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    Projection lithography photomask blanks, preforms and method of making
    142.
    发明申请
    Projection lithography photomask blanks, preforms and method of making 失效
    投影光刻光掩模坯料，预成型件和制造方法

    公开(公告)号：US20010027025A1

    公开(公告)日：2001-10-04

    申请号：US09876194

    申请日：2001-06-06

    Inventor： George Edward Berkey ,  Lisa Anne Moore ,  Charles Chunzhe Yu

    IPC: H01L021/302 ,  H01L021/461

    CPC classification number: C03B23/07 ,  C03B19/1415 ,  C03B19/1423 ,  C03B19/1453 ,  C03B19/1469 ,  C03B19/1492 ,  C03B23/043 ,  C03B23/045 ,  C03B23/051 ,  C03B2201/07 ,  C03B2201/075 ,  C03B2201/12 ,  C03B2201/21 ,  C03B2207/02 ,  C03B2207/06 ,  C03B2207/20 ,  C03B2207/32 ,  C03B2207/52 ,  C03B2207/54 ,  C03B2207/66 ,  C03C3/06 ,  C03C4/0085 ,  C03C2201/12 ,  C03C2201/21 ,  C03C2203/50 ,  G03F1/60

    Abstract: The invention includes methods of making lithography photomask blanks. The invention also includes lithography photomask blanks and preforms for producing lithography photomask. The method of making a lithography photomask blank includes providing a soot deposition surface, producing SiO2 soot particles and projecting the SiO2 soot particles toward the soot deposition surface. The method includes successively depositing layers of the SiO2 soot particle on the deposition surface to form a coherent SiO2 porous glass preform body comprised of successive layers of the SiO2 soot particles and dehydrating the coherent SiO2 glass preform body to remove OH from the preform body. The SiO2 is exposed to and reacted with a fluorine containing compound and consolidated into a nonporous silicon oxyfluoride glass body with parallel layers of striae. The method further includes forming the consolidated silicon oxyfluoride glass body into a photomask blank having a planar surface with the orientation of the striae layer parallel to the photomask blank planar surface.

    Abstract translation: 本发明包括制造光刻光掩模坯料的方法。 本发明还包括光刻光掩模坯料和用于生产光刻光掩模的预成型件。 制造光刻光掩模坯料的方法包括提供烟灰沉积表面，产生SiO 2烟灰颗粒并将SiO 2烟灰颗粒投射到烟灰沉积表面。 该方法包括在沉积表面上依次沉积SiO 2烟灰颗粒的层，以形成由SiO 2烟灰颗粒的连续层组成的粘结SiO 2多孔玻璃预制体，并使相干的SiO 2玻璃预制体脱水以从预成型体中去除OH。 将SiO 2暴露于含氟化合物并与其反应，并固化成具有平行的条纹层的无孔氟氧化硅玻璃体。 该方法还包括将固化的氟氧化硅玻璃体形成为具有平坦表面的光掩模坯料，其中条纹层的取向平行于光掩模坯料平面。

    Vaccum ultraviolet transmitting silicon oxyfluoride lithography glass
    143.
    发明申请
    Vaccum ultraviolet transmitting silicon oxyfluoride lithography glass 失效
    真空紫外透射硅氧氟硅光刻玻璃

    公开(公告)号：US20010014424A1

    公开(公告)日：2001-08-16

    申请号：US09799987

    申请日：2001-03-06

    Inventor： Lisa A. Moore ,  Charlene Smith

    IPC: G03F009/00 ,  C03C003/04 ,  C03C003/06 ,  C03C003/112 ,  G03C005/00

    CPC classification number: C03B19/1453 ,  C03B2201/07 ,  C03B2201/075 ,  C03B2201/12 ,  C03B2201/21 ,  C03C3/06 ,  C03C4/0085 ,  C03C2201/12 ,  G03F1/60 ,  Y02P40/57

    Abstract: High purity silicon oxyfluoride glass suitable for use as a photomask substrates for photolithography applications in the VUV wavelength region below 190 nm is disclosed. The inventive silicon oxyfluoride glass is transmissive at wavelengths around 157 nm, making it particularly useful as a photomask substrate at the 157 nm wavelength region. The inventive photomask substrate is a nulldry,null silicon oxyfluoride glass which exhibits very high transmittance in the vacuum ultraviolet (VUV) wavelength region while maintaining the excellent thermal and physical properties generally associated with high purity fused silica. In addition to containing fluorine and having little or no OH content, the inventive silicon oxyfluoride glass suitable for use as a photomask substrate at 157 nm is also characterized by having less than 1null1017 molecules/cm3 of molecular hydrogen and low chlorine levels.

    Abstract translation: 公开了适用于在低于190nm的VUV波长区域中用于光刻应用的光掩模基板的高纯度氟氧化硅玻璃。 本发明的氟氧化硅玻璃在157nm波长下是透射的，使其特别适用于157nm波长区域的光掩模衬底。 本发明的光掩模基材是“真空”的氟氧化硅玻璃，其在真空紫外（VUV）波长区域中表现出非常高的透射率，同时保持通常与高纯度熔融石英相关的优异的热和物理性能。 除了含氟并且具有很少或不含OH含量之外，本发明的适合用作157nm的光掩模衬底的氟氧化硅玻璃的特征还在于具有小于1×10 17分子/ cm 3的分子氢和低氯水平。

    OPTICAL COMPONENT MADE OF QUARTZ GLASS FOR USE IN ArF EXCIMER LASER LITHOGRAPHY AND METHOD FOR PRODUCING THE COMPONENT
    146.
    发明申请
    OPTICAL COMPONENT MADE OF QUARTZ GLASS FOR USE IN ArF EXCIMER LASER LITHOGRAPHY AND METHOD FOR PRODUCING THE COMPONENT 有权
    在ArF EXCIMER激光光刻仪中使用的QUARTZ玻璃的光学元件及其制造方法

    公开(公告)号：US20160002092A1

    公开(公告)日：2016-01-07

    申请号：US14769382

    申请日：2014-02-19

    Applicant: HERAEUS QUARZGLAS GMBH & CO. KG

    Inventor： Bodo KUEHN

    IPC: C03C3/06 ,  G02B1/00 ,  C03B32/02 ,  C03C4/04 ,  C03B19/14

    CPC classification number: C03C3/06 ,  C03B19/1453 ,  C03B32/00 ,  C03B32/02 ,  C03B2201/07 ,  C03B2201/075 ,  C03B2201/21 ,  C03B2201/23 ,  C03B2201/24 ,  C03C4/04 ,  C03C2201/11 ,  C03C2201/12 ,  C03C2201/21 ,  C03C2201/23 ,  C03C2201/24 ,  C03C2203/54 ,  C03C2204/00 ,  G02B1/00 ,  G02B1/02 ,  Y02P40/57

    Abstract: An optical component made of synthetic quartz glass includes a glass structure substantially free of oxygen defect sites and having a hydrogen content of 0.1×1016 to 1.0×1018 molecules/cm3, an SiH group content of less than 2×1017 molecules/cm3, a hydroxyl group content of 0.1 to 100 wt. ppm, and an Active temperature of less than 1070° C. The optical component undergoes a laser-induced change in the refractive index in response to irradiation by a radiation with a wavelength of 193 nm using 5×109 pulses with a pulse width of 125 ns and a respective energy density of 500 μJ/cm2 at a pulse repetition frequency of 2000 Hz. The change totals a first measured value M193nm when measured using the applied wavelength of 193 nm and a second measured value M633nm when measured using a measured wavelength of 633 nm. The ratio M193nm/M633nm is less than 1.7.

    Abstract translation: 由合成石英玻璃制成的光学部件包括基本上不含氧缺陷部位的玻璃结构，氢含量为0.1×1016〜1.0×1018分子/ cm3，SiH基含量小于2×1017分子/ cm3， 羟基含量为0.1〜100wt。 ppm，并且有效温度低于1070℃。光学组件响应于波长为193nm的辐射的照射，使用脉冲宽度为125的5×109脉冲对激光引起的折射率变化 ns，相应的能量密度为500μJ/ cm2，脉冲重复频率为2000Hz。 当使用193nm的施加波长测量时，该变化达到第一测量值M193nm，并且当使用633nm的测量波长测量时，该变化达到第二测量值M633nm。 M193nm / M633nm的比例小于1.7。

    Method for producing optical fiber preform
    148.
    发明授权
    Method for producing optical fiber preform 有权
    光纤预制棒的制造方法

    公开(公告)号：US08839646B2

    公开(公告)日：2014-09-23

    申请号：US13356984

    申请日：2012-01-24

    Applicant: Tetsuya Haruna ,  Masaaki Hirano ,  Yoshiaki Tamura

    Inventor： Tetsuya Haruna ,  Masaaki Hirano ,  Yoshiaki Tamura

    IPC: C03C25/60 ,  C03B37/018 ,  C03B37/014 ,  C03B37/012

    CPC classification number: C03B37/01211 ,  C03B37/01413 ,  C03B37/01807 ,  C03B37/01861 ,  C03B37/01869 ,  C03B2201/07 ,  C03B2201/12 ,  C03B2201/20 ,  C03B2201/50 ,  G02B6/02019 ,  G02B6/02242 ,  G02B6/02266 ,  G02B6/03611 ,  G02B6/03627

    Abstract: There is provided a method for producing an optical fiber preform used in producing an optical fiber having low attenuation. The production method includes (1) a rod formation step of forming a glass rod of a silica glass containing an alkali metal element, the average concentration of the alkali metal element being 5 at·ppm or more, (2) a heat treatment step of heat-treating the glass rod, (3) a core part formation step of forming an alkali metal element-free silica glass layer having a chlorine concentration of 6000 at·ppm or more around the perimeter of the glass rod heat-treated in the heat treatment step to form a core part including the glass rod and the silica glass layer, and (4) a cladding part formation step of forming a cladding part of a silica-based glass having a lower refractive index than the core part around the perimeter of the core part.

    Abstract translation: 提供了用于制造具有低衰减的光纤的光纤预制件的制造方法。 制造方法包括：（1）形成含有碱金属元素的石英玻璃的玻璃棒的棒形成工序，碱金属元素的平均浓度为5atppm以上，（2）热处理工序 对玻璃棒进行热处理，（3）在热处理的玻璃棒的周边周围形成氯浓度为6000以上的碱金属元素的二氧化硅玻璃层的芯部形成工序 处理步骤以形成包括玻璃棒和石英玻璃层的核心部分，以及（4）包层部分形成步骤，形成具有比围绕周边的核心部分的折射率低的二氧化硅基玻璃的包层部分 核心部分。

    Silica container and method for producing the same
    150.
    发明授权
    Silica container and method for producing the same 有权
    二氧化硅容器及其制造方法

    公开(公告)号：US08815403B2

    公开(公告)日：2014-08-26

    申请号：US13131987

    申请日：2010-06-25

    Applicant: Shigeru Yamagata ,  Tomomi Usui

    Inventor： Shigeru Yamagata ,  Tomomi Usui

    IPC: B32B9/04 ,  B32B13/04 ,  B32B5/16 ,  B32B1/08 ,  C03B19/01 ,  C03B37/00 ,  C03B27/012 ,  C03B29/00 ,  C03B11/08 ,  C30B29/06 ,  C30B35/00 ,  C03B19/09 ,  C30B15/10

    CPC classification number: C03B19/095 ,  C03B2201/07 ,  C03B2201/075 ,  C03B2201/32 ,  C30B15/10 ,  C30B29/06 ,  C30B35/002 ,  Y10T428/131 ,  Y10T428/1317 ,  Y10T428/2982

    Abstract: A method for producing a silica container having a rotational symmetry is provided. The method includes forming a preliminarily molded article by feeding a powdered substrate's raw material to an inner wall of an outer frame having aspiration holes with rotating the frame, and forming a silica substrate. The preliminarily molded article is aspirated from an outer peripheral side with controlling a humidity inside the outer frame by ventilating gases present in the outer frame with charging from inside the preliminarily molded article a gas mixture comprised of an O2 gas and an inert gas and made below a prescribed dew-point temperature by dehumidification, and at the same time heated from inside the preliminarily molded article by a discharge-heat melting method with carbon electrodes, thereby making an outer peripheral part of the preliminarily molded article to a sintered body while an inner peripheral part to a fused glass body.

    Abstract translation: 提供了具有旋转对称性的二氧化硅容器的制造方法。 该方法包括通过将粉末状基材的原料供给到具有旋转框架的具有抽吸孔的外框架的内壁，并形成二氧化硅基板来形成预成型品。 从外周侧抽吸预成型品，通过从外部框架内部充填从O 2气体和惰性气体构成的气体混合物从外部框架内的气体通风来控制外框内的湿度， 通过除湿规定的露点温度，同时用碳电极通过放电加热熔融法从预成型体内部加热，由此使预成型品的外周部分成为烧结体，而内部 周边部分为熔融玻璃体。

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