公开(公告)号：US5977000A

公开(公告)日：1999-11-02

申请号：US977887

申请日：1997-11-25

Applicant: Tatsuhiro Sato ,  Akira Fujinoki ,  Kyoichi Inaki ,  Nobumasa Yoshida ,  Tohru Yokota

Inventor： Tatsuhiro Sato ,  Akira Fujinoki ,  Kyoichi Inaki ,  Nobumasa Yoshida ,  Tohru Yokota

IPC: C03B5/02 ,  C03B5/08 ,  C03B19/09 ,  C03B20/00 ,  C03C3/06 ,  C03C4/08 ,  C03C11/00

CPC classification number: C03B5/08 ,  C03B19/09 ,  C03B20/00 ,  C03B5/021 ,  C03C3/06 ,  C03C2201/02 ,  C03C2201/80 ,  Y10S501/904 ,  Y10S501/905 ,  Y10T428/249969

Abstract: Opaque silica glass having a density of 2.0 to 2.18 g/cm.sup.3, sodium and potassium elements concentrations in the silica glass of each 0.5 ppm or less and an OH group concentration of 30 ppm or less, and containing bubbles which are independent bubbles having the following physical values: a bubble diameter of 300 .mu.m or less, and a bubble density of 100,000 to 1,000,000 bubbles/cm.sup.3, and a production process for opaque silica glass, including: filling quartz raw material grain having a particle size of 10 to 350 .mu.m in a heat resistant mold, heating it in a non-oxidizing atmosphere from a room temperature up to a temperature lower by 50 to 150.degree. C. than a temperature at which the above raw material grain is melted at a temperature-raising speed not exceeding 50.degree. C./minute, then, slowly heating it up to a temperature higher by 10 to 80.degree. C. than the temperature at which the quartz raw material grain is melted at the speed of 10.degree. C./minute or less, and cooling after maintaining at the above temperature.

Abstract translation: 密度为2.0〜2.18g / cm 3的不透明二氧化硅玻璃，二氧化硅玻璃中的钠和钾元素浓度为0.5ppm以下，OH基浓度为30ppm以下，并且含有具有以下的独立气泡的气泡 物理值：气泡直径为300μm以下，气泡密度为100,000〜1,000,000个气泡/ cm 3，以及不透明石英玻璃的制造方法，其特征在于，填充粒径为10〜350μm的石英原料粒子 在耐热模具中，将其在非氧化性气氛中从室温加热到低于50-150℃的温度，而不是以不升温速度将上述原料颗粒熔化的温度 超过50℃/分钟，然后缓慢加热至高于10℃至80℃的温度，高于石英原料颗粒以10℃/分钟或更低的速度熔化的温度， 并保持冷却 在上述温度下。

公开(公告)号：US5736206A

公开(公告)日：1998-04-07

申请号：US640759

申请日：1996-05-07

Applicant: Wolfgang Englisch ,  Stephan Moritz ,  Dietmar Hellmann

Inventor： Wolfgang Englisch ,  Stephan Moritz ,  Dietmar Hellmann

IPC: C03B20/00 ,  B22C9/12 ,  B28B1/26 ,  C03B19/06 ,  C03C3/06 ,  C03C11/00 ,  C03C17/02 ,  C04B33/28 ,  C04B35/14 ,  C30B35/00 ,  G01J1/42 ,  B01J3/00 ,  H01L21/02

CPC classification number: C03C17/02 ,  B22C9/12 ,  C03B19/06 ,  C03B19/066 ,  C03B20/00 ,  C03C11/00 ,  C03C3/06 ,  C30B35/002 ,  G01J1/429 ,  C03B2201/23 ,  C03C2201/02 ,  C03C2201/80 ,  C03C2203/52 ,  Y10T428/131 ,  Y10T428/1317

Abstract: Molded bodies of quartz glass have at least one surface area of transparent quartz glass, the exposed surfaces of which are smooth and which have a surface microroughness of less than 8 .mu.m. The base material has a chemical purity of at least 99.9% and a cristobalite content of no more than 1%; is gas-impermeable and opaque; and contains pores. At a wall thickness of 1 mm, the base material has a nearly uniform direct spectral transmission of less than 10% in the wavelength range of .lambda.=190-2,650 nm; and which has a density of at least 2.215 g/cm.sup.3. The transparent surface area is formed from base material by heating it to a temperature above 1,650.degree. C. The thickness of the transparent layer is at least 0.5 mm, and its direct spectral transmission in the wavelength range of .lambda.=6001-2,650 nm is at least 60% for a layer thickness of 1 mm.

Abstract translation: PCT No.PCT / EP94 / 03722 Sec。 371日期：1996年5月7日 102（e）日期1996年5月7日PCT 1994年11月10日PCT PCT。 公开号WO95 / 13248 日期1995年5月18日石英玻璃体的模体具有透明石英玻璃的至少一个表面积，其露出表面光滑，表面微粗糙度小于8μm。 基材的化学纯度为99.9％以上，方石方含量不超过1％。 是不透气和不透明的; 并含有毛孔。 在壁厚为1mm的情况下，基材在λ= 190-2,650nm的波长范围内具有小于10％的几乎均匀的直接光谱透射; 并且其密度为至少2.215g / cm 3。 透明表面积由基材通过加热至1650℃以上而形成。透明层的厚度至少为0.5mm，其在λ= 6001-2,650nm的波长范围内的直接光谱透过率为 对于层厚为1mm，最少为60％。

公开(公告)号：US5063003A

公开(公告)日：1991-11-05

申请号：US436890

申请日：1989-11-15

Applicant: Carlos Gonzalez-Oliver

Inventor： Carlos Gonzalez-Oliver

IPC: C03B8/02 ,  C03B19/06 ,  C03B19/10 ,  C03B19/12 ,  C03B20/00 ,  C03B32/00 ,  C03C1/00 ,  C03C3/06 ,  B29B9/00 ,  C01B33/12

CPC classification number: C03C3/06 ,  C03B19/06 ,  C03B19/066 ,  C03B19/1065 ,  C03B20/00 ,  C03B32/00 ,  C03C1/006 ,  C03C2201/02 ,  C03C2203/26

Abstract: The method involves prehydrolysing alkoxysilanes and atomizing to droplets which are then cured to hardened beads with no or very low porosity and narrow size distribution by slurrying with aqueous ammonia. The cured beads are mixed with binders and the resulting pastes are compacted to green forms; the greens are sintered to fused silica-like objects at temperatures significantly lower than the melting of silica.

公开(公告)号：US5004488A

公开(公告)日：1991-04-02

申请号：US331692

申请日：1989-03-20

Applicant: Vikram P. Mehrotra ,  Ray E. Barker

Inventor： Vikram P. Mehrotra ,  Ray E. Barker

IPC: C01B33/12 ,  C03B19/10 ,  C03B20/00 ,  C03C3/06 ,  C03C12/00

CPC classification number: C03C12/00 ,  C03B19/102 ,  C03C3/06 ,  C03C2201/02 ,  C03C2203/50

Abstract: High purity fused silica particles are made by heating relatively low density silica flour in a high temperature flame. The silica flour feed rate, flame temperature, and collection zone temperature are adjusted to produce an aggregate of surface-bonded fused silica particles. The aggregate is shaped like a honeycomb and can be ground autogenously without introducing impurities into the final product.

公开(公告)号：US4883521A

公开(公告)日：1989-11-28

申请号：US249317

申请日：1988-09-26

Applicant: Takaaki Shimizu ,  Syuji Tanaka

Inventor： Takaaki Shimizu ,  Syuji Tanaka

IPC: C03B8/02 ,  C03C1/00 ,  C03C3/06 ,  C03B37/016

CPC classification number: C03C3/06 ,  C03C1/006 ,  C03C2201/02 ,  C03C2203/26 ,  C03C2203/32 ,  Y10S65/901

Abstract: An improved sol-gel method is proposed for the preparation of a transparent silica gel block, in which a deposit of fine silica particles having a controlled particle diameter as prepared by hydrolyzing an alkoxy silane in the presence of ammonia is dispersed in a silica sol solution prepared in an acidic condition and settled therein to form a structure of closest-packing prior to gelation, drying, sintering and vitrification so that silica glass blocks can be obtained with low volume shrinkage from the wet gel in an improved yield without cracks, bubbles and haziness. The improvement can be further enhanced when two separately prepared deposits of silica particles having larger and smaller particle diameters are dispersed as combined in the silica sol solution, especially, when the particle diameter in one deposit is not exceeding 22.5% of that in the other deposit.

公开(公告)号：US4801318A

公开(公告)日：1989-01-31

申请号：US8226

申请日：1987-01-29

Applicant: Motoyuki Toki ,  Sadao Kanbe ,  Satoru Miyashita ,  Tetsuhiko Takeuchi

Inventor： Motoyuki Toki ,  Sadao Kanbe ,  Satoru Miyashita ,  Tetsuhiko Takeuchi

IPC: C03B8/02 ,  C03B19/12 ,  C03C1/00 ,  C03C3/06 ,  C03B19/06

CPC classification number: C03C1/006 ,  C03B19/12 ,  C03C3/06 ,  C03C2201/02 ,  C03C2203/26 ,  C03C2203/34 ,  Y02P40/57 ,  Y10S65/901

Abstract: In a forming a silica glass at low temperature, a fumed silica is added to a hydrolyzed solution of a metal alcoxide. 0.2-5 mol of fumed silica is added to 1 mol of metal alcoxide. Being uniformly dispersed, the solution is gelled and dried to be dry gel and then sintered to be non-porous. This process allows a practically large sized silica glass to be materialized which has been impossible by the previous sol-gel technology. In addition, a further large silica glass can be prepared by adjusting pH value to 3-6 with addition of base in the sol solution.

公开(公告)号：US4419115A

公开(公告)日：1983-12-06

申请号：US288788

申请日：1981-07-31

Applicant: David W. Johnson, Jr. ,  John B. MacChesney ,  Eliezer M. Rabinovich

Inventor： David W. Johnson, Jr. ,  John B. MacChesney ,  Eliezer M. Rabinovich

IPC: C03B8/02 ,  C03B19/12 ,  C03B37/016 ,  C03C1/00 ,  C03C3/06 ,  C03C13/04 ,  G02B6/00 ,  C03B37/01 ,  C03B19/06

CPC classification number: C03C3/06 ,  C03B19/12 ,  C03B37/016 ,  C03C1/006 ,  C03C2201/02 ,  C03C2201/10 ,  C03C2201/28 ,  C03C2201/31 ,  C03C2203/22 ,  Y10S65/901

Abstract: High-silica glasses are formed by sintering a dried gel at temperatures below the liquidus. The gel may be formed by mixing colloidal silica particles or silica-containing liquids with appropriate liquids. Fragmentation of the gel during drying is advantageously avoided by redispersing the dried gel or sol in a liquid to yield a colloidal suspension which is then gelled, dried, and finally sintered below the liquidus.

Abstract translation: 通过在低于液相线的温度下烧结干燥的凝胶来形成高二氧化硅玻璃。 可以通过将胶体二氧化硅颗粒或含二氧化硅的液体与适当的液体混合来形成凝胶。 通过将干燥的凝胶或溶胶再分散在液体中以产生胶体悬浮液，有利地避免了干燥期间凝胶的碎裂，然后将其胶凝，干燥，最后在液相线下方烧结。

公开(公告)号：US4317668A

公开(公告)日：1982-03-02

申请号：US226876

申请日：1981-01-21

Applicant: Kenzo Susa ,  Iwao Matsuyama ,  Shin Satoh ,  Tsuneo Suganuma

Inventor： Kenzo Susa ,  Iwao Matsuyama ,  Shin Satoh ,  Tsuneo Suganuma

IPC: C03B8/02 ,  C03B19/12 ,  C03B20/00 ,  C03B37/014 ,  C03B37/016 ,  C03C3/06 ,  G02B6/00 ,  C03B19/06 ,  C01B33/12

CPC classification number: C03B19/12 ,  C03B37/016 ,  C03C3/06 ,  C03C2201/02 ,  C03C2203/26 ,  C03C2203/50 ,  Y10S65/901

Abstract: A method for producing silica glass wherein a dry silica gel subjected to a water desorption treatment and a carbon removal treatment is heated and has its temperature raised in an atmosphere containing chlorine, to perform a hydroxyl group removal treatment, the resultant silica gel is thereafter heated to a temperature of approximately 1,000.degree. C.-1,100.degree. C. in an atmosphere containing at least 1% of oxygen, to perform a chlorine removal treatment, and the resultant silica gel is further heated to a temperature of 1,050.degree. C.-1,300.degree. C. in He or in vacuum, to perform a sintering treatment. The silica glass thus produced does not form bubbles even when heated to high temperatures of or above 1,300.degree. C. Therefore, it is easily worked and it is free from the lowering of transparency attributed to the bubble formation.

Abstract translation: 将经过水解吸处理和除碳处理的干燥硅胶加热并在含氯气氛中升温的硅石玻璃的制造方法进行羟基去除处理，然后将所得硅胶加热 在含有至少1％氧气的气氛中温度为约1000℃-111℃，进行除氯处理，所得硅胶进一步加热至1050℃-1.300℃ 在He中或在真空中进行烧结处理。 即使加热到1300℃以上的高温，这样制造的石英玻璃也不会形成气泡。因此，容易加工，并且不会降低由于气泡形成引起的透明度。

公开(公告)号：US4200681A

公开(公告)日：1980-04-29

申请号：US959586

申请日：1978-11-13

Applicant: Walter L. Hall ,  James S. Humphrey, Jr.

Inventor： Walter L. Hall ,  James S. Humphrey, Jr.

IPC: B29D11/00 ,  B32B17/10 ,  C03C3/06 ,  C03C27/12 ,  C08J7/04 ,  C23C14/02 ,  C23C14/10 ,  B32B27/30 ,  B32B27/06 ,  B32B27/08

CPC classification number: C23C14/10 ,  B29D11/00865 ,  C03C3/06 ,  C08J7/045 ,  C23C14/024 ,  C03C2201/02 ,  C03C2201/06 ,  C03C2203/40 ,  C08J2369/00 ,  Y10T428/31507 ,  Y10T428/31645

Abstract: An abrasion, scratch, mar and solvent resistant glass coated non-opaque shaped polycarbonate article comprising a polycarbonate substrate having deposited on the surface thereof (i) an intermediate primer layer containing the photoreaction products of certain polyfunctional acrylic monomers; and (ii) a top layer of vapor deposited glass.

Abstract translation: 包括具有沉积在其表面上的聚碳酸酯基材的耐磨损，耐擦伤，耐磨和耐溶剂的玻璃涂层的非不透明形聚碳酸酯制品（i）含有某些多官能丙烯酸类单体的光反应产物的中间底漆层; 和（ii）蒸镀玻璃顶层。

公开(公告)号：US4113844A

公开(公告)日：1978-09-12

申请号：US733400

申请日：1976-10-18

Applicant: Tadashi Tokimoto ,  Kazumasa Kawaguchi ,  Junji Izawa ,  Yoshinobu Hiraishi

Inventor： Tadashi Tokimoto ,  Kazumasa Kawaguchi ,  Junji Izawa ,  Yoshinobu Hiraishi

IPC: C03B37/018 ,  C03B19/14 ,  C03B37/014 ,  C03C3/06 ,  G02B6/00 ,  C01B33/12

CPC classification number: C03B37/0142 ,  C03B19/1423 ,  C03C3/06 ,  C03B2207/06 ,  C03B2207/20 ,  C03B2207/26 ,  C03B2207/32 ,  C03B2207/36 ,  C03B2207/60 ,  C03B2207/62 ,  C03C2201/02 ,  C03C2203/40 ,  Y02P40/57

Abstract: A method of producing high-purity transparent vitreous silica body through flame hydrolysis of high-purity silane type gas, comprising forming the width in the sectional direction of the reduction area of said flame so as to be about more than 1.5 times as against the diameter of the formed vitreous silica body, and the length of the reduction area of said flame so as to be about more than 2.5 times as against said diameter, while retaining the head portion of the formed vitreous silica body within the reduction area of said flame to synthesize the high-purity transparent vitreous silica body.