公开(公告)号：US20150329380A1

公开(公告)日：2015-11-19

申请号：US14650426

申请日：2013-12-09

Applicant: TROJAN TECHNOLOGIES

Inventor： Chongze Zhu ,  Yonglin Chen

IPC: C02F1/32 ,  B08B1/00

CPC classification number: C02F1/325 ,  B01J19/12 ,  B08B1/008 ,  B08B9/023 ,  C02F2201/3223 ,  C02F2201/3225 ,  C02F2201/324 ,  C02F2303/14

Abstract: There is disclosed a cleaning apparatus for a radiation source assembly in a fluid treatment system. The cleaning system comprises: a cleaning carriage comprising at least one cleaning element for contact with at least a portion of the exterior of the radiation source assembly; a rodless cylinder comprising an elongate housing having a longitudinal axis; a slidable element disposed on an exterior surface of the elongate housing, the slidable element being: (i) coupled to the cleaning carriage, and (ii) magnetically coupled to a driving element disposed within the elongate housing, the driving element comprising a friction modifying element in contact with an interior surface of the elongate housing to define a first frictional resistance in a rotational direction about the longitudinal axis and a second frictional resistance in an axial direction along the longitudinal axis, the friction modifying element configured such that the first frictional resistance is greater than the second friction resistance; and an elongate motive element coupled to the driving element.

Abstract translation: 公开了一种用于流体处理系统中的辐射源组件的清洁装置。 清洁系统包括：清洁托架，其包括用于与辐射源组件的外部的至少一部分接触的至少一个清洁元件; 无杆气缸，包括具有纵向轴线的细长壳体; 可滑动元件，其设置在所述细长壳体的外表面上，所述可滑动元件：（i）联接到所述清洁托架，以及（ii）磁耦合到设置在所述细长壳体内的驱动元件，所述驱动元件包括摩擦修正 元件，其与所述细长壳体的内表面接触以限定围绕所述纵向轴线的旋转方向上的第一摩擦阻力，以及沿着所述纵向轴线沿轴向方向的第二摩擦阻力，所述摩擦修改元件构造成使得所述第一摩擦阻力 大于第二摩擦阻力; 以及耦合到驱动元件的细长动力元件。

公开(公告)号：US20150239751A1

公开(公告)日：2015-08-27

申请号：US14424380

申请日：2012-09-05

Applicant: Soo-Tae Lee ,  Tae-Sung Pyo ,  Su-Kyu Lee

Inventor： Soo-Tae Lee ,  Tae-Sung Pyo ,  Su-Kyu Lee

IPC: C02F1/32

CPC classification number: C02F1/325 ,  B08B1/008 ,  B63J4/002 ,  C02F2103/008 ,  C02F2201/3225 ,  C02F2201/3227 ,  C02F2201/324 ,  C02F2201/326 ,  C02F2201/328

Abstract: Disclosed herein is an apparatus having a double wiper structure for sterilizing ballast water. Each wiper for use in removing foreign substances from an ultraviolet lamp has a double structure including a main wiper part and auxiliary wiper parts. The auxiliary wiper parts are disposed on opposite sides of the main wiper part so that when the wiper body is moved forward or backward, the corresponding auxiliary wiper part primarily removes foreign substances before the main wiper part wipes the ultraviolet lamp unit. Each auxiliary wiper part includes an inclined protrusion and a pointed part so that friction between the surface of the ultraviolet lamp and the auxiliary wiper part can be minimized. The main wiper part includes a first blade and a second blade that are respectively disposed on opposite sides of a depression formed in an inner circumferential surface of the main wiper part.

Abstract translation: 本文公开了具有用于对压载水进行消毒的双重擦拭器结构的装置。 用于从紫外灯去除异物的每个刮水器具有包括主擦拭器部分和辅助擦拭器部件的双重结构。 辅助擦拭器部件设置在主擦拭器部件的相对侧上，使得当刮水器主体向前或向后移动时，相应的辅助擦拭器部件在主刮具部件擦拭紫外灯单元之前主要去除异物。 每个辅助擦拭器部分包括倾斜突起和尖锐部分，使得紫外灯的表面与辅助擦拭器部件之间的摩擦力可以最小化。 主擦拭器部分包括分别设置在形成在主刮具部分的内周表面中的凹陷的相对侧上的第一刀片和第二刀片。

公开(公告)号：US20150090660A1

公开(公告)日：2015-04-02

申请号：US14503306

申请日：2014-09-30

Applicant: University of Alaska Anchorage

Inventor： Aaron Dotson

IPC: C02F1/32 ,  C02F1/44 ,  B01D69/04 ,  B01D71/04 ,  B01D61/14 ,  B01D65/02

CPC classification number: C02F1/444 ,  B01D65/02 ,  B01D65/08 ,  B01D71/02 ,  B01D2311/2619 ,  B01D2321/30 ,  B01D2321/343 ,  C02F1/325 ,  C02F1/442 ,  C02F2101/30 ,  C02F2201/003 ,  C02F2201/3223 ,  C02F2201/324 ,  C02F2303/20 ,  C02F2305/10 ,  Y10T29/49826

Abstract: In one aspect, the invention relates to a filtration apparatus comprising a tubular inorganic porous membrane and a light source disposed within the lumen of the membrane for use in, for example, enhancing oxidation of organic molecules and enhancing foulant removal. In one aspect, the invention relates to a filtration apparatus comprising a tubular porous membrane and a displacement body disposed within the lumen of the membrane. This abstract is intended as a scanning tool for purposes of searching in the particular art and is not intended to be limiting of the present invention.

Abstract translation: 一方面，本发明涉及一种过滤装置，其包括管状无机多孔膜和设置在膜的内腔内的光源，用于例如增强有机分子的氧化和增强除垢。 一方面，本发明涉及一种过滤装置，其包括管状多孔膜和设置在膜的内腔内的置换体。 该摘要旨在作为用于在特定技术中进行搜索的扫描工具，而不意在限制本发明。

公开(公告)号：US20140360947A1

公开(公告)日：2014-12-11

申请号：US14458692

申请日：2014-08-13

Applicant: TROJAN TECHNOLOGIES INC.

Inventor： WES FROM ,  BOYKO M. TCHAVDAROV ,  MIKE MARCU ,  RICHARD GRATTON ,  DAVID OLSON ,  JIM FRASER ,  DUSKO A. KEZELE

IPC: C02F1/32

CPC classification number: C02F1/325 ,  A61L2/10 ,  C02F1/006 ,  C02F1/32 ,  C02F2201/3225 ,  C02F2201/3227 ,  C02F2201/3228 ,  C02F2201/324 ,  C02F2201/328

Abstract: A fluid treatment system having an inlet, an outlet, and a fluid treatment zone therebetween. The zone has an array of rows of radiation source assemblies. Each radiation source assembly has a longitudinal axis disposed at an oblique angle with respect to a direction of fluid flow. Each row has a plurality of radiation source assemblies in spaced relation in a direction transverse to the direction of fluid flow, to define a gap through which fluid may flow between an adjacent pair of assemblies. Preferably, all rows in the array are staggered with respect to one another in a direction orthogonal to the direction of fluid flow, such that the gap between an adjacent pair of radiation source assemblies in an upstream row of assemblies is partially or completely obstructed in the direction of fluid flow by a serially disposed radiation source assembly in at least one downstream row.

Abstract translation: 一种在其间具有入口，出口和流体处理区域的流体处理系统。 该区域具有排列的辐射源组件。 每个辐射源组件具有相对于流体流动方向以倾斜角度设置的纵向轴线。 每排具有在横向于流体流动方向的方向上间隔开的多个辐射源组件，以限定一个间隙，流体可以通过该间隙在相邻的一对组件之间流动。 优选地，阵列中的所有行在与流体流动方向正交的方向上彼此交错，使得上游排组件中相邻的一对辐射源组件之间的间隙在 在至少一个下游排中通过串联设置的辐射源组件的流体流动方向。

公开(公告)号：US08679416B2

公开(公告)日：2014-03-25

申请号：US11840590

申请日：2007-08-17

Applicant: George Traubenberg ,  Douglas Penhale ,  Li-Zheng Ma

Inventor： George Traubenberg ,  Douglas Penhale ,  Li-Zheng Ma

IPC: B01J19/08

CPC classification number: C02F1/325 ,  C02F1/008 ,  C02F2201/3225 ,  C02F2201/3227 ,  C02F2201/324 ,  C02F2201/326 ,  C02F2201/328 ,  C02F2209/42

Abstract: There is described a fluid treatment system. The fluid treatment system comprises: an open channel for receiving a flow of fluid and a fluid treatment zone. The fluid treatment zone comprising a plurality of elongate radiation source assemblies orientated such that: (i) a longitudinal axis of each radiation source assembly is transverse to a direction of fluid flow through the fluid treatment zone, and (ii) an end of each radiation source assembly is disposed above a predetermined maximum height of fluid flow in the open channel. A first baffle plate is disposed upstream of the fluid treatment zone. The first baffle plate is positioned such that a distal end thereof is below the predetermined maximum height of fluid flow in the open channel. In a preferred embodiment, the present fluid treatment system provides for an area in which a cleaning system for the radiation source assemblies can be “parked” when not in use. In the so-called “parked” position, the cleaning system may be readily accessed for servicing and the like without affecting the flow of fluid through the fluid treatment zone and a fluid treatment system. This is as significant advantage of the fluid treatment system.

Abstract translation: 描述了一种流体处理系统。 流体处理系统包括：用于接收流体流的开放通道和流体处理区。 所述流体处理区包括多个细长的辐射源组件，其定向成：（i）每个辐射源组件的纵向轴线横向于通过流体处理区域的流体流动的方向，和（ii）每个辐射的末端 源组件设置在开放通道中的流体流的预定最大高度之上。 第一挡板设置在流体处理区的上游。 第一挡板被定位成使得其远端低于开放通道中流体流量的预定最大高度。 在优选实施例中，本流体处理系统提供了在不使用时用于辐射源组件的清洁系统可以“停放”的区域。 在所谓的“停放”位置，清洁系统可以容易地进行维修等，而不影响通过流体处理区和流体处理系统的流体的流动。 这是流体处理系统的显着优点。

公开(公告)号：US20130277571A1

公开(公告)日：2013-10-24

申请号：US13920327

申请日：2013-06-18

Applicant: TROJAN TECHNOLOGIES INC.

Inventor： WES FROM ,  BOYKO M. TCHAVDAROV ,  MIKE MARCU ,  RICHARD GRATTON ,  DAVID OLSON ,  JIM FRASER ,  DUSKO A. KEZELE

IPC: C02F1/32

CPC classification number: C02F1/325 ,  A61L2/10 ,  C02F1/006 ,  C02F1/32 ,  C02F2201/3225 ,  C02F2201/3227 ,  C02F2201/3228 ,  C02F2201/324 ,  C02F2201/328

Abstract: A fluid treatment system having an inlet, an outlet, and a fluid treatment zone therebetween. The zone has an array of rows of radiation source assemblies. Each radiation source assembly has a longitudinal axis disposed at an oblique angle with respect to a direction of fluid flow. Each row has a plurality of radiation source assemblies in spaced relation in a direction transverse to the direction of fluid flow, to define a gap through which fluid may flow between an adjacent pair of assemblies. Preferably, all rows in the array are staggered with respect to one another in a direction orthogonal to the direction of fluid flow, such that the gap between an adjacent pair of radiation source assemblies in an upstream row of assemblies is partially or completely obstructed in the direction of fluid flow by a serially disposed radiation source assembly in at least one downstream row.

Abstract translation: 一种在其间具有入口，出口和流体处理区域的流体处理系统。 该区域具有排列的辐射源组件。 每个辐射源组件具有相对于流体流动方向以倾斜角度设置的纵向轴线。 每排具有在横向于流体流动方向的方向上间隔开的多个辐射源组件，以限定一个间隙，流体可以通过该间隙在相邻的一对组件之间流动。 优选地，阵列中的所有行在与流体流动方向正交的方向上彼此交错，使得上游排组件中相邻的一对辐射源组件之间的间隙在 在至少一个下游排中通过串联设置的辐射源组件的流体流动方向。

公开(公告)号：US08507874B2

公开(公告)日：2013-08-13

申请号：US13437329

申请日：2012-04-02

Applicant: Wes From ,  Boyko M. Tchavdarov ,  Mike Marcu ,  Richard Gratton ,  David Olson ,  Jim Fraser ,  Dusko A. Kezele

Inventor： Wes From ,  Boyko M. Tchavdarov ,  Mike Marcu ,  Richard Gratton ,  David Olson ,  Jim Fraser ,  Dusko A. Kezele

IPC: B01J19/08

CPC classification number: C02F1/325 ,  A61L2/10 ,  C02F1/006 ,  C02F1/32 ,  C02F2201/3225 ,  C02F2201/3227 ,  C02F2201/3228 ,  C02F2201/324 ,  C02F2201/328

Abstract: A fluid treatment system having: an inlet; an outlet; and a fluid treatment zone disposed therebetween. The fluid treatment zone has: (i) an elongate first radiation source assembly having a first longitudinal axis, and (ii) an elongate second radiation source assembly having a second longitudinal axis. The first and second longitudinal axes are non-parallel to each other and to a direction of fluid flow through the treatment zone. The present fluid treatment system can treat large volumes of fluid (e.g., wastewater, drinking water or the like); it requires a relatively small “footprint”; it results in a relatively lower coefficient of drag resulting in an improved hydraulic pressure loss/gradient over the length of the treatment system; and it results in relatively lower (or no) forced oscillation of the radiation sources thereby mitigating breakage of the radiation source and/or protective sleeve (if present).

Abstract translation: 一种流体处理系统，具有：入口; 一个出口 以及设置在其间的流体处理区。 流体处理区具有：（i）具有第一纵向轴线的细长的第一辐射源组件，和（ii）具有第二纵向轴线的细长的第二辐射源组件。 第一和第二纵向轴线彼此不平行，并且流过流经处理区域的流体的方向。 本流体处理系统可以处理大量流体（例如，废水，饮用水等）; 它需要相对较小的“足迹”; 它导致相对较低的阻力系数导致在处理系统的长度上改善的液压损失/梯度; 并且其导致辐射源的相对较低（或不）强制振荡，从而减轻辐射源和/或保护套筒（如果存在）的破坏。

公开(公告)号：US20120318376A1

公开(公告)日：2012-12-20

申请号：US13509448

申请日：2010-11-10

Applicant: George Traubenberg ,  Allan Archer ,  Cristian Moglan

Inventor： George Traubenberg ,  Allan Archer ,  Cristian Moglan

IPC: B08B1/00

CPC classification number: B08B1/008 ,  B08B9/023 ,  C02F1/325 ,  C02F2201/3225 ,  C02F2201/3227 ,  C02F2201/324 ,  Y10T137/4238

Abstract: There is described a cleaning apparatus for a surface (e.g., a radiation source assembly) in a fluid treatment system. A preferred embodiment of the cleaning apparatus comprises: a wiping element for contact with at least a portion of the surface; at least one cutting element connected to the wiping element for cutting elongate debris in contact with the surface; and a motive element for moving the carriage between a first position and a second position. This preferred embodiment of the present cleaning apparatus is particularly advantageous for removing elongate debris from one or more radiation source assemblies disposed in the fluid treatment system. The approach utilized in this preferred embodiment of the present cleaning apparatus is to include at least one cutting element which is moved along the exterior of the radiation source assembly. The cutting element is connected to a wiping element that is translated between a first position and a second position. As the wiping element is moved from the first position to the second position, it will tend to push the elongate debris toward a distal portion of the radiation source assembly. During this translation step, it is possible that some of the debris may be cut by the cutting element. As the wiping element approaches the distal portion of the radiation source assembly, it will tend to clamp down on the elongate debris and, as the force of movement is continually applied, the cutting element will cut the elongate debris. Once the elongate debris is cut, it will more readily fall away from the radiation source assembly and this action is facilitated by a flow of fluid past the radiation source assembly.

Abstract translation: 在流体处理系统中描述了用于表面（例如，辐射源组件）的清洁装置。 清洁装置的优选实施例包括：用于与表面的至少一部分接触的擦拭元件; 连接到所述擦拭元件的至少一个切割元件，用于切割与所述表面接触的细长碎片; 以及用于在第一位置和第二位置之间移动托架的动力元件。 本清洁装置的该优选实施例对于从设置在流体处理系统中的一个或多个辐射源组件移除细长碎片是特别有利的。 本清洁装置的该优选实施例中采用的方法是包括沿着辐射源组件的外部移动的至少一个切割元件。 切割元件连接到在第一位置和第二位置之间平移的擦拭元件。 当擦拭元件从第一位置移动到第二位置时，它将倾向于将细长碎片推向辐射源组件的远端部分。 在该平移步骤期间，有些碎片可能被切割元件切割。 当擦拭元件接近辐射源组件的远端部分时，它将倾向于夹紧在细长碎片上，并且随着移动力被连续施加，切割元件将切割细长碎片。 一旦细长的碎片被切割，它将更容易地从辐射源组件脱落，并且通过流过该辐射源组件的流体促进了该作用。

公开(公告)号：US08293185B2

公开(公告)日：2012-10-23

申请号：US13129071

申请日：2009-11-10

Applicant: John Michael Baron

Inventor： John Michael Baron

IPC: C02F1/32

CPC classification number: C02F1/325 ,  B01F5/0615 ,  B01F13/0001 ,  B01F13/001 ,  B01J19/006 ,  B01J19/123 ,  B01J2219/0877 ,  B01J2219/0892 ,  B01J2219/182 ,  C02F2201/3227 ,  C02F2201/324 ,  C02F2201/328

Abstract: A method and an apparatus are described for use in the irradiation of fluids. The apparatus has an elongate conduit (312) having a central axis (334) and two or more elongate ultraviolet radiation sources (114) extending along the interior of the conduit for irradiation of the fluid within the conduit. An array of static mixer elements (300) is located within the conduit, and the two or more elongate ultraviolet radiation sources (114) are arranged to extend through apertures in deflection surfaces of the static mixer elements making up the array (300). The apparatus and method allows for reliable and uniform ultraviolet irradiation of fluids of low UV transmissivity, such as turbid fluids, particularly for ultraviolet disinfection of such fluids. Wipers may be fitted to the static mixer elements to enable relative movement between the static mixer elements and the surfaces of the elongate ultraviolet radiation sources to clean the surfaces of the sources without need to dismantle the apparatus.

Abstract translation: 描述了用于流体照射的方法和装置。 该装置具有细长的导管（312），该导管具有中心轴线（334）和两个或更多个细长的紫外线辐射源（114），沿着管道内部延伸，用于照射导管内的流体。 一组静态混合器元件（300）位于导管内，并且两个或多个细长的紫外线辐射源（114）被布置成延伸穿过构成阵列（300）的静态混合器元件的偏转表面中的孔。 该装置和方法允许对紫外线透射率低的流体（例如混浊流体）进行可靠和均匀的紫外线照射，特别是用于这种流体的紫外线消毒。 刮水器可以安装到静态混合器元件上，以使得静态混合器元件和细长紫外线辐射源的表面之间能够相对移动，以清洁源的表面，而不需要拆卸设备。

公开(公告)号：US20120181446A1

公开(公告)日：2012-07-19

申请号：US13386615

申请日：2010-07-23

Applicant: Joseph Elku ,  Douglas Penhale

Inventor： Joseph Elku ,  Douglas Penhale

IPC: B08B3/02 ,  G21K5/00 ,  B08B3/04

CPC classification number: C02F1/325 ,  C02F2201/3225 ,  C02F2201/3227 ,  C02F2201/324

Abstract: There is disclosed a cleaning apparatus for a radiation source assembly in a fluid treatment system. The clean apparatus comprises a cleaning sleeve moveable to remove fouling materials from an exterior portion of the radiation source assembly, the cleaning sleeve comprising at least one chamber for receiving a cleaning fluid and a cleaning sleeve inlet in fluid communication with the at least one chamber and a first conduit element for conveying the cleaning fluid to the cleaning sleeve inlet, the first conduit element being configured such that a distal portion of the first conduit element is in fluid communication with the cleaning sleeve inlet and a proximal portion of the first conduit element is disposed outside of fluid being treated in the fluid treatment system.

Abstract translation: 公开了一种用于流体处理系统中的辐射源组件的清洁装置。 清洁装置包括可移动以从辐射源组件的外部部分去除结垢材料的清洁套筒，所述清洁套筒包括用于接收清洁流体的至少一个腔室和与所述至少一个腔室流体连通的清洁套筒入口， 用于将清洁流体输送到清洁套筒入口的第一管道元件，第一管道元件构造成使得第一管道元件的远端部分与清洁套筒入口流体连通，并且第一管道元件的近端部分是 设置在流体处理系统中被处理的流体外部。