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    Ballast water treatment system having a back-pressure formation part and control method thereof
    175.
    发明授权
    Ballast water treatment system having a back-pressure formation part and control method thereof 有权
    具有背压形成部的压载水处理系统及其控制方法

    公开(公告)号：US08980103B2

    公开(公告)日：2015-03-17

    申请号：US13035288

    申请日：2011-02-25

    Applicant: Soo-Tae Lee ,  Tae-Sung Pyo ,  Sang-Gyu Cheon

    Inventor： Soo-Tae Lee ,  Tae-Sung Pyo ,  Sang-Gyu Cheon

    IPC: C02F1/00 ,  B01D21/30 ,  C02F1/32 ,  B63J4/00 ,  C02F103/08 ,  C02F103/00

    CPC classification number: C02F1/325 ,  B01D29/23 ,  B01D29/682 ,  B01D29/688 ,  B63J4/002 ,  C02F1/001 ,  C02F1/008 ,  C02F2103/008 ,  C02F2103/08 ,  C02F2201/3225 ,  C02F2201/3227 ,  C02F2201/324 ,  C02F2201/326 ,  C02F2201/328 ,  C02F2209/001 ,  C02F2209/02 ,  C02F2209/03 ,  C02F2209/40 ,  C02F2301/043 ,  C02F2303/04 ,  C02F2303/16

    Abstract: Disclosed herein are a ballast water treatment system having a back-pressure formation unit and a control method thereof. Back pressure in a filtering unit is checked and formed during a back washing operation for a filter of a filtering unit, thus enabling efficient back washing operation. Both a method of physically filtering ballast water using the filter and a method of sterilizing ballast water using ultraviolet rays are used to treat ballast water, thus preventing secondary contamination due to byproducts, and preventing the contamination of a ballast tank. A flow rate of ballast water introduced into an ultraviolet treatment unit is controlled such that the efficiency of the ultraviolet treatment unit is not reduced, while back pressure is formed in the filtering unit, thus increasing the overall treatment efficiency of the ballast water treatment system. Further, the filtering unit or the ultraviolet treatment unit may be automatically washed.

    Abstract translation: 本文公开了具有背压形成单元及其控制方法的压载水处理系统。 在过滤单元的过滤器的后清洗操作期间检查和形成过滤单元中的背压，从而能够进行有效的反洗操作。 使用过滤器对使用过滤器的压载水进行物理过滤的方法以及使用紫外线对压载水进行灭菌的方法被用于处理压载水，从而防止由于副产物引起的二次污染，并且防止压载舱的污染。 控制引入紫外线处理单元的压载水的流量，使得在过滤单元中形成背压的同时，紫外线处理单元的效率不降低，从而提高压载水处理系统的整体处理效率。 此外，过滤单元或紫外线处理单元可以被自动洗涤。

    ULTRAVIOLET WATER TREATMENT DEVICE
    176.
    发明申请
    ULTRAVIOLET WATER TREATMENT DEVICE 审中-公开
    ULTRAVIOLET水处理设备

    公开(公告)号：US20140374618A1

    公开(公告)日：2014-12-25

    申请号：US14479199

    申请日：2014-09-05

    Applicant: Kabushiki Kaisha Toshiba

    Inventor： Takeshi IDE ,  Norimitsu ABE ,  Seiichi MURAYAMA ,  Shinji KOBAYASHI ,  Kenji TAKEUCHI ,  Takahiro SOMA

    IPC: C02F1/32

    CPC classification number: C02F1/325 ,  C02F2201/3227 ,  C02F2201/324

    Abstract: An ultraviolet water treatment device of an embodiment includes an ultraviolet irradiation tank. The ultraviolet irradiation tank includes a plurality of ultraviolet irradiation modules. The ultraviolet irradiation modules include a plurality of lines of ultraviolet irradiation pipes, a cleaning device and a cleaning device driving unit. The ultraviolet irradiation pipes include a plurality of lines of ultraviolet lamps and a plurality of lines of ultraviolet lamp protective pipes individually protecting the ultraviolet lamps. The cleaning device cleans a surface of each ultraviolet lamp protective pipe. Each ultraviolet irradiation module includes two or three ultraviolet irradiation pipes.

    Abstract translation: 实施方式的紫外线水处理装置包括紫外线照射容器。 紫外线照射槽包括多个紫外线照射模块。 紫外线照射模块包括多条紫外线照射管，清洁装置和清洁装置驱动单元。 紫外线照射管包括多条紫外线线以及多条紫外线灯保护管线，分别保护紫外线灯。 清洁装置清洁每个紫外灯保护管的表面。 每个紫外线照射模块包括两个或三个紫外线照射管。

    Fluid treatment system
    177.
    发明授权
    Fluid treatment system 有权
    流体处理系统

    公开(公告)号：US08859989B2

    公开(公告)日：2014-10-14

    申请号：US13920327

    申请日：2013-06-18

    Applicant: Trojan Technologies Inc.

    Inventor： Wes From ,  Boyko M. Tchavdarov ,  Mike Marcu ,  Richard Gratton ,  David Olson ,  Jim Fraser ,  Dusko A. Kezele

    IPC: C02F1/32 ,  A61L2/10 ,  C02F1/00

    CPC classification number: C02F1/325 ,  A61L2/10 ,  C02F1/006 ,  C02F1/32 ,  C02F2201/3225 ,  C02F2201/3227 ,  C02F2201/3228 ,  C02F2201/324 ,  C02F2201/328

    Abstract: A fluid treatment system having an inlet, an outlet, and a fluid treatment zone therebetween. The zone has an array of rows of radiation source assemblies. Each radiation source assembly has a longitudinal axis disposed at an oblique angle with respect to a direction of fluid flow. Each row has a plurality of radiation source assemblies in spaced relation in a direction transverse to the direction of fluid flow, to define a gap through which fluid may flow between an adjacent pair of assemblies. Preferably, all rows in the array are staggered with respect to one another in a direction orthogonal to the direction of fluid flow, such that the gap between an adjacent pair of radiation source assemblies in an upstream row of assemblies is partially or completely obstructed in the direction of fluid flow by a serially disposed radiation source assembly in at least one downstream row.

    Abstract translation: 一种流体处理系统，其间具有入口，出口和流体处理区域。 该区域具有排列的辐射源组件。 每个辐射源组件具有相对于流体流动方向以倾斜角度设置的纵向轴线。 每排具有在横向于流体流动方向的方向上间隔开的多个辐射源组件，以限定一个间隙，流体可以通过该间隙在相邻的一对组件之间流动。 优选地，阵列中的所有行在与流体流动方向正交的方向上彼此交错，使得上游排组件中相邻的一对辐射源组件之间的间隙部分地或完全地被阻挡在 在至少一个下游排中通过串联设置的辐射源组件的流体流动方向。

    High Flow Rate Fluid Disinfection System
    179.
    发明申请
    High Flow Rate Fluid Disinfection System 审中-公开
    高流量流体消毒系统

    公开(公告)号：US20140263090A1

    公开(公告)日：2014-09-18

    申请号：US13841275

    申请日：2013-03-15

    Applicant: Stephen A. Yencho

    Inventor： Stephen A. Yencho

    IPC: C02F1/32

    CPC classification number: C02F1/325 ,  C02F1/36 ,  C02F2103/023 ,  C02F2103/10 ,  C02F2103/365 ,  C02F2201/324 ,  C02F2201/328 ,  C02F2209/40 ,  C02F2303/04 ,  Y02W10/37

    Abstract: One example of a fluid disinfection unit includes a chamber through which fluid can flow, the chamber having an inlet through which fluid enters the chamber and an outlet through which fluid exits the chamber; a source for illuminating the chamber with ultraviolet light; and a plurality of baffles within the chamber for defining a multiplicity of subchambers within the chamber through which fluid to be purified flows from the inlet to the outlet; each subchamber being located to receive the ultraviolet light; where holes are defined through at least one baffle, and wherein those holes collectively define a fluid flow area that increases with the radial distance from the center of the baffle.

    Abstract translation: 流体消毒单元的一个实例包括流体可以流过的室，腔室具有流体进入腔室的入口和流体离开室的出口; 用紫外线照射室的源; 以及在所述腔室内的多个挡板，用于在所述腔室内限定多个子室，待净化的流体将从所述入口到所述出口流动; 每个子室被定位成接收紫外光; 其中孔通过至少一个挡板限定，并且其中这些孔共同限定了随着与挡板中心的径向距离而增加的流体流动面积。

    Split Wiper Assembly for UV Disinfection Modules
    180.
    发明申请
    Split Wiper Assembly for UV Disinfection Modules 审中-公开
    用于UV消毒模块的分体刮水器组件

    公开(公告)号：US20140157531A1

    公开(公告)日：2014-06-12

    申请号：US13712860

    申请日：2012-12-12

    Applicant: Ozonia North America, LLC

    Inventor： Bruno Ferran ,  Robert Molter ,  Manileo Lapugot

    IPC: B08B7/00

    CPC classification number: C02F1/325 ,  B08B1/008 ,  C02F2201/3227 ,  C02F2201/324

    Abstract: The present invention is directed to a cleaning system for a UV disinfection module. In general, the UV disinfection module may have a pair of headers with a multiplicity of UV lamps extending therebetween. The cleaning system may include a cleaning plate having a multiplicity of openings therein, the openings arranged to substantially coincide with positions of the lamps to permit movement of the plate between the headers; a split wiper assembly including a plurality of wiper portions, each wiper portion mounted in a housing, the split wiper assembly connected to the cleaning plate and substantially encircling each opening, sized such that each split wiper assembly has an inner diameter less than the exterior diameter of a corresponding lamp; and a movement device operatively connected to move the plate between the headers.

    Abstract translation: 本发明涉及一种用于UV消毒模块的清洁系统。 通常，紫外消毒模块可以具有一对在其间延伸的多个UV灯的集管。 清洁系统可以包括其中具有多个开口的清洁板，所述开口布置成基本上与灯的位置重合，以允许板在集管之间移动; 分开的刮水器组件，包括多个擦拭器部分，每个刮水器部分安装在壳体中，所述拼接刮水器组件连接到所述清洁板并且基本上环绕每个开口，其大小使得每个所述刮水器组件的内径小于所述外部直径 相应的灯; 以及可操作地连接以在所述集管之间移动所述板的运动装置。

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