公开(公告)号：US20100163728A1

公开(公告)日：2010-07-01

申请号：US12653324

申请日：2009-12-11

Applicant: Fumio Ohtomo ,  Hisashi Isozaki

Inventor： Fumio Ohtomo ,  Hisashi Isozaki

IPC: G01N23/225 ,  G02B21/06

CPC classification number: H01J37/28 ,  G02B21/06 ,  G02B21/365 ,  H01J37/22 ,  H01J37/265 ,  H01J2237/2482

Abstract: The present invention provides an electron microscope device 1, comprising a scanning electron microscope 2 and an optical microscope 3, wherein the scanning electron microscope has scanning means 10 for scanning an electron beam and an electron detector 12 for detecting electrons issued from a specimen 8 scanned by the electron beam, and the scanning electron microscope acquires a scanning electron image based on a detection result from the electron detector, wherein the optical microscope projects an illumination light to the specimen, receives a reflection light from the specimen and acquires an optical image, and wherein an optical axis 7 of the scanning electron microscope crosses an optical axis 6 of the optical microscope at a point of observation of the specimen, wherein the scanning means projects the electron beam for scanning with a scanning width wider than a width of a scanning area, the optical microscope projects an illumination light and acquires an optical image in an overrunning portion where the electron beam is projected beyond the scanning area, and the scanning electron microscope acquires a scanning electron image based on electrons issued when the electron beam scans over the scanning area.

Abstract translation: 本发明提供一种电子显微镜装置1，其包括扫描电子显微镜2和光学显微镜3，其中扫描电子显微镜具有用于扫描电子束的扫描装置10和用于检测扫描的试样8发出的电子的电子检测器12 并且扫描电子显微镜基于来自电子检测器的检测结果获取扫描电子图像，其中光学显微镜向样本投射照明光，接收来自样本的反射光并获取光学图像， 并且其中扫描电子显微镜的光轴7在试样的观察点处与光学显微镜的光轴6交叉，其中扫描装置以比扫描宽度宽的扫描宽度投影扫描电子束 光学显微镜投射照明光并获取光学图像 电子束突出超过扫描区域的超越部分，扫描电子显微镜根据电子束扫描扫描区域时发出的电子获取扫描电子图像。

公开(公告)号：US07714286B2

公开(公告)日：2010-05-11

申请号：US12121924

申请日：2008-05-16

Applicant: Tomonori Nakano ,  Takeshi Kawasaki ,  Kotoko Hirose ,  Makoto Ezumi

Inventor： Tomonori Nakano ,  Takeshi Kawasaki ,  Kotoko Hirose ,  Makoto Ezumi

IPC: G01N23/00

CPC classification number: H01J37/153 ,  H01J37/265 ,  H01J37/28 ,  H01J2237/216 ,  H01J2237/221

Abstract: A charged particle beam apparatus includes: a correction image acquisition part 52 for making a detector 20 acquire items of two-dimensional image data at different focal positions; a directional differentiation operation part 53 for obtaining directional derivative values in a plurality of directions for each of the items of two-dimensional image data at different focal positions; an aberration parameter calculation part 54 for obtaining aberration parameters according to previously determined methods by using the directional derivative values in a plurality of directions for each of the items of two-dimensional image data; an aberration correction value calculation part 55 for obtaining correction values for aberrations by using the aberration parameters; and a control part 56 for setting the correction values in a correction optical system control means to make an aberration corrector 16 correct the aberrations.

Abstract translation: 带电粒子束装置包括：校正图像获取部52，用于使检测器20获取不同焦点位置处的二维图像数据项; 方向微分运算部53，用于在不同的焦点位置获得每个二维图像数据项的多个方向的方向导数值; 像差参数计算部54，用于根据先前确定的方法通过对于每个二维图像数据使用多个方向上的方向导数值来获得像差参数; 用于通过使用像差参数获得像差的校正值的像差校正值计算部55; 以及用于在校正光学系统控制装置中设置校正值以使像差校正器16校正像差的控制部分56。

公开(公告)号：US07700918B2

公开(公告)日：2010-04-20

申请号：US12076355

申请日：2008-03-17

Applicant: Makoto Ezumi ,  Yoichi Ose ,  Akira Ikegami ,  Hideo Todokoro ,  Tatsuaki Ishijima ,  Takahiro Sato ,  Ritsuo Fukaya ,  Kazunari Asao

Inventor： Makoto Ezumi ,  Yoichi Ose ,  Akira Ikegami ,  Hideo Todokoro ,  Tatsuaki Ishijima ,  Takahiro Sato ,  Ritsuo Fukaya ,  Kazunari Asao

IPC: G01N23/00 ,  H01J37/28 ,  G01R19/00

CPC classification number: H01J37/265 ,  G01N23/2251 ,  H01J37/21 ,  H01J37/244 ,  H01J37/28 ,  H01J2237/0041 ,  H01J2237/216 ,  H01J2237/244 ,  H01J2237/24564 ,  H01J2237/24592 ,  H01J2237/2594 ,  H01J2237/2817

Abstract: The present invention has the object of providing a charged particle beam irradiation method ideal for reducing the focus offset, magnification fluctuation and measurement length error in charged particle beam devices. To achieve these objects, a method is disclosed in the invention for measuring the electrical potential distribution on the sample with a static electrometer while loaded by a loader mechanism. Another method is disclosed for measuring the local electrical charge at specified points on the sample, and isolating and measuring the wide area electrostatic charge quantity from those local electrostatic charges. Yet another method is disclosed for correcting the measurement length value or magnification based on fluctuations found by measuring the amount of electrostatic charge at the specified points under at least two charged particle optical conditions, and then using a charged particle beam to measure fluctuations in measurement dimensions occurring due to fluctuations in the electrostatic charge at the specified locations.

Abstract translation: 本发明的目的是提供一种理想的用于减少带电粒子束装置中的聚焦偏移，放大波动和测量长度误差的带电粒子束照射方法。 为了实现这些目的，在本发明中公开了一种用于在由装载机构加载的情况下用静电静电计测量样品上的电位分布的方法。 公开了另一种测量样品上特定点的局部电荷的方法，并且从这些局部静电电荷中分离和测量广域静电电荷量。 公开了另一种用于基于通过测量至少两个带电粒子光学条件下的指定点处的静电电荷量而发现的波动来校正测量长度值或放大倍率的方法，然后使用带电粒子束来测量测量尺寸的波动 由于在指定位置处的静电电荷的波动而发生。

公开(公告)号：US07615746B2

公开(公告)日：2009-11-10

申请号：US11599343

申请日：2006-11-15

Applicant: Wataru Nagatomo ,  Atsushi Miyamoto ,  Ryoichi Matsuoka

Inventor： Wataru Nagatomo ,  Atsushi Miyamoto ,  Ryoichi Matsuoka

IPC: G01N23/00 ,  G01B11/14

CPC classification number: H01J37/28 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/70525 ,  G03F7/70625 ,  G06T7/0006 ,  G06T2207/30148 ,  H01J37/222 ,  H01J37/265 ,  H01J37/3174 ,  H01J2237/216 ,  H01J2237/24578 ,  H01J2237/2487 ,  H01J2237/2817

Abstract: The present invention provides a semiconductor pattern shape evaluating apparatus using a critical dimension SEM, which eliminates the necessity of data conversion corresponding to each process of semiconductor manufacturing conventionally required; controls possessed data integratedly; can select data effective for use in each process from the possessed data easily; if the shape of formed pattern changes with time, can create a photographing recipe which enables stable measurement by correcting the photographing recipe based on time-series data. Specifically, the semiconductor pattern shape evaluating apparatus correlates coordinate systems among diversified data to control the diversified data stored in a database integratedly, selects part or all of the diversified data arbitrarily and creates a photographing recipe for observing a semiconductor pattern with a critical dimension SEM using selected data.

Abstract translation: 本发明提供一种使用临界尺寸SEM的半导体图案形状评估装置，其消除了对应于常规所需的半导体制造的每个处理的数据转换的必要性; 控制统计数据; 可以轻松地从拥有的数据中选择有效用于每个进程的数据; 如果形成的图案的形状随着时间而变化，则可以创建通过基于时间序列数据校正摄影配方而能够进行稳定测量的拍摄配方。 具体地，半导体图案形状评估装置将多个数据中的坐标系统相互关联，以一体化地存储在数据库中控制多样化数据，任意地选择部分或全部多样化数据，并使用临界尺寸SEM创建用于观察半导体图案的拍摄配方 选择的数据。

公开(公告)号：US07612347B2

公开(公告)日：2009-11-03

申请号：US11774823

申请日：2007-07-09

Applicant: Makoto Hiramoto

Inventor： Makoto Hiramoto

IPC: H01J37/244 ,  G01T1/29

CPC classification number: H01J37/265 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/263 ,  H01J37/28 ,  H01J37/304 ,  H01J37/3174 ,  H01J2237/221 ,  H01J2237/2823 ,  H01J2237/30483

Abstract: A charged particle beam apparatus in accordance with one preferred form of this invention includes an irradiation unit for irradiating a charged particle beam, an instrumentation unit which performs instrumentation of a reflection signal from a mark as obtained by scanning the mark while irradiating the charged particle beam onto the mark, and a measurement unit which uses an approximation equation defined by use of a prespecified mark shape function and an error function to perform the fitting of a waveform obtained based on the reflection signal and which measures beam resolution which becomes a parameter of the error function from the waveform obtained based on the reflection signal.

Abstract translation: 根据本发明的一个优选形式的带电粒子束装置包括用于照射带电粒子束的照射单元，仪器单元，其从照射带电粒子束的扫描标记获得的标记进行反射信号的检测 以及测量单元，其使用通过使用预先指定的标记形状函数和误差函数定义的近似方程来执行基于反射信号获得的波形的拟合，并且测量作为参数的波束分辨率 基于反射信号获得的波形的误差函数。

公开(公告)号：US07598497B2

公开(公告)日：2009-10-06

申请号：US11892332

申请日：2007-08-22

Applicant: Kouichi Yamamoto ,  Kaneo Kageyama

Inventor： Kouichi Yamamoto ,  Kaneo Kageyama

IPC: H01J37/26

CPC classification number: H01J37/265 ,  H01J37/222 ,  H01J37/28 ,  H01J2237/1536 ,  H01J2237/2809 ,  H01J2237/2817 ,  H01J2237/2826

Abstract: A method and an apparatus for calculating a scan signal so that the scan region becomes a scan region which is based on magnification ratio between desired magnification in a scan-line interval direction and desired magnification in a scan-line direction, and performing a calculation for rotating the scan direction with respect to the scan signal in order to suppress a distortion which is caused to occur when the technology where the scan direction of a charged particle beam is rotated is applied to the technology where the charged particle beam is scanned such that the scan-line interval is enlarged.

Abstract translation: 一种用于计算扫描信号的方法和装置，使得扫描区域变为基于扫描线间隔方向上的期望倍率与扫描线方向上的期望倍率之间的倍率的扫描区域，并且对扫描区域进行计算 相对于扫描信号旋转扫描方向，以便在将带电粒子束的扫描方向旋转的技术应用于扫描带电粒子束的技术时，抑制发生的变形，使得 扫描线间隔被放大。

公开(公告)号：US20090242762A1

公开(公告)日：2009-10-01

申请号：US12407918

申请日：2009-03-20

Applicant: Hidetoshi Nishiyama ,  Mitsuru Koizumi

Inventor： Hidetoshi Nishiyama ,  Mitsuru Koizumi

IPC: G01N23/00

CPC classification number: G01N23/2251 ,  G01N23/2204 ,  G01N2223/307 ,  G01N2223/612 ,  G01N2223/637 ,  H01J37/20 ,  H01J37/228 ,  H01J37/265 ,  H01J37/28 ,  H01J2237/182 ,  H01J2237/2004 ,  H01J2237/244 ,  H01J2237/2808

Abstract: Method and apparatus have a film including a first surface to hold the liquid sample thereon, a vacuum chamber for reducing the pressure of an ambient in contact with a second surface of the film, primary beam irradiation means connected with the vacuum chamber and irradiating the sample with a primary beam via the film, signal detection means for detecting a secondary signal produced from the sample in response to the beam irradiation, a partitioning plate for partially partitioning off the space between the film and the primary beam irradiation means in the vacuum chamber, and a vacuum gauge for detecting the pressure inside the vacuum chamber.

Abstract translation: 方法和装置具有包括用于将液体样品保持在其上的第一表面的膜，用于降低与膜的第二表面接触的环境压力的真空室，与真空室连接并照射样品的主光束照射装置 通过胶片具有主光束，信号检测装置，用于响应于光束照射检测从样品产生的二次信号;分隔板，用于在真空室中部分地分隔膜和主光束照射装置之间的空间， 以及用于检测真空室内的压力的真空计。

公开(公告)号：US20090184256A1

公开(公告)日：2009-07-23

申请号：US12351523

申请日：2009-01-09

Applicant: Kunji Shigeto ,  Takeshi Ogashiwa

Inventor： Kunji Shigeto ,  Takeshi Ogashiwa

IPC: H01J3/14

CPC classification number: H01J37/28 ,  H01J37/265 ,  H01J2237/216 ,  H01J2237/2487 ,  H01J2237/2826

Abstract: Disclosed herein is a scanning electron microscope having a function for positioning an object point of an objective lens at a defined position even under an electronic optical condition in which it is difficult to accurately control the position of the object point of the objective lens. A deflector is provided to deflect an electron beam in order to detect the object point and located at a desired position of the object point of the objective lens. The deflector is not used to scan a sample with the electron beam. The scanning electron microscope has a function for automatically adjusting the position of the object point to ensure that the object point of the objective lens is located at the position of the object point detection deflector by using a characteristic in which a displacement of an image by the deflector is minimal when the object point is located at the position of the deflector.

Abstract translation: 这里公开了一种扫描电子显微镜，其具有即使在难以精确地控制物镜的物体的位置的电子光学条件下将物镜的物体点定位在限定位置的功能。 提供偏转器以偏转电子束以便检测物点并且位于物镜的物点的期望位置处。 偏转器不用于用电子束扫描样品。 扫描电子显微镜具有自动调整物点的位置的功能，以通过使用图像的位移由特征来确定物镜的物点位于物点检测偏转器的位置 当物点位于偏转器的位置时，偏转器最小。

公开(公告)号：US07550724B2

公开(公告)日：2009-06-23

申请号：US11520605

申请日：2006-09-14

Applicant: Takashi Ichimura ,  Takeshi Ogashiwa ,  Toshihide Agemura ,  Kenji Aoki

Inventor： Takashi Ichimura ,  Takeshi Ogashiwa ,  Toshihide Agemura ,  Kenji Aoki

IPC: G01N23/00

CPC classification number: H01J37/09 ,  H01J37/265 ,  H01J37/28 ,  H01J2237/0458

Abstract: An electron beam device includes an electron gun section having an internal space kept at an ultrahigh vacuum level for generating a primary electron beam, a mirror section having an internal space kept at a vacuum level lower than that of the electron gun section for scanning a specimen with an electron probe of the primary electron beam generated in the electron gun section and focused on the specimen, a differential exhaust diaphragm for providing communication in internal space between the electron gun section and the mirror section and passing the primary electron beam, and a control section for controlling respective constituent elements in the electron beam device. A diaphragm mechanism having a plurality of different diaphragm aperture diameters is provided between a second anode and a first condenser lens.

Abstract translation: 电子束装置包括具有保持在超高真空度的内部空间以产生一次电子束的电子枪部分，具有保持在比用于扫描样本的电子枪部分的真空度更低的真空度的内部空间的镜部分 在电子枪部分中产生的一次电子束的电子探针聚焦在试样上，用于在电子枪部分和反射镜部分之间的内部空间中提供通信并使一次电子束通过的差动排气隔膜，以及控制 用于控制电子束装置中的各个组成元件。 具有多个不同光阑孔径的光阑机构设置在第二阳极和第一聚光透镜之间。

公开(公告)号：US07544936B2

公开(公告)日：2009-06-09

申请号：US11594222

申请日：2006-11-08

Applicant: Hiromi Inada ,  Isao Nagaoki ,  Hiroyuki Kobayashi

Inventor： Hiromi Inada ,  Isao Nagaoki ,  Hiroyuki Kobayashi

IPC: G01N23/00 ,  G21K7/00

CPC classification number: G01N23/04 ,  G01N23/225 ,  G06K9/00127 ,  H01J37/222 ,  H01J37/26 ,  H01J37/265 ,  H01J2237/223

Abstract: The present invention provides a method of observing a specimen in a field of view of an electron microscope comprising the acts of illuminating the specimen with an electron beam having a first angle and forming a first transmission image of the specimen in the field of view and adjusting the electron beam to a second angle and forming a second transmission image of the specimen in the field of view and calculating a degree of coincidence between the first and second transmission images.