 ,  G02B6/3546 ,  G02B6/3548 ,  G02B6/3556 ,  G02B6/3558 ,  G02B6/356 ,  G02B6/3566 ,  G02B6/357 ,  G02B6/3584 ,  G02B6/3598 ,  G02B26/0841 ,  Y10T307/977

Abstract: A microstructure is provided including a base layer underlying a first and second structural plates. Operation of the microstructure is capable of overcoming stiction. Methods of operation include providing an edge of the first structural plate in contact with a contact point. A second structural plate is deflected in a way that overcomes stiction between the first structural plate and the contact point. Such deflection can include providing a prying force to lift the first structural plate or a hammering force to disturb any stiction related forces at the contact point.

公开(公告)号：US06494230B2

公开(公告)日：2002-12-17

申请号：US09877222

申请日：2001-06-08

Applicant: Calvin Y. H. Chow

Inventor： Calvin Y. H. Chow

IPC: F15C106

CPC classification number: B01J19/0093 ,  B01J2219/00317 ,  B01J2219/00351 ,  B01J2219/00587 ,  B01J2219/00702 ,  B01J2219/00783 ,  B01L3/5027 ,  B01L3/502707 ,  B01L3/502715 ,  B01L2200/16 ,  B01L2300/0816 ,  B01L2300/0864 ,  B01L2300/0867 ,  B01L2300/0874 ,  B01L2300/0887 ,  B01L2400/0415 ,  B01L2400/0418 ,  B01L2400/0487 ,  B81B2201/047 ,  B81B2201/058 ,  B81C1/00119 ,  B81C2201/019 ,  C40B60/14 ,  G01N27/44791 ,  Y10S366/03 ,  Y10T137/2191 ,  Y10T137/2224 ,  Y10T137/7897 ,  Y10T137/8158 ,  Y10T137/8326 ,  Y10T137/8359

Abstract: The present invention provides multi-layer microfluidic systems, by providing additional substrate layers, e.g., third, fourth, fifth and more substrate layers, mated with the typically described first and second layers. Microfabricated elements, e.g., grooves, wells and the like, are manufactured into the surfaces between the various substrate layers. These microfabricated elements define the various microfluidic aspects or structures of the overall device, e.g., channels, chambers and the like. In preferred aspects, a separate microscale channel network is provided between each of the substrate layers.

公开(公告)号：US06343178B1

公开(公告)日：2002-01-29

申请号：US09707602

申请日：2000-11-07

Applicant: Brent E. Burns ,  Tseng-Yang Hsu

Inventor： Brent E. Burns ,  Tseng-Yang Hsu

IPC: G02B600

CPC classification number: G02B6/266 ,  B81B3/0051 ,  B81B2201/047 ,  B81B2203/053 ,  G02B6/3518 ,  G02B6/352 ,  G02B6/357 ,  G02B6/358 ,  G02B6/3584 ,  G02B6/3594 ,  G02B2006/12104

Abstract: This invention provides a very sensitive optical attenuator, which can be used to couple and attenuate optical signals between optical fibers with a wide range of attenuation level. Such an optical attenuator includes a flexible conductive membrane to be moved by an external force, such as electrostatic force, to achieve deformation of the conductive membrane. The conductive membrane can be formed, for example, by a vacuum deposited silicon nitride film. A thin metallic, conductive layer is then deposited on the flexible membrane to form a reflective mirror to receive and reflect incident optical signals. The semiconductor structure includes one or more spacing posts, with which the first structural member is to be joined and bonded. Electrodes are placed on the semiconductor structure in close proximity to the flexible membrane. At various areas of the semiconductor structure, additional spacing posts are added to cause deformation of the conductive membrane when a voltage is applied between the membrane and the electrodes on the semiconductor structure.

Abstract translation: 本发明提供了一种非常灵敏的光衰减器，其可用于耦合和衰减具有广泛衰减级别的光纤之间的光信号。 这种光衰减器包括通过诸如静电力的外力移动的柔性导电膜，以实现导电膜的变形。 导电膜可以由例如真空沉积的氮化硅膜形成。 然后将薄的金属导电层沉积在柔性膜上以形成反射镜以接收和反射入射光信号。 半导体结构包括一个或多个间隔柱，第一结构构件将与该间隔柱接合并结合。 电极放置在靠近柔性膜的半导体结构上。 在半导体结构的各个区域，当半导体结构上的膜和电极之间施加电压时，添加额外的间隔柱以引起导电膜的变形。