公开(公告)号：US07368725B2

公开(公告)日：2008-05-06

申请号：US10998168

申请日：2004-11-29

Applicant: D. Gordon Knight ,  Alex M. W. Verdun ,  Catalina M. Dragoi

Inventor： D. Gordon Knight ,  Alex M. W. Verdun ,  Catalina M. Dragoi

IPC: G01N21/01

CPC classification number: C02F1/325 ,  C02F2201/326 ,  G01J1/0204 ,  G01J1/0266 ,  G01J1/0437 ,  G01J1/06 ,  G01J1/429 ,  G01J2001/0485 ,  G01J2001/063

Abstract: There is described an optical radiation sensor device for detecting radiation in a radiation field. The device comprises a sensor element capable of detecting and responding to incident radiation from the radiation field and a radiation window interposed between the sensor element and the radiation field. The radiation window comprises a non-circular (preferably square) shaped radiation transparent opening. The optical radiation sensor device can be used in a so-called dynamic manner while mitigating or obviating the detection errors resulting from the use of a circular-shaped attenuating aperture and/or angular (even minor) misalignment of the sensor device with respect to the array of radiation sources when multiple such circular-shaped attenuating apertures are used.

Abstract translation: 描述了用于检测辐射场中的辐射的光辐射传感器装置。 该装置包括能够检测和响应来自辐射场的入射辐射的传感器元件和插入在传感器元件和辐射场之间的辐射窗口。 辐射窗包括非圆形（优选正方形）形状的辐射透明开口。 光辐射传感器装置可以以所谓的动态方式使用，同时减轻或消除由于使用圆形衰减孔径和/或传感器装置相对于所述传感器装置的角度（甚至较小的）未对准而导致的检测误差 当使用多个这样的圆形衰减孔时，辐射源阵列。

公开(公告)号：US20080087836A1

公开(公告)日：2008-04-17

申请号：US11578832

申请日：2005-04-19

Applicant: Douglas Knight ,  Alex Verdun ,  Peter Van-Doodewaard

Inventor： Douglas Knight ,  Alex Verdun ,  Peter Van-Doodewaard

IPC: G01J1/42

CPC classification number: G01J1/429 ,  C02F1/32 ,  C02F2201/326 ,  G01N21/0303 ,  G01N21/33 ,  G01N2021/036

Abstract: There is disclosed a process for measuring transmittance of a fluid in a radiation field comprising polychromatic radiation—i.e., radiation at a first wavelength and radiation at a second wavelength different from the first wavelength. The process comprises the steps of: (i) positioning a polychromatic radiation source and a polychromatic radiation sensor element in a spaced relationship to define a first thickness of fluid in the radiation field; (ii) detecting a first radiation intensity corresponding to radiation at the first wavelength received by the sensor element at the first thickness; (iii) detecting a second radiation intensity corresponding to radiation at the second wavelength received by the sensor element at the first thickness; (iv) altering the first thickness to define a second thickness; (v) detecting a third radiation intensity corresponding to radiation at the first wavelength received by the sensor element at the second thickness; (vi) detecting a fourth radiation intensity corresponding to radiation at the second wavelength received by the sensor element at the second thickness; and (vii) calculating radiation transmittance of the fluid in the radiation field from the first radiation intensity, the second radiation intensity, the third radiation intensity and the fourth radiation intensity. Thus, the present process relates to a novel manner to measure UV transmittance of a fluid in an on-line or random measurement manner.

Abstract translation: 公开了一种用于测量包括多色辐射的辐射场中的流体的透射率的方法，即在第一波长的辐射和不同于第一波长的第二波长的辐射。 该方法包括以下步骤：（i）以间隔关系定位多色辐射源和多色辐射传感器元件，以在辐射场中限定第一厚度的流体; （ii）检测对应于由传感器元件以第一厚度接收的第一波长的辐射的第一辐射强度; （iii）检测对应于由传感器元件以第一厚度接收的第二波长的辐射的第二辐射强度; （iv）改变所述第一厚度以限定第二厚度; （v）检测对应于由传感器元件以第二厚度接收的第一波长的辐射的第三辐射强度; （vi）检测对应于由第二厚度的传感器元件接收的第二波长的辐射的第四辐射强度; 和（vii）从第一辐射强度，第二辐射强度，第三辐射强度和第四辐射强度计算辐射场中的流体的辐射透射率。 因此，本方法涉及以在线或随机测量方式测量流体的UV透射率的新颖方式。

公开(公告)号：US20080048285A1

公开(公告)日：2008-02-28

申请号：US11801443

申请日：2007-05-10

Applicant: Jim Schloss ,  Michele Winz ,  Sam Mallicoat ,  Wolfram Urbanek ,  Guang Li ,  Larry Potter ,  Kevin Shea

Inventor： Jim Schloss ,  Michele Winz ,  Sam Mallicoat ,  Wolfram Urbanek ,  Guang Li ,  Larry Potter ,  Kevin Shea

IPC: H01L31/00 ,  G01D5/56 ,  G01D5/12 ,  G01D5/26

CPC classification number: G01J1/429 ,  G03F7/7085 ,  H01L27/14643 ,  H01L31/00

Abstract: A laminated wafer sensor structure includes a housing layer having pocket openings formed therein, a circuit layer having a sensor element and electronic components mounted for registration with the pocket openings in the housing layer, and a rigid back layer. The laminated structure is suitable for handling by conventional robotic wafer handling systems. The wafer sensor structure is adapted for electrical connection to a base station that is also adapted for connection to a host computer system to facilitate communication among the sensor structure, the base station and the host computer.

Abstract translation: 层压晶片传感器结构包括其中形成有口袋开口的壳体层，具有传感器元件的电路层和安装成与壳体层中的口袋开口对准的电子部件和刚性背层。 层压结构适用于常规机器人晶片处理系统的处理。 晶片传感器结构适于与基站的电连接，该基站也适于连接到主计算机系统，以促进传感器结构，基站和主计算机之间的通信。

公开(公告)号：US20070279616A1

公开(公告)日：2007-12-06

申请号：US11723290

申请日：2007-03-19

Applicant: Tomoki Sasayama

Inventor： Tomoki Sasayama

IPC: G01N1/00

CPC classification number: G01N21/33 ,  G01J1/02 ,  G01J1/0252 ,  G01J1/429

Abstract: A photometric apparatus which includes a cover that houses a UV light source and a photodetector, the cover hermetically sealing an entire light path extending from the light source to the photodetector therewithin; device for replacing an internal atmosphere of the cover with nitrogen gas; and a window plate unit which is adapted to be readily attached to and detached from a partition wall between a light source chamber and a spectral chamber located in a subsequent stage thereof. The window plate unit blocks gaseous communication between the light source chamber and the spectral chamber while allowing measurement light to be transmitted therethrough.

Abstract translation: 一种测光装置，其包括容纳UV光源的盖和光电检测器，所述盖将从所述光源延伸到所述光电检测器的整个光路密封; 用氮气代替盖子内部气氛的装置; 以及窗板单元，其适于容易地附接到位于其后续阶段中的光源室和光谱室之间的分隔壁和从其分离。 窗板单元阻止光源室和光谱室之间的气体连通，同时允许测量光透射通过。

公开(公告)号：US07292343B2

公开(公告)日：2007-11-06

申请号：US11075973

申请日：2005-03-08

Applicant: Rajasekhar M. Rao ,  John T. Melchior ,  Holger K. Glatzel

Inventor： Rajasekhar M. Rao ,  John T. Melchior ,  Holger K. Glatzel

IPC: G01B9/02 ,  G01J3/45 ,  H01S3/13

CPC classification number: G01J1/4257 ,  G01J1/429 ,  G01J3/02 ,  G01J3/0205 ,  G01J3/0208 ,  G01J3/024 ,  G01J3/027 ,  G01J3/26 ,  G01J9/02 ,  G01J9/0246 ,  G03F7/70025 ,  G03F7/70575 ,  G03F7/70933 ,  H01S3/0057 ,  H01S3/0071 ,  H01S3/02 ,  H01S3/036 ,  H01S3/038 ,  H01S3/0385 ,  H01S3/0401 ,  H01S3/041 ,  H01S3/08009 ,  H01S3/08036 ,  H01S3/097 ,  H01S3/0971 ,  H01S3/0975 ,  H01S3/1024 ,  H01S3/104 ,  H01S3/105 ,  H01S3/1055 ,  H01S3/1305 ,  H01S3/134 ,  H01S3/139 ,  H01S3/22 ,  H01S3/2207 ,  H01S3/223 ,  H01S3/225 ,  H01S3/2251 ,  H01S3/2256 ,  H01S3/2258 ,  H01S3/2333 ,  H01S3/2366

Abstract: A wavemeter and method for measuring bandwidth for a high repetition rate gas discharge laser having an output laser bean comprising a pulsed output of greater than or equal to 15 mJ per pulse, sub-nanometer bandwidth tuning range pulses having a femptometer bandwidth precision and tens of femptometers bandwidth accuracy range, for measuring bandwidth on a pulse to pulse basis at pulse repetition rates of 4000 Hz and above, is disclosed which may comprise a focusing lens having a focal length; an optical interferometer creating an interference fringe pattern; an optical detection means positioned at the focal length from the focusing lens; and a bandwidth calculator calculating bandwidth from the position of interference fringes in the interference fringe pattern incident on the optical detection means, defining a DID and a DOD, the respective distances between a pair of first fringe borders and between a pair of second fringe borders in the interference pattern on an axis of the interference pattern, and according to the formula Δλ=λ0[DOD2−DID2]/[8f2−D02], where λ0 is an assumed constant wavelength and D0=(DOD−DID)/2, and f is the focal length. The optical detector may be a photodiode array. The wavemeter may have an optical interferometer having a slit function; the slit function and the focal length being selected to deliver to the optical detector the two innermost fringes of the optical interference ring pattern. The optical detector may comprise an array of pixels each having a height and width and the array having a total width; and an aperture at the optical input to the optical interferometer may selectively input to the optical interferometer a portion of a beam of light sufficient for the output of the etalon to illuminate the optical detector over the height of each respective pixel height and the total width. The optical interferometer may comprise an etalon having a slit function of 3 pm or less and a finesses of 25 or greater; and the focal length may be 1.5 meters. A second stage diffuser may be placed between the first stage diffuser and the etalon delivering a narrow cone of light to the etalon, and an aperture between the second stage diffuser and the etalon may deliver to the etalon a thin strip of the narrow cone of light.

公开(公告)号：US20070221864A1

公开(公告)日：2007-09-27

申请号：US10599933

申请日：2005-04-20

Applicant: Hermann Neuhaus-Steinmetz ,  Dennis Perlbach ,  Dieter Muller

Inventor： Hermann Neuhaus-Steinmetz ,  Dennis Perlbach ,  Dieter Muller

IPC: G01J1/48

CPC classification number: G01J1/50 ,  G01J1/429

Abstract: A dosing film for measuring ultraviolet rays and/or electron beams, formed of a radiation-sensitive layer having covering films on both sides.

Abstract translation: 一种用于测量紫外线和/或电子束的计量膜，由具有两侧覆盖膜的辐射敏感层形成。

公开(公告)号：US20070108389A1

公开(公告)日：2007-05-17

申请号：US11280144

申请日：2005-11-15

Applicant: Jakke Makela ,  Timo Kolehmainen ,  Timo Tokkonen ,  Kai Ojala

Inventor： Jakke Makela ,  Timo Kolehmainen ,  Timo Tokkonen ,  Kai Ojala

IPC: G01J1/42

CPC classification number: G01J1/429 ,  G01J1/02 ,  G01J1/0219 ,  G01J1/0488

Abstract: An apparatus for quantifying irradiance has a first sensor having an output for providing a reference signal of irradiance within a first band, such as the visible light band. A filter and a second sensor are in optical series so that irradiance sensed at the second sensor is filtered. The second sensor outputs a filtered signal of irradiance within the first band. The filter particularly filters irradiance in the first band as a function of irradiance in the second band, such as the UV light band. In an exemplary embodiment, the filter is made from a material that darkens with increasing UV irradiance. A processor has inputs coupled to the outputs of the first and second sensors for determining irradiance in the second band from the reference signal and the filtered signal. Mathematical formulations for the processor are provided, as are methods and a computer program embodied on a medium. A single sensor embodiment is also described.

Abstract translation: 用于量化辐照度的装置具有第一传感器，其具有用于在诸如可见光带之类的第一频带内提供辐照度的参考信号的输出。 过滤器和第二传感器是光学系列，使得在第二传感器处感测到的辐照度被过滤。 第二传感器在第一频带内输出辐照度的滤波信号。 滤波器特别地将第一频带中的辐照度作为第二频带中的辐照度的函数，例如UV光带。 在示例性实施例中，过滤器由随着紫外线辐照度增加而变暗的材料制成。 处理器具有耦合到第一和第二传感器的输出的输入，用于根据参考信号和滤波信号确定第二频带中的辐照度。 提供了用于处理器的数学公式，以及在介质上实现的方法和计算机程序。 还描述了单个传感器实施例。

公开(公告)号：US07217932B2

公开(公告)日：2007-05-15

申请号：US10717904

申请日：2003-11-21

Applicant: Minoru Niigaki ,  Yasufumi Takagi ,  Kazutoshi Nakajima ,  Yoshitaka Suzuki ,  Nobuharu Suzuki

Inventor： Minoru Niigaki ,  Yasufumi Takagi ,  Kazutoshi Nakajima ,  Yoshitaka Suzuki ,  Nobuharu Suzuki

IPC: G01J5/10

CPC classification number: G01J1/429 ,  H01L2224/48465

Abstract: A UV sensor (1) includes a container (5) in which the upper end opening of a metal side tube (2) is sealed with a front plate (3) composed of borosilicate glass as an incident light window and the lower end opening is sealed with a base plate (4). The front plate (3) serving as an incident light window constitutes part of the wall of container (5) by sealing the upper end opening of the metal side tube (2). A pin-type photodiode (6) is disposed inside the container (5). The pin-type photodiode (6) comprises a photoabsorption layer (9) formed from InxGa(1−x)N (0

Abstract translation: UV传感器（1）包括容器（5），金属侧管（2）的上端开口用作为入射光窗的硼硅玻璃构成的前板（3）密封，下端开口 用基板（4）密封。 用作入射光窗的前板（3）通过密封金属侧管（2）的上端开口构成容器（5）的壁的一部分。 销式光电二极管（6）设置在容器（5）的内部。 针式光电二极管（6）包括由n个（n-1）x（1-x）N（0

公开(公告)号：US07183558B2

公开(公告)日：2007-02-27

申请号：US11354973

申请日：2006-02-16

Applicant: Joe T. May ,  David C. Snyder ,  James M. Raymont ,  Matthew J. McConnell ,  Edward A. Casacia ,  Kyle L. Bostian

Inventor： Joe T. May ,  David C. Snyder ,  James M. Raymont ,  Matthew J. McConnell ,  Edward A. Casacia ,  Kyle L. Bostian

IPC: G01J1/42

CPC classification number: G01J1/4228 ,  G01J1/0271 ,  G01J1/429

Abstract: A radiometer that incorporates multiple UV bandwidth sensors, defined in nanometers, and includes connectors for inserting a cable that is used to connect to another sensor, or to a data collection module (DCM) in a multidrop, or daisy-chain arrangement. Each sensor can be positioned at any point on a three-dimensional work piece, and will receive UV energy at the aperture having an optical component. The collected energy is directed to a detector in the sensor. A processor in the body of the sensor then computes the amount of UV radiation based on signals from the detector. This information is transferred to and stored in a data collection module to which the sensor string is connected. Data stored in the DCM can then be transferred to a computer for display purposes. The sensors and DCM can be tethered to the computer for real-time measurement readings when adjusting the UV lamps.

Abstract translation: 包含多个以纳米为单位的紫外线带宽传感器的辐射计，包括用于插入用于连接到另一个传感器的电缆的连接器，或以多点或菊花链布置的数据采集模块（DCM）。 每个传感器可以定位在三维工件上的任何点上，并且将在具有光学部件的孔处接收UV能量。 收集的能量被引导到传感器中的检测器。 然后传感器主体中的处理器根据来自检测器的信号计算出紫外线辐射量。 该信息被传送到并存储在传感器串连接到的数据收集模块中。 存储在DCM中的数据可以传输到计算机进行显示。 当调节UV灯时，传感器和DCM可以连接到计算机上进行实时测量读数。

公开(公告)号：US20060285107A1

公开(公告)日：2006-12-21

申请号：US11494061

申请日：2006-07-27

Applicant: Andrew Garcia ,  Anton Moldovan

Inventor： Andrew Garcia ,  Anton Moldovan

IPC: G01J1/00

CPC classification number: G01J1/429 ,  G01J1/0425 ,  G01J1/32

Abstract: A system is disclosed that is using a high energy point like source illuminator comprising an ultraviolet source, where the source is being energized by a variable power supply that is controlled by a UV sensor and microprocessor. The energy from the illuminator is focused in the proximal end of a fiber optic light guide, a feed back branch coupling reflected light to the UV sensor. The light travels inside the guide and exits through its distal end first exposing a standard substrate. The standard substrate and a working substrate are positioned adjacent to each other and the UV light is first directed toward the standard substrate, the reflected light being incident on the sensor. The sensor output signal is then coupled to the microprocessor, which adjusts the power delivered to the bulb to correspond to the value established for the standard substrate, the microprocessor determining the needed exposure time to affect the cure. Thereafter, the incident light is redirected toward the working substrate, the reflected light therefrom being sensed, the microprocessor then adjusting the power supply such as to keep the bulb light intensity constant in accordance with the parameters established by the standard measurements.