Apparatus for dipping substrate
    141.
    发明授权

    公开(公告)号:US09795982B2

    公开(公告)日:2017-10-24

    申请号:US14892900

    申请日:2015-05-19

    Inventor: Eun-Ah You

    CPC classification number: B05C3/02 B05C3/04 B05C13/02 C25D17/00

    Abstract: An apparatus for dipping a substrate includes: a body having an internal plate formed therein, and including a backing plate provided over the internal plate; a crucible accommodating an aqueous solution therein and provided over the backing plate; a crucible driving unit provided in the body and connected to the crucible to move the crucible in a horizontal direction or a vertical direction of the body; a support having a lower end to which a substrate is fixed; a support driving unit provided to an upper side of the body and connected to the support to drive the support in a length direction of the support or rotate the support in the vertical direction of the body; and a controlling unit connected to the crucible driving unit and the support driving unit to control driving of the crucible driving unit and the support driving unit.

    SENSOR
    144.
    发明申请
    SENSOR 审中-公开

    公开(公告)号:US20170184557A1

    公开(公告)日:2017-06-29

    申请号:US15300514

    申请日:2015-03-17

    CPC classification number: G01N33/005 G01N27/125 G01N27/127

    Abstract: The present invention relates to a sensor for sensing hydrogen. The sensor of the present invention comprises: a core which reacts with hydrogen to change a resistance value; at least two electrodes connected to the core; and a variable resistor which is connected to at least one of the two electrodes and of which the resistance value changes in response to a control signal, wherein the core includes palladium having a thin film shape, and graphene which is applied on the palladium and has a thin film shape.

    APPARATUS FOR DIPPING SUBSTRATE
    145.
    发明申请

    公开(公告)号:US20170106394A1

    公开(公告)日:2017-04-20

    申请号:US14892900

    申请日:2015-05-19

    Inventor: Eun-Ah YOU

    CPC classification number: B05C3/02 B05C3/04 B05C13/02 C25D17/00

    Abstract: An apparatus for dipping a substrate includes: a body having an internal plate formed therein, and including a backing plate 120 provided over the internal plate; a crucible accommodating an aqueous solution therein and provided over the backing plate; a crucible driving unit provided in the body and connected to the crucible so as to move the crucible in a horizontal direction or a vertical direction of the body; a support having a lower end to which a substrate is fixed; a support driving unit provided to an upper side of the body and connected to the support so as to drive the support in a length direction of the support or rotate the support in the vertical direction of the body; and a controlling unit connected to the crucible driving unit and the support driving unit to control driving of the crucible driving unit and the support driving unit.

    Monochromator and charged particle apparatus including the same
    147.
    发明授权
    Monochromator and charged particle apparatus including the same 有权
    包括其的单色器和带电粒子装置

    公开(公告)号:US09425022B2

    公开(公告)日:2016-08-23

    申请号:US14696569

    申请日:2015-04-27

    Abstract: Disclosed herein are a monochromator and a charged particle beam apparatus including the same. The monochromator may include a first electrostatic lens configured to have a charged particle beam discharged by an emitter incident on the first electrostatic lens, refract a ray of the charged particle beam, and include a plurality of electrodes and a second electrostatic lens spaced apart from the first electrostatic lens at a specific interval and configured to have a central axis disposed identically with a central axis of the first electrostatic lens, have the charged particle beam output by the first electrostatic lens incident on the second electrostatic lens, refract the ray of the charged particle beam, and comprise a plurality of electrodes. Accordingly, there is an advantage in that a charged particle beam can have an excellent profile even after passing through the monochromator.

    Abstract translation: 本文公开了一种单色仪和包括该单色仪的带电粒子束装置。 单色仪可以包括第一静电透镜,其被配置为具有由入射在第一静电透镜上的发射体放电的带电粒子束,折射带电粒子束的射线,并且包括多个电极和与该第一静电透镜间隔开的第二静电透镜 第一静电透镜以特定间隔被配置为具有与第一静电透镜的中心轴线相同设置的中心轴,由入射在第二静电透镜上的第一静电透镜输出的带电粒子束折射带电的光线 粒子束,并且包括多个电极。 因此,具有即使在通过单色仪之后,带电粒子束也具有优异的特性的优点。

    Apparatus for forming fine patterns capable of switching direction of polarization interference pattern in laser scanning method and method of forming fine patterns using the same
    148.
    发明授权
    Apparatus for forming fine patterns capable of switching direction of polarization interference pattern in laser scanning method and method of forming fine patterns using the same 有权
    用于在激光扫描方法中形成能够切换极化干涉图案的精细图案的装置和使用其形成精细图案的方法

    公开(公告)号:US09223223B2

    公开(公告)日:2015-12-29

    申请号:US13878482

    申请日:2010-11-12

    Abstract: An apparatus for forming fine patterns by employing polarization interference in a laser scanning method comprises a laser generator; a calcite wave plate configured to refract at least one of the S wave and the P wave, polarized by the polarization plate, an analyzer configured to make coincident with each other the polarization directions of the S wave and the P wave having the paths spaced apart from each other by the calcite wave plate; an exposure lens; an exposure head; an X stage; and a rotation stage configured to move the substrate mounting unit around a Z axis which is a vertical axis.

    Abstract translation: 一种用于通过在激光扫描方法中使用偏振干涉来形成精细图案的装置包括:激光发生器; 被配置为折射由偏振板极化的S波和P波中的至少一个的方解石波片,被配置为使S波的极化方向和具有间隔开的路径的P波彼此一致的分析器 由方解石波片相互作用; 曝光镜片; 曝光头; X阶段 以及旋转台,被配置为使基板安装单元围绕作为垂直轴的Z轴移动。

    MONOCHROMATOR AND CHARGED PARTICLE APPARATUS INCLUDING THE SAME
    149.
    发明申请
    MONOCHROMATOR AND CHARGED PARTICLE APPARATUS INCLUDING THE SAME 有权
    单色器和充电粒子装置,包括它们

    公开(公告)号:US20150371811A1

    公开(公告)日:2015-12-24

    申请号:US14696569

    申请日:2015-04-27

    Abstract: Disclosed herein are a monochromator and a charged particle beam apparatus including the same. The monochromator may include a first electrostatic lens configured to have a charged particle beam discharged by an emitter incident on the first electrostatic lens, refract a ray of the charged particle beam, and include a plurality of electrodes and a second electrostatic lens spaced apart from the first electrostatic lens at a specific interval and configured to have a central axis disposed identically with a central axis of the first electrostatic lens, have the charged particle beam output by the first electrostatic lens incident on the second electrostatic lens, refract the ray of the charged particle beam, and comprise a plurality of electrodes. Accordingly, there is an advantage in that a charged particle beam can have an excellent profile even after passing through the monochromator.

    Abstract translation: 本文公开了一种单色仪和包括该单色仪的带电粒子束装置。 单色仪可以包括第一静电透镜,其被配置为具有由入射在第一静电透镜上的发射体放电的带电粒子束,折射带电粒子束的射线,并且包括多个电极和与该第一静电透镜间隔开的第二静电透镜 第一静电透镜以特定间隔被配置为具有与第一静电透镜的中心轴线相同设置的中心轴,由入射在第二静电透镜上的第一静电透镜输出的带电粒子束折射带电的光线 粒子束,并且包括多个电极。 因此,具有即使在通过单色仪之后,带电粒子束也具有优异的特性的优点。

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