Abstract:
A structure can comprise a substrate and a composite coating. The composite coating can be formed over a surface of the substrate. The composite coating can include one or more nanoparticles within an oxide matrix. The nanoparticles can be formed of a temperature-dependent Mott insulator having a phase transition temperature. At a temperature below the phase transition temperature, the composite coating can transmit light in a first wavelength range, and at a temperature above the phase transition temperature, the composite coating can block light in the first wavelength range. For example, the structure can be used as a smart 10 window to help regulate heating of building interiors due to solar radiation. The composite coating can be formed via a short-duration, high-temperature heating pulse, for example, at least 1500 K for less than 60 seconds.
Abstract:
A copper dopant delivery powder comprising a fused silica powder and a Cu2S powder. A method of making the copper dopant delivery powder. A method of making a copper-doped glass comprising placing a target glass in a container, packing a composite SiO.CuS dopant powder around the target glass and heating the container and SiO.CuS dopant powder to a temperature of between 800° C. and 1150° C. A copper-doped glass comprising a glass comprising copper-doping wherein the copper-doped glass was formed by covering the glass with a fused silica powder and a Cu2S powder, wherein the fused silica powder and the Cu2S powder are mixed in varying ratios of Cu2S to silica represented by the formula (SiO2)(1-x)(Cu2S)x and heating to a temperature of between 800° C. and 1150° C.
Abstract:
Ultralow expansion titania-silica glass. The glass has high hydroxyl content and optionally include one or more dopants. Representative optional dopants include boron, alkali elements, alkaline earth elements or metals such as Nb, Ta, Al, Mn, Sn Cu and Sn. The glass is prepared by a process that includes steam consolidation to increase the hydroxyl content. The high hydroxyl content or combination of dopant(s) and high hydroxyl content lowers the fictive temperature of the glass to provide a glass having a very low coefficient of thermal expansion (CTE), low fictive temperature (Tf), and low expansivity slope.
Abstract:
A method of inspecting a synthetic silica glass molded body includes: irradiating the synthetic silica glass molded body with a spectrum line of an Hg lamp having a wavelength of 248 nm; measuring light emitted by the synthetic silica glass molded body; and a procedure which may include screening a portion which satisfies a condition that a ratio of the bright line intensity and the fluorescent light intensity is of a certain value or less, or which may include determining whether a condition that a ratio of a minimum value and a maximum value of a measured fluorescent light intensity is in a certain range is satisfied or not.
Abstract:
A method of inspecting a synthetic silica glass molded body includes: irradiating the synthetic silica glass molded body with a spectrum line of an Hg lamp having a wavelength of 248 nm; measuring light emitted by the synthetic silica glass molded body; and a procedure which may include screening a portion which satisfies a condition that a ratio of the bright line intensity and the fluorescent light intensity is of a certain value or less, or which may include determining whether a condition that a ratio of a minimum value and a maximum value of a measured fluorescent light intensity is in a certain range is satisfied or not.
Abstract:
The invention relates to a silica glass compound having improved physical and chemical properties. In one embodiment, the present invention relates to a silica glass having a desirable brittleness in combination with a desirable density while still yielding a glass composition having a desired hardness and desired strength relative to other glasses. In another embodiment, the present invention relates to a silica glass composition that contains at least about 85 mole percent silicon dioxide and up to about 15 mole percent of one or more dopants selected from F, B, N, Al, Ge, one or more alkali metals (e.g., Li, Na, K, etc.), one or more alkaline earth metals (e.g., Mg, Ca, Sr, Ba, etc.), one or more transition metals (e.g., Ti, Zn, Y, Zr, Hf, etc.), one or more lanthanides (e.g., Ce, etc.), or combinations of any two or more thereof.
Abstract:
The present invention is to provide a TiO2—SiO2 glass having suitable thermal expansion properties as an optical member of an exposure tool for EUVL. The present invention relates to a TiO2-containing silica glass having a temperature, at which a coefficient of thermal expansion is 0 ppb/° C., falling within the range of 23±4° C. and a temperature width, in which a coefficient of thermal expansion is 0±5 ppb/° C., of 5° C. or more.
Abstract:
A method of molding a synthetic silica glass molded body by accommodating a synthetic silica glass block in a mold provided with a pressing portion, and by pressing the block while heating, the method comprising: a step of washing the synthetic silica glass block so that a concentration of copper which is present on the surface of the synthetic silica glass block is 2 ng/cm2 or less, and so that a concentration of aluminium thereon is 10 ng/cm2 or less, before accommodating the synthetic silica glass block in the mold; a step of heating high purity carbon powders in which a content of copper is 40 wt.ppb or less and a content of aluminium is 100 wt.ppb or less at a temperature condition of 1200° C. to 1900° C.; a step of heating the mold at a temperature condition of 1700° C. to 1900° C.; a step of applying the high purity carbon powders after the heating step on the inner surface of the mold after the heating step, before accommodating the synthetic silica glass block in the mold; and a step of molding the synthetic silica glass block in a predetermined form by pressing the block by means of the pressing portion while heating so as to the temperature of the block can be within a hold temperature range of 1500° C. to 1700° C., after accommodating the washed synthetic silica glass block in the mold.
Abstract translation:一种通过将合成石英玻璃块容纳在具有按压部分的模具中并通过在加热时加压块来成型合成石英玻璃成型体的方法,所述方法包括:洗涤合成石英玻璃块,使得 存在于合成石英玻璃块的表面上的铜的浓度在将合成石英玻璃块容纳在模具中之前为2ng / cm 2以下,使其上的铝浓度为10ng / cm 2以下。 在1200℃至1900℃的温度条件下,加热铜含量为40重量ppm以下,铝含量为100重量ppm以下的高纯度碳粉末的工序。 在1700℃至1900℃的温度条件下加热模具的步骤。 在将合成石英玻璃块容纳在模具中之后,在加热步骤之后将高纯度碳粉末加热到模具的内表面之后的步骤; 以及通过在加热的同时通过按压部分压块而使预定形式的合成石英玻璃块成型的步骤,使得块的温度可以在1500℃至1700℃的保持温度范围内 在将洗涤的合成石英玻璃块容纳在模具中之后。
Abstract:
The X-ray opaque glass is characterized by a composition, in mol %, of SiO2, 75-98; Yb2O3, 0.1 to 40; and ZrO2, 0 to 40. Preferred embodiments of the glass are free of Al2O3 and B2O3. The glass is produced from the glass batch by melting at a temperature of at least 1500° C. in an iridium or iridium alloy vessel with the assistance of high-frequency radiation. In preferred embodiments of the glass production process at least one raw material ingredient is present in the batch as a nanoscale powder. The glass is useful in dental applications, optical applications, and biomedical applications, or for photovoltaics, or as a target material in PVD processes.
Abstract translation:X射线不透明玻璃的特征在于以摩尔%计的SiO 2,75-98的组成; Yb2O3,0.1〜40; 和ZrO 2,0至40.玻璃的优选实施方案不含Al 2 O 3和B 2 O 3。 在高频辐射的帮助下,通过在铱或铱合金容器中在至少1500℃的温度下熔融从玻璃批料中制造玻璃。 在玻璃制备方法的优选实施方案中,至少一种原料成分以批量存在于纳米级粉末中。 该玻璃可用于牙科应用,光学应用,生物医学应用,或光伏发电,或作为PVD工艺中的靶材料。
Abstract:
A known quartz glass crucible for crystal pulling consists of a crucible wall, having an outer layer which is provided in an external area thereof with a crystallisation promoter which results in crystallisation of quartz glass, forming cristobalite when the quartz glass crucible is heated according to specified use in crystal pulling. The aim of the invention is to provide a quartz glass crucible which has a long service life. As a result, the crystallisation promoter contains, in addition to a silicon, a first component which acts as a reticulating agent in quartz glass and a second component which is free of alkali metals and which acts as an agent forming separating points in quartz glass. The above mentioned components are contained and incorporated into a doping area (8) of the outer layer (6) having a layer thickness of more than 0.2 mm.