公开(公告)号：US20160231243A1

公开(公告)日：2016-08-11

申请号：US14850730

申请日：2015-09-10

Applicant: Electronics and Telecommunications Research Institute

Inventor： Jong Deog KIM ,  Mi-ryong PARK ,  Dongseung SHIN

IPC: G01N21/59 ,  G01N21/49

CPC classification number: G01N21/59 ,  G01N21/5911 ,  G01N2021/1793 ,  G01N2201/06113 ,  G01N2201/10

Abstract: A vehicle window visible ray transmittance remote sensing system emits a plurality of laser beams to a driving vehicle, estimates transmittance of a window of the vehicle by acquiring a plurality of point data of a plurality of points from which a plurality of laser beams are reflected from a surface of the vehicle, and distinguishes a vehicle that deviates from a transmittance reference based on the estimated window transmittance.

Abstract translation: 车辆窗口可见光透射率遥感系统向驾驶车辆发射多个激光束，通过获取从多个激光束反射的多个点的多个点数据来估计车辆的窗口的透射率 车辆的表面，并且基于估计的窗口透射率来区分偏离透射率基准的车辆。

公开(公告)号：US20160209322A1

公开(公告)日：2016-07-21

申请号：US14962971

申请日：2015-12-08

Applicant: Bruker Nano, Inc.

Inventor： Gregory O. Andreev

IPC: G01N21/17 ,  G01Q30/20

CPC classification number: G01N21/171 ,  B82Y35/00 ,  G01N21/3563 ,  G01N2201/06113 ,  G01N2201/10 ,  G01N2201/12 ,  G01Q30/02 ,  G01Q30/20 ,  G01Q60/32

Abstract: An apparatus and method of performing photothermal chemical nanoidentification of a sample includes positioning a tip of a probe at a region of interest of the sample, with the tip-sample separation being less than about 10 nm. Then, IR electromagnetic energy having a selected frequency, ω, is directed towards the tip. Using PFT mode AFM operation, absorption of the energy at the region of interest is identified. calorimetry may also be performed with the photothermal PFT system.

Abstract translation: 进行样品的光热化学纳米识别的装置和方法包括将探针的尖端定位在样品的感兴趣区域，尖端样品分离小于约10nm。 然后，具有选定频率ω的IR电磁能量指向尖端。 使用PFT模式AFM操作，识别感兴趣区域的能量吸收。 光热法还可以用光热PFT系统进行。

公开(公告)号：US09355443B2

公开(公告)日：2016-05-31

申请号：US14478859

申请日：2014-09-05

Applicant: Applied Materials Israel, Ltd.

Inventor： Zvi Goren ,  Nir Ben-David Dodzin

IPC: G06K9/00 ,  G06T7/00 ,  G01N21/95 ,  G01B11/14

CPC classification number: G06T7/0008 ,  G01B11/14 ,  G01N21/9501 ,  G01N2201/10 ,  G01N2201/125 ,  G01N2201/127 ,  G06T7/32 ,  G06T2207/30148

Abstract: A system for location based wafer analysis, the system comprising: (i) a first input interface; (ii) a second input interface; (iii) a correlator; and (iv) a processor, configured to generate inspection results for the inspected wafer, with the help of at least one frame run-time displacement.

Abstract translation: 一种用于基于位置的晶片分析的系统，所述系统包括：（i）第一输入接口; （ii）第二输入接口; （iii）相关器; 以及（iv）处理器，被配置为通过至少一个帧运行时位移来产生检查的晶片的检查结果。

公开(公告)号：US09329136B2

公开(公告)日：2016-05-03

申请号：US14396908

申请日：2013-04-24

Applicant: Hitachi High-Technologies Corporation

Inventor： Toshifumi Honda ,  Yuta Urano ,  Takahiro Jingu ,  Akira Hamamatsu

IPC: G01N21/00 ,  G01N21/95 ,  G01N21/956 ,  G01J1/04

CPC classification number: G01N21/8806 ,  G01J1/0474 ,  G01J1/44 ,  G01N21/9501 ,  G01N21/956 ,  G01N2201/06113 ,  G01N2201/068 ,  G01N2201/0683 ,  G01N2201/0697 ,  G01N2201/10 ,  G01N2201/12

Abstract: To detect an infinitesimal defect, highly precisely measure the dimensions of the detect, a detect inspection device is configured to comprise: a irradiation unit which irradiate light in a linear region on a surface of a sample; a detection unit which detect light from the linear region; and a signal processing unit which processes a signal obtained by detecting light and detecting a defect. The detection unit includes: an optical assembly which diffuses the light from the sample in one direction and forms an image in a direction orthogonal to the one direction; and a detection assembly having an array sensor in which detection pixels are positioned two-dimensionally, which detects the light diffused in the one direction and imaged in the direction orthogonal to the one direction, adds output signals of each of the detection pixels aligned in the direction in which the light is diffused, and outputs same.

Abstract translation: 为了检测无限小的缺陷，高度精确地测量检测器的尺寸，检测检查装置被配置为包括：照射单元，其照射样品表面上的线性区域中的光; 检测单元，其检测来自所述线性区域的光; 以及处理通过检测光而获得的信号并检测缺陷的信号处理单元。 检测单元包括：光学组件，其在一个方向上扩散来自样品的光并在与该一个方向正交的方向上形成图像; 以及检测组件，其具有阵列传感器，其中检测像素被二维地定位，其检测沿与所述一个方向正交的方向成像的沿所述一个方向漫射的光，并将每个所述检测像素的输出信号相加， 光漫射的方向，并输出。

公开(公告)号：US20160069786A1

公开(公告)日：2016-03-10

申请号：US14785199

申请日：2014-04-15

Applicant: KONINKLIJKE PHILIPS N.V.

Inventor： TOMMY WINTHER BERG ,  ERIK SPILLUM ,  MARTIN CHRISTIAN VALVIK ,  TOM OLESEN

IPC: G01N15/02 ,  G01N15/06

CPC classification number: G01N15/0211 ,  G01N15/0227 ,  G01N15/06 ,  G01N15/10 ,  G01N15/1463 ,  G01N21/07 ,  G01N21/272 ,  G01N21/51 ,  G01N21/53 ,  G01N33/146 ,  G01N2015/0053 ,  G01N2015/0065 ,  G01N2015/0088 ,  G01N2015/025 ,  G01N2015/0294 ,  G01N2015/0687 ,  G01N2015/0693 ,  G01N2015/1006 ,  G01N2015/1087 ,  G01N2015/1093 ,  G01N2015/1493 ,  G01N2015/1497 ,  G01N2201/10

Abstract: An optical system suitable for determining a characteristic as a function of time of at least a part of a liquid volume comprising a plurality of objects. The optical system provides a fast detection of a change in the liquid volume. The optical system comprises—an optical detection assembly comprising at least one image acquisition device configured to acquire images of an image acquisition area; —a sample device comprising at least one sample container suitable for holding a sample of said liquid volume; —a translating arrangement configured to translate said image acquisition area through at least one part of said sample container to perform a scan along a scanning path through said part of said sample container; and—an image analyzing processing system. The optical system is programmed to perform consecutive scans through said at least one part of said sample container, wherein each scan comprises acquiring images at a plurality of image acquiring positions of the image acquisition area by the optical detection assembly along at least one scanning path of the scan. The image analyzing processing system is programmed to determine a set of features in the form of a set of values for each of a plurality of objects captured on said images from each respective scan and to determine for each scan at least one derived result, the derived result is derived from a plurality of the sets of values, and to present said derived result obtained from the respective, consecutive scans as a function of time.

Abstract translation: 一种光学系统，适于确定作为包括多个物体的液体体积的至少一部分的时间的函数的特性。 光学系统提供对液体体积变化的快速检测。 光学系统包括 - 光学检测组件，其包括被配置为获取图像获取区域的图像的至少一个图像采集装置; 一种样品装置，其包括适于保持所述液体体积的样品的至少一个样品容器; - 平移装置，被配置为通过所述样本容器的至少一部分翻译所述图像获取区域，以沿着穿过所述样本容器的所述部分的扫描路径进行扫描; 和图像分析处理系统。 光学系统被编程为通过所述样品容器的所述至少一个部分执行连续的扫描，其中每个扫描包括通过光学检测组件在图像获取区域的多个图像获取位置沿着至少一个扫描路径获取图像 扫描。 图像分析处理系统被编程为以对于从每个相应扫描在所述图像上捕获的多个对象中的每一个的一组值的形式来确定一组特征，并且为每个扫描确定至少一个派生结果，导出 结果是从多组值导出的，并且呈现作为时间的函数的从相应的连续扫描获得的所得到的结果。

公开(公告)号：US20160061749A1

公开(公告)日：2016-03-03

申请号：US14674856

申请日：2015-03-31

Applicant: KLA-Tencor Corporation

Inventor： Hong Chen ,  Kenong Wu ,  Eugene Shifrin ,  Masatoshi Yamaoka

IPC: G01N21/95 ,  G01N21/94

CPC classification number: G01N21/9501 ,  G01N21/00 ,  G01N21/94 ,  G01N21/95 ,  G01N2201/061 ,  G01N2201/10

Abstract: Systems and methods for detecting defects on a wafer are provided. One method includes generating test image(s) for at least a portion of an array region in die(s) on a wafer from frame image(s) generated by scanning the wafer with an inspection system. The method also includes generating a reference image for cell(s) in the array region from frame images generated by the scanning of the wafer. In addition, the method includes determining difference image(s) for at least one cell in the at least the portion of the array region in the die(s) by subtracting the reference image from portion(s) of the test image(s) corresponding to the at least one cell. The method further includes detecting defects on the wafer in the at least one cell based on the difference image(s).

Abstract translation: 提供了用于检测晶片上的缺陷的系统和方法。 一种方法包括从通过用检查系统扫描晶片产生的帧图像为晶片上的晶片中的晶片的阵列区域的至少一部分生成测试图像。 该方法还包括从通过晶片扫描生成的帧图像生成阵列区域中的单元的参考图像。 另外，该方法包括通过从测试图像的一部分中减去参考图像来确定模具中的阵列区域的至少一部分中的至少一个单元的差分图像， 对应于至少一个小区。 该方法还包括基于差分图像来检测至少一个单元中的晶片上的缺陷。

公开(公告)号：US20160026845A1

公开(公告)日：2016-01-28

申请号：US14875882

申请日：2015-10-06

Applicant: LOCKHEED MARTIN CORPORATION

Inventor： Edward Miesak ,  V. Edward Gold, JR.

IPC: G06K9/00 ,  G01N21/94

CPC classification number: G06K9/00033 ,  G01N21/8851 ,  G01N21/94 ,  G01N2201/06113 ,  G01N2201/10 ,  G06K9/00013 ,  G06K9/2036

Abstract: This document relates to systems and method for latent fingerprint detection using specular reflection (glare). An exemplary system may include a light source alignment portion configured to align a light source at an illumination angle relative to a sample surface such that the light source illuminates a sample surface so that the surface produces specular reflection. The system may also include a specular reflection discriminator that directs the produced specular reflection to an optical detector aligned relative to said sample surface at an alignment angle that is substantially equal to an angle of reflection of the produced specular reflection. Preferably, the directed specular reflection does not saturate the optical detector; and the optical detector captures the specular reflection from the sample surface and generates image data using essentially only the specular reflection.

公开(公告)号：US09229338B2

公开(公告)日：2016-01-05

申请号：US13059405

申请日：2009-07-27

Applicant: Marcus Adrianus Van De Kerkhof ,  Maurits Van Der Schaar ,  Hendrik Jan Hidde Smilde

Inventor： Marcus Adrianus Van De Kerkhof ,  Maurits Van Der Schaar ,  Hendrik Jan Hidde Smilde

IPC: G01B11/00 ,  G03B27/32 ,  G03B27/54 ,  G03B27/74 ,  H01L23/28 ,  G03F7/20 ,  G03F9/00 ,  H01L23/544

CPC classification number: G01N21/9501 ,  G01N21/4738 ,  G01N2201/06113 ,  G01N2201/10 ,  G02B5/1823 ,  G02B5/1861 ,  G03F7/70058 ,  G03F7/70633 ,  G03F7/70683 ,  G03F9/70 ,  G03F9/7046 ,  G03F9/7076 ,  H01L23/544 ,  H01L2924/0002 ,  Y10T428/24612 ,  H01L2924/00

Abstract: Scatterometry for measuring overlay. A second set of superimposed gratings are superposed over a first set of superimposed gratings. The second set of gratings have a different periodicity from the first set of gratings or a different orientation. Consequently the first order diffraction pattern from the second set of superimposed gratings can be distinguished from the first order diffraction pattern from the first set of superimposed gratings.

Abstract translation: 用于测量覆盖层的散射法。 第二组叠加的光栅叠加在第一组叠加的光栅上。 第二组光栅具有与第一组光栅不同的周期性或不同的取向。 因此，来自第二组叠加光栅的一阶衍射图可以与来自第一组叠加光栅的一阶衍射图案区分开。

公开(公告)号：US20150323471A1

公开(公告)日：2015-11-12

申请号：US14708058

申请日：2015-05-08

Applicant: KLA-Tencor Corporation

Inventor： Noam Sapiens ,  Andrei V. Shchegrov ,  Stilian Ivanov Pandev

IPC: G01N21/956 ,  G01N21/95 ,  G01N21/93 ,  G01B11/00

CPC classification number: G01N21/93 ,  G01B2210/56 ,  G01N21/4788 ,  G01N21/9501 ,  G01N21/95607 ,  G01N2201/06113 ,  G01N2201/062 ,  G01N2201/10 ,  G01N2201/1296

Abstract: In one embodiment, apparatus and methods for determining a parameter of a target are disclosed. A target having an imaging structure and a scatterometry structure is provided. An image of the imaging structure is obtained with an imaging channel of a metrology tool. A scatterometry signal is also obtained from the scatterometry structure with a scatterometry channel of the metrology tool. At least one parameter, such as overlay error, of the target is determined based on both the image and the scatterometry signal.

Abstract translation: 在一个实施例中，公开了用于确定目标的参数的装置和方法。 提供具有成像结构和散射测量结构的目标。 使用计量工具的成像通道获得成像结构的图像。 散射测量信号也通过散度仪结构与计量工具的散射测量通道获得。 基于图像和散射测量信号确定目标的至少一个参数，例如重叠误差。

公开(公告)号：US20150293035A1

公开(公告)日：2015-10-15

申请号：US14682822

申请日：2015-04-09

Applicant: KLA-Tencor Corporation

Inventor： Vaibhav Gaind ,  Nisha Amthul

IPC: G01N21/95 ,  G01N21/47 ,  G01N21/956

CPC classification number: G01N21/9501 ,  G01N21/956 ,  G01N2201/10

Abstract: Methods and systems for detecting defects on a wafer are provided. One system includes an illumination subsystem configured to direct light to at least one spot on a wafer. The system also includes at least one element configured to block first portion(s) of light scattered from the at least one spot from reaching a detector while allowing second portion(s) of the light scattered from the at least one spot to be detected by the detector. The first portion(s) of the light are scattered from one or more patterned features in a logic region on the wafer. The second portion(s) of the light are not scattered from the one or more patterned features. The detector is not an imaging detector. The system further includes a computer subsystem configured to detect defects on the wafer based on output of the detector.

Abstract translation: 提供了用于检测晶片上的缺陷的方法和系统。 一个系统包括被配置为将光引导到晶片上的至少一个点的照明子系统。 该系统还包括至少一个元件，其构造成阻挡从至少一个点散射的光的第一部分到达检测器，同时允许从至少一个点散射的光的第二部分被 检测器。 光的第一部分从晶片上的逻辑区域中的一个或多个图案特征散射。 光的第二部分不从一个或多个图案特征散射。 检测器不是成像检测器。 该系统还包括被配置为基于检测器的输出来检测晶片上的缺陷的计算机子系统。