Process for forming an isolated electrically conductive contact through a metal package
    161.
    发明授权
    Process for forming an isolated electrically conductive contact through a metal package 失效
    用于通过金属封装形成隔离的导电触点的工艺

    公开(公告)号:US08117744B2

    公开(公告)日:2012-02-21

    申请号:US13027167

    申请日:2011-02-14

    Abstract: A method of forming an isolated electrically conductive contact through a metallic substrate includes creating at least one via through the substrate, where the via includes a first opening in a top surface of the substrate, a second opening in an opposing bottom surface and at least one continuous sidewall extending therebetween. A dielectric sleeve is formed on the at least one sidewall of the via while preserving at least a portion of the through via. An electrically conductive filler is then placed into the via. In the examples disclosed, the filler may be a conductive ink or a conductive epoxy.

    Abstract translation: 通过金属基底形成隔离的导电接触的方法包括产生穿过基底的至少一个通孔,其中通孔包括在基底的顶表面中的第一开口,在相对的底表面中的第二开口和至少一个 连续的侧壁在其间延伸。 介电套筒形成在通孔的至少一个侧壁上,同时保留通孔的至少一部分。 然后将导电填料放入通孔中。 在所公开的实施例中,填料可以是导电油墨或导电环氧树脂。

    Core via for chip package and interconnect
    165.
    发明申请
    Core via for chip package and interconnect 审中-公开
    核心芯片封装和互连

    公开(公告)号:US20100326716A1

    公开(公告)日:2010-12-30

    申请号:US12459082

    申请日:2009-06-26

    Abstract: In integrated circuit packages, core vias are created to provide electrical connections between circuitry on one face of the core substrate material with circuitry on an opposing face of the core substrate material. Provided are methods for forming a via in a packaging substrate and packaging substrates having core vias formed in the core substrate material. Methods for forma a core via in a packaging substrate in which a first hole is created through the core substrate and filled with a low permittivity filler material. A second co-axially aligned hole is then created in the low permittivity filler material wherein the second hole is smaller in diameter than the first hole. The second hole is then filled with conducting material to provide a conducting via through the core substrate material.

    Abstract translation: 在集成电路封装中,形成核心通孔以在芯基板材料的一个面上的电路与芯基板材料的相对面上的电路之间提供电连接。 提供了在封装基板中形成通孔的方法以及在芯基板材料中形成有芯通孔的封装基板。 在包装基材中形成芯通孔的方法,其中通过芯基板产生第一孔并填充低介电常数的填充材料。 然后在低介电常数填充材料中产生第二同轴对准的孔,其中第二孔的直径小于第一孔。 然后用导电材料填充第二孔,以通过芯基板材料提供导电通孔。

    Circuit board manufacturing method and circuit board
    167.
    发明授权
    Circuit board manufacturing method and circuit board 有权
    电路板制造方法和电路板

    公开(公告)号:US07679004B2

    公开(公告)日:2010-03-16

    申请号:US10598524

    申请日:2005-03-02

    Abstract: As means for solving a problem of a positional shift of a land and a hole which is caused by an alignment in the formation of an etching resist layer and a plated resist layer in a method of manufacturing a circuit board, there are provided a method of manufacturing a circuit board including the steps of forming a first resin layer on a surface of an insulating substrate having a conductive layer on the surface and an internal wall of a through hole or/and a non-through hole, forming a second resin layer which is insoluble or slightly soluble in a developing solution for the first resin layer on the first resin layer provided on the surface conductive layer, and removing the first resin layer provided over the hole with the developing solution for the first resin layer, and a method of manufacturing a circuit board including the step of uniformly charging a surface of the first resin layer to induce a potential difference to the first resin layer provided over the hole and the first resin layer provided on the surface conductive layer before forming the second resin layer. Moreover, there is provided a circuit board having a hole with a small positional shift and high precision.

    Abstract translation: 作为在电路基板的制造方法中解决在形成抗蚀剂层和电镀抗蚀剂层时的取向引起的焊盘和孔的位置偏移的问题的方法,提供了一种方法, 制造电路板,包括以下步骤:在表面上具有导电层的绝缘基板的表面上形成第一树脂层和通孔或/或非通孔的内壁,形成第二树脂层,所述第二树脂层 在设置在表面导电层上的第一树脂层上的第一树脂层的显影液中不溶或微溶,用第一树脂层的显影液除去设在孔上的第一树脂层, 制造电路板,包括对第一树脂层的表面均匀充电以对设置在孔上的第一树脂层引起电位差的步骤, 在形成第二树脂层之前,在表面导电层上设置阴极层。 此外,提供一种电路板,其具有位置偏移小且精度高的孔。

    Microelectronic device with mixed dielectric
    168.
    发明授权
    Microelectronic device with mixed dielectric 有权
    具有混合电介质的微电子器件

    公开(公告)号:US07470863B2

    公开(公告)日:2008-12-30

    申请号:US11338402

    申请日:2006-01-24

    Abstract: A microelectronic device and method of making the microelectronic device is provided. A dielectric substrate having first and second surfaces is provided. A first component, located in the dielectric substrate between the first and second surfaces of the dielectric substrate is formed. The first component includes a first interface and a second interface. A second component located in the dielectric substrate and spaced relative to the first component is formed, and a first low permittivity material is formed having a predetermined thickness and a first and second surface, the first surface of the low permittivity material is adjacent to or in contact with a first portion of the first interface of the first component. The first low permittivity material substantially reduces capacitive parasitics of the first component, resulting in a substantially higher characteristic impedance of the first component during operation of the microelectronic device.

    Abstract translation: 提供微电子器件和制造微电子器件的方法。 提供具有第一和第二表面的电介质基片。 形成位于电介质基板之间的电介质基板的第一和第二表面之间的第一部件。 第一组件包括第一接口和第二接口。 形成位于电介质基板中并相对于第一部件间隔开的第二部件,并且形成具有预定厚度的第一低介电常数材料和第一和第二表面,低介电常数材料的第一表面邻近或介于 与第一部件的第一界面的第一部分接触。 第一低介电常数材料显着地减小了第一部件的电容寄生效应,导致在微电子器件工作期间第一部件的特征阻抗基本上更高。

    PROCESS FOR FORMING AN ISOLATED ELECTRICALLY CONDUCTIVE CONTACT THROUGH A METAL PACKAGE
    169.
    发明申请
    PROCESS FOR FORMING AN ISOLATED ELECTRICALLY CONDUCTIVE CONTACT THROUGH A METAL PACKAGE 有权
    通过金属包装形成隔离电导电接触的方法

    公开(公告)号:US20080289178A1

    公开(公告)日:2008-11-27

    申请号:US11753996

    申请日:2007-05-25

    Abstract: A method of forming an isolated electrically conductive contact through a metal substrate by creating at least one via through the substrate. The at least one sidewall of the via is cleaned and coated with a non-conductive layer. In one example, the non-conductive layer is formed by anodizing the sidewall(s) of the via. In another example, the non-conductive layer may be formed by thin film deposition of a dielectric on the sidewall(s). An electrically conductive filler is then placed into the via. In the examples disclosed, the filler may be a conductive ink or a conductive epoxy.

    Abstract translation: 通过形成至少一个通孔穿过衬底,通过金属衬底形成隔离的导电接触的方法。 通孔的至少一个侧壁被清洁并涂覆有非导电层。 在一个示例中,非导电层通过阳极氧化通孔的侧壁而形成。 在另一示例中,非导电层可以通过在侧壁上的电介质的薄膜沉积来形成。 然后将导电填料放入通孔中。 在所公开的实施例中,填料可以是导电油墨或导电环氧树脂。

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