公开(公告)号：US20020014403A1

公开(公告)日：2002-02-07

申请号：US09823757

申请日：2001-04-03

Inventor： Eiichi Hoshino

IPC: H01B013/00 ,  C23F001/00 ,  B44C001/22 ,  C03C015/00 ,  C03C025/68

CPC classification number: B82Y10/00 ,  B82Y40/00 ,  C23F1/00 ,  G03F1/24 ,  G03F1/84 ,  G21K2201/067

Abstract: After a Ta radiation absorber 13 is subjected to reactive ion overetching to form a desired pattern till an upper portion of the SiO2 buffer film 12 is removed, the buffer film 12 is removed by two steps of reactive sputter pre-underetching and final wet etching. In the wet etching, a substrate is rotated while spraying a dilute hydrofluoric acid solution, spray and rotation are ceased, the substrate is illuminated with a light beam to detect regularly reflected light, the detected signal is amplified, differentiated and compared with a reference voltage to detect an etching endpoint, and etching is ceased after a predetermined time has elapsed from the detection of the etching endpoint. At an inspection step, an image of a reflective mask is obtained with a microscope and it is determined that the side etching amount of the buffer film is short if the luminance, at a point of the maximum change rate on a luminance curve around the edge of the Ta radiation absorber 13, is lower than a reference value.

Abstract translation: 在将Ta辐射吸收体13进行反应离子过蚀刻以形成所需的图案之后，直到除去SiO 2缓冲膜12的上部，通过反应溅射预脱模和最终湿法蚀刻的两个步骤除去缓冲膜12。 在湿蚀刻中，在喷涂稀氢氟酸溶液的同时旋转基板，停止喷雾和旋转，用光束照射基板以定期检测反射光，检测信号被放大，微分并与参考电压 以检测蚀刻终点，并且在从蚀刻端点的检测经过预定时间之后停止蚀刻。 在检查步骤中，用显微镜获得反射掩模的图像，并且如果在边缘周围的亮度曲线上的最大变化率的点处的亮度被确定为缓冲膜的侧蚀刻量短 的Ta辐射吸收体13比基准值低。

公开(公告)号：US20010031034A1

公开(公告)日：2001-10-18

申请号：US09854054

申请日：2001-05-12

Inventor： David B. Wittry

IPC: G21K001/06

CPC classification number: G21K1/06 ,  G21K2201/062 ,  G21K2201/064 ,  G21K2201/067

Abstract: A method and apparatus for fabricating x-ray optics of the type having a doubly curved crystal lamella attached to a backing plate that is positioned and aligned for use in a spectrometer, monochromator or point-focusing instrument. The fabrication method is an improvement over the one described in U.S. Pat. No. 6,236,710 and provides for simpler and more accurate prepositioning the crystal lamella relative to the backing plate. This method utilizes an apparatus with a removable top and a removable liner; said top containing one or more micrometer screws, and said liner being made of a material to which the bonding agent does not adhere. During fabrication of the optic by pressing the crystal against a doubly curved mold via the viscous bonding agent, excess bonding agent escapes through channels in the liner. The liner is suitably configured so that the completed optic can be easily removed and the mold and fabrication apparatus can be reused many times.

Abstract translation: 一种用于制造这种类型的X射线光学器件的方法和装置，该方法和装置具有连接到背板的双曲面晶片，其被定位和对准以用于光谱仪，单色仪或点聚焦仪器。 制造方法是比美国专利中描述的方法更好的改进。 No.6,236,710并且提供了相对于背板更简单和更准确地预定晶片。 该方法利用具有可拆卸顶部和可拆卸衬垫的装置; 所述顶部包含一个或多个千分尺螺钉，并且所述衬垫由粘合剂不粘附到的材料制成。 在通过粘性粘合剂将晶体压靠双曲模具制造光学元件期间，过量的粘合剂通过衬管中的通道逸出。 该衬套适当地构造成使得完整的光学元件能够容易地移除，并且模具和制造装置可以被重复使用多次。

公开(公告)号：US06203715B1

公开(公告)日：2001-03-20

申请号：US09232824

申请日：1999-01-19

Applicant: You-Kwang Kim ,  Jae-Hyuk Chung

Inventor： You-Kwang Kim ,  Jae-Hyuk Chung

IPC: G02B508

CPC classification number: B81C1/00174 ,  B81B2201/042 ,  B81C2201/0109 ,  B81C2201/117 ,  G02B26/0858 ,  G21K1/06 ,  G21K2201/067

Abstract: An inventive method for the manufacture of a thin film actuated mirror array comprises the steps of: preparing an active matrix including a substrate, an array of switching devices and an array of connecting terminals; forming a first sacrificial layer including an array of empty cavities; forming an array of actuating structures, each of the actuating structures including an elastic member, a lower electrode, an electrodisplacive member, an upper electrode and a via contact; forming a second sacrificial layer including an array of empty slots; forming an array of mirrors; removing the first and the second sacrificial layer to thereby form the thin film actuated mirror array. The use of a poly-Si as the material for the first and the second sacrificial layers will ensure an easy flattening thereof and an easy removal thereof, resulting an increased otpical efficiency in the thin film actuated mirror thus formed.

Abstract translation: 用于制造薄膜致动反射镜阵列的创造性方法包括以下步骤：制备包括基板，开关装置阵列和连接端子阵列的有源矩阵; 形成包括空腔阵列的第一牺牲层; 形成致动结构的阵列，每个致动结构包括弹性构件，下电极，电致位移构件，上电极和通孔接触件; 形成包括空槽阵列的第二牺牲层; 形成一组镜子; 去除第一和第二牺牲层，从而形成薄膜致动反射镜阵列。 使用多晶硅作为第一牺牲层和第二牺牲层的材料将确保其容易的平坦化和易于除去，从而在由此形成的薄膜致动反射镜中产生增加的效率。

公开(公告)号：US5799056A

公开(公告)日：1998-08-25

申请号：US755294

申请日：1996-11-22

Applicant: George Gutman

Inventor： George Gutman

IPC: G21K1/06

CPC classification number: B82Y10/00 ,  G21K1/062 ,  G21K2201/061 ,  G21K2201/064 ,  G21K2201/067 ,  G21K2201/068

Abstract: This invention relates to novel methods of producing flat and curved optical elements with laterally and depth graded multilayer thin films, in particular multilayers of extremely high precision, for use with soft and hard x-rays and neutrons and the optical elements achieved by these methods. In order to improve the performance of an optical element, errors in d spacing and curvature are isolated and subsequently compensated.

Abstract translation: 本发明涉及生产具有横向和深度梯度多层薄膜的平面和弯曲光学元件的新方法，特别是具有极高精度的多层，用于软和硬x射线和中子以及通过这些方法实现的光学元件。 为了提高光学元件的性能，分离出d间隔和曲率的误差并随后进行补偿。

公开(公告)号：US5268954A

公开(公告)日：1993-12-07

申请号：US961789

申请日：1992-10-14

Applicant: Frederic H. Middleton

Inventor： Frederic H. Middleton

IPC: G21K1/06

CPC classification number: G21K1/06 ,  G21K2201/06 ,  G21K2201/062 ,  G21K2201/067

Abstract: A mounting mechanism for a double crystal monochromator or the like has a parallelogram based mounting mechanism in which two of the vertices of the parallelogram are fixed in position, and two vertices are free to translate back and forth in a straight line parallel to the fixed base of the parallelogram. One diffractor is mounting for pivoting at one of the fixed vertices, and the second diffractor is mounted for pivoting at an adjacent movable vertex. The surfaces of the diffractors are maintained parallel as the angle of the diffractors with respect to input and output beams to the monochromator is changed to change the wavelength being passed. The diffractor mounted at the fixed pivot may be connected to a large diameter wheel which in turn is connected by a band to a smaller diameter wheel mounted for rotation at the other fixed vertex of the parallelogram, with a pivotable arm connected to the smaller wheel to rotate therewith. Another larger diameter wheel is connected to the diffractor at the movable vertex and is connected by a band to a smaller diameter wheel at the adjacent movable vertex of the parallelogram, where the smaller wheel is connected by a slider to the pivotable arm. As the movable diffractor is translated in position, the arm pivots to cause the small wheels to move through the same angle of angular displacement as the pivotable arm. The corresponding angular displacement of the diffractors may be one half the angular displacement of the pivotable arm where the larger wheels are twice the diameter of the smaller wheels.

Abstract translation: 双晶单色仪等的安装机构具有基于平行四边形的安装机构，其中平行四边形的两个顶点被固定就位，并且两个顶点在平行于固定基座的直线中来回自由地平移 的平行四边形。 一个衍射器安装用于在固定顶点之一处枢转，并且第二衍射器被安装用于在相邻的可动顶点处枢转。 当衍射器相对于单色器的输入和输出光束的角度改变以改变所通过的波长时，衍射器的表面保持平行。 安装在固定枢轴处的衍射器可以连接到大直径轮，该大直径轮又通过带连接到安装成在平行四边形的另一固定顶点处旋转的较小直径的轮，其中可枢转臂连接到较小的轮到 与其一起旋转。 另一个较大直径的轮在可移动顶点处连接到衍射器，并且通过带连接到平行四边形的相邻可移动顶点处的较小直径的轮，其中较小的轮通过滑块连接到可枢转臂。 当可移动衍射器平移时，臂枢转以使小轮移动通过与可枢转臂相同的角位移角度。 衍射器的相应角位移可以是可枢转臂的角位移的一半，其中较大的轮是较小轮的直径的两倍。

公开(公告)号：US5203977A

公开(公告)日：1993-04-20

申请号：US666971

申请日：1991-03-11

Applicant: Daniel M. Makowiecki ,  Alan F. Jankowski

Inventor： Daniel M. Makowiecki ,  Alan F. Jankowski

IPC: C23C14/06 ,  C23C14/18 ,  C23C14/34 ,  G21K1/06

CPC classification number: B82Y10/00 ,  C23C14/0635 ,  C23C14/0647 ,  C23C14/18 ,  C23C14/185 ,  C23C14/3414 ,  G21K1/062 ,  G21K2201/061 ,  G21K2201/067 ,  Y10T428/265 ,  Y10T428/31678

Abstract: A method is described for the production of thin boron and titanium/boron films by magnetron sputter deposition. The amorphous boron films contain no morphological growth features, unlike those found when thin films are prepared by various physical vapor deposition processes. Magnetron sputter deposition method requires the use of a high density crystalline boron sputter target which is prepared by hot isostatic pressing. Thin boron films prepared by this method are useful for ultra-thin band pass filters as well as the low Z element in low Z/high Z mirrors which enhance reflectivity from grazing to normal incidence.

Abstract translation: 描述了通过磁控溅射沉积生产薄硼和钛/硼膜的方法。 不同于当通过各种物理气相沉积工艺制备薄膜时，无定形硼膜不含形态生长特征。 磁控溅射沉积法需要使用通过热等静压制备的高密度结晶硼溅射靶。 通过该方法制备的薄硼膜对于超薄带通滤波器以及低Z /高Z反射镜中的低Z元件是有用的，其增强了从放牧到正常入射的反射率。

公开(公告)号：US4940319A

公开(公告)日：1990-07-10

申请号：US342793

申请日：1989-04-25

Applicant: Katsunobu Ueda ,  Mitsuo Sumiya ,  Michio Baba

Inventor： Katsunobu Ueda ,  Mitsuo Sumiya ,  Michio Baba

IPC: G21K1/02 ,  G21K1/06

CPC classification number: G21K1/06 ,  G21K2201/064 ,  G21K2201/067

Abstract: An X-ray mirror apparatus includes a substantially cylindrical mirror body and a pair of light shielding members provided at both open ends of the mirror body. The inner surface of the mirror body constitutes a reflecting mirror surface having a surface of revolution. Each light shielding member has a light shielding plate arranged at the opened end of the mirror body to block it, and an annular slit allowing passage of X-rays entering onto and reflected on the reflecting mirror surface. A cylindrical fitting member is fixed to the light shielding plate to be coaxial with the slit. The fitting member is fitted on the opened end portion of the mirror body, thereby positioning the light shielding member so that the slit is located coaxial with the axis of the reflecting mirror surface.

公开(公告)号：US4921327A

公开(公告)日：1990-05-01

申请号：US356115

申请日：1989-05-24

Applicant: Richard R. Zito

Inventor： Richard R. Zito

IPC: G02B6/032 ,  G21K1/06

CPC classification number: G02B6/032 ,  G21K1/06 ,  G21K2201/067 ,  G21K2201/068

Abstract: A thin, flexible, hollow fiber capable of transmitting ionizing radiation. Ionizing radiation enters the fiber through entrance pupil (10) and travels through the hollow interior of fiber body (20) by reflecting and scattering off the inner wall of the fiber, frequently at grazing incidence angles. Fiber body (20) is covered at one end by thin film cap (30) which is thin enough to be at least semitransparent to ionizing radiation, but which is also strong enough to allow air to be withdrawn from fiber body (20) at the opposite uncapped end. Small obstructions (32) at the exit end of the fiber can be used to spread the beam of ionizing radiation to a desirable width. A flexible fiber capable of transmitting ionizing radiation has important applications in medicine for the radiation therapy of tumors. Applications also exist in communications and other fields.

Abstract translation: 一种能够传输电离辐射的薄而灵活的中空纤维。 电离辐射通过入射光瞳（10）进入光纤，通过反射和散射光纤的内壁，经常在掠入射角度下行进穿过纤维体（20）的中空内部。 纤维体（20）在一端被薄膜盖（30）覆盖，薄膜帽（30）足够薄至至少与电离辐射半透明，但是也足够强，以允许空气从纤维体（20）中取出， 对面无边。 纤维出口处的小障碍物（32）可以用于将电离辐射束扩展到期望的宽度。 能够传输电离辐射的柔性纤维在肿瘤放射治疗的医学中具有重要的应用。 应用也存在于通信等领域。

公开(公告)号：US4916721A

公开(公告)日：1990-04-10

申请号：US81964

申请日：1987-08-05

Applicant: Martin J. Carr ,  Alton D. Romig, Jr.

Inventor： Martin J. Carr ,  Alton D. Romig, Jr.

IPC: G21K1/06

CPC classification number: G21K1/06 ,  G21K2201/064 ,  G21K2201/067

Abstract: A non-planar, focusing mirror, to be utilized in both electron column instruments and micro-x-ray fluorescence instruments for performing chemical microanalysis on a sample, comprises a concave, generally spherical base substrate and a predetermined number of alternating layers of high atomic number material and low atomic number material contiguously formed on the base substrate. The thickness of each layer is an integral multiple of the wavelength being reflected and may vary non-uniformly according to a predetermined design. The chemical analytical instruments in which the mirror is used also include a predetermined energy source for directing energy onto the sample and a detector for receiving and detecting the x-rays emitted from the sample; the non-planar mirror is located between the sample and detector and collects the x-rays emitted from the sample at a large solid angle and focuses the collected x-rays to the sample.For electron column instruments, the wavelengths of interest lie above 1.5 nm, while for x-ray fluorescence instruments, the range of interest is below 0.2 nm. Also, x-ray fluorescence instruments include an additional non-planar focusing mirror, formed in the same manner as the previously described mThe invention described herein was made in the performance of work under contract with the Department of Energy, Contract No. DE-AC04-76DP00789, and the United States Government has rights in the invention pursuant to this contract.

Abstract translation: 在用于对样品进行化学微量分析的电子束仪器和微x射线荧光仪器中使用的非平面聚焦镜包括凹的，通常为球形的基底基底和预定数量的高原子的交替层 数字材料和低原子序数材料连续地形成在基底基板上。 每个层的厚度是被反射的波长的整数倍，并且可以根据预定的设计而不均匀地变化。 使用反射镜的化学分析仪器还包括用于将能量引导到样品上的预定能量源和用于接收和检测从样品发射的x射线的检测器; 非平面镜位于样品和检测器之间，并以大的立体角收集从样品发射的x射线，并将收集的x射线聚焦到样品。 对于电子柱仪器，感兴趣的波长在1.5nm以上，而对于x射线荧光仪器，感兴趣的范围低于0.2nm。 此外，x射线荧光仪器包括以与前述反射镜相同的方式形成并位于能量源和样品之间的附加非平面聚焦反射镜，以收集从光源发射的x射线并将其引导到 样品不损失强度。

公开(公告)号：US4910759A

公开(公告)日：1990-03-20

申请号：US189525

申请日：1988-05-03

Applicant: Mark Sharnoff

Inventor： Mark Sharnoff

IPC: G21K1/02 ,  G02B5/18 ,  G03F7/20 ,  G21K1/06 ,  G21K3/00

CPC classification number: G03F7/70058 ,  G02B5/1876 ,  G21K1/06 ,  G21K2201/067

Abstract: A lens and collimator apparatus for focusing and increasing the intensity of an x-ray beam at a specimen point. A screen with an aperture of pupil diameter comparable and no larger than the x-ray transverse coherence length and no smaller that the specimen diameter focuses the x-ray beam by diffraction. The screen is positioned from the specimen plane proportional to the ratio of the square of the pupil diameter to the mean wavelength of the x-ray beam. A plurality of parallel screens can also be used.

Abstract translation: 用于在样本点聚焦和增加x射线束的强度的透镜和准直器装置。 具有瞳孔直径相当并且不大于x射线横向相干长度的屏幕，并且不小于样本直径通过衍射聚焦x射线束。 屏幕从样品平面定位，与瞳孔直径的平方与X射线束的平均波长成比例。 还可以使用多个平行屏幕。