公开(公告)号：US20150140257A1

公开(公告)日：2015-05-21

申请号：US14569535

申请日：2014-12-12

Applicant: Heraeus Quarzglas GmbH & Co. KG

Inventor： Bodo Kuehn

IPC: C03B23/20 ,  G02B5/10 ,  G03F7/20 ,  C03C3/06

CPC classification number: C03B23/20 ,  C03B19/1453 ,  C03B32/00 ,  C03B2201/42 ,  C03C3/06 ,  C03C2201/42 ,  G02B5/10 ,  G03F7/708 ,  Y10T428/22 ,  Y10T428/24612

Abstract: On the basis of a known method for producing a blank of titanium-doped glass with a high silica content (glass) for a mirror substrate for use in EUV lithography which has a surface region that has an outer contour, is intended to be provided with a reflective coating and is specified as a highly loaded zone when the mirror substrate is used as intended, in order to provide a blank which can be produced at low cost and nevertheless meets high requirements with respect to homogeneity and freedom from blisters and striae, a procedure which comprises the following method steps is proposed: (a) producing a front body of titanium-doped high-quality glass with dimensions more than large enough to enclose the outer contour, (b) producing a cylindrical supporting body from titanium-doped glass, (c) bonding the front body and the supporting body to form a composite body, and (d) working the composite body to form the mirror substrate blank, wherein the step of producing the front body comprises a homogenizing process involving twisting a starting body obtained in the form of a strand by flame hydrolysis of a silicon-containing compound to form a front body blank, and the supporting body is formed as a monolithic glass block with less homogeneity than the front body.

Abstract translation: 基于具有高二氧化硅含量的钛掺杂玻璃的坯料的制造方法（玻璃）的基础是用于具有外表面的EUV光刻用的镜面基板，其目的是设置有 反射涂层，并且当反射镜基板按预期使用时被指定为高负载区域，以便提供可以以低成本生产的空白，并且在均匀性方面满足高要求并且不受起泡和条纹的影响， 提出了包括以下方法步骤的方法：（a）制造尺寸大到足以包围外轮廓的钛掺杂高品质玻璃的前体，（b）从掺钛玻璃制造圆柱形支撑体 ，（c）将所述前体和所述支撑体接合以形成复合体，和（d）加工所述复合体以形成所述反射镜基板坯料，其中，所述制造所述前体的步骤包括 一种均质化方法，其特征在于，通过使含硅化合物的火焰水解使绞合线形成的起始体扭转而形成前体坯料，所述支撑体形成为与前身均匀性较差的整体式玻璃块。

公开(公告)号：US08901019B2

公开(公告)日：2014-12-02

申请号：US13835039

申请日：2013-03-15

Applicant: Corning Incorporated

Inventor： Seshian Annamalai ,  Carlos Alberto Duran ,  Kenneth Edward Hrdina

IPC: G03F1/22 ,  C03C3/06 ,  C03C4/00 ,  C03B19/14 ,  C03B19/12

CPC classification number: G03F1/22 ,  C03B19/12 ,  C03B19/1461 ,  C03B2201/075 ,  C03B2201/12 ,  C03B2201/20 ,  C03B2201/23 ,  C03B2201/32 ,  C03B2201/40 ,  C03B2201/42 ,  C03C3/06 ,  C03C4/0085 ,  C03C2201/12 ,  C03C2201/23 ,  C03C2201/32 ,  C03C2201/40 ,  C03C2201/42 ,  C03C2203/44 ,  C03C2203/54

Abstract: The present disclosure is directed to a doped silica-titania glass, DST glass, consisting essentially of 0.1 wt. % to 5 wt. % halogen, 50 ppm-wt. to 6 wt. % one or more oxides of Al, Ta and Nb, 3 wt. % to 10 wt. % TiO2 and the remainder SiO2. In an embodiment the halogen content can be in the range of 0.2 wt. % to 3 wt. % along with 50 ppm-wt. to 6 wt. % one or more oxides of Al, Ta and Nb, 3 wt. % to 10 wt. % TiO2 and the remainder SiO2. In an embodiment the DST glass has an OH concentration of less than 100 ppm. In another embodiment the OH concentration is less than 50 ppm. The DST glass has a fictive temperature Tf of less than 875° C. In an embodiment Tf is less than 825° C. In another embodiment Tf is less than 775° C.

Abstract translation: 本公开涉及掺杂的二氧化硅 - 二氧化钛玻璃，DST玻璃，其基本上由0.1重量％ ％至5wt。 ％卤素，50ppm-wt。 至6重量％ ％的一种或多种Al，Ta和Nb的氧化物，3wt。 ％至10重量％ ％的TiO 2和其余的SiO 2。 在一个实施方案中，卤素含量可以在0.2wt。 ％〜3重量％ ％和50ppm-wt。 至6重量％ ％的一种或多种Al，Ta和Nb的氧化物，3wt。 ％〜10重量％ ％的TiO 2和其余的SiO 2。 在一个实施方案中，DST玻璃的OH浓度小于100ppm。 在另一个实施方案中，OH浓度小于50ppm。 DST玻璃具有小于875℃的假想温度Tf。在一个实施方案中，Tf小于825℃。在另一个实施方案中，Tf小于775℃

公开(公告)号：US08870396B2

公开(公告)日：2014-10-28

申请号：US13667862

申请日：2012-11-02

Applicant: Carl Zeiss SMT GmbH

Inventor： Julian Kaller ,  Wilfried Clauss ,  Michael Gerhard

IPC: G02B5/08 ,  C03B19/09 ,  C03B19/06 ,  C03C10/00 ,  G03F7/20 ,  C03C14/00 ,  C03C3/06

CPC classification number: G02B5/08 ,  C03B19/06 ,  C03B19/09 ,  C03C3/06 ,  C03C10/00 ,  C03C14/00 ,  C03C2201/42 ,  G03F7/70891

Abstract: For the production of mirrors for EUV lithography, substrates are suggested having a mean relative thermal longitudinal expansion of no more than 10 ppb across a temperature difference ΔT of 15° C. and a zero-crossing temperature in the range between 20° C. and 40° C. For this purpose, at least one first and one second material having low thermal expansion coefficients and opposite gradients of the relative thermal expansion as a function of temperature are selected and a substrate is produced by mixing and bonding these materials.

Abstract translation: 为了生产用于EUV光刻的反射镜，建议在15℃的温差和Dgr; T的平均相对热纵向膨胀不超过10ppb的基底和在20℃之间的范围内的零交叉温度 对于此目的，选择具有低热膨胀系数和相对热膨胀作为温度的函数的相反梯度的至少一种第一和第二材料，并通过混合和粘合这些材料来生产基底。

公开(公告)号：US08763430B2

公开(公告)日：2014-07-01

申请号：US13001920

申请日：2008-06-30

Applicant: Tomomi Ichinose ,  Toru Achiwa

Inventor： Tomomi Ichinose ,  Toru Achiwa

IPC: C03B37/016 ,  C03B37/027 ,  C03B19/12 ,  C03C1/00

CPC classification number: C03B37/016 ,  C03B19/12 ,  C03B37/027 ,  C03B2203/26 ,  C03C1/006 ,  C03C2201/40 ,  C03C2201/42 ,  C03C2203/26

Abstract: [Object] In manufacturing a GRIN lens by a sol-gel method, an operation for preparing a wet gel is facilitated and cracking in a base material during sintering and foaming during drawing are prevented.[Solution] The object is achieved by obtaining a GRIN lens by producing a wet gel from an alcohol solution containing a silicon alkoxide, a dopant alkoxide, and a boron alkoxide as the main ingredients, leaching the same, drying the same to form a dry gel, and sintering and drawing the same.

Abstract translation: 在通过溶胶 - 凝胶法制造GRIN透镜时，促进制备湿凝胶的操作，并且防止了在烧结期间的基材中的裂纹和拉伸期间的发泡。 [解决方案]通过从含有硅醇盐，掺杂剂醇盐和硼醇盐的醇溶液中生产湿凝胶作为主要成分，通过获得GRIN透镜获得GRIN透镜，浸出，干燥，​​形成干燥 凝胶，烧结和拉丝。

公开(公告)号：US08539797B2

公开(公告)日：2013-09-24

申请号：US12940405

申请日：2010-11-05

Applicant: Shigeru Maida ,  Hisatoshi Otsuka

Inventor： Shigeru Maida ,  Hisatoshi Otsuka

IPC: C03B37/018 ,  C03B19/01 ,  C03B19/06 ,  C03C3/06

CPC classification number: G03F1/22 ,  C03B19/1423 ,  C03B2201/20 ,  C03B2201/42 ,  C03C3/06 ,  C03C4/0085 ,  C03C2201/20 ,  C03C2201/42 ,  Y02P40/57

Abstract: A titania and sulfur co-doped quartz glass member is provided. Due to co-doping of titania and sulfur, the quartz glass member undergoes zero expansion at a certain temperature and low thermal expansion over a wide temperature range, and is thus suited for use in a commercial EUV lithography tool. A manufacturing method and an optical member for EUV lithography are also provided.

Abstract translation: 提供二氧化钛和硫共掺杂石英玻璃构件。 由于二氧化钛和硫的共掺杂，石英玻璃构件在宽温度范围内在一定温度下经历零膨胀和低热膨胀，因此适用于商业EUV光刻工具。 还提供了用于EUV光刻的制造方法和光学构件。

公开(公告)号：US08377612B2

公开(公告)日：2013-02-19

申请号：US13345936

申请日：2012-01-09

Applicant: Shigeru Maida ,  Hisatoshi Otsuka

Inventor： Shigeru Maida ,  Hisatoshi Otsuka

IPC: G03F1/22 ,  G03F1/24 ,  B32B9/00

CPC classification number: C03C3/06 ,  C03B19/1453 ,  C03B19/1469 ,  C03B23/0026 ,  C03B2201/23 ,  C03B2201/42 ,  C03C2201/42 ,  C03C2203/46 ,  C03C2203/52 ,  Y10T428/31616

Abstract: In a titania-doped quartz glass member having a surface where EUV light of up to 70 nm wavelength is reflected, a refractive index distribution in the surface has only one extreme point within a central 80% region of the member. The titania-doped quartz glass member has a surface with a high level of precision and thus can be formed into an EUV lithography photomask substrate which is improved in flatness and thermal expansion properties.

Abstract translation: 在具有反射高达70nm波长的EUV光的表面的二氧化钛掺杂石英玻璃构件中，表面中的折射率分布在构件的中心80％区域内仅具有一个极值点。 掺杂二氧化钛的石英玻璃构件具有高精度的表面，因此可以形成为平面度和热膨胀性能提高的EUV光刻光掩模基板。

公开(公告)号：US08240172B2

公开(公告)日：2012-08-14

申请号：US13080704

申请日：2011-04-06

Applicant: Chikaya Tamitsuji ,  Kunio Watanabe ,  Akio Koike

Inventor： Chikaya Tamitsuji ,  Kunio Watanabe ,  Akio Koike

IPC: C03B37/018

CPC classification number: C03B19/1461 ,  C03B2201/12 ,  C03B2201/42 ,  C03C3/06 ,  C03C2201/12 ,  C03C2201/42

Abstract: The present invention relates to a process for production of a synthetic quartz glass having a fluorine concentration of 1,000 mass ppm or more, the process comprising: (a) a step of depositing and growing quartz glass fine particles obtained by flame hydrolysis of a glass forming raw material onto a substrate, to thereby form a porous glass body; (b) a step of keeping the porous glass body in a reaction vessel that is filled with elemental fluorine (F2) or a mixed gas comprising elemental fluorine (F2) diluted with an inert gas and contains a solid metal fluoride, to thereby obtain a fluorine-containing porous glass body; and (c) a step of heating the fluorine-containing porous glass body to a transparent vitrification temperature, to thereby obtain a fluorine-containing transparent glass body.

Abstract translation: 本发明涉及一种氟浓度为1000质量ppm以上的合成石英玻璃的制造方法，其特征在于，包括：（a）沉积和生长通过玻璃成形的火焰水解得到的石英玻璃微粒子的工序 原料在基板上，从而形成多孔玻璃体; （b）将多孔玻璃体保持在填充有元素氟（F2）的反应容器或包含用惰性气体稀释的元素氟（F2）的混合气体并含有固体金属氟化物的步骤，从而获得 含氟多孔玻璃体; 和（c）将含氟多孔质玻璃体加热至透明玻璃化温度的步骤，得到含氟透明玻璃体。

公开(公告)号：US20120104336A1

公开(公告)日：2012-05-03

申请号：US13345936

申请日：2012-01-09

Applicant: Shigeru MAIDA ,  Hisatoshi Otsuka

Inventor： Shigeru MAIDA ,  Hisatoshi Otsuka

IPC: C03C4/04

CPC classification number: C03C3/06 ,  C03B19/1453 ,  C03B19/1469 ,  C03B23/0026 ,  C03B2201/23 ,  C03B2201/42 ,  C03C2201/42 ,  C03C2203/46 ,  C03C2203/52 ,  Y10T428/31616

Abstract: In a titania-doped quartz glass member having a surface where EUV light of up to 70 nm wavelength is reflected, a refractive index distribution in the surface has only one extreme point within a central 80% region of the member. The titania-doped quartz glass member has a surface with a high level of precision and thus can be formed into an EUV lithography photomask substrate which is improved in flatness and thermal expansion properties.

Abstract translation: 在具有反射高达70nm波长的EUV光的表面的二氧化钛掺杂石英玻璃构件中，表面中的折射率分布在构件的中心80％区域内仅具有一个极值点。 掺杂二氧化钛的石英玻璃构件具有高精度的表面，因此可以形成为平面度和热膨胀性能提高的EUV光刻光掩模基板。

公开(公告)号：US08137469B2

公开(公告)日：2012-03-20

申请号：US11305857

申请日：2005-12-14

Applicant: Daniel Warren Hawtof ,  Michael T Kelley ,  John Stephen Rosettie ,  Andrew Paul Schermerhorn ,  Kashyap H Shah ,  John Stone, III ,  Pushkar Tandon

Inventor： Daniel Warren Hawtof ,  Michael T Kelley ,  John Stephen Rosettie ,  Andrew Paul Schermerhorn ,  Kashyap H Shah ,  John Stone, III ,  Pushkar Tandon

IPC: C03B37/018

CPC classification number: C03B19/1423 ,  C03B19/1453 ,  C03B19/1476 ,  C03B2207/66 ,  C03C3/06 ,  C03C2201/23 ,  C03C2201/42

Abstract: Disclosed are process and apparatus for making high purity fused silica glass materials. The process involves depositing soot particles onto an essentially planar deposition supporting surface and modulation of motion of the soot-generating device relative to the deposition supporting surface to result in a low local soot density variation. The apparatus is designed to implement the planar deposition process. The invention makes it possible to produce fused silica glass without the use of potentially contaminating refractory bricks.

Abstract translation: 公开了制备高纯度熔融石英玻璃材料的方法和设备。 该方法包括将烟灰颗粒沉积到基本平坦的沉积支撑表面上，并且调节烟灰产生装置相对于沉积支撑表面的运动以导致低的局部烟灰密度变化。 该设备被设计成实现平面沉积过程。 本发明使得可以生产熔融石英玻璃而不使用潜在的污染耐火砖。

公开(公告)号：US08105734B2

公开(公告)日：2012-01-31

申请号：US12496688

申请日：2009-07-02

Applicant: Shigeru Maida ,  Hisatoshi Otsuka

Inventor： Shigeru Maida ,  Hisatoshi Otsuka

IPC: G03F1/00 ,  C03B19/06

CPC classification number: C03C3/06 ,  C03B19/1453 ,  C03B19/1469 ,  C03B23/0026 ,  C03B2201/23 ,  C03B2201/42 ,  C03C2201/42 ,  C03C2203/46 ,  C03C2203/52 ,  Y10T428/31616

Abstract: In a titania-doped quartz glass member having a surface where EUV light of up to 70 nm wavelength is reflected, a refractive index distribution in the surface has only one extreme point within a central 80% region of the member. The titania-doped quartz glass member has a surface with a high level of precision and thus can be formed into an EUV lithography photomask substrate which is improved in flatness and thermal expansion properties.

Abstract translation: 在具有反射高达70nm波长的EUV光的表面的二氧化钛掺杂石英玻璃构件中，表面中的折射率分布在构件的中心80％区域内仅具有一个极值点。 掺杂二氧化钛的石英玻璃构件具有高精度的表面，因此可以形成为平面度和热膨胀性能提高的EUV光刻光掩模基板。