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公开(公告)号：US20180065319A1
公开(公告)日：2018-03-08
申请号：US15255760
申请日：2016-09-02
Applicant: General Electric Company
Inventor： Stephen Michael Deak
CPC classification number: B33Y30/00 , B05C11/02 , B29C64/214 , B29K2105/0058
Abstract: A mounting apparatus for a recoater rail of an additive manufacturing machine includes: a bracket including: a body having first and second ends; first and second flanges extending from the first and second ends respectively, the body and flanges cooperatively forming a C-shape; a first jack screw mounted to the first flange, the first jack screw extending parallel to the body; and a second jack screw mounted to the second flange, the second jack screw extending parallel to the body.
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公开(公告)号：US09889477B2
公开(公告)日：2018-02-13
申请号：US14857650
申请日：2015-09-17
Inventor： Chi-Lun Lu , Sheng-Chi Chin
IPC: B08B5/00 , B08B6/00 , B08B7/02 , H01L21/12 , G03F1/82 , B05C13/00 , B05C11/02 , A47L13/40 , B05C13/02 , B08B5/02 , B08B7/00 , H01L21/67 , H01L21/673 , H01L21/02 , H01L21/66
CPC classification number: B08B5/00 , A47L13/40 , B05C11/02 , B05C13/02 , B08B5/02 , B08B6/00 , B08B7/0057 , B08B7/02 , B08B7/028 , G03F1/82 , H01L21/0206 , H01L21/67028 , H01L21/67359 , H01L22/12
Abstract: A cleaning and inspection system includes a cleaning chamber and retaining structure disposed within the cleaning chamber and configured to secure an article to be cleaned within the cleaning chamber. The cleaning and inspection system also includes a gas distributor disposed within the cleaning chamber and configured to distribute a turbulent flow of gas into the cleaning chamber that facilitates removal of foreign particles from a surface of the article. Further, the system includes a particle collection surface positioned to collect foreign particles removed from the surface of the article.
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公开(公告)号：US20180036909A1
公开(公告)日：2018-02-08
申请号：US15663044
申请日：2017-07-28
Applicant: UNITED STATES GYPSUM COMPANY
Inventor： Ashish DUBEY , Peter B. GROZA , Christopher R. NELSON
CPC classification number: B28B5/027 , B05C3/18 , B05C11/02 , B28B1/52 , B28B1/526 , B28B19/0092 , B29L2031/10 , C04B14/42 , C04B28/14 , C04B40/0067
Abstract: A slurry feed apparatus for depositing a slurry upon a moving forming web having a direction of travel, including: a headbox mounted transverse to the direction of travel of the moving web, having a back wall, sidewalls, a concave transverse front wall, an open top, and an open bottom for directing slurry onto the forming web; a moveable dam releasably attached to the back wall, a seal attached to a bottom wall of the dam; and a headbox support system extending from opposed the sidewalls. Also disclosed is a continuous process for depositing a uniform layer of a cementitious slurry containing reinforcing fibers from the headbox onto a traveling web.
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公开(公告)号：US09842751B2
公开(公告)日：2017-12-12
申请号：US14922441
申请日：2015-10-26
Applicant: Tokyo Electron Limited
Inventor： Shouta Umezaki , Yoshihiro Kai , Kazuki Kosai , Mitsuo Tanaka
CPC classification number: H01L21/6708 , B05B1/28 , B05C11/02 , H01L21/67051
Abstract: Disclosed is a substrate liquid processing apparatus. The apparatus includes: a substrate holding unit configured to hold a substrate horizontally; a nozzle configured to eject a processing liquid in a transversal direction toward a liquid arrival target position set on the substrate held by the substrate holding unit from an ejection port which is located at an injection position spaced away from the liquid arrival target position by a predetermined distance horizontally; and a liquid receiving unit provided below the nozzle to receive the processing liquid dropping from the ejection port of the nozzle.
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公开(公告)号：US09757831B2
公开(公告)日：2017-09-12
申请号：US14633756
申请日：2015-02-27
Applicant: Voxeljet AG
Inventor： Ingo Ederer , Andreas Hartmann
IPC: B29C67/00 , B23P19/04 , B29C41/02 , B05C19/04 , B05C13/00 , B05C11/02 , B05C15/00 , B41J3/407 , B28D1/00 , B21D39/00 , B21D53/00
CPC classification number: B23P19/04 , B05C11/02 , B05C13/00 , B05C15/00 , B05C19/04 , B21D39/00 , B21D53/00 , B28D1/001 , B29C41/02 , B29C64/112 , B29C64/153 , B29C64/165 , B29C64/188 , B29C64/20 , B29C64/245 , B41J3/4073 , Y10T29/49826
Abstract: The instant invention relates to a method for assembling a device for the manufacturing patterns in layers. The method includes attaching a build module to a casing. The build module includes a spreader device and a dispensing device mounted above a mounting platform. The build module preferably includes a build platform mounted below the mounting platform. For example, the build module may be attached to the casing by screwing the mounting platform to the casing.
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Patent Agency Ranking
公开(公告)号：US20170246657A1
公开(公告)日：2017-08-31
申请号：US15436411
申请日：2017-02-17
Applicant: CANON KABUSHIKI KAISHA
Inventor： Wataru Tamura , Noriyasu Hasegawa , Tosiya Asano , Setsuo Yoshida
IPC: B05D3/12 , H01L21/027 , H01L21/67 , B05C11/02
CPC classification number: B05D3/12 , B05C11/02 , G03F7/0002 , G03F9/7042 , H01L21/0274 , H01L21/6715
Abstract: An imprinting apparatus can form a pattern of an imprint material supplied to a substrate with a mold. The imprinting apparatus includes a substrate holding unit configured to hold the substrate, a mold holding unit configured to hold the mold, and a control unit configured to control the mold holding unit that changes an inclination of the mold while the mold is kept in contact with the imprint material based on a position in a surface direction of the substrate where the mold contacts the imprint material, in such a way as to reduce a relative inclination between the mold and the substrate that may occur if the substrate holding unit inclines when the mold is brought into contact with the imprint material.
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公开(公告)号：US20160114345A1
公开(公告)日：2016-04-28
申请号：US14922441
申请日：2015-10-26
Applicant: Tokyo Electron Limited
Inventor： Shouta Umezaki , Yoshihiro Kai , Kazuki Kosai , Mitsuo Tanaka
CPC classification number: H01L21/6708 , B05B1/28 , B05C11/02 , H01L21/67051
Abstract: Disclosed is a substrate liquid processing apparatus. The apparatus includes: a substrate holding unit configured to hold a substrate horizontally; a nozzle configured to eject a processing liquid in a transversal direction toward a liquid arrival target position set on the substrate held by the substrate holding unit from an ejection port which is located at an injection position spaced away from the liquid arrival target position by a predetermined distance horizontally; and a liquid receiving unit provided below the nozzle to receive the processing liquid dropping from the ejection port of the nozzle.
Abstract translation: 公开了一种基板液体处理装置。 该装置包括：基板保持单元，被配置为水平地保持基板; 喷嘴，被配置为从设置在由所述基板保持单元保持的所述基板上的液体到达目标位置朝向从所述液体到达目标位置隔开预定的喷射口的喷出口喷射处理液， 水平距离 以及液体接收单元，设置在喷嘴下方，以接收从喷嘴的喷射口落下的处理液。
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公开(公告)号：US20160005591A1
公开(公告)日：2016-01-07
申请号：US14857650
申请日：2015-09-17
Inventor： Chi-Lun Lu , Sheng-Chi Chin
CPC classification number: B08B5/00 , A47L13/40 , B05C11/02 , B05C13/02 , B08B5/02 , B08B6/00 , B08B7/0057 , B08B7/02 , B08B7/028 , G03F1/82 , H01L21/0206 , H01L21/67028 , H01L21/67359 , H01L22/12
Abstract: A cleaning and inspection system includes a cleaning chamber and retaining structure disposed within the cleaning chamber and configured to secure an article to be cleaned within the cleaning chamber. The cleaning and inspection system also includes a gas distributor disposed within the cleaning chamber and configured to distribute a turbulent flow of gas into the cleaning chamber that facilitates removal of foreign particles from a surface of the article. Further, the system includes a particle collection surface positioned to collect foreign particles removed from the surface of the article.
Abstract translation: 清洁和检查系统包括清洁室和设置在清洁室内的保持结构，并且构造成将要清洁的物品固定在清洁室内。 清洁和检查系统还包括设置在清洁室内的气体分配器，其构造成将湍流的气体分配到清洁室中，从而有助于从制品的表面去除外来颗粒。 此外，该系统包括定位成收集从制品表面去除的外来颗粒的颗粒收集表面。
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149.发明申请公开(公告)号：US20150165574A1
公开(公告)日：2015-06-18
申请号：US14633756
申请日：2015-02-27
Applicant: Voxeljet AG
Inventor： Ingo Ederer , Andreas Hartman
IPC: B23P19/04
CPC classification number: B23P19/04 , B05C11/02 , B05C13/00 , B05C15/00 , B05C19/04 , B21D39/00 , B21D53/00 , B28D1/001 , B29C41/02 , B29C64/112 , B29C64/153 , B29C64/165 , B29C64/188 , B29C64/20 , B29C64/245 , B41J3/4073 , Y10T29/49826
Abstract: The instant invention relates to a method for assembling a device for the manufacturing patterns in layers. The method includes attaching a build module to a casing. The build module includes a spreader device and a dispensing device mounted above a mounting platform. The build module preferably includes a build platform mounted below the mounting platform. For example, the build module may be attached to the casing by screwing the mounting platform to the casing.
Abstract translation: 本发明涉及一种用于组装用于制造图案的装置的方法。 该方法包括将构建模块附接到壳体。 构建模块包括安装在安装平台上方的吊具装置和分配装置。 构建模块优选地包括安装在安装平台下方的构建平台。 例如，构建模块可以通过将安装平台拧到壳体上来附接到壳体。
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公开(公告)号：US20140023790A1
公开(公告)日：2014-01-23
申请号：US14002742
申请日：2012-03-03
Applicant: Karlsson Hakan
Inventor： Karlsson Hakan
CPC classification number: B05D1/26 , B05C1/0813 , B05C1/083 , B05C1/0834 , B05C5/00 , B05C5/0254 , B05C5/0262 , B05C9/04 , B05C11/02 , B05C11/025 , B05C11/042 , B05C11/1039
Abstract: The present invention relates to an applicator arrangement comprising base support arrangement, a supply unit for supply of coating liquid/slurry, an applicator device, and a metering device, wherein said supply unit comprises a distribution pipe which is supported on said support body by means of a bearing arrangement arranged to enable axial expansion and contraction of said distribution pipe.
Abstract translation: 本发明涉及一种包括基部支撑装置的涂抹器装置，用于供应涂布液体/浆料的供应单元，涂抹器装置和计量装置，其中所述供应单元包括分配管，其通过装置被支撑在所述支撑体上 布置成能够使所述分配管的轴向膨胀和收缩的轴承装置。
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