公开(公告)号：US20080094614A1

公开(公告)日：2008-04-24

申请号：US11975403

申请日：2007-10-19

Applicant: David Tuschel ,  Arjun Bangalore

Inventor： David Tuschel ,  Arjun Bangalore

IPC: G01N21/00 ,  G21G5/00 ,  G01J1/00 ,  G01J3/28 ,  G01J3/30 ,  G01J3/44

CPC classification number: G01J3/44 ,  G01J3/10 ,  G01N21/274 ,  G01N21/65

Abstract: A pulse photobleaching methodology wherein a monochromatic illumination (e.g., laser illumination) having a higher power intensity (photobleaching power) just below the photodamage threshold of a luminescent sample is initially used to significantly attenuate sample luminescence without photothermally destroying the sample material. Thereafter, the laser power density may be reduced to a significantly lower level (analytical power level) to carry out spectroscopic measurements (e.g., collection of Raman scattered photons) on the sample. In one embodiment, the laser illumination wavelength remains the same despite changes in laser power intensity. Some figures-of-merit may be computed from optical measurements made at the analytical power level to guide the photobleaching process. Sample-dependent combinations of laser power density and short exposure times may be obtained to significantly expedite photobleaching to assist in collection of sample spectral data in the field without a long wait. Portable spectroscopy systems employing pulse photobleaching may be devised for expeditious collection of spectral data from luminescent samples in the field.

Abstract translation: 脉冲光漂白方法，其中最初使用具有刚好低于发光样品的光损伤阈值的较高功率强度（光漂白能力）的单色照明（例如，激光照明）来显着衰减样品发光而不光热地破坏样品材料。 此后，激光功率密度可以降低到显着较低的水平（分析能级），以对样品进行光谱测量（例如，拉曼散射光子的收集）。 在一个实施例中，激光照射波长保持相同，尽管激光功率强度的变化。 可以通过在分析功率级别进行的光学测量来计算一些数字值，以指导光漂白过程。 可以获得激光功率密度和短曝光时间的样品依赖组合，以显着加速光漂白，以帮助在现场收集样品光谱数据而不用长时间等待。 可以设计采用脉冲光漂白的便携式光谱系统，以便从现场的发光样品中快速收集光谱数据。

公开(公告)号：US20080094612A1

公开(公告)日：2008-04-24

申请号：US11877852

申请日：2007-10-24

Applicant: H. Bruce Land

Inventor： H. Bruce Land

IPC: H02H3/00 ,  G01J1/00 ,  G01L7/00

CPC classification number: H02H1/0023 ,  G01J1/429

Abstract: An arc flash detection system includes a sensor for determining and responding to the presence of an arc flash condition in electrical equipment by detecting a pressure rise, rate of pressure rise and/or ultraviolet radiation characteristic of an arc flash, and generating a signal in response thereto; and processing means responsive to said signal for operating a protective system to de-energize the electrical equipment within a period of time of sufficiently short duration to prevent a pressure wave from the arc flash from causing unacceptable darn age to equipment or personnel.

Abstract translation: 电弧闪光检测系统包括用于通过检测电弧闪光的压力上升，压力升高和/或紫外线辐射特性来确定和响应电气设备中存在电弧闪光状况的传感器，以及响应于产生信号 到; 以及响应于所述信号的处理装置，用于操作保护系统以在足够短的持续时间的时间段内使电气设备断电，以防止电弧闪光的压力波对设备或人员造成不可接受的损坏。

公开(公告)号：US20080079930A1

公开(公告)日：2008-04-03

申请号：US11541793

申请日：2006-10-03

Applicant: Eduard Martinus Klarenbeek

Inventor： Eduard Martinus Klarenbeek

IPC: G01J1/00 ,  G03C5/00

CPC classification number: G02B27/017 ,  G01J1/04 ,  G01J1/0414 ,  G01J1/4228 ,  G02B2027/0178 ,  G03F7/70116 ,  G03F7/7085 ,  G03F7/70891 ,  G09G5/377

Abstract: A measurement apparatus disclosed that has a radiation source configured to provide a measurement beam of radiation such that an individually controllable element of an array of individually controllable elements capable of modulating a beam of radiation, is illuminated by the measurement beam and redirects the measurement beam, and a detector arranged to receive the redirected measurement beam and determine the position at which the redirected measurement beam is incident upon the detector, the position at which the redirected measurement beam is incident upon the detector being indicative of a characteristic of the individually controllable element.

Abstract translation: 公开了一种测量装置，其具有被配置为提供测量辐射束的辐射源，使得能够调制辐射束的独立可控元件的阵列的独立可控元件被测量光束照射并且重定向测量光束， 以及检测器，其布置成接收重定向的测量光束并确定重定向的测量光束入射到检测器上的位置，重定向的测量光束入射到检测器上的位置指示单独可控元件的特性。

公开(公告)号：US07352451B2

公开(公告)日：2008-04-01

申请号：US11032126

申请日：2005-01-11

Applicant: Vladimir Levinski ,  Michael E. Adel

Inventor： Vladimir Levinski ,  Michael E. Adel

IPC: G01J1/00 ,  G01B9/00

CPC classification number: G03F7/70641 ,  G03F1/44

Abstract: Within a lithography process having a critical dimension, a method, system and structure for determining a focus deviation value relative to an ideal focus position said is disclosed. By projecting a series of lines or spots characterized by the constant pitch size which is greater than the projection devise optical resolution and incrementally increasing widths onto the surface of the photoactive material, wherein the width of at least one of the lines or sports is substantially the same as the critical dimension, and the widths of the other lines or spots are substantially equally distributed around the critical dimension, approximate focus and exposure dose deviation values may be determined.

Abstract translation: 在具有临界尺寸的光刻工艺中，公开了一种用于确定相对于理想聚焦位置的聚焦偏差值的方法，系统和结构。 通过投射一系列具有恒定间距尺寸的线或点，其大于投射光学分辨率并逐渐增加到光活性材料表面上的宽度，其中至少一条线或运动的宽度基本上是 与临界尺寸相同，并且其他线或点的宽度在临界尺寸周围基本均匀分布，可以确定近似焦点和曝光剂量偏差值。

公开(公告)号：US20080067452A1

公开(公告)日：2008-03-20

申请号：US11774085

申请日：2007-07-06

Applicant: Kunio MORIYAMA ,  Noriaki Ouchi ,  Masahiro Tadokoro ,  Hisataka Fujimaki

Inventor： Kunio MORIYAMA ,  Noriaki Ouchi ,  Masahiro Tadokoro ,  Hisataka Fujimaki

IPC: G01J1/00

CPC classification number: H05H7/12 ,  A61N5/1048 ,  A61N2005/1087

Abstract: The present invention improves the accuracy of therapy by checking in real time whether an spread-out Bragg peak (SOBP) width agrees with a desired width during irradiation with a beam. The device for outputting a charged particle beam includes a charged particle beam generator 1 including a synchrotron 4; a range modulation device such as a range modulation wheel (RMW) 28 which forms a Bragg peak of an ion beam extracted from this charged particle beam generator 1; an irradiation device 16 which is located in the direction of ion beam propagation of this RMW device 28 and includes a dose monitor 31 for detecting a dose of the ion beam; and an SOBP width calculation device 73 which calculates ion beam Bragg peak formed by the RMW device 28 based on a detection value of the dose monitor 31.

Abstract translation: 本发明通过实时检查展开的布拉格峰（SOBP）宽度是否与用束照射期间的期望宽度一致而提高了治疗的准确性。 用于输出带电粒子束的装置包括：包括同步加速器4的带电粒子束发生器1; 范围调制装置，例如形成从该带电粒子束发生器1提取的离子束的布拉格峰的范围调制轮（RMW）28; 照射装置16，其位于该RMW装置28的离子束传播方向上，并包括用于检测离子束剂量的剂量监测器31; 以及SOBP宽度计算装置73，其基于剂量监视器31的检测值计算由RMW装置28形成的离子束布拉格峰。

公开(公告)号：US20080055590A1

公开(公告)日：2008-03-06

申请号：US11515197

申请日：2006-08-31

Applicant: J.E. Patrick Gagnon

Inventor： J.E. Patrick Gagnon

IPC: G01J1/00

CPC classification number: G01J1/02 ,  G01J1/0219 ,  G01J1/4257

Abstract: A system operable to detect a light beam generated by a light source includes a substrate that is operable to be coupled to a photomask. One or more image sensors are disposed outwardly from the substrate. An image sensor of the one or more image sensors is operable to detect a light beam and generate a sensor signal representing the detected light beam.

Abstract translation: 可操作以检测由光源产生的光束的系统包括可操作以耦合到光掩模的衬底。 一个或多个图像传感器从衬底向外设置。 一个或多个图像传感器的图像传感器可操作以检测光束并产生表示检测到的光束的传感器信号。

公开(公告)号：US07298469B2

公开(公告)日：2007-11-20

申请号：US11048041

申请日：2005-01-31

Applicant: Boris J. Muchnik

Inventor： Boris J. Muchnik

IPC: G01J1/00

CPC classification number: G01N9/00 ,  G01B11/272

Abstract: An object is placed at a particular distance away from the nonreflecting side of a mirror, such that the gravitational force of the object affects the mirror. A laser is then pointed at the opposite, reflecting side of the mirror, thereby itself reflecting off the mirror and going back in to the cavity of the laser, creating a mode-hopping effect. The mirror will be affected by three forces, the force of a spring (FS), the force of a modulating signal (FMS), created by an electro mechanical device attached to the mirror, and the gravitational force of objects as they approach and recede away from the mirror.

Abstract translation: 物体被放置在远离反射镜的非反射侧的特定距离处，使得物体的重力影响反射镜。 然后将激光指向反射镜的相对的反射侧，从而本身反射离开反射镜并返回激光器的空腔，产生跳频效应。 反射镜将受到三个力，弹簧的力（F S S S S S S），由机电装置产生的调制信号的力（F> MS）的影响 附着在镜子上，以及当物体接近并从镜子中退出时的重力。

公开(公告)号：US20070242264A1

公开(公告)日：2007-10-18

申请号：US11737827

申请日：2007-04-20

Applicant: Kazuaki Ohkubo

Inventor： Kazuaki Ohkubo

IPC: G01J1/00

CPC classification number: G01J1/42 ,  G01J1/04 ,  G01J1/0422 ,  G01J1/0455 ,  G01J1/08 ,  G01J2001/0481 ,  G01J2001/4247

Abstract: An optical measuring device according to the present invention includes: a plane mirror (3), which has a central opening that functions as either a light entering window or a light source fitting hole (5) and an observation window 6′ that enables a photodetector (6) to take measurements; and an integrating hemisphere (2), which has its center of radius of curvature defined within the central opening of the plane mirror (3) and of which the inner wall surface functions as a light diffuse reflective surface (1). The plane mirror (3) and the integrating hemisphere (2) form an integrating space inside.

Abstract translation: 根据本发明的光学测量装置包括：平面镜（3），其具有用作光进入窗口或光源装配孔（5）的中心开口和观察窗6'，其能够使光电检测器 （6）进行测量; 以及整体半球（2），其具有限定在平面镜（3）的中心开口内的曲率半径的中心，并且其内壁表面用作光漫反射表面（1）。 平面镜（3）和积分半球（2）在内部形成积分空间。

公开(公告)号：US20070229804A1

公开(公告)日：2007-10-04

申请号：US11727581

申请日：2007-03-27

Applicant: Katsumi Inoue ,  Jun Watanabe ,  Tetsuya Asakura ,  Daiki Wakizaka ,  Hideyasu Ishibashi ,  Isao Ikuhara

Inventor： Katsumi Inoue ,  Jun Watanabe ,  Tetsuya Asakura ,  Daiki Wakizaka ,  Hideyasu Ishibashi ,  Isao Ikuhara

IPC: G01J1/00

CPC classification number: G02B5/0284 ,  G02B5/0242 ,  G02B5/0268 ,  G02F1/133504 ,  G02F1/133528 ,  G02F2201/38 ,  G02F2201/50 ,  G02F2202/28

Abstract: A light-scattering film is provided and includes a transparent support having thereon at least a light-scattering layer. When substantially parallel light is incident on a surface of the film at an incident angle of 5°, the reflectance for an angle θ in the light-receiving part measured in a plane containing the film normal line and the incident direction is R(θ), the value obtained by normalizing R(θ) by the reflectance of regular reflection is Rrel(θ), and the value calculated from the maximum variation |dRrel(θ)/dθ|max for the angle θ is a scattering coefficient A (formula 1), the reflection coefficient B (formula 2) calculated from the scattering coefficient A and the 5° specular reflectance Rs is from 2.0 to 5.0. Scattering coefficient A=1/(10×|dRrel(θ)/dθ|max)  (Formula 1) Reflection coefficient B=2.2×log 10(Rs)−7.5×log 10(A)+5.9  (Formula 2)

Abstract translation: 提供光散射膜，并且包括其上至少具有光散射层的透明支撑体。 当基本上平行的光以5°的入射角入射到膜的表面上时，在包含膜法线和入射方向的平面中测量的光接收部分中的角度θ的反射率为R（θ） 通过将正反射的反射率归一化为R（θ）所获得的值为Rrel（θ），并且从角度θ的最大变化| dRrel（θ）/dθ| max计算的值为散射系数A（公式 1），从散射系数A和5°镜面反射率Rs求出的反射系数B（式2）为2.0〜5.0。 散布系数A = 1 /（10x | dRrel（θ）/dθ| max）（公式1）<？in-line-formula description =“In-line formula”end =“lead” 公式描述=“内联公式”end =“tail”？> <？in-line-formula description =“In-line Formulas”end =“lead”？>反射系数B = 2.2xlog 10（Rs）-7.5 xlog 10（A）+5.9（公式2）<？in-line-formula description =“In-line Formulas”end =“tail”？>

公开(公告)号：US07271886B2

公开(公告)日：2007-09-18

申请号：US10716176

申请日：2003-11-17

Applicant: Frank Witney ,  Gary McMaster ,  Quan Nguyen ,  Steve Chen

Inventor： Frank Witney ,  Gary McMaster ,  Quan Nguyen ,  Steve Chen

IPC: G01J1/00

CPC classification number: G01N21/6452

Abstract: Uncaging devices that can be used to uncage photoactivatable caged components are provided. Consistent, uniform and/or high throughput processing of reactions and assays that include caged components is provided. Masked multiwell plates that can be used for uncaging photoactivatable caged components are provided. Methods and apparatus for initiating assays involving caged components are provided.

Abstract translation: 提供了可用于解除可光灭活的笼式组件的非屏蔽设备。 提供了包括笼式组件的反应和测定的一致，均匀和/或高通量处理。 提供了可用于解码可光致灭活笼式组件的蒙版多孔板。 提供了用于启动包含笼式组件的测定的方法和装置。