METHOD FOR MANUFACTURING SUBSTRATE HAVING CONCAVE PATTERN, COMPOSITION, METHOD FOR FORMING CONDUCTIVE FILM, ELECTRONIC CIRCUIT AND ELECTRONIC DEVICE
    134.
    发明申请
    METHOD FOR MANUFACTURING SUBSTRATE HAVING CONCAVE PATTERN, COMPOSITION, METHOD FOR FORMING CONDUCTIVE FILM, ELECTRONIC CIRCUIT AND ELECTRONIC DEVICE 有权
    用于制造具有凹凸图案的基板的方法,组成物,形成导电膜的方法,电子电路和电子设备

    公开(公告)号:US20160062242A1

    公开(公告)日:2016-03-03

    申请号:US14888244

    申请日:2014-04-15

    Abstract: Provided is a method for manufacturing a substrate having a concave pattern to be used for forming a high-definition pattern while suppressing wet-spreading and bleeding of a film-forming ink, provided is a composition to be used for manufacturing the substrate, and provided are a method for forming a conductive film, an electronic circuit, and an electronic device.The method for manufacturing a substrate having a concave pattern includes: (i) a step of applying, on a substrate 1, a composition containing a polymer having an acid-dissociable group and an acid generator to form a coating film 2 and (ii) a step of irradiating a predetermined portion of the coating film 2 with radiation. The method for forming a conductive film includes applying a conductive film-forming ink on the concave pattern formed in the exposed portion of the coating film 2 and heating the ink to form a pattern 6. The electronic circuit and the electronic device are provided by using the method for forming a conductive film.

    Abstract translation: 提供一种用于制造用于形成高清晰度图案的凹形图案的基板的方法,同时抑制成膜油墨的湿扩展和渗色,提供用于制造基板的组合物,并且提供 是形成导电膜,电子电路和电子器件的方法。 具有凹形图案的基板的制造方法包括:(i)在基板1上涂布含有具有酸解离基的聚合物和酸发生剂的组合物以形成涂膜2的步骤,(ii) 用辐射照射涂膜2的预定部分的步骤。 形成导电膜的方法包括在形成在涂膜2的暴露部分中的凹形图案上涂覆导电膜形成油墨并加热油墨以形成图案6.电子电路和电子设备通过使用 形成导电膜的方法。

    Passive electrical devices and methods of fabricating passive electrical devices
    135.
    发明授权
    Passive electrical devices and methods of fabricating passive electrical devices 有权
    无源电器件和无源电器件的制造方法

    公开(公告)号:US08866018B2

    公开(公告)日:2014-10-21

    申请号:US12352411

    申请日:2009-01-12

    Abstract: A thin laminate passive electrical device, such as, a capacitor, and a method of fabricating a thin laminate passive electrical device are provided. The passive electrical device includes two conductors, for example, copper foil conductors, separated by a dielectric having a first layer of a first material having a softening point temperature greater than a first temperature and a first layer of a second material having a softening point temperature less than the first temperature. The first temperature may be at least 150 degrees C. or higher. By providing a first layer having a higher softening point material, shorting across the conductors, that can be promoted by the fabrication process, is prevented. Methods of fabricating passive electrical devices are also disclosed.

    Abstract translation: 提供了一种诸如电容器的薄层压无源电器件以及制造薄层压无源电器件的方法。 无源电器件包括两个导体,例如铜箔导体,由具有软化点温度大于第一温度的第一材料的第一层和第一材料的电介质隔开,第一层的第一材料具有软化点温度 小于第一温度。 第一温度可以为至少150摄氏度或更高。 通过提供具有较高软化点材料的第一层,可以防止通过制造工艺促进导体的短路。 还公开了制造无源电器件的方法。

    PHOTOCURABLE/THERMOSETTING RESIN COMPOSITION
    137.
    发明申请
    PHOTOCURABLE/THERMOSETTING RESIN COMPOSITION 有权
    可光/热固化树脂组合物

    公开(公告)号:US20140147776A1

    公开(公告)日:2014-05-29

    申请号:US14127078

    申请日:2012-06-15

    Abstract: Provided is an alkali-developable photocurable/thermosetting resin composition from which a cured coating film that has excellent thermal shock resistance and exhibits excellent PCT resistance, HAST resistance and electroless gold plating resistance, which are important as a solder resist for semiconductor packages, can be formed. The alkali-developable photocurable/thermosetting resin composition is characterized by comprising (A) a carboxyl group-containing photosensitive resin, (B) a photopolymerization initiator, (C) a block copolymer and (D) a thermosetting component.

    Abstract translation: 本发明提供一种可显影的光固化/热固性树脂组合物,其作为半导体封装的阻焊剂是重要的,具有优异的耐热冲击性和优异的耐PCT耐性,耐HAST电阻和无电镀金电镀的固化涂膜可以是 形成。 碱显影性光固化/热固性树脂组合物的特征在于包含(A)含羧基的感光性树脂,(B)光聚合引发剂,(C)嵌段共聚物和(D)热固性组分。

    Manufacturing method of circuit structure
    139.
    发明授权
    Manufacturing method of circuit structure 有权
    电路结构的制造方法

    公开(公告)号:US08161638B2

    公开(公告)日:2012-04-24

    申请号:US12783806

    申请日:2010-05-20

    Abstract: A manufacturing method of circuit structure is described as follows. Firstly, a composite dielectric layer, a circuit board and an insulating layer disposed therebetween are provided. The composite dielectric layer includes a non-platable dielectric layer and a platable dielectric layer between the non-platable dielectric layer and the insulating layer wherein the non-platable dielectric layer includes a chemical non-platable material and the platable dielectric layer includes a chemical platable material. Then, the composite dielectric layer, the circuit board and the insulating layer are compressed. Subsequently, a through hole passing through the composite dielectric layer and the insulating layer is formed and a conductive via connecting a circuit layer of the circuit board is formed therein. Then, a trench pattern passing through the non-platable dielectric layer is formed on the composite dielectric layer. Subsequently, a chemical plating process is performed to form a conductive pattern in the trench pattern.

    Abstract translation: 电路结构的制造方法如下所述。 首先,提供复合电介质层,电路基板和设置在它们之间的绝缘层。 复合电介质层包括不可镀介电层和介于非平板电介质层和绝缘层之间的可镀介电层,其中非可镀介电层包括化学不可镀材料,并且可镀介电层包括化学镀层 材料。 然后,复合介电层,电路板和绝缘层被压缩。 随后,形成穿过复合介电层和绝缘层的通孔,并且在其中形成连接电路板的电路层的导电通孔。 然后,在复合电介质层上形成通过非电介质层的沟槽图案。 随后,执行化学镀处理以在沟槽图案中形成导电图案。

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