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公开(公告)号：US20130116108A1
公开(公告)日：2013-05-09
申请号：US13540204
申请日：2012-07-02
Applicant: Nathan J. Cassingham , Ben Matthew Gauthier , Martin Panchula , Robert Stephen Pavlik , Yan Zhou , Konstantin S. Zuyev
Inventor： Nathan J. Cassingham , Ben Matthew Gauthier , Martin Panchula , Robert Stephen Pavlik , Yan Zhou , Konstantin S. Zuyev
IPC: C03C3/06
CPC classification number: C03C1/02 , C03B1/00 , C03B2201/075 , C03B2201/08 , C03B2201/23 , C03B2201/24 , C03B2201/31 , C03B2201/32 , C03B2201/34 , C03B2201/50 , C03B2201/54 , C03C3/06 , C03C2201/08 , C03C2201/23 , C03C2201/24 , C03C2201/31 , C03C2201/32 , C03C2201/34 , C03C2201/40 , C03C2201/50
Abstract: The invention relates to a silica glass compound having improved physical and chemical properties. In one embodiment, the present invention relates to a silica glass having a desirable brittleness in combination with a desirable density while still yielding a glass composition having a desired hardness and desired strength relative to other glasses. In another embodiment, the present invention relates to a silica glass composition that contains at least about 85 mole percent silicon dioxide and up to about 15 mole percent of one or more dopants selected from F, B, N, Al, Ge, one or more alkali metals (e.g., Li, Na, K, etc.), one or more alkaline earth metals (e.g., Mg, Ca, Sr, Ba, etc.), one or more transition metals (e.g., Ti, Zn, Y, Zr, Hf, etc.), one or more lanthanides (e.g., Ce, etc.), or combinations of any two or more thereof.
Abstract translation: 本发明涉及具有改善的物理和化学性质的二氧化硅玻璃化合物。 在一个实施方案中，本发明涉及具有期望的脆性以及所需密度的二氧化硅玻璃，同时仍然产生相对于其它玻璃具有所需硬度和所需强度的玻璃组合物。 在另一个实施方案中，本发明涉及二氧化硅玻璃组合物，其含有至少约85摩尔％的二氧化硅和至多约15摩尔％的选自F，B，N，Al，Ge的一种或多种掺杂剂，一种或多种 碱金属（如Li，Na，K等），一种或多种碱土金属（如Mg，Ca，Sr，Ba等），一种或多种过渡金属（如Ti，Zn，Y， Zr，Hf等），一种或多种镧系元素（例如Ce等），或其任何两种或多种的组合。
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公开(公告)号：US08156761B2
公开(公告)日：2012-04-17
申请号：US13023262
申请日：2011-02-08
Applicant: Tatsuhiro Sato
Inventor： Tatsuhiro Sato
CPC classification number: C03C1/00 , C03B19/063 , C03B32/005 , C03B2201/12 , C03B2201/20 , C03B2201/24 , C03B2201/36 , C03C3/06 , C03C3/112 , C03C4/20 , C03C2201/12 , C03C2201/23 , C03C2201/24 , C03C2201/26 , C03C2201/32 , C03C2201/3411 , C03C2201/3435 , C03C2201/36
Abstract: A mixed quartz powder contains quartz powder and two or more types of doping element in an amount of from 0.1 to 20 mass %. The aforementioned doped elements include a first dope element selected from the group consisting of N, C and F, and a second dope element selected from the group consisting of Mg, Ca, Sr, Ba, Sc, Y, Ti, Zr, Hf, the lanthanides and the actinides. The “quartz powder” is a powder of crystalline quartz or it is a powder of glassy SiO2 particles. It is made form natural occurring quartz or it is fabricated synthetically. The “quartz powder” may be doped. The compounding ratio of the total amount (M1) of the aforementioned first elements and the total amount (M2) of the aforementioned second elements as the ratio of the number of atoms (M1)/(M2) is preferably from 0.1 to 20. Al as well as the aforementioned doped elements is preferably included in a mixed quartz powder of this invention.
Abstract translation: 混合石英粉含有0.1〜20质量％的石英粉和2种以上的掺杂元素。 上述掺杂元素包括选自N，C和F的第一掺杂元素和选自Mg，Ca，Sr，Ba，Sc，Y，Ti，Zr，Hf的第二掺杂元素， 镧系元素和锕系元素。 “石英粉”是结晶石英粉，或是玻璃状SiO 2粉末的粉末。 它由天然石英制成，或者由合成制成。 可以掺杂“石英粉”。 上述第一元素的总量（M1）与上述第二元素的总量（M2）的配位比优选为0.1〜20。作为原子数（M1）/（M2）的比例，优选为0.1〜20。 以及上述掺杂元素优选包括在本发明的混合石英粉末中。
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3.发明授权Quartz glass, heat treating apparatus using quartz glass, and heat treating method 失效石英玻璃，使用石英玻璃的热处理装置和热处理方法公开(公告)号：US06263704B1
公开(公告)日：2001-07-24
申请号：US09584721
申请日：2000-06-01
Applicant: Hiroshi Tomita , Tsuneo Ishii , Chie Hongo
Inventor： Hiroshi Tomita , Tsuneo Ishii , Chie Hongo
IPC: C03C1900
CPC classification number: C03B32/00 , C03B20/00 , C03C3/06 , C03C23/002 , C03C2201/20 , C03C2201/24 , C03C2201/26 , C03C2201/32 , C03C2203/10 , C03C2203/50 , Y10S501/905
Abstract: A quartz glass which would not become a source for the contamination even if it contains metallic impurities. This quartz glass includes a region where a concentration of E′ center as measured by means of an electron spin resonance analysis is 3×1019 cm−3 or more. This quartz glass can be manufactured by a method including the steps of forming an initial quartz glass by melting and quenching a raw material for quartz glass, and implanting therein an ion, which is capable of entering into an SiO2 network of the initial quartz glass and substantially incapable of externally diffusing, to increase a concentration of E′ center in at least part of the initial quartz glass. This quartz glass can be manufactured by a method making use of a quartz glass raw material containing 0.01 to 0.1% by weight of silicon, by a method of irradiating ultraviolet ray to the initial quartz glass, or by a method of giving an abrasion damage to the surface of the initial quartz glass by means of sand blast.
Abstract translation: 即使含有金属杂质，也不会成为污染源的石英玻璃。 该石英玻璃包含通过电子自旋共振分析测定的E'中心浓度为3×10 19 cm -3以上的区域。 该石英玻璃可以通过以下方法制造：包括以下步骤：通过熔融和淬火用于石英玻璃的原料形成初始石英玻璃，并且在其中注入能够进入初始石英玻璃的SiO 2网络的离子，以及 基本上不能进行外部扩散，以增加至少部分初始石英玻璃中的E'中心的浓度。 该石英玻璃可以通过使用含有0.01〜0.1重量％的硅的石英玻璃原料的方法，通过对初始石英玻璃照射紫外线的方法，或通过对其进行磨损损伤的方法 初始石英玻璃的表面通过喷砂。
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4.发明授权Quartz glass, heat treating apparatus using quartz glass, and heat treating method 失效石英玻璃，使用石英玻璃的热处理装置和热处理方法
公开(公告)号：US6093666A
公开(公告)日：2000-07-25
申请号：US85006
申请日：1998-05-28
Applicant: Hiroshi Tomita , Tsuneo Ishii , Chie Hongo
Inventor： Hiroshi Tomita , Tsuneo Ishii , Chie Hongo
CPC classification number: C03B32/00 , C03B20/00 , C03C23/002 , C03C3/06 , C03C2201/20 , C03C2201/24 , C03C2201/26 , C03C2201/32 , C03C2203/10 , C03C2203/50 , Y10S501/905
Abstract: A quartz glass which would not become a source for the contamination even if it contains metallic impurities. This quartz glass includes a region where a concentration of E' center as measured by means of an electron spin resonance analysis is 3.times.10.sup.19 cm.sup.-3 or more. This quartz glass can be manufactured by a method including the steps of forming an initial quartz glass by melting and quenching a raw material for quartz glass, and implanting therein an ion, which is capable of entering into an SiO.sub.2 network of the initial quartz glass and substantially incapable of externally diffusing, to increase a concentration of E' center in at least part of the initial quartz glass. This quartz glass can be manufactured by a method making use of a quartz glass raw material containing 0.01 to 0.1% by weight of silicon, by a method of irradiating ultraviolet ray to the initial quartz glass, or by a method of giving an abrasion damage to the surface of the initial quartz glass by means of sand blast.
Abstract translation: 即使含有金属杂质，也不会成为污染源的石英玻璃。 该石英玻璃包含通过电子自旋共振分析测定的E'中心浓度为3×10 19 cm -3以上的区域。 该石英玻璃可以通过以下方法制造：包括以下步骤：通过熔融和淬火用于石英玻璃的原料形成初始石英玻璃，并且在其中注入能够进入初始石英玻璃的SiO 2网络的离子，以及 基本上不能进行外部扩散，以增加至少部分初始石英玻璃中的E'中心的浓度。 该石英玻璃可以通过使用含有0.01〜0.1重量％的硅的石英玻璃原料的方法，通过对初始石英玻璃照射紫外线的方法或通过对 初始石英玻璃的表面通过喷砂。
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公开(公告)号：US20110120190A1
公开(公告)日：2011-05-26
申请号：US13023262
申请日：2011-02-08
Applicant: Tatsuhiro Sato
Inventor： Tatsuhiro Sato
CPC classification number: C03C1/00 , C03B19/063 , C03B32/005 , C03B2201/12 , C03B2201/20 , C03B2201/24 , C03B2201/36 , C03C3/06 , C03C3/112 , C03C4/20 , C03C2201/12 , C03C2201/23 , C03C2201/24 , C03C2201/26 , C03C2201/32 , C03C2201/3411 , C03C2201/3435 , C03C2201/36
Abstract: A mixed quartz powder contains quartz powder and two or more types of doping element in an amount of from 0.1 to 20 mass %. The aforementioned doped elements include a first dope element selected from the group consisting of N, C and F, and a second dope element selected from the group consisting of Mg, Ca, Sr, Ba, Sc, Y, Ti, Zr, Hf, the lanthanides and the actinides. The “quartz powder” is a powder of crystalline quartz or it is a powder of glassy SiO2 particles. It is made form natural occurring quartz or it is fabricated synthetically. The “quartz powder” may be doped. The compounding ratio of the total amount (M1) of the aforementioned first elements and the total amount (M2) of the aforementioned second elements as the ratio of the number of atoms (M1)/(M2) is preferably from 0.1 to 20. Al as well as the aforementioned doped elements is preferably included in a mixed quartz powder of this invention.
Abstract translation: 混合石英粉含有0.1〜20质量％的石英粉和2种以上的掺杂元素。 上述掺杂元素包括选自N，C和F的第一掺杂元素和选自Mg，Ca，Sr，Ba，Sc，Y，Ti，Zr，Hf的第二掺杂元素， 镧系元素和锕系元素。 “石英粉”是结晶石英粉，或是玻璃状SiO 2粉末的粉末。 它由天然石英制成，或者由合成制成。 可以掺杂“石英粉”。 上述第一元素的总量（M1）与上述第二元素的总量（M2）的配位比优选为0.1〜20。作为原子数（M1）/（M2）的比例，优选为0.1〜20。 以及上述掺杂元素优选包括在本发明的混合石英粉末中。
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Patent Agency Ranking
公开(公告)号：US07841211B2
公开(公告)日：2010-11-30
申请号：US10535935
申请日：2003-11-28
Applicant: Tatsuhiro Sato , Takahiro Kaitou , Akira Fujinoki , Toshiyuki Kato , Tohru Segawa , Nobumasa Yoshida
Inventor： Tatsuhiro Sato , Takahiro Kaitou , Akira Fujinoki , Toshiyuki Kato , Tohru Segawa , Nobumasa Yoshida
CPC classification number: C03C3/06 , C03B19/1453 , C03B2201/03 , C03B2201/04 , C03B2201/07 , C03B2201/075 , C03B2201/20 , C03B2201/24 , C03C2201/02 , C03C2201/11 , C03C2201/23 , C03C2201/24 , C03C2201/26
Abstract: First of all, there is provided a production process of a synthetic quartz glass which has less impurity, has a high-temperature viscosity characteristic equal to or more than that of a natural quartz glass, and hardly deforms even in a high-temperature environment, and especially a production process of a highly heat resistant synthetic quartz glass which is free from the generation of bubbles and is dense. Secondly, there is provided a highly heat resistant synthetic quartz glass body which is easily obtained by the production process of the present invention, and especially a transparent or black quartz glass body which is free from the generation of bubbles, is dense, has high infrared absorption rate and emission rate, and has an extremely high effect for preventing diffusion of alkali metal. The process is a process of producing a highly heat resistant quartz glass body having an absorption coefficient at 245 nm of 0.05 cm−1 or more, and the silica porous body was subjected to a reduction treatment, followed by baking, thereby forming a dense glass body.
Abstract translation: 首先，提供了杂质少，具有等于或高于天然石英玻璃的高温粘度特性的合成石英玻璃的制造方法，即使在高温环境下也几乎不变形， 特别是高度耐热的合成石英玻璃的生产过程，其不产生气泡并且致密。 其次，提供了通过本发明的制造方法容易获得的高耐热性合成石英玻璃体，特别是不产生气泡的透明或黑色石英玻璃体，具有高红外 吸收率和排放率，对防止碱金属的扩散具有极高的效果。 该方法是制造吸收系数在245nm为0.05cm -1以上的高耐热性石英玻璃体的工序，对二氧化硅多孔体进行还原处理，然后进行烧成，由此形成致密的玻璃 身体。
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7.发明申请Component of Quartz Glass for Use in Semiconductor Manufacture and Method for Producing the Same 有权用于半导体制造的石英玻璃的组成部分及其制造方法公开(公告)号：US20090163344A1
公开(公告)日：2009-06-25
申请号：US12226861
申请日：2007-09-04
Applicant: Juergen Weber , Tatsuhiro Sato , Ralf Schneider , Achim Hofmann , Christian Gebauer
Inventor： Juergen Weber , Tatsuhiro Sato , Ralf Schneider , Achim Hofmann , Christian Gebauer
CPC classification number: C03C3/06 , C03B19/06 , C03B19/066 , C03B20/00 , C03B2201/07 , C03B2201/075 , C03B2201/24 , C03B2201/34 , C03B2201/36 , C03C4/20 , C03C2201/23 , C03C2201/24 , C03C2201/3411 , C03C2201/3435 , C03C2203/10 , C03C2203/54
Abstract: The invention starts from a known component of quartz glass for use in semiconductor manufacture, which component at least in a near-surface region shows a co-doping of a first dopant and of a second oxidic dopant, said second dopant containing one or more rare-earth metals in a concentration of 0.1-3% by wt. each (based on the total mass of SiO2 and dopant). Starting from this, to provide a quartz glass component for use in semiconductor manufacture in an environment with etching action, which component is distinguished by both high purity and high resistance to dry etching and avoids known drawbacks caused by co-doping with aluminum oxide, it is suggested according to the invention that the first dopant should be nitrogen and that the mean content of metastable hydroxyl groups of the quartz glass is less than 30 wtppm.
Abstract translation: 本发明从用于半导体制造的石英玻璃的已知组件开始，至少在近表面区域中的该组分表现出第一掺杂剂和第二氧化物掺杂剂的共掺杂，所述第二掺杂剂含有一种或多种稀有金属 - 浓度为0.1-3重量％的矿物金属。 每个（基于SiO 2和掺杂剂的总质量）。 从此开始，为了在具有蚀刻作用的环境中提供用于半导体制造的石英玻璃组分，该组分通过高纯度和高耐干蚀刻性而被区分，并避免了与氧化铝共掺杂引起的已知缺点。 根据本发明建议第一掺杂剂应为氮，并且石英玻璃的亚稳态羟基的平均含量小于30重量ppm。
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公开(公告)号：US20020106174A1
公开(公告)日：2002-08-08
申请号：US10068968
申请日：2002-02-07
Inventor： Ikerionwu Asiegbu Akwani , Robert Alan Bellman , Thomas Paul Grandi , Paul Arthur Sachenik
IPC: G02B006/10
CPC classification number: C01B21/0821 , C01P2006/32 , C01P2006/60 , C03B19/1453 , C03B32/00 , C03B2201/24 , C03B2201/31 , C03C3/045 , C03C3/111 , C03C2201/24 , C03C2201/31 , Y10T428/265
Abstract: A composition represented by the formula Si1nullxGexO2(1nully)N1.33y, wherein x is from about 0.05 to about 0.6 and y is from about 0.14 to about 0.74 exhibits properties highly suited for use in fabricating waveguides for liquid crystal based optical devices. In particular, the compositions have an index of refraction of from about 1.6 to about 1.8 for light at a wavelength of 1550 nm, and/or a coefficient of thermal expansion of from about 2.5null10null6null C.null1 to about 5.0null10null6null C. null1. The compositions also have inherently low hydrogen content, and a high hydrogen permeability which allows better hydrogen removal by thermal annealing to provide a material which exhibits low optical losses and better etching properties than alternative materials.
Abstract translation: 由式Si1-xGexO2（1-y）N1.33y表示的组合物，其中x为约0.05至约0.6，y为约0.14至约0.74，表现出非常适合用于制造液晶基光学波导的性能 设备。 特别地，组合物对于波长1550nm的光具有约1.6至约1.8的折射率，和/或约2.5×10-6℃-1至约5.0×10 10的热膨胀系数 -6℃-1。 组合物还具有固有的低氢含量和高的氢渗透性，其允许通过热退火更好的氢去除以提供与替代材料相比表现出低的光损耗和更好的蚀刻性能的材料。
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公开(公告)号：US06408125B1
公开(公告)日：2002-06-18
申请号：US09437677
申请日：1999-11-10
Applicant: Ikerionwu Asiegbu Akwani , Robert Alan Bellman , Thomas Paul Grandi , Paul Arthur Sachenik
Inventor： Ikerionwu Asiegbu Akwani , Robert Alan Bellman , Thomas Paul Grandi , Paul Arthur Sachenik
IPC: G02B600
CPC classification number: C01B21/0821 , C01P2006/32 , C01P2006/60 , C03B19/1453 , C03B32/00 , C03B2201/24 , C03B2201/31 , C03C3/045 , C03C3/111 , C03C2201/24 , C03C2201/31 , Y10T428/265
Abstract: A composition represented by the formula Si1−xGexO2(1−y)N1.33y, wherein x is from about 0.05 to about 0.6 and y is from about 0.14 to about 0.74 exhibits properties highly suited for use in fabricating waveguides for liquid crystal based optical devices. In particular, the compositions have an index of refraction of from about 1.6 to about 1.8 for light at a wavelength of 1550 nm, and/or a coefficient of thermal expansion of from about 2.5×10−6° C.−1 to about 5.0×10−6° C.−1. The compositions also have inherently low hydrogen content, and a high hydrogen permeability which allows better hydrogen removal by thermal annealing to provide a material which exhibits low optical losses and better etching properties than alternative materials.
Abstract translation: 由式Si1-xGexO2（1-y）N1.33y表示的组合物，其中x为约0.05至约0.6，y为约0.14至约0.74，表现出非常适合用于制造液晶基光学波导的性能 设备。 特别地，组合物对于波长1550nm的光具有约1.6至约1.8的折射率，和/或约2.5×10-6℃-1至约5.0×10 10的热膨胀系数 -6℃-1。 组合物还具有固有的低氢含量和高的氢渗透性，其允许通过热退火更好的氢去除以提供与替代材料相比表现出低的光损耗和更好的蚀刻性能的材料。
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10.发明申请公开(公告)号：US20180057391A1
公开(公告)日：2018-03-01
申请号：US15797061
申请日：2017-10-30
Applicant: Heraeus Quarzglas GmbH & Co. KG
Inventor： Bodo KÜHN
CPC classification number: C03C3/06 , C03B19/1453 , C03B32/00 , C03B32/02 , C03B2201/07 , C03B2201/075 , C03B2201/21 , C03B2201/23 , C03B2201/24 , C03C4/04 , C03C2201/11 , C03C2201/12 , C03C2201/21 , C03C2201/23 , C03C2201/24 , C03C2203/54 , C03C2204/00 , G02B1/00 , G02B1/02 , Y02P40/57
Abstract: An optical component made of synthetic quartz glass includes a glass structure substantially free of oxygen defect sites and having a hydrogen content of 0.1×1016 to 1.0×1018 molecules/cm3, an SiH group content of less than 2×1017 molecules/cm3, a hydroxyl group content of 0.1 to 100 wt. ppm, and an Active temperature of less than 1070° C. The optical component undergoes a laser-induced change in the refractive index in response to irradiation by a radiation with a wavelength of 193 nm using 5×109 pulses with a pulse width of 125 ns and a respective energy density of 500 μJ/cm2 at a pulse repetition frequency of 2000 Hz. The change totals a first measured value M193 nm when measured using the applied wavelength of 193 nm and a second measured value M633 nm when measured using a measured wavelength of 633 nm. The ratio M193 nm/M633 nm is less than 1.7.
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