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1.发明公开公开(公告)号：US20240327250A1
公开(公告)日：2024-10-03
申请号：US18744224
申请日：2024-06-14
Applicant: Nicolas MEUDAL
Inventor： Nicolas MEUDAL
CPC classification number: C02F1/325 , C02F1/004 , C02F1/725 , C02F1/78 , C02F2201/007 , C02F2201/3225 , C02F2201/3227 , C02F2201/3228 , C02F2201/782 , C02F2303/04 , C02F2305/10
Abstract: Device for treating aqueous effluents comprising:
A tank,
A rotary filter arranged in the tank to carry out an aqueous effluent filtration operation,
At least one UV lamp disposed in the tank so as to be immersed in the filtered aqueous effluent,
At least one catalyst element arranged to be illuminated by the UV lamp and fixed in the tank so as to be immersed in the aqueous effluents and/or fixed on the rotary filter.-
公开(公告)号：US20240150204A1
公开(公告)日：2024-05-09
申请号：US18416999
申请日：2024-01-19
Applicant: Waterdrape, LLC
Inventor： John B. Hayden , Sapanbir S. Thind
IPC: C02F1/467 , C02F1/32 , C02F1/461 , C02F101/30 , C02F101/36 , C02F103/08 , C02F103/42
CPC classification number: C02F1/4672 , C02F1/325 , C02F1/46109 , C02F2001/46142 , C02F2001/46157 , C02F2001/46171 , C02F2101/308 , C02F2101/36 , C02F2103/08 , C02F2103/42 , C02F2201/3222 , C02F2201/3223 , C02F2201/3225 , C02F2303/04
Abstract: Methods and systems for the purification of an aqueous solution comprising a photocatalyst employed as an anode and a cathode in communication with an electrolyte to achieve a current flow wherein a charge is applied between the cathode and the photocatalytic excited anode a corresponding increase in electron-hole pairs occurs.
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3.发明申请公开(公告)号：US20180147314A1
公开(公告)日：2018-05-31
申请号：US15864095
申请日：2018-01-08
CPC classification number: A61L9/205 , A61L2/10 , A61L2209/11 , C02F1/32 , C02F1/325 , C02F2201/3222 , C02F2201/3225 , C02F2201/3227 , C02F2201/3228 , C02F2201/326 , C02F2201/328 , C02F2209/11 , C02F2303/04 , C02F2305/10 , G01N21/031 , G01N21/33 , G01N21/5907 , G01N2201/065
Abstract: A system for disinfecting a fluid, including: a flow cell including one or more inlet ports and one or more outlet ports, wherein the flow cell is configured to communicate a fluid containing a biological contaminant from the one or more inlet ports to the one or more outlet portions through an interior portion thereof; and one or more point radiation sources disposed about the flow cell, wherein the one or more point radiation sources are operable for delivering radiation to the biological contaminant; wherein an interior surface of the flow cell is operable for reflecting the radiation delivered to the biological contaminant by the one or more point radiation sources; and wherein the interior surface of the flow cell is operable for reflecting the radiation delivered to the biological contaminant by the one or more point radiation sources such that a radiation intensity is uniform throughout the interior portion of the flow cell. In one exemplary embodiment, the flow cell is an integrating sphere. Optionally, the system also includes a photocatalyzing material disposed on at least a portion of the interior surface of the flow cell.
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4.发明申请公开(公告)号：US20170291831A1
公开(公告)日：2017-10-12
申请号：US15478572
申请日：2017-04-04
Applicant: Hydro-Photon, Inc.
Inventor： Miles Maiden , Aaron M. Cox , Karen C. Milliken
IPC: C02F1/32
CPC classification number: C02F1/325 , C02F1/002 , C02F2201/006 , C02F2201/008 , C02F2201/009 , C02F2201/3221 , C02F2201/3222 , C02F2201/3225 , C02F2201/3227 , C02F2201/3228 , C02F2303/04 , C02F2303/14 , C02F2307/02 , Y02A20/212
Abstract: A water purification system includes one or more UV light sources that produce germicidal UV light and provide the UV light to a given amount of fluid contained in a chamber as a batch or as flowing through the chamber. An inner surface of the chamber, that may be reflective, is coated with a thin plastic film, such as polypropylene, that is highly transmissive to UV germicidal light. The thin plastic film separates the inner surface from the fluid, and the UV light passes through the thin plastic film to reach the fluid that is being purified in the chamber. The thin plastic film may be melted at relatively low temperatures to provide heat sealing of the surface to produce the chamber. Alternatively, the thin plastic film may be readily shaped as a bag or pipe that contains or directs fluid flow.
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公开(公告)号：US20170290943A1
公开(公告)日：2017-10-12
申请号：US15631050
申请日：2017-06-23
Applicant: Edward Brittain Stokes , Jennifer Godwin Pagan , Thomas Andrew Schmedake
CPC classification number: A61L9/205 , A61L2/10 , A61L2209/11 , C02F1/32 , C02F1/325 , C02F2201/3222 , C02F2201/3225 , C02F2201/3227 , C02F2201/3228 , C02F2201/326 , C02F2201/328 , C02F2209/11 , C02F2303/04 , C02F2305/10 , G01N21/031 , G01N21/33 , G01N21/5907 , G01N2201/065
Abstract: A system for disinfecting a fluid, including: a flow cell including one or more inlet ports and one or more outlet ports, wherein the flow cell is configured to communicate a fluid containing a biological contaminant from the one or more inlet ports to the one or more outlet portions through an interior portion thereof; and one or more point radiation sources disposed about the flow cell, wherein the one or more point radiation sources are operable for delivering radiation to the biological contaminant; wherein an interior surface of the flow cell is operable for reflecting the radiation delivered to the biological contaminant by the one or more point radiation sources; and wherein the interior surface of the flow cell is operable for reflecting the radiation delivered to the biological contaminant by the one or more point radiation sources such that a radiation intensity is uniform throughout the interior portion of the flow cell. In one exemplary embodiment, the flow cell is an integrating sphere. Optionally, the system also includes a photocatalyzing material disposed on at least a portion of the interior surface of the flow cell.
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Patent Agency Ranking
公开(公告)号：US20170240263A1
公开(公告)日：2017-08-24
申请号：US15504442
申请日：2015-07-02
Applicant: SUMITOMO ELECTRIC INDUSTRIES, LTD.
Inventor： Shinichi KANAZAWA , Satoshi YAHAGI , Munetsugu UEYAMA , Kazuhiro TANIDA
CPC classification number: B63J4/002 , B01D33/06 , B01D33/11 , B01D39/16 , B01D2239/1291 , B01J19/12 , B01J2219/0877 , B63B13/00 , C02F1/32 , C02F1/325 , C02F2103/008 , C02F2201/3225 , C02F2201/326 , C02F2303/04 , Y02W10/37
Abstract: A ballast water treatment device includes a filtration device and an irradiation device that irradiates, with ultraviolet rays, filtered water that has been filtered. The filtration device is a device that removes 99.999% or more of L-size organisms having a minimum part size of 50 μm or more, and 90% or more of S-size organisms having a minimum part size of 10 μm or more and less than 50 μm. The irradiation device is capable of sterilizing the filtered water at a flow rate of 250 m3/h and a power consumption of 13 kW to eliminate 90% of S-size organisms immediately after a sterilization treatment.
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公开(公告)号：US09533060B2
公开(公告)日：2017-01-03
申请号：US13380676
申请日：2010-06-30
Applicant: Douglas Penhale , Joseph Elku
Inventor： Douglas Penhale , Joseph Elku
CPC classification number: A61L2/10 , A61L2202/11 , C02F1/325 , C02F2201/004 , C02F2201/3225 , C02F2201/3227 , H01J9/003 , H01J61/28 , H01J61/523
Abstract: There is described In another of its aspects, the present invention provides a radiation source assembly comprising: (i) an elongate radiation source; (ii) a positioning element connected to a proximal portion of the elongate radiation source; and (iii) a connecting portion secured to a proximal portion of the positioning element and configured to engage a support element to maintain a distal portion of the elongate radiation source in a cantilevered position. The present radiation source assembly is configured such that the distal portion of the radiation source is cantilevered with the respect to the distal portion of the protective sleeve in which it is disposed. This feature obviates the need to use spacers, stops, springs and the like in a distal portion of the protective sleeve to maintain correct position of the radiation source within the protective sleeve. Further, the present radiation source assembly is advantageous in that allows for withdrawal of the radiation source from the radiation source assembly without the need to disengage all of the components. Thus, it is possible to replace a single radiation source by removing it from the protective sleeve during operation of the fluid treatment system. This operation can be accomplished quickly without the need to shut down the fluid treatment system or otherwise compensate for the fact that one of the radiation source is being serviced.
Abstract translation: 在其另一方面，本发明提供了一种辐射源组件，其包括：（i）细长辐射源; （ii）连接到所述细长辐射源的近端部分的定位元件; 和（iii）固定到所述定位元件的近端部分并被构造成接合支撑元件以将所述细长辐射源的远侧部分保持在悬臂位置的连接部分。 本辐射源组件被配置为使得辐射源的远端部分相对于其所配置的保护套筒的远端部分是悬臂的。 该特征避免了在保护套管的远端部分中使用间隔件，止动件，弹簧等以保持辐射源在保护套筒内的正确位置的需要。 此外，本辐射源组件的优点在于允许辐射源从辐射源组件中取出，而不需要使所有部件脱离。 因此，可以在流体处理系统的操作期间将其从保护套筒中取出来替换单个辐射源。 该操作可以快速完成，而不需要关闭流体处理系统或以其他方式补偿辐射源中的一个被维修的事实。
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8.发明授权Apparatus for treating ballast water with ultraviolet rays, having double wiper structure 有权用紫外线处理压载水的设备，具有双重刮水器结构公开(公告)号：US09321657B2
公开(公告)日：2016-04-26
申请号：US14424380
申请日：2012-09-05
Applicant: Soo-Tae Lee , Tae-Sung Pyo , Su-Kyu Lee
Inventor： Soo-Tae Lee , Tae-Sung Pyo , Su-Kyu Lee
IPC: B63J4/00 , C02F1/32 , C02F1/00 , B08B1/00 , C02F103/00
CPC classification number: C02F1/325 , B08B1/008 , B63J4/002 , C02F2103/008 , C02F2201/3225 , C02F2201/3227 , C02F2201/324 , C02F2201/326 , C02F2201/328
Abstract: Disclosed herein is an apparatus having a double wiper structure for sterilizing ballast water. Each wiper for use in removing foreign substances from an ultraviolet lamp has a double structure including a main wiper part and auxiliary wiper parts. The auxiliary wiper parts are disposed on opposite sides of the main wiper part so that when the wiper body is moved forward or backward, the corresponding auxiliary wiper part primarily removes foreign substances before the main wiper part wipes the ultraviolet lamp unit. Each auxiliary wiper part includes an inclined protrusion and a pointed part so that friction between the surface of the ultraviolet lamp and the auxiliary wiper part can be minimized. The main wiper part includes a first blade and a second blade that are respectively disposed on opposite sides of a depression formed in an inner circumferential surface of the main wiper part.
Abstract translation: 本文公开了具有用于对压载水进行消毒的双重擦拭器结构的装置。 用于从紫外灯去除异物的每个刮水器具有包括主擦拭器部分和辅助擦拭器部件的双重结构。 辅助擦拭器部件设置在主擦拭器部件的相对侧上，使得当刮水器主体向前或向后移动时，相应的辅助擦拭器部件在主刮具部件擦拭紫外灯单元之前主要去除异物。 每个辅助擦拭器部分包括倾斜突起和尖锐部分，使得紫外灯的表面与辅助擦拭器部件之间的摩擦力可以最小化。 主擦拭器部分包括分别设置在形成在主刮具部分的内周表面中的凹陷的相对侧上的第一刀片和第二刀片。
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公开(公告)号：US20150329380A1
公开(公告)日：2015-11-19
申请号：US14650426
申请日：2013-12-09
Applicant: TROJAN TECHNOLOGIES
Inventor： Chongze Zhu , Yonglin Chen
CPC classification number: C02F1/325 , B01J19/12 , B08B1/008 , B08B9/023 , C02F2201/3223 , C02F2201/3225 , C02F2201/324 , C02F2303/14
Abstract: There is disclosed a cleaning apparatus for a radiation source assembly in a fluid treatment system. The cleaning system comprises: a cleaning carriage comprising at least one cleaning element for contact with at least a portion of the exterior of the radiation source assembly; a rodless cylinder comprising an elongate housing having a longitudinal axis; a slidable element disposed on an exterior surface of the elongate housing, the slidable element being: (i) coupled to the cleaning carriage, and (ii) magnetically coupled to a driving element disposed within the elongate housing, the driving element comprising a friction modifying element in contact with an interior surface of the elongate housing to define a first frictional resistance in a rotational direction about the longitudinal axis and a second frictional resistance in an axial direction along the longitudinal axis, the friction modifying element configured such that the first frictional resistance is greater than the second friction resistance; and an elongate motive element coupled to the driving element.
Abstract translation: 公开了一种用于流体处理系统中的辐射源组件的清洁装置。 清洁系统包括：清洁托架，其包括用于与辐射源组件的外部的至少一部分接触的至少一个清洁元件; 无杆气缸，包括具有纵向轴线的细长壳体; 可滑动元件，其设置在所述细长壳体的外表面上，所述可滑动元件：（i）联接到所述清洁托架，以及（ii）磁耦合到设置在所述细长壳体内的驱动元件，所述驱动元件包括摩擦修正 元件，其与所述细长壳体的内表面接触以限定围绕所述纵向轴线的旋转方向上的第一摩擦阻力，以及沿着所述纵向轴线沿轴向方向的第二摩擦阻力，所述摩擦修改元件构造成使得所述第一摩擦阻力 大于第二摩擦阻力; 以及耦合到驱动元件的细长动力元件。
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公开(公告)号：US09174858B2
公开(公告)日：2015-11-03
申请号：US12514894
申请日：2007-11-06
Applicant: Li Zheng Ma , George Traubenberg , Douglas Penhale
Inventor： Li Zheng Ma , George Traubenberg , Douglas Penhale
IPC: C02F1/32
CPC classification number: C02F1/325 , C02F2201/3225 , C02F2201/3227 , C02F2201/328
Abstract: In one of its aspects, the present invention relates to a fluid treatment system comprising: an inlet; an outlet; a fluid treatment zone disposed between the inlet and the outlet. The fluid treatment zone: (i) comprises a first wall surface and a second wall surface opposed to the first wall surface, and (ii) having disposed therein at least one array of rows of radiation source assemblies. Each radiation source assembly has a longitudinal axis transverse to a direction of fluid flow through the fluid treatment zone and each of the first wall surface and the second wall surface comprises a first fluid deflector element and a second fluid deflector element. The first fluid deflector element projecting into the fluid treatment zone to a greater extent than the second fluid deflector element.
Abstract translation: 在其一个方面，本发明涉及一种流体处理系统，包括：入口; 一个出口 设置在入口和出口之间的流体处理区。 流体处理区：（i）包括与第一壁表面相对的第一壁表面和第二壁表面，和（ii）在其中设置有至少一排辐射源组件的阵列。 每个辐射源组件具有横向于流过流体处理区的流体流动方向的纵向轴线，并且第一壁表面和第二壁表面中的每一个包括第一流体偏转器元件和第二流体偏转器元件。 所述第一流体导流元件比所述第二流体导流元件突出到所述流体处理区域更大的程度。
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